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    • 7. 发明授权
    • Optical apparatus for defect inspection
    • 用于缺陷检查的光学设备
    • US07557913B2
    • 2009-07-07
    • US11822003
    • 2007-06-29
    • Seiji OtaniKoichi Nagoya
    • Seiji OtaniKoichi Nagoya
    • G01N21/88
    • G01N21/95607G01N21/94
    • An optical apparatus for defect inspection having an illuminating optical system for irradiating illumination light beams on the surface of a specimen to form a beam spot and a detection optical system for detecting a reflection light ray originating from the beam spot comprises a storage unit in which the position and size of a standard particle of known size on a specimen for correction are stored in advance, a correction processing section which, when the correction specimen is used as an inspection target, correlates a detected scattering light quantity from the standard particle with the known size of standard particle stored at a corresponding position in the storage unit to prepare a correlation between the scattering light quantity and a true value, and a signal processing section which, when an inspection wafer is used as an inspection target, converts a detected scattering light quantity into a defect dimension.
    • 一种用于缺陷检查的光学装置,具有用于在样本表面上照射照明光束以形成光束点的照明光学系统和用于检测源自束斑的反射光的检测光学系统,包括:存储单元,其中 预先存储用于校正的样本上的已知尺寸的标准粒子的位置和尺寸,校正处理部,当将校正样本用作检查对象时,将来自标准粒子的检测到的散射光量与已知的 存储在存储单元中的对应位置处的标准粒子的尺寸,以准备散射光量与真实值之间的相关性;以及信号处理部,其将检查用晶片用作检查对象时,将检测出的散射光 数量变成缺陷维度。
    • 9. 发明申请
    • OPTICAL APPARATUS FOR DEFECT INSPECTION
    • 用于缺陷检查的光学装置
    • US20090251690A1
    • 2009-10-08
    • US12480102
    • 2009-06-08
    • Seiji OtaniKoichi Nagoya
    • Seiji OtaniKoichi Nagoya
    • G01N21/88
    • G01N21/95607G01N21/94
    • An optical apparatus for defect inspection having an illuminating optical system for irradiating illumination light beams on the surface of a specimen to form a beam spot and a detection optical system for detecting a reflection light ray originating from the beam spot comprises a storage unit in which the position and size of a standard particle of known size on a specimen for correction are stored in advance, a correction processing section which, when the correction specimen is used as an inspection target, correlates a detected scattering light quantity from the standard particle with the known size of standard particle stored at a corresponding position in the storage unit to prepare a correlation between the scattering light quantity and a true value, and a signal processing section which, when an inspection wafer is used as an inspection target, converts a detected scattering light quantity into a defect dimension.
    • 一种用于缺陷检查的光学装置,具有用于在样本表面上照射照明光束以形成光束点的照明光学系统和用于检测源自束斑的反射光的检测光学系统,包括:存储单元,其中 预先存储用于校正的样本上的已知尺寸的标准粒子的位置和尺寸,校正处理部,当将校正样本用作检查对象时,将来自标准粒子的检测到的散射光量与已知的 存储在存储单元中的对应位置处的标准粒子的尺寸,以准备散射光量与真实值之间的相关性;以及信号处理部,其将检查用晶片用作检查对象时,将检测出的散射光 数量变成缺陷维度。
    • 10. 发明申请
    • Optical apparatus for defect inspection
    • 用于缺陷检查的光学设备
    • US20080002195A1
    • 2008-01-03
    • US11822003
    • 2007-06-29
    • Seiji OtaniKoichi Nagoya
    • Seiji OtaniKoichi Nagoya
    • G01N21/88
    • G01N21/95607G01N21/94
    • An optical apparatus for defect inspection having an illuminating optical system for irradiating illumination light beams on the surface of a specimen to form a beam spot and a detection optical system for detecting a reflection light ray originating from the beam spot comprises a storage unit in which the position and size of a standard particle of known size on a specimen for correction are stored in advance, a correction processing section which, when the correction specimen is used as an inspection target, correlates a detected scattering light quantity from the standard particle with the known size of standard particle stored at a corresponding position in the storage unit to prepare a correlation between the scattering light quantity and a true value, and a signal processing section which, when an inspection wafer is used as an inspection target, converts a detected scattering light quantity into a defect dimension.
    • 一种用于缺陷检查的光学装置,具有用于在样本表面上照射照明光束以形成光束点的照明光学系统和用于检测源自束斑的反射光的检测光学系统,包括:存储单元,其中 预先存储用于校正的样本上的已知尺寸的标准粒子的位置和尺寸,校正处理部,当将校正样本用作检查对象时,将来自标准粒子的检测到的散射光量与已知的 存储在存储单元中的对应位置处的标准粒子的尺寸,以准备散射光量与真实值之间的相关性;以及信号处理部,其将检查用晶片用作检查对象时,将检测出的散射光 数量变成缺陷维度。