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1. 发明授权

US06426167B2 Water-resistant protective overcoat for image recording materials 失效
标题翻译：用于图像记录材料的防水保护罩
公开(公告)号：US06426167B2
公开(公告)日：2002-07-30
申请号：US09353939
申请日：1999-07-15
申请人： Hwei-Ling Yau , Lan B. Thai , Jin-Shan Wang , Tienteh Chen
发明人： Hwei-Ling Yau , Lan B. Thai , Jin-Shan Wang , Tienteh Chen
IPC分类号： G03C1108
CPC分类号： G03C1/7614 , B41M7/0027 , G03C1/047 , G03C1/95 , G03C11/08 , G03C2001/03594 , G03C2001/7635 , G03C2200/36 , Y10S430/162
摘要： An overcoat composition for imaging products containing: 30-95 weight %, based on the dry laydown of the overcoat, of a hydrophobic polymer, said hydrophobic polymer being homopolymers or copolymers containing at least 30% by weight, based on the total weight of monomers, of the monomer described in structurel; and 5 to 70 weight %, based on the dry laydown of the overcoat, of gelatin: wherein: R is H, CH3, C2H5, and C3H7; and X1, X2, X3, X4 and X5 are H, F, Cl, Br, I, CN, CH3O, C2H5O, C3H7O, C4H9O, CH3, C2H5, C3H7, n-C4H9, sec-C4H9, tert-C4H9, CF3, C2F5, C3F7, iso-C3F7, n-C4F9, sec-C4F9, tert-C4F9, CH3NH, (CH3)2N, n-C5H11, C4H9, n-C6H13, n-C7H15, n-C8H17, n-C9H19, n-C10H21, or n-C12H25.
摘要翻译：用于成像产品的外涂层组合物，其基于外涂层的干沉积，疏水性聚合物为30-95重量％，所述疏水性聚合物为基于单体总重量的至少30重量％的均聚物或共聚物，结构1中描述的单体; 和5至70重量％，基于外涂层的干沉积;明胶：其中：R是H，CH 3，C 2 H 5和C 3 H 7; 并且X 1，X 2，X 3，X 4和X 5分别是H，F，Cl，Br，I，CN，CH 3 O，C 2 H 5 O，C 3 H 7 O，C 4 H 9 O，CH 3，C 2 H 5，C 3 H 7，n-C 4 H 9，仲-C 4 H 9，C 4 H 9，CF 3， C2F5，C3F7，iso-C3F7，n-C4F9，sec-C4F9，叔-C4F9，CH3NH，（CH3）2N，n-C5H11，C4H9，n-C6H13，n-C7H15，n-C8H17，n-C9H19，n -C 10 H 21或n-C 12 H 25。

2. 发明授权

US5958660A Hydrophilic colloid composition 失效
标题翻译：亲水胶体组成
公开(公告)号：US5958660A
公开(公告)日：1999-09-28
申请号：US1987
申请日：1997-12-31
申请人： Jeffrey F. Taylor , Tien-teh Chen , Hwei-Ling Yau , Elmer C. Flood , Lan B. Thai
发明人： Jeffrey F. Taylor , Tien-teh Chen , Hwei-Ling Yau , Elmer C. Flood , Lan B. Thai
IPC分类号： C08F220/38 , C08F230/06 , C08L43/00 , C08L101/14 , C09D4/00 , C09D201/00 , G03C1/053 , G03C1/30 , G03C1/047 , G03C1/38
CPC分类号： G03C1/053 , C08F220/38 , C08F230/06 , C09D4/00 , G03C1/30
摘要： This invention comprises a composition containing a hydrophilic colloid and a water soluble polymer of boric acid, and optionally a hardening agent for the hydrophilic colloid. The hydrophilic colloid is preferably gelatin. This invention also comprises a photographic element in which at least one layer thereof contains a hydrophilic colloid and a water-soluble polymer of boric acid and a method of making the photographic element.
摘要翻译：本发明包括含有亲水胶体和硼酸的水溶性聚合物的组合物，以及任选的用于亲水胶体的硬化剂。亲水胶体优选为明胶。本发明还包括其中至少一层含有亲水胶体和硼酸的水溶性聚合物的照相元件以及制造照相元件的方法。

3. 发明授权

US5244763A Polymeric scavengers for oxidized developing agents and photographic elements containing the same 失效
标题翻译：用于氧化发展代理的聚合物扫描器和包含其的摄影元件
公开(公告)号：US5244763A
公开(公告)日：1993-09-14
申请号：US3038
申请日：1993-01-11
申请人： Ralph B. Nielsen , Lan B. Thai , Hwei-ling Yau
发明人： Ralph B. Nielsen , Lan B. Thai , Hwei-ling Yau
IPC分类号： G03C1/34 , C07C69/90 , G03C1/053 , G03C7/392 , G03C7/396
CPC分类号： G03C1/053 , C07C69/90 , G03C7/396
摘要： Reducing agents for oxidized developing agents and light sensitive elements containing the reducing agents wherein the reducing agents comprise a polymer having gallic acid or gallic acid derivative moieties.

4. 发明授权

US06268101B1 Water-resistant polyurethane overcoat for imaging materials 失效
标题翻译：用于成像材料的防水聚氨酯外套
公开(公告)号：US06268101B1
公开(公告)日：2001-07-31
申请号：US09548514
申请日：2000-04-13
申请人： Paul D. Yacobucci , Hwei-Ling Yau , Catherine A. Falkner , Lan B. Thai
发明人： Paul D. Yacobucci , Hwei-Ling Yau , Catherine A. Falkner , Lan B. Thai
IPC分类号： G03C1108
CPC分类号： B41M7/0027 , G03C1/7614 , G03C2001/7635 , G03C2200/47 , G03G7/0033 , G03G7/0046 , G03G8/00 , Y10S430/162
摘要： The present invention relates to imaging elements, including photographic elements and recording media, having a protective overcoat that resists fingerprints, common stains, and spills. More particularly, the present invention provides a water permeable overcoat during image formation but that is water resistant in the final processed product. The overcoat, before formation of the image, comprises polyurethane particles in a gelatin-containing matrix. Subsequent to formation of the image, the overcoat is heat fused, resulting in the formation of a water-resistant continuous protective overcoat that provides excellent scratch and spill resistance.
摘要翻译：本发明涉及包含摄影元件和记录介质的成像元件，其具有防止指纹，常见污渍和溢出物的保护外套。更具体地，本发明在成像期间提供了可渗透的外涂层，但是在最终加工产品中具有防水性。在形成图像之前，外涂层包含含有明胶的基质中的聚氨酯颗粒。在形成图像之后，外涂层被热熔化，导致形成耐水的连续保护性外涂层，其提供优异的耐刮擦和防溢流性。

5. 发明授权

US5198517A Polymeric scavengers for oxidized developing agents and photographic elements containing the same 失效
标题翻译：用于氧化发展代理的聚合物扫描器和包含其的摄影元件
公开(公告)号：US5198517A
公开(公告)日：1993-03-30
申请号：US740732
申请日：1991-08-06
申请人： Ralph B. Neilsen , Lan B. Thai , Hwei-ling Yau
发明人： Ralph B. Neilsen , Lan B. Thai , Hwei-ling Yau
IPC分类号： G03C1/34 , C07C69/90 , G03C1/053 , G03C7/392 , G03C7/396
CPC分类号： G03C1/053 , C07C69/90 , G03C7/396
摘要： Reducing agents for oxidized developing agents and light sensitive elements containing the reducing agents wherein the reducing agents comprise a polymer having gallic acid or gallic acid derivative moieties.
摘要翻译：用于氧化显影剂和含有还原剂的光敏元件的还原剂，其中还原剂包含具有没食子酸或没食子酸衍生物部分的聚合物。

6. 发明申请

US20090130398A1 Gradient colored mask 有权
标题翻译：渐变色面具
公开(公告)号：US20090130398A1
公开(公告)日：2009-05-21
申请号：US11986189
申请日：2007-11-20
申请人： Lyn M. Irving , Mark E. Irving , Lan B. Thai
发明人： Lyn M. Irving , Mark E. Irving , Lan B. Thai
IPC分类号： G03F1/00 , G03F7/26
CPC分类号： H01L27/1288 , G03F7/0005 , G03F7/2022 , H01L27/1214 , H01L27/1225 , H01L29/66765 , H01L29/7869 , Y10T428/24802
摘要： The invention relates to a process for forming a structure comprising: (a) providing a transparent support; (b) forming a color mask having a selected absorption spectral range wherein the color mask has an effectively transparent portion and a partially absorptive portion, wherein the partially absorptive portion includes at least two portions having different optical densities within the absorption spectral range; (c) coating a layer of a photopatternable material sensitive to visible light in the absorption spectral range; (d) exposing and developing the photopatternable material to form a photopattern corresponding to at least one of said two portions of the partially absorptive portion; and (e) depositing and patterning a layer of functional material such that a pattern of functional material results corresponding to the at least one of said two portions of the partially absorptive portion.
摘要翻译：本发明涉及一种用于形成结构的方法，包括：（a）提供透明支撑体; （b）形成具有选定的吸收光谱范围的彩色掩模，其中所述彩色掩模具有有效透明部分和部分吸收部分，其中所述部分吸收部分包括在吸收光谱范围内具有不同光密度的至少两个部分; （c）在吸收光谱范围内涂覆对可见光敏感的光致图案材料层; （d）曝光和显影所述光图案化材料以形成对应于所述部分吸收部分的所述两个部分中的至少一个的光图案; 和（e）沉积和图案化功能材料层，使得功能材料的图案对应于部分吸收部分的所述两个部分中的至少一个。

7. 发明授权

US08173355B2 Gradient colored mask 有权
标题翻译：渐变色面具
公开(公告)号：US08173355B2
公开(公告)日：2012-05-08
申请号：US11986189
申请日：2007-11-20
申请人： Lyn M. Irving , Mark E. Irving , Lan B. Thai
发明人： Lyn M. Irving , Mark E. Irving , Lan B. Thai
IPC分类号： G03F1/00 , G03F7/26
CPC分类号： H01L27/1288 , G03F7/0005 , G03F7/2022 , H01L27/1214 , H01L27/1225 , H01L29/66765 , H01L29/7869 , Y10T428/24802
摘要： The invention relates to a process for forming a structure comprising: (a) providing a transparent support; (b) forming a color mask having a selected absorption spectral range wherein the color mask has an effectively transparent portion and a partially absorptive portion, wherein the partially absorptive portion includes at least two portions having different optical densities within the absorption spectral range; (c) coating a layer of a photopatternable material sensitive to visible light in the absorption spectral range; (d) exposing and developing the photopatternable material to form a photopattern corresponding to at least one of said two portions of the partially absorptive portion; and (e) depositing and patterning a layer of functional material such that a pattern of functional material results corresponding to the at least one of said two portions of the partially absorptive portion.
摘要翻译：本发明涉及一种用于形成结构的方法，包括：（a）提供透明支撑体; （b）形成具有选定的吸收光谱范围的彩色掩模，其中所述彩色掩模具有有效透明部分和部分吸收部分，其中所述部分吸收部分包括在吸收光谱范围内具有不同光密度的至少两个部分; （c）在吸收光谱范围内涂覆对可见光敏感的光致图案材料层; （d）曝光和显影所述光图案化材料以形成对应于所述部分吸收部分的所述两个部分中的至少一个的光图案; 和（e）沉积和图案化功能材料层，使得功能材料的图案对应于部分吸收部分的所述两个部分中的至少一个。

8. 发明授权

US08153352B2 Multicolored mask process for making display circuitry 有权
标题翻译：用于制作显示电路的多彩蒙版工艺
公开(公告)号：US08153352B2
公开(公告)日：2012-04-10
申请号：US11986088
申请日：2007-11-20
申请人： Lyn M. Irving , David H. Levy , Lan B. Thai
发明人： Lyn M. Irving , David H. Levy , Lan B. Thai
IPC分类号： G03F7/20
CPC分类号： H01L27/1288 , G03F7/2022 , H01L27/1214 , H01L27/1225 , H01L27/3244 , H01L29/66765 , H01L29/7869 , H01L2227/323 , Y10T428/24802
摘要： A process for forming a pixel circuit is disclosed comprising: (a) providing a transparent support; (b) forming a multicolor mask having at least four different color patterns; (c) forming integrated electronic components of the pixel circuit having at least four layers of patterned functional material comprising a first conductor, a dielectric, a semiconductor, and a second conductor each layer of patterned functional material corresponding to the four different color patterns of the multicolor mask. The functional material is patterned using a photopattern corresponding to each color pattern.
摘要翻译：公开了一种用于形成像素电路的工艺，包括：（a）提供透明支撑体; （b）形成具有至少四种不同颜色图案的多色蒙版; （c）形成像素电路的集成电子部件，其具有至少四层图案化的功能材料，其包括第一导体，电介质，半导体和第二导体，每层图案化的功能材料层对应于四个不同颜色图案多色面膜使用对应于每个颜色图案的光图案来对功能材料进行图案化。

9. 发明申请

US20120181554A1 MULTICOLORED MASK PROCESS FOR MAKING DISPLAY CIRCUITRY 有权
标题翻译：用于制作显示电路的MULTICOLORA MASK PROCESS
公开(公告)号：US20120181554A1
公开(公告)日：2012-07-19
申请号：US13410342
申请日：2012-03-02
申请人： Lyn M. Irving , David H. Levy , Lan B. Thai
发明人： Lyn M. Irving , David H. Levy , Lan B. Thai
IPC分类号： H01L33/62
CPC分类号： H01L27/1288 , G03F7/2022 , H01L27/1214 , H01L27/1225 , H01L27/3244 , H01L29/66765 , H01L29/7869 , H01L2227/323 , Y10T428/24802
摘要： A process for forming a pixel circuit is disclosed comprising: (a) providing a transparent support; (b) forming a multicolor mask having at least four different color patterns; (c) forming integrated electronic components of the pixel circuit having at least four layers of patterned functional material comprising a first conductor, a dielectric, a semiconductor, and a second conductor each layer of patterned functional material corresponding to the four different color patterns of the multicolor mask. The functional material is patterned using a photopattern corresponding to each color pattern.
摘要翻译：公开了一种用于形成像素电路的工艺，包括：（a）提供透明支撑体; （b）形成具有至少四种不同颜色图案的多色蒙版; （c）形成像素电路的集成电子部件，其具有至少四层图案化的功能材料，其包括第一导体，电介质，半导体和第二导体，每层图案化的功能材料层对应于四个不同颜色图案多色面膜使用对应于每个颜色图案的光图案来对功能材料进行图案化。

10. 发明授权

US08664673B2 Multicolored mask process for making display circuitry 有权
标题翻译：用于制作显示电路的多彩蒙版工艺
公开(公告)号：US08664673B2
公开(公告)日：2014-03-04
申请号：US13410342
申请日：2012-03-02
申请人： Lyn M. Irving , David H. Levy , Lan B. Thai
发明人： Lyn M. Irving , David H. Levy , Lan B. Thai
IPC分类号： H01L33/62
CPC分类号： H01L27/1288 , G03F7/2022 , H01L27/1214 , H01L27/1225 , H01L27/3244 , H01L29/66765 , H01L29/7869 , H01L2227/323 , Y10T428/24802
摘要： A process for forming a pixel circuit is disclosed comprising: (a) providing a transparent support; (b) forming a multicolor mask having at least four different color patterns; (c) forming integrated electronic components of the pixel circuit having at least four layers of patterned functional material comprising a first conductor, a dielectric, a semiconductor, and a second conductor each layer of patterned functional material corresponding to the four different color patterns of the multicolor mask. The functional material is patterned using a photopattern corresponding to each color pattern.
摘要翻译：公开了一种用于形成像素电路的工艺，包括：（a）提供透明支撑体; （b）形成具有至少四种不同颜色图案的多色蒙版; （c）形成像素电路的集成电子部件，其具有至少四层图案化的功能材料，其包括第一导体，电介质，半导体和第二导体，每层图案化的功能材料层对应于四个不同颜色图案多色面膜使用对应于每个颜色图案的光图案来对功能材料进行图案化。

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