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    • 2. 发明申请
    • GROUP III NITRIDE NANOROD LIGHT EMITTING DEVICE AND METHOD OF MANUFACTURING THEREOF
    • 第III组氮化物纳米光发光装置及其制造方法
    • US20120068153A1
    • 2012-03-22
    • US13231415
    • 2011-09-13
    • Han Kyu SeongHun Jae ChungJung Ja YangCheol Soo Sone
    • Han Kyu SeongHun Jae ChungJung Ja YangCheol Soo Sone
    • H01L33/04H01L33/32
    • H01L33/32H01L33/08H01L33/16H01L33/24
    • A group III nitride nanorod light emitting device and a method of manufacturing thereof. The method includes preparing a substrate, forming an insulating film including one or more openings exposing parts of the substrate on the substrate, growing first conductive group III nitride nanorod seed layers on the substrate exposed through the openings by supplying a group III source gas and a nitrogen (N) source gas thereto, growing first conductive group III nitride nanorods on the first conductive group III nitride nanorod seed layers by supplying the group III source gas and an impurity source gas in a pulse mode and continuously supplying the N source gas, forming an active layer on a surface of each of the first conductive group III nitride nanorods, and forming a second conductive nitride semiconductor layer on the active layer.
    • 一种III族氮化物纳米棒发光器件及其制造方法。 该方法包括:准备衬底,形成绝缘膜,该绝缘膜包括一个或多个开口,暴露在衬底上的衬底的部分;通过提供第III族源气体,在通过开口暴露的衬底上生长第一导电III族氮化物纳米棒种子层; 通过向第一导电III族氮化物纳米棒种子层生长第一导电III族氮化物纳米棒,通过以脉冲模式提供第III族源气体和杂质源气体并连续地供给N源气体,形成氮 在所述第一导电III族氮化物纳米棒中的每一个的表面上的有源层,以及在所述有源层上形成第二导电氮化物半导体层。
    • 5. 发明授权
    • Group III nitride nanorod light emitting device and method of manufacturing thereof
    • III族氮化物纳米棒发光器件及其制造方法
    • US08455284B2
    • 2013-06-04
    • US13231415
    • 2011-09-13
    • Han Kyu SeongHun Jae ChungJung Ja YangCheol Soo Sone
    • Han Kyu SeongHun Jae ChungJung Ja YangCheol Soo Sone
    • H01L21/00
    • H01L33/32H01L33/08H01L33/16H01L33/24
    • A group III nitride nanorod light emitting device and a method of manufacturing thereof. The method includes preparing a substrate, forming an insulating film including one or more openings exposing parts of the substrate on the substrate, growing first conductive group III nitride nanorod seed layers on the substrate exposed through the openings by supplying a group III source gas and a nitrogen (N) source gas thereto, growing first conductive group III nitride nanorods on the first conductive group III nitride nanorod seed layers by supplying the group III source gas and an impurity source gas in a pulse mode and continuously supplying the N source gas, forming an active layer on a surface of each of the first conductive group III nitride nanorods, and forming a second conductive nitride semiconductor layer on the active layer.
    • 一种III族氮化物纳米棒发光器件及其制造方法。 该方法包括:准备衬底,形成绝缘膜,该绝缘膜包括一个或多个开口,暴露在衬底上的衬底的部分;通过提供第III族源气体,在通过开口暴露的衬底上生长第一导电III族氮化物纳米棒种子层; 通过向第一导电III族氮化物纳米棒种子层生长第一导电III族氮化物纳米棒,通过以脉冲模式提供第III族源气体和杂质源气体并连续地供给N源气体,形成氮 在所述第一导电III族氮化物纳米棒中的每一个的表面上的有源层,以及在所述有源层上形成第二导电氮化物半导体层。
    • 6. 发明授权
    • Nitride semiconductor device
    • 氮化物半导体器件
    • US07923716B2
    • 2011-04-12
    • US12188698
    • 2008-08-08
    • Soo Min LeeHee Seok ParkJae Woong HanSeong Suk LeeCheol Soo Sone
    • Soo Min LeeHee Seok ParkJae Woong HanSeong Suk LeeCheol Soo Sone
    • H01L31/00
    • H01L33/32B82Y10/00B82Y20/00H01L33/06
    • There is provided a nitride semiconductor device including: an n-type nitride semiconductor layer; a p-type nitride semiconductor layer; and an active layer formed between the n-type and p-type nitride semiconductor layers, the active layer including a plurality of quantum well layers and at least one quantum barrier layer deposited alternately with each other, wherein the active layer includes a first quantum well layer, a second quantum well layer formed adjacent to the first quantum well layer toward the p-type nitride semiconductor layer and having a quantum level higher than a quantum level of the first quantum well layer, and a tunneling quantum barrier layer formed between the first and second quantum well layers and having a thickness enabling a carrier to be tunneled therethrough.
    • 提供了一种氮化物半导体器件,包括:n型氮化物半导体层; p型氮化物半导体层; 以及形成在所述n型和p型氮化物半导体层之间的有源层,所述有源层包括彼此交替沉积的多个量子阱层和至少一个量子势垒层,其中所述有源层包括第一量子阱 层,与第一量子阱层相邻形成朝向p型氮化物半导体层并且具有高于第一量子阱层的量子级的量子级的第二量子阱层,以及形成在第一量子阱层之间的隧穿量子势垒层 和第二量子阱层,并且具有能够使载体穿过其的厚度。
    • 7. 发明申请
    • NITRIDE SEMICONDUCTOR DEVICE
    • 氮化物半导体器件
    • US20110186815A1
    • 2011-08-04
    • US13083990
    • 2011-04-11
    • Soo Min LEEHee Seok ParkJae Woong HanSeong Suk LeeCheol Soo Sone
    • Soo Min LEEHee Seok ParkJae Woong HanSeong Suk LeeCheol Soo Sone
    • H01L29/15
    • H01L33/32B82Y10/00B82Y20/00H01L33/06
    • There is provided a nitride semiconductor device including: an n-type nitride semiconductor layer; a p-type nitride semiconductor layer; and an active layer formed between the n-type and p-type nitride semiconductor layers, the active layer including a plurality of quantum well layers and at least one quantum barrier layer deposited alternately with each other, wherein the active layer includes a first quantum well layer, a second quantum well layer formed adjacent to the first quantum well layer toward the p-type nitride semiconductor layer and having a quantum level higher than a quantum level of the first quantum well layer, and a tunneling quantum barrier layer formed between the first and second quantum well layers and having a thickness enabling a carrier to be tunneled therethrough.
    • 提供了一种氮化物半导体器件,包括:n型氮化物半导体层; p型氮化物半导体层; 以及形成在所述n型和p型氮化物半导体层之间的有源层,所述有源层包括彼此交替沉积的多个量子阱层和至少一个量子势垒层,其中所述有源层包括第一量子阱 层,与第一量子阱层相邻形成朝向p型氮化物半导体层并且具有高于第一量子阱层的量子级的量子级的第二量子阱层,以及形成在第一量子阱层之间的隧穿量子势垒层 和第二量子阱层,并且具有能够使载体穿过其的厚度。
    • 9. 发明申请
    • NITRIDE SEMICONDUCTOR DEVICE
    • 氮化物半导体器件
    • US20090146132A1
    • 2009-06-11
    • US12188698
    • 2008-08-08
    • Soo Min LEEHee Seok ParkJae Woong HanSeong Suk LeeCheol Soo Sone
    • Soo Min LEEHee Seok ParkJae Woong HanSeong Suk LeeCheol Soo Sone
    • H01L33/00
    • H01L33/32B82Y10/00B82Y20/00H01L33/06
    • There is provided a nitride semiconductor device including: an n-type nitride semiconductor layer; a p-type nitride semiconductor layer; and an active layer formed between the n-type and p-type nitride semiconductor layers, the active layer including a plurality of quantum well layers and at least one quantum barrier layer deposited alternately with each other, wherein the active layer includes a first quantum well layer, a second quantum well layer formed adjacent to the first quantum well layer toward the p-type nitride semiconductor layer and having a quantum level higher than a quantum level of the first quantum well layer, and a tunneling quantum barrier layer formed between the first and second quantum well layers and having a thickness enabling a carrier to be tunneled therethrough.
    • 提供了一种氮化物半导体器件,包括:n型氮化物半导体层; p型氮化物半导体层; 以及形成在所述n型和p型氮化物半导体层之间的有源层,所述有源层包括彼此交替沉积的多个量子阱层和至少一个量子势垒层,其中所述有源层包括第一量子阱 层,与第一量子阱层相邻形成朝向p型氮化物半导体层并且具有高于第一量子阱层的量子级的量子级的第二量子阱层,以及形成在第一量子阱层之间的隧穿量子势垒层 和第二量子阱层,并且具有能够使载体穿过其的厚度。