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1. 发明授权

US08021211B2 Substrate holder with liquid supporting surface 失效
标题翻译：基板支架，液面支撑
公开(公告)号：US08021211B2
公开(公告)日：2011-09-20
申请号：US12105798
申请日：2008-04-18
申请人： Hung Chih Chen , Yin Yuan , Stephen Jew
发明人： Hung Chih Chen , Yin Yuan , Stephen Jew
IPC分类号： B24B7/22
CPC分类号： B24B37/30
摘要： Embodiments of the present invention generally relate to a substrate transferring system. One embodiment of the present invention provides a substrate holder comprising a pedestal plate, a basin wall extending from a top surface of the pedestal plate, wherein the basin wall has a substantially leveled top surface, the basin wall and the pedestal plate define a basin configured to retain a liquid therein, and a liquid port opening to the basin, wherein the liquid port is configured to flow a liquid to the basin and allow the liquid to overflow from the basin wall, and a top surface of the overflow liquid in the basin is configured to support a substrate without contacting the basin wall or the pedestal plate.
摘要翻译：本发明的实施例一般涉及基板传送系统。本发明的一个实施例提供了一种衬底保持器，其包括基座板，从基座板的顶表面延伸的盆壁，其中，所述盆壁具有基本上平整的顶表面，所述盆壁和所述基座板限定了配置在其中保持液体，以及通向所述盆的液体口，其中所述液体端口被配置为使液体流到所述盆中并允许所述液体从所述盆壁溢出，并且所述盆中的所述溢流液体的顶表面构造成支撑基板而不接触盆壁或基座板。

2. 发明申请

US20090264056A1 SUBSTRATE HOLDER WITH LIQUID SUPPORTING SURFACE 失效
标题翻译：带液体支撑表面的基座
公开(公告)号：US20090264056A1
公开(公告)日：2009-10-22
申请号：US12105798
申请日：2008-04-18
申请人： Hung Chih Chen , Yin Yuan , Stephen Jew
发明人： Hung Chih Chen , Yin Yuan , Stephen Jew
IPC分类号： B24B41/06
CPC分类号： B24B37/30
摘要： Embodiments of the present invention generally relate to a substrate transferring system. One embodiment of the present invention provides a substrate holder comprising a pedestal plate, a basin wall extending from a top surface of the pedestal plate, wherein the basin wall has a substantially leveled top surface, the basin wall and the pedestal plate define a basin configured to retain a liquid therein, and a liquid port opening to the basin, wherein the liquid port is configured to flow a liquid to the basin and allow the liquid to overflow from the basin wall, and a top surface of the overflow liquid in the basin is configured to support a substrate without contacting the basin wall or the pedestal plate.
摘要翻译：本发明的实施例一般涉及基板传送系统。本发明的一个实施例提供了一种衬底保持器，其包括基座板，从基座板的顶表面延伸的盆壁，其中，所述盆壁具有基本上平整的顶表面，所述盆壁和所述基座板限定了配置在其中保持液体，以及通向所述盆的液体口，其中所述液体端口被配置为使液体流到所述盆中并允许所述液体从所述盆壁溢出，并且所述盆中的所述溢流液体的顶表面构造成支撑基板而不接触盆壁或基座板。

3. 发明授权

US09254547B2 Side pad design for edge pedestal 有权
标题翻译：边垫设计用于边缘基座
公开(公告)号：US09254547B2
公开(公告)日：2016-02-09
申请号：US12751743
申请日：2010-03-31
申请人： Yin Yuan , Hung Chih Chen , Shou-Sung Chang
发明人： Yin Yuan , Hung Chih Chen , Shou-Sung Chang
IPC分类号： B24B53/017 , B24B37/005 , B24B37/10 , B24B37/34
CPC分类号： B24B53/017 , B24B37/005 , B24B37/10
摘要： A method and apparatus for facilitating equalized conditioning of a polishing surface of a polishing pad is described. The apparatus includes an extension device coupled to a base adjacent a peripheral edge of a polishing pad that is adapted to support a conditioning device, the extension device includes a body that is movable relative to the polishing pad, and a sacrificial pad comprising a polishing material coupled to a mounting surface of the body.
摘要翻译：描述了一种用于促进抛光垫的抛光表面的均匀调节的方法和装置。该装置包括连接到邻近抛光垫的外围边缘的基座的延伸装置，其适于支撑调节装置，该延伸装置包括可相对于抛光垫移动的主体，以及包括抛光材料的牺牲垫联接到主体的安装表面。

4. 发明授权

US08721391B2 Carrier head with narrow inner ring and wide outer ring 有权
标题翻译：承载头带窄内圈和宽外圈
公开(公告)号：US08721391B2
公开(公告)日：2014-05-13
申请号：US13204571
申请日：2011-08-05
申请人： Hung Chih Chen , Samuel Chu-Chiang Hsu , Yin Yuan , Huanbo Zhang , Gautam Shashank Dandavate
发明人： Hung Chih Chen , Samuel Chu-Chiang Hsu , Yin Yuan , Huanbo Zhang , Gautam Shashank Dandavate
IPC分类号： B24B37/32
CPC分类号： B24B41/06 , B24B37/32 , B24B41/067
摘要： A carrier head for a chemical mechanical polisher includes base, a substrate mounting surface, an annular inner ring, and an annular outer ring. The inner ring has an inner surface configured to circumferentially surround the edge of a substrate positioned on the substrate mounting surface, an outer surface, and a lower surface to contact a polishing pad. The inner ring is vertically movable relative to the substrate mounting surface. The outer ring has an inner surface circumferentially surrounding the inner ring, an outer surface, and a lower surface to contact the polishing pad. The outer ring is vertically movable relative to and independently of the substrate mounting surface and the inner ring. The lower surface of the inner ring has a first width, and the lower surface of the outer ring has a second width greater than the first width.
摘要翻译：用于化学机械抛光机的载体头包括基底，基底安装表面，环形内环和环形外环。内环具有被构造为周向地围绕位于基板安装表面上的基板的边缘的内表面，外表面和与抛光垫接触的下表面。内环可相对于基板安装表面垂直移动。外环具有围绕内环的内表面，外表面和与抛光垫接触的下表面。外环可相对于基板安装表面和内圈而相对并且独立于其上下移动。内圈的下表面具有第一宽度，并且外环的下表面具有大于第一宽度的第二宽度。

5. 发明申请

US20120034849A1 CARRIER HEAD WITH NARROW INNER RING AND WIDE OUTER RING 有权
标题翻译：带有内圈和宽外圈的承载头
公开(公告)号：US20120034849A1
公开(公告)日：2012-02-09
申请号：US13204571
申请日：2011-08-05
申请人： Hung Chih Chen , Samuel Chu-Chiang Hsu , Yin Yuan , Huanbo Zhang , Gautam Shashank Dandavate
发明人： Hung Chih Chen , Samuel Chu-Chiang Hsu , Yin Yuan , Huanbo Zhang , Gautam Shashank Dandavate
IPC分类号： B24B41/06 , B24B1/00
CPC分类号： B24B41/06 , B24B37/32 , B24B41/067
摘要： A carrier head for a chemical mechanical polisher includes base, a substrate mounting surface, an annular inner ring, and an annular outer ring. The inner ring has an inner surface configured to circumferentially surround the edge of a substrate positioned on the substrate mounting surface, an outer surface, and a lower surface to contact a polishing pad. The inner ring is vertically movable relative to the substrate mounting surface. The outer ring has an inner surface circumferentially surrounding the inner ring, an outer surface, and a lower surface to contact the polishing pad. The outer ring is vertically movable relative to and independently of the substrate mounting surface and the inner ring. The lower surface of the inner ring has a first width, and the lower surface of the outer ring has a second width greater than the first width.
摘要翻译：用于化学机械抛光机的载体头包括基底，基底安装表面，环形内环和环形外环。内环具有被构造为周向地围绕位于基板安装表面上的基板的边缘的内表面，外表面和与抛光垫接触的下表面。内环可相对于基板安装表面垂直移动。外环具有围绕内环的内表面，外表面和与抛光垫接触的下表面。外环可相对于基板安装表面和内圈而相对并且独立于其上下移动。内圈的下表面具有第一宽度，并且外环的下表面具有大于第一宽度的第二宽度。

6. 发明申请

US20110244763A1 SIDE PAD DESIGN FOR EDGE PEDESTAL 有权
标题翻译：侧面设计用于边缘馅饼
公开(公告)号：US20110244763A1
公开(公告)日：2011-10-06
申请号：US12751743
申请日：2010-03-31
申请人： Yin Yuan , Hung Chih Chen , Shou-Sung Chang
发明人： Yin Yuan , Hung Chih Chen , Shou-Sung Chang
IPC分类号： B24B1/04 , B24B55/00
CPC分类号： B24B53/017 , B24B37/005 , B24B37/10
摘要： A method and apparatus for facilitating equalized conditioning of a polishing surface of a polishing pad is described. The apparatus includes an extension device coupled to a base adjacent a peripheral edge of a polishing pad that is adapted to support a conditioning device, the extension device includes a body that is movable relative to the polishing pad, and a sacrificial pad comprising a polishing material coupled to a mounting surface of the body.
摘要翻译：描述了一种用于促进抛光垫的抛光表面的均匀调节的方法和装置。该装置包括连接到邻近抛光垫的外围边缘的基座的延伸装置，其适于支撑调节装置，该延伸装置包括可相对于抛光垫移动的主体，以及包括抛光材料的牺牲垫联接到主体的安装表面。

7. 发明申请

US20130149942A1 INNER RETAINING RING AND OUTER RETAINING RING FOR CARRIER HEAD 有权
标题翻译：内圈保持环和外保持架
公开(公告)号：US20130149942A1
公开(公告)日：2013-06-13
申请号：US13762963
申请日：2013-02-08
申请人： Hung Chih Chen , Samuel Chu-Chiang Hsu , Yin Yuan , Huanbo Zhang , Gautam Shashank Dandavate
发明人： Hung Chih Chen , Samuel Chu-Chiang Hsu , Yin Yuan , Huanbo Zhang , Gautam Shashank Dandavate
IPC分类号： B24B41/06
CPC分类号： B24B41/06 , B24B37/32 , B24B41/067
摘要： An inner ring for a carrier head has an inner surface configured to circumferentially surround the edge of a substrate positioned on the substrate mounting surface, an outer surface, and a lower surface to contact a polishing pad. An outer ring for a carrier head has an inner surface circumferentially surrounding the inner ring, an outer surface, and a lower surface to contact the polishing pad.
摘要翻译：用于承载头的内圈具有内表面，该内表面被构造成周向地围绕位于基板安装表面上的基板的边缘，外表面和下表面以接触抛光垫。用于承载头的外圈具有周向围绕内圈的外表面，外表面和与抛光垫接触的下表面。

8. 发明申请

US20120034848A1 SUBSTRATE EDGE TUNING WITH RETAINING RING 审中-公开
标题翻译：基板边缘调整与保持环
公开(公告)号：US20120034848A1
公开(公告)日：2012-02-09
申请号：US13204541
申请日：2011-08-05
申请人： Hung Chih Chen , Mario David Silvetti , Yin Yuan
发明人： Hung Chih Chen , Mario David Silvetti , Yin Yuan
IPC分类号： B24B1/00 , B24B41/06
CPC分类号： B24B41/06 , B24B37/32 , B24B41/067
摘要： A carrier head for a chemical mechanical polisher includes a base, a substrate mounting surface, an annular inner ring and an outer ring. The inner ring has a lower surface configured to contact an upper surface of a substrate positioned on the substrate mounting surface, an outer surface, and an inwardly facing surface extending downwardly from the lower surface and is configured to circumferentially surround the edge of the substrate, the inner ring vertically movable relative to the substrate mounting surface. The outer ring has an inner surface circumferentially surrounding the inner ring, an outer surface, and a lower surface to contact the polishing pad, and the outer ring is vertically movable relative to and independently of the substrate mounting surface and the inner ring.
摘要翻译：用于化学机械抛光机的载体头包括基底，基底安装表面，环形内环和外环。所述内环具有被配置为接触位于所述基板安装表面上的基板的上表面的下表面，外表面和从所述下表面向下延伸的面向内的表面，并且构造成周向地围绕所述基板的边缘，所述内环可相对于所述基板安装表面垂直移动。外环具有周向包围内环的内表面，外表面和与抛光垫接触的下表面，并且外环可相对于基板安装表面和内环而垂直地可移动。

9. 发明授权

US08033895B2 Retaining ring with shaped profile 有权
标题翻译：带有形状轮廓的保持环
公开(公告)号：US08033895B2
公开(公告)日：2011-10-11
申请号：US11780335
申请日：2007-07-19
申请人： Gopalakrishna B. Prabhu , Yin Yuan , Jeonghoon Oh , Gregory E. Menk
发明人： Gopalakrishna B. Prabhu , Yin Yuan , Jeonghoon Oh , Gregory E. Menk
IPC分类号： B24B7/22
CPC分类号： B24B37/32 , H01L21/68721 , Y10T292/205
摘要： Retaining rings with curved surfaces are described. The curved surfaces prevent damage to a fixed abrasive polishing pad when the retaining ring is used in a polishing process. The curved surfaces are on the bottom surface of the ring, such as along the outer diameter and/or along the sidewalls of channels formed in the bottom of the ring.
摘要翻译：描述具有弯曲表面的保持环。当在抛光过程中使用保持环时，弯曲表面可防止固定磨料抛光垫的损坏。弯曲表面位于环的底表面上，例如沿着形成在环的底部的通道的外径和/或沿着通道的侧壁。

10. 发明申请

US20090021024A1 Retaining Ring with Shaped Profile 有权
标题翻译：带形状的保持环
公开(公告)号：US20090021024A1
公开(公告)日：2009-01-22
申请号：US11780335
申请日：2007-07-19
申请人： Gopalakrishna B. Prabhu , Yin Yuan , Jeonghoon Oh , Gregory E. Menk
发明人： Gopalakrishna B. Prabhu , Yin Yuan , Jeonghoon Oh , Gregory E. Menk
IPC分类号： B65D45/32
CPC分类号： B24B37/32 , H01L21/68721 , Y10T292/205
摘要： Retaining rings with curved surfaces are described. The curved surfaces prevent damage to a fixed abrasive polishing pad when the retaining ring is used in a polishing process. The curved surfaces are on the bottom surface of the ring, such as along the outer diameter and/or along the sidewalls of channels formed in the bottom of the ring.
摘要翻译：描述具有弯曲表面的保持环。当在抛光过程中使用保持环时，弯曲表面可防止固定磨料抛光垫的损坏。弯曲表面位于环的底表面上，例如沿着形成在环的底部的通道的外径和/或沿着通道的侧壁。

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