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1. 发明申请

US20150041650A1 Gas Field Ionization Ion Source and Ion Beam Apparatus 有权
标题翻译：气体离子源和离子束装置
公开(公告)号：US20150041650A1
公开(公告)日：2015-02-12
申请号：US14390071
申请日：2013-03-11
申请人： Hitachi High-Technologies Corporation
发明人： Yoshimi Kawanami , Hironori Moritani
IPC分类号： H01J37/08 , H01J37/147 , H01J37/26 , H01J37/10
CPC分类号： H01J37/08 , H01J27/26 , H01J37/10 , H01J37/147 , H01J37/26 , H01J37/28 , H01J2237/006 , H01J2237/0807
摘要： In the case of a conventional gas field ionization ion source, it was not possible to carry out an analysis with a high S/N ratio and a high-speed machining process because the current amount of an ion beam is small. In view of these problems, the present invention has been devised, and its object is to obtain a large ion beam current, while suppressing a probability of damaging an emitter electrode. The present invention is characterized by a process in which an ion beam is emitted at least in two operation states including a first operation state in which, when a first extraction voltage is applied, with the gas pressure being set to a first gas pressure, ions are emitted from a first ion emission region at the apex of the emitter electrode, and a second operation state in which, when a second extraction voltage that is higher than the first extraction voltage is applied, with the gas pressure being set to a second gas pressure that is higher than the first gas pressure, ions are emitted from a second ion emission region that is larger than the first ion emission region.
摘要翻译：在常规气田电离离子源的情况下，由于离子束的电流量小，所以不可能以高S / N比和高速加工工艺进行分析。鉴于这些问题，本发明的目的是为了获得大的离子束电流，同时抑制发射电极损坏的可能性。本发明的特征在于，其中离子束至少在两种操作状态下发射的过程，包括第一操作状态，其中当施加第一提取电压时，将气体压力设置为第一气体压力，离子从发射电极的顶点处的第一离子发射区域发射;以及第二操作状态，其中当施加高于第一提取电压的第二提取电压时，将气体压力设定为第二气体高于第一气体压力的压力，从大于第一离子发射区域的第二离子发射区域发射离子。

2. 发明授权

US09018597B2 Gas field ionization ion source and ion beam apparatus 有权
标题翻译：气田电离离子源和离子束装置
公开(公告)号：US09018597B2
公开(公告)日：2015-04-28
申请号：US14390071
申请日：2013-03-11
申请人： Hitachi High-Technologies Corporation
发明人： Yoshimi Kawanami , Hironori Moritani
IPC分类号： H01J27/26 , H01J37/08 , H01J37/10 , H01J37/147 , H01J37/26
CPC分类号： H01J37/08 , H01J27/26 , H01J37/10 , H01J37/147 , H01J37/26 , H01J37/28 , H01J2237/006 , H01J2237/0807
摘要： In the case of a conventional gas field ionization ion source, it was not possible to carry out an analysis with a high S/N ratio and a high-speed machining process because the current amount of an ion beam is small. In view of these problems, the present invention has been devised, and its object is to obtain a large ion beam current, while suppressing a probability of damaging an emitter electrode. The present invention is characterized by a process in which an ion beam is emitted at least in two operation states including a first operation state in which, when a first extraction voltage is applied, with the gas pressure being set to a first gas pressure, ions are emitted from a first ion emission region at the apex of the emitter electrode, and a second operation state in which, when a second extraction voltage that is higher than the first extraction voltage is applied, with the gas pressure being set to a second gas pressure that is higher than the first gas pressure, ions are emitted from a second ion emission region that is larger than the first ion emission region.
摘要翻译：在常规气田电离离子源的情况下，由于离子束的电流量小，所以不可能以高S / N比和高速加工工艺进行分析。鉴于这些问题，本发明的目的是为了获得大的离子束电流，同时抑制发射电极损坏的可能性。本发明的特征在于，其中离子束至少在两种操作状态下发射的过程，包括第一操作状态，其中当施加第一提取电压时，将气体压力设置为第一气体压力，离子从发射电极的顶点处的第一离子发射区域发射;以及第二操作状态，其中当施加高于第一提取电压的第二提取电压时，将气体压力设定为第二气体高于第一气体压力的压力，从大于第一离子发射区域的第二离子发射区域发射离子。

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