专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US5314770A Method for producing color filter 失效
标题翻译：彩色滤光片制作方法
公开(公告)号：US5314770A
公开(公告)日：1994-05-24
申请号：US872615
申请日：1992-04-22
申请人： Yukio Yamasita , Haruyoshi Sato , Toru Nakamura , Hitoshi Yuasa , Yutaka Otsuki
发明人： Yukio Yamasita , Haruyoshi Sato , Toru Nakamura , Hitoshi Yuasa , Yutaka Otsuki
IPC分类号： G03F7/00 , G03F9/00
CPC分类号： G03F7/0007
摘要： A method for producing a color filter involves (A) forming a photosensitive coating film on an electrically conductive layer formed on a surface of a substrate, and exposing the photosensitive coating film trough a mask having patterns of at least three different degrees of light transmittances; (B) developing and removing a photosensitive coating film portion registering with one of the patterns of smallest and largest degrees of light transmittances for exposing the electrically conductive layer and electrodepositing a colord coating on the exposed electrically conductive layer for forming a colored layer thereon, operation of developing and removing the photosensitive coating film followed by electrodeposition being repeated for the respective patterns of different degrees of light transmittances in sequence of difference in transmittances for producing different colored layers, respectively; (C) selectively forming a metal layer in interstices present between the colored layers, and (D) transcribing the colored layers and the metal layer onto another substrate.
摘要翻译：制造滤色器的方法包括：（A）在形成于基板的表面上的导电层上形成感光性涂膜，通过具有至少三种不同透光度的图案的掩模使该感光性涂膜曝光; （B）显影和除去与最小和最大光透射度的图案之一配准的感光涂膜部分，用于暴露导电层，并在露出的导电层上电沉积一层涂层以形成着色层，操作分别对不同颜色的层的透光率的差异顺序重复对不同程度的透光率的各图案进行电沉积的显影和除去感光性涂膜，（C）在着色层之间的间隙中选择性地形成金属层，（D）将着色层和金属层转印到另一基板上。

2. 发明授权

US5214541A Method for producing color filter 失效
公开(公告)号：US5214541A
公开(公告)日：1993-05-25
申请号：US874064
申请日：1992-04-24
申请人： Yukio Yamasita , Haruyoshi Sato , Toru Nakamura , Hitoshi Yuasa , Yutaka Otsuki
发明人： Yukio Yamasita , Haruyoshi Sato , Toru Nakamura , Hitoshi Yuasa , Yutaka Otsuki
IPC分类号： G03F7/00
CPC分类号： G03F7/0007 , Y10S359/90
摘要： A method for producing a color filter involves (A) forming a photosensitive coating film on a transparent electrically conductive layer provided on an outermost surface of a substrate having an alignment film, and exposing the photosensitive coating film to light through a mask having patterns of at least three different degrees of light transmittances; (B) developing and removing a photosensitive coating film portion registering with one of the patterns of smallest and largest degrees of light transmittances for exposing the transparent electrically conductive layer and electrodepositing a colored coating on the exposed electrically conductive layer for forming a colored layer thereon, operation of developing and removing the photosensitive coating film and electrodepositing the colored coating being repeated for the respective patterns of different degrees of light transmittances in sequence of difference in light transmittances to form different colored layers, respectively; and (Z) transcribing the colored layers, the transparent electrically conductive layer and the alignment film onto another substrate.

3. 发明授权

US5478681A Method for producing color filter 失效
标题翻译：彩色滤光片制作方法
公开(公告)号：US5478681A
公开(公告)日：1995-12-26
申请号：US152870
申请日：1993-11-10
申请人： Yukio Yamasita , Haruyoshi Sato , Toru Nakamura , Hitoshi Yuasa , Yutaka Otsuki
发明人： Yukio Yamasita , Haruyoshi Sato , Toru Nakamura , Hitoshi Yuasa , Yutaka Otsuki
IPC分类号： G03F7/00 , G03F7/20 , G03F5/00 , G03F7/12
CPC分类号： G03F7/0007 , G03F7/2022
摘要： A method for producing a color filter comprising exposing a portion of the color filter corresponding to colored portions through a different pattern mask by colors and in an irradiation dose varying for each mask to effect patterning and successively coloring the pattern portions smaller or larger in the order of light irradiation dose by way of development and electrodeposition.
摘要翻译：一种彩色滤光片的制造方法，其特征在于，将通过不同的图案掩模的彩色滤色片的与彩色部分对应的部分以颜色曝光，并以每个掩模变化的照射剂量曝光，进行图案化，的光照射剂量通过显影和电沉积。

4. 发明授权

US5385795A Method for producing color filter 失效
标题翻译：彩色滤光片制作方法
公开(公告)号：US5385795A
公开(公告)日：1995-01-31
申请号：US845390
申请日：1992-03-03
申请人： Hitoshi Yuasa , Yukio Yamasita , Haruyoshi Sato , Toru Nakamura , Yutaka Otsuki
发明人： Hitoshi Yuasa , Yukio Yamasita , Haruyoshi Sato , Toru Nakamura , Yutaka Otsuki
IPC分类号： G02F1/1335 , G03F7/00
CPC分类号： G03F7/0007 , G02F1/133516
摘要： A method for producing a color filter involves the steps of: (A) forming a photosensitive coating film on an electrically conductive layer formed on a surface of a substrate, and exposing the photosensitive coating film through a mask having patterns of at least three different degrees of light transmittances; (B) developing and removing a photosensitive coating film portion registering with one of the patterns of smallest and largest degrees of light transmittances for exposing the electrically conductive layer, and electrodepositing a colored coating on the exposed electrically conductive layer for forming a colored layer thereon; (C) repeating the step (B) for the respective patterns of different degrees of light transmittances in sequence of difference in transmittances for producing different colored layers, respectively; and (D) transcribing the colored layers onto another substrate.
摘要翻译：制造滤色器的方法包括以下步骤：（A）在形成于基板的表面上的导电层上形成感光性涂膜，并使感光性涂膜通过具有至少三个不同程度的图案的掩模曝光的光透射率; （B）显影和除去与最小和最大程度的透光度图案之一的曝光导电层的感光涂膜部分，以及将暴露的导电层上的着色涂层电沉积以在其上形成着色层; （C）分别对不同着色层的透射率差异依次重复不同程度的透光率的各个图案的步骤（B）; 和（D）将着色层转录到另一基底上。

5. 发明授权

US5334468A Method for producing color filter 失效
标题翻译：彩色滤光片制作方法
公开(公告)号：US5334468A
公开(公告)日：1994-08-02
申请号：US909320
申请日：1992-07-06
申请人： Yukio Yamasita , Haruyoshi Sato , Toru Nakamura , Hitoshi Yuasa , Yutaka Otsuki
发明人： Yukio Yamasita , Haruyoshi Sato , Toru Nakamura , Hitoshi Yuasa , Yutaka Otsuki
IPC分类号： G02F1/1335 , G03F7/00 , G03F7/20 , G03F9/00
CPC分类号： G03F7/2022 , G03F7/0007 , G02F1/133516
摘要： A method for producing a color filter involves (A) forming a photosensitive coating film on a transparent electrically conductive layer provided on an outermost surface of a substrate having an alignment film, and exposing the photosensitive coating film to light in a first irradiation amount through a mask having a predetermined pattern of a certain light transmittance and at least once displacing the mask to another position on the photosensitive coating film and exposing the photosensitive coating film to light in a second irradiation amount different from the first irradiation amount through the mask; (B) developing and removing a photosensitive coating film portion exposed to light in one of smallest and largest irradiation amounts for exposing the transparent electrically conductive layer and electrodepositing a colored coating on the exposed electrically conductive layer for forming a colored layer thereon, operation of developing and removing the photosensitive coating film and electrodepositing the colored coating being repeated in sequence of difference in irradiation amounts to form different colored layers, respectively; and (A) transcribing the colored layers, the transparent electrically conductive layer and the alignment film onto another substrate.
摘要翻译：制造滤色器的方法包括：（A）在设置在具有取向膜的基板的最外表面上的透明导电层上形成感光性涂膜，并使感光性涂膜以第一照射量曝光掩模具有一定的透光率的预定图案，并且至少一次将掩模移位到感光涂膜上的另一位置，并且通过掩模以不同于第一照射量的第二照射量将感光涂层曝光; （B）以暴露于透明导电层的最小和最大照射量之一曝光的感光性涂膜部分显影和除去，并将暴露的导电层上的着色涂层电沉积在其上形成着色层，显影操作并且除去感光性涂膜并使着色涂层电沉积重复，以分别照射量不同，形成不同的着色层; 和（A）将着色层，透明导电层和取向膜转印到另一基板上。

6. 发明授权

US5314769A Method for producing color filter 失效
标题翻译：彩色滤光片制作方法
公开(公告)号：US5314769A
公开(公告)日：1994-05-24
申请号：US872612
申请日：1992-04-22
申请人： Yukio Yamasita , Haruyoshi Sato , Toru Nakamura , Hitoshi Yuasa , Yutaka Otsuki
发明人： Yukio Yamasita , Haruyoshi Sato , Toru Nakamura , Hitoshi Yuasa , Yutaka Otsuki
IPC分类号： G02F1/1335 , G03F1/00 , G03F7/00 , G03F9/00
CPC分类号： G02F1/133516 , G03F1/50 , G03F7/0007
摘要： A method for producing a color filter involves (A) forming a photosensitive coating film on a transparent electrically conductive layer formed on a surface of a transparent substrate and exposing the photosensitive coating film through a mask having patterns of at least three different degrees of light transmittances; (B) developing and removing a photosensitive coating film region registering with one of the patterns of smallest and largest degrees of light transmittances for exposing the transparent electrically conductive layer and electrodepositing a colored coating on the exposed transparent electrically conductive layer for forming a colored layer thereon, operation of developing and removing the photosensitive coating film and electrodepositing the colored coating being repeated for the respective patterns of different degrees of light transmittances in sequence of difference in light transmittances to form different colored layers, respectively; and (C) selectively forming a metal layer on at least one exposed region of the transparent electrically conductive layer.
摘要翻译：一种彩色滤光片的制造方法，其特征在于，（A）在透明导电层上形成感光性涂膜，所述透明导电层形成在透明基板的表面上，并通过具有至少三种不同透光度的图案的掩模曝光所述感光性涂膜 ; （B）显影和除去与最小和最大光透射率的图案之一配准的感光涂层区域，用于暴露透明导电层并将暴露的透明导电层上的着色涂层电沉积以在其上形成着色层对光敏涂层的显影和除去的操作，并按照不同的透光度顺序对不同程度的透光率的各个图案重复着色的着色涂层，以分别形成不同的着色层; 和（C）在所述透明导电层的至少一个暴露区域上选择性地形成金属层。

7. 发明授权

US5214542A Method for producing color filter 失效
标题翻译：彩色滤光片制作方法
公开(公告)号：US5214542A
公开(公告)日：1993-05-25
申请号：US846287
申请日：1992-03-03
申请人： Yukio Yamasita , Toru Nakamura , Haruyoshi Sato , Hitoshi Yuasa , Yutaka Otsuki
发明人： Yukio Yamasita , Toru Nakamura , Haruyoshi Sato , Hitoshi Yuasa , Yutaka Otsuki
IPC分类号： G03F7/00
CPC分类号： G03F7/0007 , Y10S359/90
摘要： A method for producing a color filter involves the steps of: (A) forming a photosensitive coating film on a transparent electrically conductive layer formed on a surface of a transparent substrate, and exposing the photosensitive coating film through a mask having patterns of at least three different degrees of light transmittances; (B) developing and removing a photosensitive coating film portion registering with one of the patterns of smallest and largest degrees of light transmittances for exposing the transparent electrically conductive layer, and electrodepositing a colored coating on the exposed transparent electrically conductive layer for forming a colored layer thereon; and (C) repeating the step (B) for the respective patterns of different degrees of light transmittances in sequence of difference in transmittances for producing different colored layers, respectively.

8. 发明授权

US5372902A Method for producing color filter 失效
标题翻译：彩色滤光片制作方法
公开(公告)号：US5372902A
公开(公告)日：1994-12-13
申请号：US125487
申请日：1993-09-22
申请人： Yukio Yamashita , Haruyoshi Sato , Toru Nakamura , Hitoshi Yuasa , Yutaka Otsuki
发明人： Yukio Yamashita , Haruyoshi Sato , Toru Nakamura , Hitoshi Yuasa , Yutaka Otsuki
IPC分类号： G02B5/20 , G02F1/1335 , G03F7/00 , G03F9/00 , C25D13/00
CPC分类号： G03F7/0007 , Y10S359/90
摘要： A method for producing a color filter involves (A) forming a photosensitive coating film on a transparent electrically conductive layer of a transparent substrate having the transparent electrically conductive layer on its surface, and exposing the photosensitive coating film to light in a first irradiation amount through a mask having a predetermined pattern of a certain light transmittance and at least once displacing the mask to another position on the photosensitive coating film and exposing the photosensitive coating film to light in a second irradiation amount different from the first irradiation amount through the mask; and (B) developing and removing a photosensitive coating film portion exposed to light in one of the smallest and largest irradiation amounts for exposing the transparent electrically conductive layer and electrodepositing a colored coating on the exposed electrically conductive layer for forming a colored layer thereon, operation of developing and removing the photosensitive coating film and electrodepositing the colored coating being sequentially repeated for the respective irradiation amounts where the sequence of repetition is selected from increasing irradiation amount and decreasing irradiation amount to form different colored layers, respectively.
摘要翻译：一种彩色滤光片的制造方法，其特征在于，包括：（A）在其表面具有透明导电层的透明基板的透明导电层上形成感光性涂膜，以及使感光性涂膜以第一照射量通过掩模，其具有一定光线透射率的预定图案，并且至少一次将掩模移位到感光涂膜上的另一位置，并通过掩模以不同于第一照射量的第二辐射量使感光涂层曝光; 和（B）以最小和最大照射量之一曝光的感光性涂膜部分显影和除去，用于曝光透明导电层，并在露出的导电层上电沉积着色涂层，以形成着色层，操作显影和除去感光涂膜，并对着色涂层进行电沉积，分别对增加照射量和减少照射量选择重复序列的各个照射量重新进行电沉积以形成不同的着色层。

9. 发明授权

US5718992A Substrate having light shielding layer 失效
标题翻译：基板具有遮光层
公开(公告)号：US5718992A
公开(公告)日：1998-02-17
申请号：US743888
申请日：1996-11-06
申请人： Haruyoshi Sato , Toru Nakamura , Hitoshi Yuasa , Yutaka Otsuki , Hiroyoshi Omika , Norikatsu Ono , Tadafumi Shindo
发明人： Haruyoshi Sato , Toru Nakamura , Hitoshi Yuasa , Yutaka Otsuki , Hiroyoshi Omika , Norikatsu Ono , Tadafumi Shindo
IPC分类号： C09D5/44 , G02B5/20 , G02F1/1335 , G03F7/00
CPC分类号： G02F1/133512 , G03F7/0007
摘要： A method for preparing a substrate having a light-shielding layer involves forming a photosensitive coating film on a transparent electrically conductive layer formed on a transparent substrate, exposing the photosensitive coating film via a mask exhibiting light transmitting properties, removing and developing the coating film for exposing the transparent electrically conductive layer and electrodepositing a dark-hued coating on the exposed transparent electrically conductive layer for forming the light-shielding layer, and heating the light-shielding layer. The substrate having the light-shielding layer has a volume resistivity of 1.times.10.sup.2 ohm.cm or higher and may be used for a counterelectrode substrate for a TFT array substrate incorporated in a liquid crystal display device.
摘要翻译：制备具有遮光层的基板的方法包括在形成于透明基板上的透明导电层上形成感光性涂膜，通过具有透光性的掩模曝光感光性涂膜，除去和显影涂膜暴露透明导电层并在暴露的透明导电层上电沉积暗色涂层以形成遮光层，并加热遮光层。具有遮光层的基板具有1×102欧姆·厘米或更高的体积电阻率，并且可以用于结合在液晶显示装置中的TFT阵列基板的反电极基板。

10. 发明授权

US5527649A Method for forming a substrate having a light shielding layer 失效
标题翻译：用于形成具有遮光层的基板的方法
公开(公告)号：US5527649A
公开(公告)日：1996-06-18
申请号：US249754
申请日：1994-05-26
申请人： Haruyoshi Sato , Toru Nakamura , Hitoshi Yuasa , Yutaka Otsuki , Hiroyoshi Omika , Norikatsu Ono , Tadafumi Shindo
发明人： Haruyoshi Sato , Toru Nakamura , Hitoshi Yuasa , Yutaka Otsuki , Hiroyoshi Omika , Norikatsu Ono , Tadafumi Shindo
IPC分类号： C09D5/44 , G02B5/20 , G02F1/1335 , G03F7/00
CPC分类号： G02F1/133512 , G03F7/0007
摘要： A method for preparing a substrate having a light-shielding layer involves forming a photosensitive coating film on a transparent electrically conductive layer formed on a transparent substrate, exposing the photosensitive coating film via a mask exhibiting light transmitting properties, removing and developing the coating film for exposing the transparent electrically conductive layer and electrodepositing a dark-hued coating on the exposed transparent electrically conductive layer for forming the light-shielding layer, and heating the light-shielding layer. The substrate having the light-shielding layer has a volume resistivity of 1.times.10.sup.2 ohm.multidot.cm or higher and may be used for a counterelectrode substrate for a TFT array substrate incorporated in a liquid crystal display device.
摘要翻译：制备具有遮光层的基板的方法包括在形成于透明基板上的透明导电层上形成感光性涂膜，通过具有透光性的掩模曝光感光性涂膜，除去和显影涂膜暴露透明导电层并在暴露的透明导电层上电沉积暗色涂层以形成遮光层，并加热遮光层。具有遮光层的基板的体积电阻率为1×102ohm×cm以上，可以用于配置在液晶显示装置中的TFT阵列基板的反电极基板。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式