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    • 2. 发明授权
    • Optical stress generator and detector
    • 光应力发生器和探测器
    • US06208421B1
    • 2001-03-27
    • US09512141
    • 2000-02-23
    • Humphrey J. MarisRobert J Stoner
    • Humphrey J. MarisRobert J Stoner
    • G01N2100
    • G01N21/1702G01N29/0681G01N29/2418G01N2291/02827G01N2291/02881G01N2291/0426G01N2291/0427Y10S977/834Y10S977/90Y10S977/901Y10S977/955Y10S977/956
    • Disclosed is a system for the characterization of thin films and interfaces between thin films through measurements of their mechanical and thermal properties. In the system light is absorbed in a thin film or in a structure made up of several thin films, and the change in optical transmission or reflection is measured and analyzed. The change in reflection or transmission is used to give information about the ultrasonic waves that are produced in the structure. The information that is obtained from the use of the measurement methods and apparatus of this invention can include: (a) a determination of the thickness of thin films with a speed and accuracy that is improved compared to earlier methods; (b) a determination of the thermal, elastic, and optical properties of thin films; (c) a determination of the stress in thin films; and (d) a characterization of the properties of interfaces, including the presence of roughness and defects.
    • 公开了一种用于通过测量其薄膜和薄膜的机械和热性能来表征薄膜和界面的系统。 在系统中,光被薄膜吸收或由几个薄膜构成的结构中,并且测量和分析光学透射或反射的变化。 反射或透射的变化用于提供关于在结构中产生的超声波的信息。 从使用本发明的测量方法和装置获得的信息可以包括:(a)与先前的方法相比,以与速度和准确性相比较的速度和准确度确定薄膜的厚度; (b)确定薄膜的热,弹性和光学性能; (c)确定薄膜中的应力; 和(d)表征界面的性质,包括粗糙度和缺陷的存在。
    • 3. 发明授权
    • Optical stress generator and detector
    • 光应力发生器和探测器
    • US06400449B2
    • 2002-06-04
    • US09848144
    • 2001-05-03
    • Humphrey J. MarisRobert J Stoner
    • Humphrey J. MarisRobert J Stoner
    • G01B1106
    • G01N21/1702G01N29/0681G01N29/2418G01N2291/02827G01N2291/02881G01N2291/0426G01N2291/0427Y10S977/834Y10S977/90Y10S977/901Y10S977/955Y10S977/956
    • Disclosed is a system for the characterization of thin films and interfaces between thin films through measurements of their mechanical and thermal properties. In the system light is absorbed in a thin film or in a structure made up of several thin films, and the change in optical transmission or reflection is measured and analyzed. The change in reflection or transmission is used to give information about the ultrasonic waves that are produced in the structure. The information that is obtained from the use of the measurement methods and apparatus of this invention can include: (a) a determination of the thickness of thin films with a speed and accuracy that is improved compared to earlier methods; (b) a determination of the thermal, elastic, and optical properties of thin films; (c) a determination of the stress in thin films; and (d) a characterization of the properties of interfaces, including the presence of roughness and defects.
    • 公开了一种用于通过测量其薄膜和薄膜的机械和热性能来表征薄膜和界面的系统。 在系统中,光被薄膜吸收或由几个薄膜构成的结构中,并且测量和分析光学透射或反射的变化。 反射或透射的变化用于提供关于在结构中产生的超声波的信息。 从使用本发明的测量方法和装置获得的信息可以包括:(a)与先前的方法相比,以与速度和准确性相比较的速度和准确度确定薄膜的厚度; (b)确定薄膜的热,弹性和光学性能; (c)确定薄膜中的应力; 和(d)表征界面的性质,包括粗糙度和缺陷的存在。
    • 5. 发明授权
    • Apparatus and method for characterizing thin film and interfaces using
an optical heat generator and detector
    • 使用光学热发生器和检测器表征薄膜和界面的装置和方法
    • US5748317A
    • 1998-05-05
    • US786706
    • 1997-01-21
    • Humphrey J MarisRobert J Stoner
    • Humphrey J MarisRobert J Stoner
    • G01N21/17G01B9/02
    • G01N21/171
    • An optical heat generation and detection system generates a first non-destructive pulsed beam of electromagnetic radiation that is directed upon a sample containing at least one interface between similar or dissimilar materials. The first pulsed beam of electromagnetic radiation, a pump beam (21a), produces a non-uniform temperature change within the sample. A second non-destructive pulsed beam of electromagnetic radiation, a probe beam (21b), is also directed upon the sample. Physical and chemical properties of the materials, and of the interface, are measured by observing changes in a transient optical response of the sample to the probe beam, as revealed by a time dependence of changes in, by example, beam intensity, direction, or state of polarization. The system has increased sensitivity to interfacial properties including defects, contaminants, chemical reactions and delaminations, as compared to conventional non-destructive, non-contact techniques. One feature of this invention is a determination of a Kapitza resistance at the interface, and the correlation of the determined Kapitza resistance with a characteristic of the interface, such as roughness, delamination, the presence of contaminants, etc.
    • 光学发热和检测系统产生电磁辐射的第一非破坏性脉冲束,其被引导到包含相似或不同材料之间的至少一个界面的样品。 电磁辐射的第一脉冲束,泵浦光束(21a)在样品内产生不均匀的温度变化。 电磁辐射的第二个非破坏性脉冲束,探针光束(21b)也被引导到样品上。 通过观察样品对探针光束的瞬态光学响应的​​变化来测量材料和界面的物理和化学性质,如通过例如光束强度,方向或方向的变化的时间依赖性所揭示的 极化状态 与传统的非破坏性非接触技术相比,该系统对界面性能的敏感性增加,包括缺陷,污染物,化学反应和分层。 本发明的一个特征是确定界面处的Kapitza电阻,以及确定的Kapitza电阻与界面的特性(例如粗糙度,分层,污染物的存在等)的相关性。