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1. 发明申请

US20060117666A1 Polishing composition 有权
公开(公告)号：US20060117666A1
公开(公告)日：2006-06-08
申请号：US11328149
申请日：2006-01-10
申请人： Hiroyuki Yoshida , Toshiya Hagihara , Ryoichi Hashimoto , Yasuhiro Yoneda
发明人： Hiroyuki Yoshida , Toshiya Hagihara , Ryoichi Hashimoto , Yasuhiro Yoneda
IPC分类号： B24B7/30 , C09K3/14
CPC分类号： C09G1/02 , C09K3/1463 , H01L21/31053
摘要： A polishing composition comprising an improver of a ratio of a polishing rate of an insulating film to that of a stopper film, wherein the polishing rate of the stopper film is selectively decreased, comprising one or more compounds selected from the group consisting of a monoamine or diamine compound; a polyamine having three or more amino groups in its molecule; an ether group-containing amine; and a heterocyclic compound having nitrogen atom. The polishing composition can be used for removing an insulating film which has been embedded for isolation into a trench formed on a silicon substrate and sedimented outside the trench, thereby planing a surface of the silicon substrate.

2. 发明授权

US07247082B2 Polishing composition 有权
标题翻译：抛光组成
公开(公告)号：US07247082B2
公开(公告)日：2007-07-24
申请号：US11328149
申请日：2006-01-10
申请人： Hiroyuki Yoshida , Toshiya Hagihara , Ryoichi Hashimoto , Yasuhiro Yoneda
发明人： Hiroyuki Yoshida , Toshiya Hagihara , Ryoichi Hashimoto , Yasuhiro Yoneda
IPC分类号： C09K13/06
CPC分类号： C09G1/02 , C09K3/1463 , H01L21/31053
摘要： A polishing composition comprising an improver of a ratio of a polishing rate of an insulating film to that of a stopper film, wherein the polishing rate of the stopper film is selectively decreased, comprising one or more compounds selected from the group consisting of a monoamine or diamine compound; a polyamine having three or more amino groups in its molecule; an ether group-containing amine; and a heterocyclic compound having nitrogen atom. The polishing composition can be used for removing an insulating film which has been embedded for isolation into a trench formed on a silicon substrate and sedimented outside the trench, thereby planing a surface of the silicon substrate.
摘要翻译： 1.一种抛光组合物，其特征在于，包括：绝缘膜的抛光速度与阻挡膜的研磨速度的比例的提高剂，其中所述阻挡膜的研磨速度选择性地降低，所述抛光组合物包含一种或多种选自以下的化合物：单胺或二胺化合物; 在其分子中具有三个或更多个氨基的多胺; 含醚基的胺; 和具有氮原子的杂环化合物。抛光组合物可以用于将已经嵌入以隔离的绝缘膜去除形成在硅衬底上的沟槽并沉淀在沟槽外部，从而平面化硅衬底的表面。

3. 发明授权

US07059941B2 Polishing composition 失效
公开(公告)号：US07059941B2
公开(公告)日：2006-06-13
申请号：US10701606
申请日：2003-11-06
申请人： Hiroyuki Yoshida , Toshiya Hagihara , Ryoichi Hashimoto , Yasuhiro Yoneda
发明人： Hiroyuki Yoshida , Toshiya Hagihara , Ryoichi Hashimoto , Yasuhiro Yoneda
IPC分类号： C09K13/06
CPC分类号： C09G1/02 , C09K3/1463 , H01L21/31053
摘要： A polishing composition comprising an improver of a ratio of a polishing rate of an insulating film to that of a stopper film, wherein the polishing rate of the stopper film is selectively decreased, comprising one or more compounds selected from the group consisting of a monoamine or diamine compound; a polyamine having three or more amino groups in its molecule; an ether group-containing amine; and a heterocyclic compound having nitrogen atom. The polishing composition can be used for removing an insulating film which has been embedded for isolation into a trench formed on a silicon substrate and sedimented outside the trench, thereby planing a surface of the silicon substrate.

4. 发明授权

US07666238B2 Polishing composition 失效
标题翻译：抛光组成
公开(公告)号：US07666238B2
公开(公告)日：2010-02-23
申请号：US11948705
申请日：2007-11-30
申请人： Shigeo Fujii , Hiroyuki Yoshida , Toshiya Hagihara , Hiroaki Kitayama
发明人： Shigeo Fujii , Hiroyuki Yoshida , Toshiya Hagihara , Hiroaki Kitayama
IPC分类号： B24D3/02 , C09C1/68 , C09G1/02 , C09K13/00
CPC分类号： C09G1/02 , C09K3/1409 , C09K3/1463
摘要： A polishing composition comprising an abrasive and water, wherein the polishing composition has an index of degree of sedimentation of 80 or more and 100 or less; a process for producing a substrate comprising polishing a substrate to be polished using the above-mentioned composition; a process for preventing clogging of a polishing pad comprising applying the above-mentioned composition; a process for preventing clogging of a polishing pad comprising applying the above-mentioned composition to polishing with a polishing pad for a nickel-containing object to be polished; and a process for preventing clogging of a polishing pad comprising applying a composition comprising a hydrophilic polymer having two or more hydrophilic groups in its molecule and a molecular weight of 300 or more, or a compound capable of dissolving nickel hydroxide at a pH of 8.0, and water to polishing with a polishing pad for a nickel-containing object to be polished.
摘要翻译：一种抛光组合物，其包含研磨剂和水，其中所述抛光组合物的沉降度指数为80以上且100以下; 用于制造基材的方法，包括使用上述组合物抛光待抛光的基材; 防止抛光垫堵塞的方法，包括施加上述组合物; 一种用于防止抛光垫堵塞的方法，包括将上述组合物用抛光用的待研磨的含镍物体的抛光垫进行抛光; 以及防止抛光垫堵塞的方法，包括在其分子中施加包含其分子中具有两个或更多个亲水基团的亲水性聚合物和分子量为300以上的组合物或能够溶解氢氧化镍的化合物在pH为8.0的组合物，和水用抛光用的抛光垫进行抛光。

5. 发明申请

US20080160881A1 POLISHING COMPOSITION 失效
标题翻译：抛光组合物
公开(公告)号：US20080160881A1
公开(公告)日：2008-07-03
申请号：US11948705
申请日：2007-11-30
申请人： Shigeo Fujii , Hiroyuki Yoshida , Toshiya Hagihara , Hiroaki Kitayama
发明人： Shigeo Fujii , Hiroyuki Yoshida , Toshiya Hagihara , Hiroaki Kitayama
IPC分类号： C09G1/02 , B24B1/00 , C09K3/14
CPC分类号： C09G1/02 , C09K3/1409 , C09K3/1463
摘要： A polishing composition comprising an abrasive and water, wherein the polishing composition has an index of degree of sedimentation of 80 or more and 100 or less; a process for producing a substrate comprising polishing a substrate to be polished using the above-mentioned composition; a process for preventing clogging of a polishing pad comprising applying the above-mentioned composition; a process for preventing clogging of a polishing pad comprising applying the above-mentioned composition to polishing with a polishing pad for a nickel-containing object to be polished; and a process for preventing clogging of a polishing pad comprising applying a composition comprising a hydrophilic polymer having two or more hydrophilic groups in its molecule and a molecular weight of 300 or more, or a compound capable of dissolving nickel hydroxide at a pH of 8.0, and water to polishing with a polishing pad for a nickel-containing object to be polished.
摘要翻译：一种抛光组合物，其包含研磨剂和水，其中所述抛光组合物的沉降度指数为80以上且100以下; 一种生产基材的方法，包括使用上述组合物抛光待抛光的基材; 包括施加上述组合物的防止抛光垫堵塞的方法; 一种用于防止抛光垫堵塞的方法，包括将上述组合物用抛光用的待研磨的含镍物体的抛光垫进行抛光; 以及防止抛光垫堵塞的方法，其包括在其分子中施加包含其分子中具有两个或更多个亲水基团的亲水性聚合物和分子量为300以上的组合物或能够溶解氢氧化镍的化合物在pH为8.0的组合物，和水用抛光用的抛光垫进行抛光。

6. 发明申请

US20050208883A1 Polishing composition 审中-公开
标题翻译：抛光组成
公开(公告)号：US20050208883A1
公开(公告)日：2005-09-22
申请号：US11081560
申请日：2005-03-17
申请人： Hiroyuki Yoshida , Yuichi Honma , Shigeaki Takashina , Toshiya Hagihara
发明人： Hiroyuki Yoshida , Yuichi Honma , Shigeaki Takashina , Toshiya Hagihara
IPC分类号： B24B1/00 , B24B7/24 , B24B37/04 , B24D3/02 , C09G1/02 , C09K3/14
CPC分类号： C09G1/02 , B24B37/044 , C09K3/1436 , C09K3/1463
摘要： The present invention relates to a polishing composition containing an aqueous medium and silica particles, wherein the silica particles in the polishing composition has a zeta potential of from −15 to 40 mV; a method for manufacturing a substrate including the step of polishing a substrate to be polished with a polishing composition containing an aqueous medium and silica particles, wherein the silica particles in the polishing composition has a zeta potential of from −15 to 40 mV; and a method for reducing scratches on a substrate to be polished with a polishing composition containing an aqueous medium and silica particles, including the step of adjusting a zeta potential of silica particles in the polishing composition to −15 to 40 mV. The polishing composition can be favorably used in polishing the substrate for precision parts, including substrates for magnetic recording media such as magnetic discs, optical discs and opto-magnetic discs; photomask substrates; optical lenses; optical mirrors; optical prisms; semiconductor substrates; and the like.
摘要翻译：本发明涉及含有水性介质和二氧化硅颗粒的抛光组合物，其中抛光组合物中的二氧化硅颗粒的ζ电位为-15至40mV; 一种基板的制造方法，其特征在于，包括使用含有水性介质和二氧化硅粒子的研磨用组合物研磨待研磨基板的工序，其中，研磨用组合物中的二氧化硅粒子的ζ电位为-15〜40mV，以及包括将研磨用组合物中的二氧化硅粒子的ζ电位调整为-15〜40mV的步骤的减少含有水性介质和二氧化硅粒子的研磨用组合物的研磨用基板上的划痕的方法。抛光组合物可以有利地用于抛光用于精密部件的基板，包括用于诸如磁盘，光盘和光磁盘的磁记录介质的基板; 光掩模基板; 光学镜片; 光学镜; 光学棱镜半导体衬底; 等等。

7. 发明授权

US09354433B2 Image measuring apparatus 有权
标题翻译：图像测量仪
公开(公告)号：US09354433B2
公开(公告)日：2016-05-31
申请号：US13398042
申请日：2012-02-16
申请人： Hiroyuki Yoshida
发明人： Hiroyuki Yoshida
IPC分类号： H04N5/232 , H04N7/18 , G02B21/00 , G01B11/24 , G02B21/36 , G03B3/10 , G03B13/36 , G03B15/02
CPC分类号： G02B21/0016 , G01B11/24 , G02B21/365 , G03B3/10 , G03B13/36 , G03B15/02 , H04N5/23212
摘要： An image measuring apparatus includes: an imaging device of a rolling shutter type configured to image a work; a position control system configured to output a focusing position as information representing a position in a direction of a focusing axis by controlling an in-focus position of the imaging device; and a computing device configured to calculate, from image information acquired from the imaging device, contrast information corresponding to the image information, wherein the computing device divides an acquired image into a plurality of regions and corrects the contrast information corresponding to the image information based on a position of and the contrast information corresponding to each of the regions.
摘要翻译：一种图像测量装置包括：被配置为对工件进行成像的滚动快门类型的成像装置; 位置控制系统，被配置为通过控制成像装置的对焦位置来输出聚焦位置作为表示聚焦轴方向上的位置的信息; 以及计算装置，被配置为从从所述成像装置获取的图像信息中计算与所述图像信息相对应的对比度信息，其中，所述计算装置将获取的图像划分为多个区域，并且基于所述图像信息对应于所述图像信息来校正所述对比度信息对应于每个区域的位置和对比度信息。

8. 发明授权

US09056096B2 Hyaluronic acid decomposition-promoting factor and inhibitor thereof 有权
标题翻译：透明质酸分解促进因子及其抑制剂
公开(公告)号：US09056096B2
公开(公告)日：2015-06-16
申请号：US13701702
申请日：2011-06-03
申请人： Hiroyuki Yoshida , Shintaro Inoue , Shingo Sakai , Aya Nagaoka
发明人： Hiroyuki Yoshida , Shintaro Inoue , Shingo Sakai , Aya Nagaoka
IPC分类号： G01N33/53 , A61K39/395 , A61K8/42 , A61K8/44 , A61K8/49 , A61K31/365 , A61K31/4015 , A61K31/5415 , A61K31/7088 , A61K31/713 , A61K48/00 , A61Q19/08 , C07K14/47 , C07K16/40 , C12N15/113 , G01N33/50 , A61K31/16 , A61K31/198 , A61K31/7048 , C07K7/08 , C07K16/18 , C12Q1/02 , A61K8/64 , A61K8/73 , A61K31/728 , A61K38/00
CPC分类号： C07K16/40 , A61K8/42 , A61K8/44 , A61K8/49 , A61K8/4913 , A61K8/498 , A61K8/602 , A61K8/606 , A61K8/64 , A61K8/735 , A61K9/0014 , A61K31/16 , A61K31/198 , A61K31/35 , A61K31/365 , A61K31/40 , A61K31/4015 , A61K31/5415 , A61K31/7048 , A61K31/7088 , A61K31/713 , A61K31/728 , A61K38/00 , A61K39/3955 , A61K48/005 , A61K2800/782 , A61Q19/007 , A61Q19/08 , C07K7/08 , C07K14/47 , C07K16/18 , C07K2317/34 , C12N9/2474 , C12N15/113 , C12N15/1137 , C12N15/52 , C12N2310/11 , C12N2310/111 , C12N2310/14 , C12N2320/32 , C12Q1/025 , G01N33/5023 , G01N2400/40 , G01N2500/10
摘要： The present invention is directed to KIAA1199, which is a novel factor involved in decomposition of hyaluronic acid, and to use thereof. More specifically, the invention is directed to a hyaluronic acid decomposition-promoting agent containing the KIAA1199 gene and a protein encoded by the gene; to a hyaluronic acid decomposition-inhibiting agent characterized by inhibiting the activity or expression thereof (including an siRNA or a monoclonal antibody); and to a method for screening a novel hyaluronic acid decomposition-controlling agent, in which the method contains employing the expression of KIAA1199 as an index.
摘要翻译：本发明涉及KIAA1199，它是涉及透明质酸分解的新颖因素及其应用。更具体地，本发明涉及含有KIAA1199基因和由该基因编码的蛋白质的透明质酸分解促进剂; 特征在于抑制其活性或表达（包括siRNA或单克隆抗体）的透明质酸分解抑制剂; 以及用于筛选新型透明质酸分解控制剂的方法，其中该方法包含使用KIAA1199的表达作为指标。

9. 发明申请

US20150138570A1 DISPLAY PROCESSING APPARATUS AND DISPLAY PROCESSING METHOD 有权
标题翻译：显示处理装置和显示处理方法
公开(公告)号：US20150138570A1
公开(公告)日：2015-05-21
申请号：US14534558
申请日：2014-11-06
申请人： Risa Tsutsui , Ryonosuke Miyazaki , Hiroyuki Yoshida , Yuki Kawata , Rieko Ishihara
发明人： Risa Tsutsui , Ryonosuke Miyazaki , Hiroyuki Yoshida , Yuki Kawata , Rieko Ishihara
IPC分类号： G06F3/12 , G06K15/02 , G06K15/00
CPC分类号： G06F3/1256 , G06F3/1208
摘要： A display processing apparatus includes a first display controller that displays a background image in a display unit; and a second display controller that displays a print image in the display unit. The second display controller changes a magnification of the print image so that the print image has a size obtained by changing a size of a recording medium on which the print image is to be printed on a scale of the background image displayed in the display unit, and superimposes and displays the print image on the background image.
摘要翻译：显示处理装置包括在显示单元中显示背景图像的第一显示控制器; 以及在显示单元中显示打印图像的第二显示控制器。第二显示控制器改变打印图像的放大倍数，使得打印图像具有通过在显示单元中显示的背景图像的比例改变其上要打印图像的记录介质的尺寸而获得的尺寸，并将印刷图像叠加并显示在背景图像上。

10. 发明授权

US08964255B2 Display processing apparatus, display processing system, display processing method, and computer program product 有权
标题翻译：显示处理装置，显示处理系统，显示处理方法和计算机程序产品
公开(公告)号：US08964255B2
公开(公告)日：2015-02-24
申请号：US13858197
申请日：2013-04-08
申请人： Ryonosuke Miyazaki , Yasushi Yamaguchi , Hiroyuki Yoshida , Tomoyoshi Takeuchi
发明人： Ryonosuke Miyazaki , Yasushi Yamaguchi , Hiroyuki Yoshida , Tomoyoshi Takeuchi
IPC分类号： H04N1/46 , G06K15/02 , G06F3/12 , H04N1/54
CPC分类号： G06K15/025 , G06F3/1208 , G06F3/1256 , G06F3/1285 , H04N1/54
摘要： A display processing apparatus includes a transparent display data generating unit and a preview image generating unit. Based on document data including color plane image data indicating an area for which use of a color developer is specified and transparent plane image data indicating an area for which use of a transparent developer is specified together with the type of transparent processing performed on the area by using the transparent developer, the transparent display data generating unit generates pieces of transparent display data showing a result of image formation corresponding to the transparent processing with the transparent developer for each type of transparent processing. The preview image generating unit generates a preview image by projecting a color display plane on which the color plane image data is displayed and transparent display planes on which the pieces of transparent display data are displayed in a three-dimensional space onto a two-dimensional plane.
摘要翻译：显示处理装置包括透明显示数据生成单元和预览图像生成单元。基于包括指定使用彩色显影剂的区域的彩色平面图像数据的文档数据和指示使用透明显影剂的区域的透明平面图像数据以及对该区域进行的透明处理的类型使用透明显影剂，透明显示数据生成单元通过透明显影剂生成与透明处理对应的图像形成结果的透明显示数据，用于各种透明处理。预览图像生成单元通过投影在其上显示彩色平面图像数据的彩色显示平面和在三维空间上将透明显示数据显示在二维平面上的透明显示平面来生成预览图像。

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