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1. 发明授权

US07868303B2 Method and handling apparatus for placing patterning device on support member for charged particle beam imaging 有权
标题翻译：用于将图案形成装置放置在用于带电粒子束成像的支撑构件上的方法和处理装置
公开(公告)号：US07868303B2
公开(公告)日：2011-01-11
申请号：US12249640
申请日：2008-10-10
申请人： You-Jin Wang , Hsuan-Bin Huang , Chung-Shih Pan
发明人： You-Jin Wang , Hsuan-Bin Huang , Chung-Shih Pan
IPC分类号： G01J1/00 , G01N21/00 , G01N23/00
CPC分类号： H01L21/68707 , H01J2237/204
摘要： A patterning device handling apparatus for use in charged particle beam imaging is disclosed. The disclosed patterning device handling apparatus comprises a first gripping member and a second gripping member. The first gripping member is equipped with a plurality of first positioning projections, and the second gripping member is equipped with a plurality of second positioning projections. When the patterning device is held at one angle, the first positioning projections abut against one edge of the patterning device and the second positioning projections abut against the opposite edge of the patterning device. When the patterning device is held at another angle, the first positioning projections abut against two neighboring edges of the patterning device, and the second positioning projections abut against the other two neighboring edges of the patterning device. Therefore, the disclosed patterning device handling apparatus can hold the pattering device at different angles.
摘要翻译：公开了一种用于带电粒子束成像的图案形成装置处理装置。所公开的图案形成装置处理装置包括第一夹持构件和第二夹持构件。第一夹持构件配备有多个第一定位突起，并且第二夹持构件配备有多个第二定位突起。当图案形成装置保持一角度时，第一定位突起抵靠图案形成装置的一个边缘，并且第二定位突起抵靠图案形成装置的相对边缘。当图案形成装置保持在另一个角度时，第一定位突起邻接图案形成装置的两个相邻边缘，并且第二定位突起抵靠图案形成装置的另外两个相邻的边缘。因此，所公开的图案形成装置处理装置可以以不同的角度保持图案装置。

2. 发明申请

US20100102226A1 PATTERNING DEVICE HOLDING APPARATUS AND APPLICATION THEREOF 有权
标题翻译：图案装置保存装置及其应用
公开(公告)号：US20100102226A1
公开(公告)日：2010-04-29
申请号：US12256828
申请日：2008-10-23
申请人： Hsuan-Bin HUANG , You-Jin Wang , Chung-Shih Pan
发明人： Hsuan-Bin HUANG , You-Jin Wang , Chung-Shih Pan
IPC分类号： H01J37/20
CPC分类号： H01J37/20 , H01J2237/2007 , H01J2237/20207
摘要： A patterning device holding apparatus includes a support platform unit with a plurality of first positioning projections and a gripper unit. The gripper unit includes a head portion and a plurality of second positioning projections disposed on the head portion, and a rolling member set at a base portion. The grapping and releasing of the patterning device is achieved by the rotation of the gripper unit about a pivot substantially parallel with the center axis of the rolling member. The first and second positioning projections corporately abut against the edges of a patterning device to fix the patterning device in place.
摘要翻译：图案形成装置保持装置包括具有多个第一定位突起和夹持单元的支撑平台单元。夹持单元包括头部和设置在头部上的多个第二定位突起，以及设置在基部的滚动体。图案形成装置的拍摄和释放通过夹持器单元围绕基本上平行于滚动构件的中心轴线的枢轴的旋转来实现。第一和第二定位突起共同地抵靠图案形成装置的边缘，以将图案形成装置固定就位。

3. 发明授权

US07838848B2 Patterning device holding apparatus and application thereof 有权
标题翻译：图案化装置保持装置及其应用
公开(公告)号：US07838848B2
公开(公告)日：2010-11-23
申请号：US12256828
申请日：2008-10-23
申请人： Hsuan-Bin Huang , You-Jin Wang , Chung-Shih Pan
发明人： Hsuan-Bin Huang , You-Jin Wang , Chung-Shih Pan
IPC分类号： A61N5/00 , G21G5/00
CPC分类号： H01J37/20 , H01J2237/2007 , H01J2237/20207
摘要： A patterning device holding apparatus includes a support platform unit with a plurality of first positioning projections and a gripper unit. The gripper unit includes a head portion and a plurality of second positioning projections disposed on the head portion, and a rolling member set at a base portion. The grapping and releasing of the patterning device is achieved by the rotation of the gripper unit about a pivot substantially parallel with the center axis of the rolling member. The first and second positioning projections corporately abut against the edges of a patterning device to fix the patterning device in place.
摘要翻译：图案形成装置保持装置包括具有多个第一定位突起和夹持单元的支撑平台单元。夹持单元包括头部和设置在头部上的多个第二定位突起，以及设置在基部的滚动体。图案形成装置的拍摄和释放通过夹持器单元围绕基本上平行于滚动构件的中心轴线的枢轴的旋转来实现。第一和第二定位突起共同地抵靠图案形成装置的边缘，以将图案形成装置固定就位。

4. 发明授权

US08110818B2 Method of controlling particle absorption on a wafer sample being inspected by a charged particle beam imaging system 有权
标题翻译：控制由带电粒子束成像系统检查的晶片样品上的颗粒吸收的方法
公开(公告)号：US08110818B2
公开(公告)日：2012-02-07
申请号：US12247536
申请日：2008-10-08
申请人： You-Jin Wang , Chung-Shih Pan
发明人： You-Jin Wang , Chung-Shih Pan
IPC分类号： G01N23/04 , H01J37/26
CPC分类号： H01L22/12 , H01J2237/204 , H01J2237/2817 , H01L2924/0002 , H01L2924/00
摘要： A method of controlling particle absorption on a wafer sample being inspected by a charged particle beam imaging system prevents particle absorption by grounding the wafer sample and kept electrically neutral during the transfer-in and transfer-out process.
摘要翻译：控制通过带电粒子束成像系统检查的晶片样品上的颗粒吸收的方法通过将晶片样品接地并在转移和转移过程中保持电中性而防止颗粒吸收。

5. 发明授权

US08575573B2 Structure for discharging extreme ultraviolet mask 有权
标题翻译：用于放电极紫外线屏蔽的结构
公开(公告)号：US08575573B2
公开(公告)日：2013-11-05
申请号：US13112536
申请日：2011-05-20
申请人： You-Jin Wang , Chiyan Kuan , Chung-Shih Pan
发明人： You-Jin Wang , Chiyan Kuan , Chung-Shih Pan
IPC分类号： A61N5/00
CPC分类号： H05F3/02 , G01N23/2251 , H01J37/026 , H01J37/20 , H01J2237/0041 , H01J2237/0044 , H01J2237/2008 , H01J2237/2811
摘要： A structure for discharging an extreme ultraviolet mask (EUV mask) is provided to discharge the EUV mask during the inspection by an electron beam inspection tool. The structure for discharging an EUV mask includes at least one grounding pin to contact conductive areas on the EUV mask, wherein the EUV mask may have further conductive layer on sidewalls or/and bottom. The inspection quality of the EUV mask is enhanced by using the electron beam inspection system because the accumulated charging on the EUU mask is grounded.
摘要翻译：提供一种用于放电极紫外线掩模（EUV掩模）的结构，用于通过电子束检查工具在检查期间对EUV掩模进行放电。用于放电EUV掩模的结构包括至少一个接触引脚以接触EUV掩模上的导电区域，其中EUV掩模可以在侧壁或/或底部上具有另外的导电层。通过使用电子束检查系统来增强EUV掩模的检查质量，因为EUU掩模上的累积充电是接地的。

6. 发明申请

US20100084554A1 METHOD OF CONTROLLING PARTICLE ABSORPTION ON A WAFER SAMPLE BEING INSPECTED BY A CHARGED PARTICLE BEAM IMAGING SYSTEM 有权
标题翻译：通过充电颗粒光束成像系统检测的波形样品控制颗粒吸收的方法
公开(公告)号：US20100084554A1
公开(公告)日：2010-04-08
申请号：US12247536
申请日：2008-10-08
申请人： You-Jin Wang , Chung-Shih Pan
发明人： You-Jin Wang , Chung-Shih Pan
IPC分类号： G01N23/00
CPC分类号： H01L22/12 , H01J2237/204 , H01J2237/2817 , H01L2924/0002 , H01L2924/00
摘要： A method of controlling particle absorption on a wafer sample being inspected by a charged particle beam imaging system prevents particle absorption by grounding the wafer sample and kept electrically neutral during the transfer-in and transfer-out process.
摘要翻译：控制通过带电粒子束成像系统检查的晶片样品上的颗粒吸收的方法通过将晶片样品接地并在转移和转移过程中保持电中性而防止颗粒吸收。

7. 发明授权

US09460887B2 Discharging method for charged particle beam imaging 有权
标题翻译：带电粒子束成像放电方法
公开(公告)号：US09460887B2
公开(公告)日：2016-10-04
申请号：US12468026
申请日：2009-05-18
申请人： You-Jin Wang , Chung-Shih Pan
发明人： You-Jin Wang , Chung-Shih Pan
IPC分类号： H01J37/28 , H01J37/02
CPC分类号： H01J37/02 , H01J37/28 , H01J2237/0041 , H01J2237/0044
摘要： A layer of conductive or semi-conductive material is formed on a surface of a sample and then the sample, when being charged particle beam imaged, is electrically coupled with an object having a large charge-receiving or charge-storage capacity (e.g., capacitance). Hence, the charging on the sample surface is removed and released quickly by the layer. The layer is then removed by reacting it with a predefined agent. The reaction forms a gaseous product which does not form a physical or chemical bond to the sample surface.
摘要翻译：在样品的表面上形成导电或半导体材料层，然后当带电粒子束成像时，样品与具有大的电荷接收或电荷存储容量（例如，电容）。因此，样品表面的充电被层除去并快速释放。然后通过与预定义的试剂反应来除去该层。该反应形成气态产物，其不与样品表面形成物理或化学键。

8. 发明授权

US08031344B2 Z-stage configuration and application thereof 有权
标题翻译： Z级配置及其应用
公开(公告)号：US08031344B2
公开(公告)日：2011-10-04
申请号：US12609262
申请日：2009-10-30
申请人： You-Jin Wang , Chung-Shih Pan
发明人： You-Jin Wang , Chung-Shih Pan
IPC分类号： G01B11/02 , G01J1/00
CPC分类号： H01J37/20 , H01J37/28 , H01J2237/0216 , H01J2237/20235
摘要： A stage configuration is provided, wherein a ceramic plate is used as the z-stage body to decrease the use of the metal plates in the conventional configuration, so that the compact structure of the z-stage may decrease the vibrational movements of the z-stage. Further, two Laser interferometer are used to detect a movement of different points along a vertical line of the z-stage sidewall to calculate a movement of the specimen surface, so that a horizontal movement of the specimen surface can be detected more accurately.
摘要翻译：提供了一种台架结构，其中使用陶瓷板作为z阶段本体以减少常规构造中金属板的使用，使得z阶段的紧凑结构可以减小z阶段的振动运动，阶段。此外，使用两个激光干涉仪来检测沿z级侧壁的垂直线的不同点的运动，以计算样本表面的运动，从而可以更精确地检测样本表面的水平运动。

9. 发明申请

US20100288923A1 DISCHAGING METHOD FOR CHARGED PARTICLE BEAM IMAGING 有权
标题翻译：用于充电颗粒光束成像的放电方法
公开(公告)号：US20100288923A1
公开(公告)日：2010-11-18
申请号：US12468026
申请日：2009-05-18
申请人： You-Jin Wang , Chung-Shih Pan
发明人： You-Jin Wang , Chung-Shih Pan
IPC分类号： G01N23/00 , H05B31/26
CPC分类号： H01J37/02 , H01J37/28 , H01J2237/0041 , H01J2237/0044
摘要： A layer of conductive or semi-conductive material is formed on a surface of a sample and then the sample, when being charged particle beam imaged, is electrically coupled with an object having a large charge-receiving or charge-storage capacity (e.g., capacitance). Hence, the charging on the sample surface is removed and released quickly by the layer. The layer is then removed by reacting it with a predefined agent. The reaction forms a gaseous product which does not form a physical or chemical bond to the sample surface.
摘要翻译：在样品的表面上形成导电或半导体材料层，然后当带电粒子束成像时，样品与具有大的电荷接收或电荷存储容量（例如，电容）。因此，样品表面的充电被层除去并快速释放。然后通过与预定义的试剂反应来除去该层。该反应形成气态产物，其不与样品表面形成物理或化学键。

10. 发明授权

US08604428B2 Method of controlling particle absorption on a wafer sample being inspected by a charged particle beam imaging system 有权
标题翻译：控制由带电粒子束成像系统检查的晶片样品上的颗粒吸收的方法
公开(公告)号：US08604428B2
公开(公告)日：2013-12-10
申请号：US13236108
申请日：2011-09-19
申请人： You-Jin Wang , Chung-Shih Pan
发明人： You-Jin Wang , Chung-Shih Pan
IPC分类号： H01J37/26
CPC分类号： H01L22/12 , H01J2237/204 , H01J2237/2817 , H01L2924/0002 , H01L2924/00
摘要： A method of controlling particle absorption on a wafer sample and charged particle beam imaging system thereof prevents particle absorption by grounding the wafer sample and kept electrically neutral during the transfer-in and transfer-out process.
摘要翻译：控制晶片样品和带电粒子束成像系统上的颗粒吸收的方法通过在晶片样品中接地而防止颗粒吸收，并在转移和转移过程中保持电中性。

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