专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20120184100A1 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS 审中-公开
标题翻译：化学放大正电阻组合物和图案化方法
公开(公告)号：US20120184100A1
公开(公告)日：2012-07-19
申请号：US13353700
申请日：2012-01-19
申请人： Hiroyuki Yasuda , Katsuya Takemura , Noriyuki Koike
发明人： Hiroyuki Yasuda , Katsuya Takemura , Noriyuki Koike
IPC分类号： H01L21/3205 , G03F7/20 , G03F7/039
CPC分类号： G03F7/0048 , G03F7/0046 , G03F7/0392 , G03F7/0755 , G03F7/0757
摘要： A chemically amplified positive resist composition comprising (A) a substantially alkali insoluble polymer having an acidic functional group protected with an acid labile group, (B) an acid generator, and (C) a perfluoroalkyl ethylene oxide adduct or a nonionic fluorinated organosiloxane compound is coated, exposed to UV radiation having a wavelength of at least 150 nm, and developed. The composition has advantages of uniformity and minimized edge crown upon coating, and no scum formation after development.
摘要翻译：一种化学放大正性抗蚀剂组合物，其包含（A）具有由酸不稳定基团保护的酸性官能团的基本上不溶于碱的聚合物，（B）酸产生剂和（C）全氟烷基环氧乙烷加合物或非离子氟化有机硅氧烷化合物，涂覆，暴露于具有至少150nm的波长的UV辐射，并显影。该组合物具有均匀性和涂覆后边缘冠最小化的优点，并且在显影后没有浮渣形成。

2. 发明授权

US08980525B2 Chemically amplified positive resist composition and patterning process 有权
标题翻译：化学扩增正性抗蚀剂组成和图案化工艺
公开(公告)号：US08980525B2
公开(公告)日：2015-03-17
申请号：US13556422
申请日：2012-07-24
申请人： Hiroyuki Yasuda , Katsuya Takemura
发明人： Hiroyuki Yasuda , Katsuya Takemura
IPC分类号： G03F7/004 , G03F7/40 , G03F7/039
CPC分类号： G03F7/0392 , G03F7/0397 , G03F7/40 , Y10S430/11
摘要： A chemically amplified positive resist composition is provided comprising an alkali-insoluble or substantially alkali-insoluble polymer having an acid labile group-protected acidic functional group, an alkyl vinyl ether polymer, a photoacid generator, and a benzotriazole compound in a solvent. The composition forms on a substrate a resist film of 5-100 μm thick which can be briefly developed to form a pattern at a high sensitivity and a high degree of removal or dissolution to bottom.
摘要翻译：提供化学放大的正性抗蚀剂组合物，其包含在溶剂中具有酸不稳定基团保护的酸性官能团，烷基乙烯基醚聚合物，光酸产生剂和苯并三唑化合物的碱不溶性或基本上不溶于碱的聚合物。组合物在基材上形成5-100μm厚的抗蚀剂膜，其可以短暂地显影以形成高灵敏度和高度去除或溶解于底部的图案。

3. 发明授权

US08968982B2 Chemically amplified positive resist composition and patterning process 有权
标题翻译：化学扩增正性抗蚀剂组成和图案化工艺
公开(公告)号：US08968982B2
公开(公告)日：2015-03-03
申请号：US13353955
申请日：2012-01-19
申请人： Hiroyuki Yasuda , Katsuya Takemura
发明人： Hiroyuki Yasuda , Katsuya Takemura
IPC分类号： G03F7/004 , G03F7/039 , G03F7/26 , G03F7/40 , H01L21/027
CPC分类号： G03F7/0392 , G03F7/0397 , G03F7/40 , H01L21/0272
摘要： In a chemically amplified positive resist composition comprising a base resin and an acid generator in a solvent, the base resin contains both an alkali-insoluble or substantially alkali-insoluble polymer having an acid labile group-protected acidic functional group having a Mw of 1,000-500,000 and an alkyl vinyl ether polymer having a Mw of 10,000-500,000. The composition forms on a substrate a resist film of 5-100 μm thick which can be briefly developed to form a pattern at a high sensitivity and a high degree of removal or dissolution to bottom.
摘要翻译：在包含基础树脂和在溶剂中的酸产生剂的化学放大型正性抗蚀剂组合物中，基础树脂含有具有1000重量％的Mw的酸不稳定基团保护的酸性官能团的碱不溶性或基本上不溶于碱的聚合物， 500,000和Mw为10,000-500,000的烷基乙烯基醚聚合物。组合物在基材上形成5-100μm厚的抗蚀剂膜，其可以短暂地显影以形成高灵敏度和高度去除或溶解于底部的图案。

4. 发明申请

US20130026044A1 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS 有权
标题翻译：化学放大正电阻组合物和图案化方法
公开(公告)号：US20130026044A1
公开(公告)日：2013-01-31
申请号：US13556422
申请日：2012-07-24
申请人： Hiroyuki Yasuda , Katsuya Takemura
发明人： Hiroyuki Yasuda , Katsuya Takemura
IPC分类号： G03F7/027 , C25D5/02 , G03F7/20
CPC分类号： G03F7/0392 , G03F7/0397 , G03F7/40 , Y10S430/11
摘要： A chemically amplified positive resist composition is provided comprising an alkali-insoluble or substantially alkali-insoluble polymer having an acid labile group-protected acidic functional group, an alkyl vinyl ether polymer, a photoacid generator, and a benzotriazole compound in a solvent. The composition forms on a substrate a resist film of 5-100 μm thick which can be briefly developed to form a pattern at a high sensitivity and a high degree of removal or dissolution to bottom.
摘要翻译：提供化学放大的正性抗蚀剂组合物，其包含在溶剂中具有酸不稳定基团保护的酸性官能团，烷基乙烯基醚聚合物，光酸产生剂和苯并三唑化合物的碱不溶性或基本上不溶于碱的聚合物。组合物在基材上形成5-100μm厚的抗蚀剂膜，其可以短暂地显影以形成高灵敏度和高度去除或溶解于底部的图案。

5. 发明申请

US20120184101A1 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS 有权
标题翻译：化学放大正电阻组合物和图案化方法
公开(公告)号：US20120184101A1
公开(公告)日：2012-07-19
申请号：US13353955
申请日：2012-01-19
申请人： Hiroyuki Yasuda , Katsuya Takemura
发明人： Hiroyuki Yasuda , Katsuya Takemura
IPC分类号： H01L21/3205 , G03F7/20 , G03F7/039
CPC分类号： G03F7/0392 , G03F7/0397 , G03F7/40 , H01L21/0272
摘要： In a chemically amplified positive resist composition comprising a base resin and an acid generator in a solvent, the base resin contains both an alkali-insoluble or substantially alkali-insoluble polymer having an acid labile group-protected acidic functional group having a Mw of 1,000-500,000 and an alkyl vinyl ether polymer having a Mw of 10,000-500,000. The composition forms on a substrate a resist film of 5-100 μm thick which can be briefly developed to form a pattern at a high sensitivity and a high degree of removal or dissolution to bottom.
摘要翻译：在包含基础树脂和在溶剂中的酸产生剂的化学放大型正性抗蚀剂组合物中，基础树脂含有具有1000重量％的Mw的酸不稳定基团保护的酸性官能团的碱不溶性或基本上不溶于碱的聚合物， 500,000和Mw为10,000-500,000的烷基乙烯基醚聚合物。组合物在基材上形成5-100μm厚的抗蚀剂膜，其可以短暂地显影以形成高灵敏度和高度去除或溶解于底部的图案。

6. 发明申请

US20130228682A1 MASS SPECTROMETER AND MASS SPECTROMETRY METHOD 有权
标题翻译：质谱仪和质谱方法
公开(公告)号：US20130228682A1
公开(公告)日：2013-09-05
申请号：US13885435
申请日：2011-11-17
申请人： Hiroyuki Yasuda , Shinji Yoshioka
发明人： Hiroyuki Yasuda , Shinji Yoshioka
IPC分类号： H01J49/14 , H01J49/00
CPC分类号： H01J49/14 , H01J49/0031 , H01J49/0045 , H01J49/063 , H01J49/4255
摘要： A mass spectrometer is provided including: a collision chamber of generating fragment ions by superimposingly applying an AC voltage and a first DC voltage between linear multipolar electrodes, and accelerating the fragment ions by applying a second DC voltage between a front stage electrode and a later stage electrode; a mass spectrometer unit of carrying out mass separation of the fragment ions; and a control unit of determining the second DC voltage based on the mass-to-charge ratios such that the rates of the fragment ions in the collision chamber become equal regardless of the mass-to-charge ratios. Herein, the control unit increases the second DC voltage as the mass-to-charge ratios selected by the mass spectrometer unit become larger. This allows the mass window to be wider even when a DC electric field is generated in order to solve a crosstalk drawback, in the movement direction of the molecular ions.
摘要翻译：提供一种质谱仪，包括：通过在线性多极电极之间叠加施加AC电压和第一DC电压来产生碎片离子的碰撞室，并且通过在前级电极和后级电极之间施加第二DC电压来加速碎片离子电极; 进行碎片离子的质量分离的质谱仪单元; 以及控制单元，其基于所述质荷比来确定所述第二DC电压，使得所述碰撞室中的碎片离子的速率与所述质荷比无关，变得相等。这里，当由质谱仪单元选择的质荷比变大时，控制单元增加第二DC电压。这样即使产生直流电场，为了解决分子离子的移动方向上的串扰缺陷，也可以使质量窗口更宽。

7. 发明申请

US20130092428A1 PRINTED WIRING BOARD AND METHOD OF MANUFACTURE THEREOF 有权
标题翻译：印刷线路板及其制造方法
公开(公告)号：US20130092428A1
公开(公告)日：2013-04-18
申请号：US13639640
申请日：2011-04-11
申请人： Toshiyuki Kawaguchi , Kazutoki Tahara , Tsutomu Saga , Hiroyuki Yasuda
发明人： Toshiyuki Kawaguchi , Kazutoki Tahara , Tsutomu Saga , Hiroyuki Yasuda
IPC分类号： H05K1/02
CPC分类号： H05K1/0218 , H05K1/0234 , H05K1/0242 , H05K1/0393 , H05K2201/0133 , H05K2201/0715 , H05K2201/09736
摘要： A printed wiring board, including a printed wiring member which respectively has object conductor that is subjected to electromagnetic wave shielding on at least one surface of an insulating layer; and an electromagnetic wave shielding member which has an electromagnetic wave shielding layer composed of a low-resistance section and a high-resistance section on at least one surface of a base film. The printed wiring member and the electromagnetic wave shielding member are bonded together with interposition of insulating adhesive layers, and with arrangement of the electromagnetic wave shielding layer separately and in opposition so that the object conductor is covered. The electromagnetic wave shielding layer and the object conductor are composed of the same type of conductive material, and the electromagnetic wave shielding layer is not exposed at the circumferential end faces of the printed wiring board.
摘要翻译：一种印刷线路板，包括分别具有在绝缘层的至少一个表面上进行电磁波屏蔽的物体导体的印刷布线构件; 以及电磁波屏蔽构件，其在基膜的至少一个表面上具有由低电阻部分和高电阻部分构成的电磁波屏蔽层。印刷线路构件和电磁波屏蔽构件通过插入绝缘粘合剂层而被接合在一起，并且电磁波屏蔽层的布置分开地和相对地布置，使得物体导体被覆盖。电磁波屏蔽层和物体导体由相同类型的导电材料构成，并且电磁波屏蔽层不在印刷线路板的周向端面处露出。

8. 发明申请

US20100320620A1 ADHESIVE FILM FOR SEMICONDUCTOR AND SEMICONDUCTOR DEVICE USING THE ADHESIVE FILM 失效
标题翻译：使用胶粘膜的半导体和半导体器件的粘合膜
公开(公告)号：US20100320620A1
公开(公告)日：2010-12-23
申请号：US12526265
申请日：2008-02-26
申请人： Hiroyuki Yasuda
发明人： Hiroyuki Yasuda
IPC分类号： H01L23/00 , C08L33/10
CPC分类号： H01L21/6836 , C08L33/06 , C08L2666/02 , C09J7/10 , C09J133/06 , C09J133/08 , C09J2201/602 , C09J2203/326 , C09J2433/00 , C09J2461/00 , H01L23/293 , H01L23/3128 , H01L24/27 , H01L24/29 , H01L24/48 , H01L24/73 , H01L24/83 , H01L24/85 , H01L25/0657 , H01L2221/68327 , H01L2224/274 , H01L2224/27436 , H01L2224/29 , H01L2224/29101 , H01L2224/2919 , H01L2224/29198 , H01L2224/2929 , H01L2224/29339 , H01L2224/29386 , H01L2224/32145 , H01L2224/32225 , H01L2224/48091 , H01L2224/48227 , H01L2224/73265 , H01L2224/83191 , H01L2224/83385 , H01L2224/8388 , H01L2224/85 , H01L2225/06562 , H01L2924/00013 , H01L2924/00014 , H01L2924/01004 , H01L2924/01005 , H01L2924/01006 , H01L2924/0101 , H01L2924/01013 , H01L2924/01019 , H01L2924/01027 , H01L2924/01033 , H01L2924/01045 , H01L2924/01047 , H01L2924/01058 , H01L2924/01059 , H01L2924/01072 , H01L2924/01077 , H01L2924/01082 , H01L2924/014 , H01L2924/0665 , H01L2924/07802 , H01L2924/10253 , H01L2924/12044 , H01L2924/15311 , H01L2924/181 , H01L2924/20105 , H01L2924/30105 , H01L2924/00 , H01L2924/3512 , H01L2924/00012 , H01L2924/05432 , H01L2924/05442 , H01L2924/05341 , H01L2224/29099 , H01L2224/29199 , H01L2224/29299 , H01L2224/45099 , H01L2224/45015 , H01L2924/207
摘要： An adhesive film for a semiconductor containing an (A) ester (meth)acrylate copolymer and a (B) thermoplastic resin other than the ester (meth)acrylate copolymer, and composed so as to satisfy the following formula (1) for two hours from 10 minutes after starting measurement, in which γ represents an amount of shearing strain produced upon undergoing a shearing stress of 3000 Pa at a frequency of 1 Hz and a temperature of 175° C. on parallel plates of 20 mm in diameter, exhibits superior filling performance in surface unevenness of a substrate through an encapsulating material sealing process, despite that semiconductor chips are stacked in multiple layers in the semiconductor device and hence a wire bonding process imposes a longer thermal history. 0.10≦γ≦0.30 (1)
摘要翻译：一种含有（A）（甲基）丙烯酸酯共聚物和（B）热塑性树脂的除了（甲基）丙烯酸酯共聚物之外的半导体的粘合剂薄膜，由下式（1）组成，满足下式（1）开始测量后10分钟，其中γ表示在直径为20mm的平行板上以1Hz的频率和175℃的剪切应力在3000Pa下产生的剪切应变的量，表现出优异的填充尽管半导体芯片在半导体器件中堆叠成多层，因此引线接合工艺施加了更长的热历史，但是通过封装材料密封工艺在基板的表面不均匀性方面。 0.10＆nlE;γ＆nlE; 0.30（1）

9. 发明授权

US07529298B2 Picture transmission method, picture transmission method program, storage medium which stores picture transmission method program, and picture transmission apparatus 失效
标题翻译：图像发送方法，图像发送方法程序，存储图像发送方法程序的存储介质和图像发送装置
公开(公告)号：US07529298B2
公开(公告)日：2009-05-05
申请号：US10133420
申请日：2002-04-29
申请人： Hiroyuki Yasuda
发明人： Hiroyuki Yasuda
IPC分类号： H04B1/66
CPC分类号： H04N19/33 , H04N19/164 , H04N19/167 , H04N19/174 , H04N19/37
摘要： A picture transmission method is disclosed which involves encoding moving picture data and transmitting the encoded data. The picture transmission method includes the steps of encoding firstly the moving picture data into a moving picture stream for transmission at a predetermined data transfer rate, and encoding secondly, based on position information acquired from a transmission destination, a part of the moving picture data which constitutes a partial picture region for transmission at a higher resolution than the first encoding step.
摘要翻译：公开了一种图像发送方法，其涉及编码运动图像数据并发送编码数据。图像发送方法包括以下步骤：首先将运动图像数据编码为用于以预定数据传送速率传输的运动图像流，然后根据从发送目的地获取的位置信息进行编码，其中，运动图像数据的一部分构成用于以比第一编码步骤更高的分辨率进行传输的部分图像区域。

10. 发明申请

US20070069123A1 Mass spectroscope and method of calibrating the same 有权
标题翻译：质谱仪及其校准方法
公开(公告)号：US20070069123A1
公开(公告)日：2007-03-29
申请号：US11508323
申请日：2006-08-23
申请人： Shinji Nagai , Hiroyuki Yasuda , Tetsuya Nishida
发明人： Shinji Nagai , Hiroyuki Yasuda , Tetsuya Nishida
IPC分类号： H01J49/00
CPC分类号： H01J49/424 , H01J49/0009 , H01J49/0027
摘要： An ion resonance condition is corrected accurately in an ion trapping device. Measurements are repeated by alternately applying and not applying a resonance frequency voltage while spectral data is obtained continuously. Data obtained in the absence of the resonance frequency voltage is used as reference data to correct the set data of a resonance condition. As a result, calibration can be made while taking into consideration the variations in the amount of ions that are introduced into the ion trap.
摘要翻译：在离子捕获装置中精确校正离子共振条件。通过在连续获得光谱数据的同时交替地施加并不施加共振频率电压来重复测量。在没有谐振频率电压的情况下获得的数据被用作参考数据，以校正谐振条件的设定数据。结果，可以考虑到引入到离子阱中的离子量的变化来进行校准。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式