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    • 2. 发明授权
    • Field-enhanced MIS/MIM electron emitters
    • 场增强MIS / MIM电子发射器
    • US06822380B2
    • 2004-11-23
    • US09975296
    • 2001-10-12
    • Xia ShengHenryk BireckiSi-Ty LamHuei-Pei KuoSteven Louis Naberhuis
    • Xia ShengHenryk BireckiSi-Ty LamHuei-Pei KuoSteven Louis Naberhuis
    • H01J1312
    • B82Y10/00H01J1/312
    • In an electron emitter based on Metal-Insulator-Semiconductor or Metal-Insulator-Metal emitters, field emission structures are enclosed within the emitter structure. The electron emitter may include a conductive substrate and an electron supply layer formed on the conductive substrate. The electron supply layer, for example undoped polysilicon, has protrusions formed on its surface. The sharpness and density of protrusions may be controlled. Above the electron supply layer and the protrusions, an insulator may be formed thereby enclosing the protrusions. A top conductive layer may be formed above the insulator. The enclosed protrusions are relatively insensitive to vacuum contamination. The thinness of the insulator allows high intensity electric fields at the protrusions to be generated with low applied voltage. Field-enhanced injection of electrons into the insulator and thence through the top conductive layer results. Furthermore, electron beam dispersion and divergence are minimized.
    • 在基于金属绝缘体半导体或金属 - 绝缘体 - 金属发射体的电子发射器中,场致发射结构被封装在发射极结构内。 电子发射器可以包括形成在导电衬底上的导电衬底和电子供给层。 电子供应层,例如未掺杂的多晶硅,在其表面上形成突起。 可以控制突起的清晰度和密度。 在电子供给层和突起之上,可以形成绝缘体,从而包围突起。 可以在绝缘体上方形成顶部导电层。 封闭的突起对真空污染相对不敏感。 绝缘体的薄度允许在低的施加电压下产生突起处的高强度电场。 电场增强注入绝缘体,从而通过顶​​层导电层注入电子。 此外,电子束分散和发散最小化。
    • 6. 发明授权
    • Silicon emitter with low porosity heavily doped contact layer
    • 具有低孔隙率重掺杂接触层的硅发射体
    • US06771010B2
    • 2004-08-03
    • US09845845
    • 2001-04-30
    • Xia ShengNobuyoshi KoshidaHuei-Pei Kuo
    • Xia ShengNobuyoshi KoshidaHuei-Pei Kuo
    • H01J102
    • H01J1/308H01J9/022Y10S438/96
    • A high emission electron emitter includes an electron injection layer, an active layer of high porosity porous silicon material in contact with the electron injection layer, a contact layer of low porosity porous silicon material in contact with the active layer and including an interface surface with a heavily doped region, and an optional top electrode in contact with the contact layer. The contact layer reduces contact resistance between the active layer and the top electrode and the heavily doped region reduces resistivity of the contact layer thereby increasing electron emission efficiency and stable electron emission from the top electrode. The electron injection layer is made from an electrically conductive material such as n+ semiconductor, n+ single crystal silicon, a metal, a silicide, or a nitride. The active layer and the contact layer are formed in a layer of silicon material that is deposited on the electron injection layer and then electrochemically anodized in a hydrofluoric acid solution. Prior to the anodization, the interface surface can be doped to form the heavily doped region. The layer of silicon material can be porous epitaxial silicon, porous polysilicon, porous amorphous silicon, and porous silicon carbide.
    • 高发射电子发射体包括电子注入层,与电子注入层接触的高孔隙率多孔硅材料的有源层,与活性层接触的低孔隙率多孔硅材料的接触层, 重掺杂区域和与接触层接触的可选顶部电极。 接触层降低有源层和顶部电极之间的接触电阻,并且重掺杂区域降低接触层的电阻率,从而增加电子发射效率和从顶部电极稳定的电子发射。 电子注入层由诸如n +半导体,n +单晶硅,金属,硅化物或氮化物的导电材料制成。 有源层和接触层形成在沉积在电子注入层上的硅材料层中,然后在氢氟酸溶液中电化学阳极氧化。 在阳极氧化之前,可以将界面表面掺杂以形成重掺杂区域。 硅材料层可以是多孔外延硅,多孔多晶硅,多孔非晶硅和多孔碳化硅。
    • 8. 发明授权
    • Method of fabricating silicon emitter with a low porosity heavily doped contact layer
    • 制造具有低孔隙率重掺杂接触层的硅发射器的方法
    • US06939728B2
    • 2005-09-06
    • US10439642
    • 2003-05-15
    • Xia ShengNobuyoshi KoshidaHuei-Pei Kuo
    • Xia ShengNobuyoshi KoshidaHuei-Pei Kuo
    • H01J1/312H01J1/308H01J9/02H10L21/00
    • H01J1/308H01J9/022Y10S438/96
    • A high emission electron emitter and a method of fabricating a high emission electron emitter are disclosed. A high emission electron emitter includes an electron injection layer, an active layer of high porosity porous silicon material in contact with the electron injection layer, a contact layer of low porosity porous silicon material in contact with the active layer and including an interface surface with a heavily doped region, and an optional top electrode in contact with the contact layer. The contact layer reduces contact resistance between the active layer and the top electrode and the heavily doped region reduces resistivity of the contact layer thereby increasing electron emission efficiency and stable electron emission from the top electrode. The electron injection layer is made from an electrically conductive material such as n+ semiconductor, n+ single crystal silicon, a metal, a silicide, or a nitride. The active layer and the contact layer are formed in a layer of silicon material that is deposited on the electron injection layer and then electrochemically anodized in a hydrofluoric acid solution. Prior to the anodization, the interface surface can be doped to form the heavily doped region. The layer of silicon material can be porous epitaxial silicon, porous polysilicon, porous amorphous silicon, and porous silicon carbide.
    • 公开了高发射电子发射体和制造高发射电子发射体的方法。 高发射电子发射体包括电子注入层,与电子注入层接触的高孔隙率多孔硅材料的有源层,与活性层接触的低孔隙率多孔硅材料的接触层, 重掺杂区域和与接触层接触的可选顶部电极。 接触层降低了有源层和顶部电极之间的接触电阻,并且重掺杂区域降低了接触层的电阻率,从而提高了电子发射效率和从顶部电极稳定的电子发射。 电子注入层由诸如n +半导体,n +单晶硅,金属,硅化物或氮化物的导电材料制成。 有源层和接触层形成在沉积在电子注入层上的硅材料层中,然后在氢氟酸溶液中电化学阳极氧化。 在阳极氧化之前,可以将界面表面掺杂以形成重掺杂区域。 硅材料层可以是多孔外延硅,多孔多晶硅,多孔非晶硅和多孔碳化硅。
    • 9. 发明授权
    • Reflective display
    • 反光显示
    • US09030728B2
    • 2015-05-12
    • US14005752
    • 2011-03-25
    • Gary GibsonXia ShengDick Henze
    • Gary GibsonXia ShengDick Henze
    • G02B26/00G02F1/167
    • G02B26/005G02F1/167
    • A display element comprises a reservoir and a channel connected to the reservoir. The channel extends across an area including a visible area of the display element, and the reservoir is substantially outside the visible area. The display element further comprises at least one electrode and a luminescent fluid in the reservoir and movable, by means of signals applied to the at least one electrode, between a first position and a second position. In the first position, the luminescent fluid is substantially contained in the reservoir outside the visible area and in the second position, the luminescent fluid extends along the channel to occupy the visible area. The luminescent fluid absorbs light in a first color waveband and converts the absorbed light to light in a second color waveband different from the first color waveband.
    • 显示元件包括储存器和连接到储存器的通道。 通道延伸穿过包括显示元件的可见区域的区域,并且储存器基本上在可见区域的外部。 显示元件还包括储存器中的至少一个电极和发光流体,并通过施加到至少一个电极的信号在第一位置和第二位置之间移动。 在第一位置,发光流体基本上容纳在可见区域外部的储存器中,而在第二位置,发光流体沿通道延伸以占据可见区域。 发光液体吸收第一颜色波段中的光,并将吸收的光转换成与第一颜色波段不同的第二颜色波段的光。