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    • 4. 发明申请
    • METHOD OF FABRICATING ELECTRIC FIELD SENSOR HAVING ELECTRIC FIELD SHIELD
    • 制造电场感应电场传感器的方法
    • US20080138924A1
    • 2008-06-12
    • US11872065
    • 2007-10-15
    • Chul-min PARKHyoung-soo KoSeung-bum Hong
    • Chul-min PARKHyoung-soo KoSeung-bum Hong
    • H01L21/44
    • G01Q60/30
    • A method of manufacturing an electric field sensor having an electric field shield. The method includes providing a substrate doped with a first impurity; forming a resistive tip having a resistance region doped with a low concentration of a second impurity at an apex of a protruding portion of the substrate, and first and second semiconductor electrode regions doped with a high concentration of the second impurity on both slopes of the protruding portion with the resistive region therebetween, wherein the second impurity has a polarity opposite to that of the first impurity; forming a dielectric layer on the resistive tip; forming a mask having a high aspect ratio on the dielectric layer; depositing a metal layer on the dielectric layer; and exposing the dielectric layer formed on the resistance region through the metal layer by removing the mask.
    • 一种制造具有电场屏蔽的电场传感器的方法。 该方法包括提供掺杂有第一杂质的衬底; 在所述基板的突出部的顶点形成具有掺杂有低浓度的第二杂质的电阻区域的电阻端头,以及在所述突出部的两个斜面上掺杂有高浓度的所述第二杂质的第一和第二半导体电极区域 其中所述第二杂质具有与所述第一杂质的极性相反的极性; 在电阻尖端上形成电介质层; 在介电层上形成具有高纵横比的掩模; 在介电层上沉积金属层; 并且通过去除掩模,使形成在电阻区域上的电介质层通过金属层曝光。