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1. 发明申请

US20060263642A1 Recording medium, method of manufacturing recording medium and recording apparatus 有权
公开(公告)号：US20060263642A1
公开(公告)日：2006-11-23
申请号：US11493807
申请日：2006-07-27
申请人： Hiroyuki Hieda , Masatoshi Sakurai , Koji Asakawa , Toshiro Hiraoka , Katsuyuki Naito
发明人： Hiroyuki Hieda , Masatoshi Sakurai , Koji Asakawa , Toshiro Hiraoka , Katsuyuki Naito
IPC分类号： G11B5/64
CPC分类号： G11B7/24079 , G11B5/74 , G11B5/746 , G11B5/855 , G11B7/24085 , G11B2005/0005 , Y10T29/49021 , Y10T29/49025 , Y10T428/24479 , Y10T428/24545 , Y10T428/2457 , Y10T428/24975
摘要： A recording medium includes a substrate, and a recording layer formed on the substrate having (a) a recording track band, and (b) recording cells regularly arrayed in the recording track band to form a plurality rows of sub-tracks. The recording cells included in each sub-track are formed apart from each other at a pitch P in the track direction. Nearest neighboring two recording cells, each positioned on adjacent two sub-tracks in the track band, are formed apart from each other at a pitch P/n in the track direction, where 2≦n≦5.

2. 发明授权

US06977108B2 Recording medium including patterned tracks and isolation regions 失效
标题翻译：包括图案化轨迹和隔离区域的记录介质
公开(公告)号：US06977108B2
公开(公告)日：2005-12-20
申请号：US10102812
申请日：2002-03-22
申请人： Hiroyuki Hieda , Masatoshi Sakurai , Koji Asakawa , Toshiro Hiraoka , Katsuyuki Naito
发明人： Hiroyuki Hieda , Masatoshi Sakurai , Koji Asakawa , Toshiro Hiraoka , Katsuyuki Naito
IPC分类号： G11B5/65 , G11B5/00 , G11B5/02 , G11B5/74 , G11B5/84 , G11B5/85 , G11B5/855 , G11B7/007 , G11B7/013 , G11B21/10 , G11B5/73 , G11B5/31
CPC分类号： G11B7/24079 , G11B5/74 , G11B5/746 , G11B5/855 , G11B7/24085 , G11B2005/0005 , Y10T29/49021 , Y10T29/49025 , Y10T428/24479 , Y10T428/24545 , Y10T428/2457 , Y10T428/24975
摘要： A recording medium includes a substrate, and a recording layer formed on the substrate having (a) a recording track band, and (b) recording cells regularly arrayed in the recording track band to form a plurality rows of sub-tracks. The recording cells included in each sub-track are formed apart from each other at a pitch P in the track direction. Nearest neighboring two recording cells, each positioned on adjacent two sub-tracks in the track band, are formed apart from each other at a pitch P/n in the track direction, where 2≦n≦5.
摘要翻译：记录介质包括基板和形成在基板上的记录层，具有（a）记录轨道带，以及（b）定期排列在记录轨道带中的记录单元以形成多行子轨道。包括在每个子轨道中的记录单元以轨道方向上的间距P彼此分开地形成。最靠近的两个记录单元分别位于轨道带中相邻的两个子轨道上，以轨道方向上的间距P / n彼此分开，其中2 <= n <= 5。

3. 发明授权

US07115208B2 Method of manufacturing recording medium 有权
标题翻译：制造记录介质的方法
公开(公告)号：US07115208B2
公开(公告)日：2006-10-03
申请号：US11000170
申请日：2004-12-01
申请人： Hiroyuki Hieda , Masatoshi Sakurai , Koji Asakawa , Toshiro Hiraoka , Katsuyuki Naito
发明人： Hiroyuki Hieda , Masatoshi Sakurai , Koji Asakawa , Toshiro Hiraoka , Katsuyuki Naito
IPC分类号： B44C1/22 , G11B5/127
CPC分类号： G11B7/24079 , G11B5/74 , G11B5/746 , G11B5/855 , G11B7/24085 , G11B2005/0005 , Y10T29/49021 , Y10T29/49025 , Y10T428/24479 , Y10T428/24545 , Y10T428/2457 , Y10T428/24975
摘要： A recording medium includes a substrate, and a recording layer formed on the substrate having (a) a recording track band, and (b) recording cells regularly arrayed in the recording track band to form a plurality rows of sub-tracks. The recording cells included in each sub-track are formed apart from each other at a pitch P in the track direction. Nearest neighboring two recording cells, each positioned on adjacent two sub-tracks in the track band, are formed apart from each other at a pitch P/n in the track direction, where 2≦n≦5.
摘要翻译：记录介质包括基板和形成在基板上的记录层，具有（a）记录轨道带，以及（b）定期排列在记录轨道带中的记录单元以形成多行子轨道。包括在每个子轨道中的记录单元以轨道方向上的间距P彼此分开地形成。最靠近的两个记录单元分别位于轨道带中相邻的两个子轨道上，以轨道方向上的间距P / n彼此分开，其中2 <= n <= 5。

4. 发明申请

US20050094549A1 Method of manufacturing recording medium 有权
标题翻译：制造记录介质的方法
公开(公告)号：US20050094549A1
公开(公告)日：2005-05-05
申请号：US11000170
申请日：2004-12-01
申请人： Hiroyuki Hieda , Masatoshi Sakurai , Koji Asakawa , Toshiro Hiraoka , Katsuyuki Naito
发明人： Hiroyuki Hieda , Masatoshi Sakurai , Koji Asakawa , Toshiro Hiraoka , Katsuyuki Naito
IPC分类号： G11B5/65 , G11B5/00 , G11B5/02 , G11B5/74 , G11B5/84 , G11B5/85 , G11B5/855 , G11B7/007 , G11B7/013 , G11B21/10 , G11B7/26
CPC分类号： G11B7/24079 , G11B5/74 , G11B5/746 , G11B5/855 , G11B7/24085 , G11B2005/0005 , Y10T29/49021 , Y10T29/49025 , Y10T428/24479 , Y10T428/24545 , Y10T428/2457 , Y10T428/24975
摘要： A recording medium includes a substrate, and a recording layer formed on the substrate having (a) a recording track band, and (b) recording cells regularly arrayed in the recording track band to form a plurality rows of sub-tracks. The recording cells included in each sub-track are formed apart from each other at a pitch P in the track direction. Nearest neighboring two recording cells, each positioned on adjacent two sub-tracks in the track band, are formed apart from each other at a pitch P/n in the track direction, where 2≦n≦5.
摘要翻译：记录介质包括基板和形成在基板上的记录层，具有（a）记录轨道带，以及（b）定期排列在记录轨道带中的记录单元以形成多行子轨道。包括在每个子轨道中的记录单元以轨道方向上的间距P彼此分开地形成。最靠近的两个记录单元分别位于轨道带中相邻的两个子轨道上，以轨道方向上的间距P / n彼此分开，其中2 <= n <= 5。

5. 发明授权

US07306743B2 Recording medium, method of manufacturing recording medium and recording apparatus 有权
标题翻译：记录介质，制造记录介质的方法和记录装置
公开(公告)号：US07306743B2
公开(公告)日：2007-12-11
申请号：US11493807
申请日：2006-07-27
申请人： Hiroyuki Hieda , Masatoshi Sakurai , Koji Asakawa , Toshiro Hiraoka , Katsuyuki Naito
发明人： Hiroyuki Hieda , Masatoshi Sakurai , Koji Asakawa , Toshiro Hiraoka , Katsuyuki Naito
IPC分类号： B44C1/22 , G11B5/127
CPC分类号： G11B7/24079 , G11B5/74 , G11B5/746 , G11B5/855 , G11B7/24085 , G11B2005/0005 , Y10T29/49021 , Y10T29/49025 , Y10T428/24479 , Y10T428/24545 , Y10T428/2457 , Y10T428/24975
摘要： A recording medium includes a substrate, and a recording layer formed on the substrate having (a) a recording track band, and (b) recording cells regularly arrayed in the recording track band to form a plurality rows of sub-tracks. The recording cells included in each sub-track are formed apart from each other at a pitch P in the track direction. Nearest neighboring two recording cells, each positioned on adjacent two sub-tracks in the track band, are formed apart from each other at a pitch P/n in the track direction, where 2≦n≦5.
摘要翻译：记录介质包括基板和形成在基板上的记录层，具有（a）记录轨道带，以及（b）定期排列在记录轨道带中的记录单元以形成多行子轨道。包括在每个子轨道中的记录单元以轨道方向上的间距P彼此分开地形成。最靠近的两个记录单元分别位于轨道带中相邻的两个子轨道上，以轨道方向上的间距P / n彼此分开，其中2 <= n <= 5。

6. 发明授权

US08043520B2 Method for manufacturing porous structure and method for forming pattern 有权
标题翻译：制造多孔结构的方法及其形成方法
公开(公告)号：US08043520B2
公开(公告)日：2011-10-25
申请号：US12355170
申请日：2009-01-16
申请人： Koji Asakawa , Toshiro Hiraoka , Yoshihiro Akasaka , Yasuyuki Hotta
发明人： Koji Asakawa , Toshiro Hiraoka , Yoshihiro Akasaka , Yasuyuki Hotta
IPC分类号： C08J9/26
CPC分类号： C08J9/26 , B82Y10/00 , B82Y30/00 , C03C17/007 , C03C2217/425 , C03C2217/479 , C03C2218/33 , C08J2333/12 , C08J2383/16 , C23F1/30 , G03F7/0002 , G11B5/74 , G11B5/743 , G11B5/855 , G11B2005/0029 , H01G11/30 , H01G11/56 , H01J9/02 , H01J9/025 , H01L21/02118 , H01L21/02126 , H01L21/02203 , H01L21/02211 , H01L21/02216 , H01L21/02282 , H01L21/02337 , H01L21/02348 , H01L21/0337 , H01L21/31695 , H01M2/145 , H01M2/1653 , H01M4/131 , H01M4/133 , H01M4/8605 , H01M4/96 , H01M8/0234 , H01M8/0245 , H01M8/026 , H01M8/1011 , H01M10/0525 , Y02E60/13 , Y02E60/523 , Y02P70/56 , Y10S438/945 , Y10S438/947 , Y10S977/90 , Y10T428/24149
摘要： A pattern forming material contains a block copolymer or graft copolymer and forms a structure having micro polymer phases, in which, with respect to at least two polymer chains among polymer chains constituting the block copolymer or graft copolymer, the ratio between N/(Nc−No) values of monomer units constituting respective polymer chains is 1.4 or more, where N represents total number of atoms in the monomer unit, Nc represents the number of carbon atoms in the monomer unit, No represents the number of oxygen atoms in the monomer unit.
摘要翻译：图案形成材料含有嵌段共聚物或接枝共聚物，并形成具有微聚合物相的结构，其中，关于构成嵌段共聚物或接枝共聚物的聚合物链中的至少两个聚合物链，N /（Nc- 否）构成各聚合物链的单体单元的值为1.4以上，其中N表示单体单元中的总原子数，Nc表示单体单元中的碳原子数，No表示单体单元中的氧原子数。

7. 发明授权

US06906423B1 Mask used for exposing a porous substrate 失效
标题翻译：用于暴露多孔基材的掩模
公开(公告)号：US06906423B1
公开(公告)日：2005-06-14
申请号：US10670520
申请日：2003-09-26
申请人： Koji Asakawa , Yasuyuki Hotta , Shigeru Matake , Toshiro Hiraoka
发明人： Koji Asakawa , Yasuyuki Hotta , Shigeru Matake , Toshiro Hiraoka
IPC分类号： H05K1/03 , H05K3/00 , H05K3/10 , H05K3/18 , H05K3/42 , G03F1/16
CPC分类号： G03F1/16 , G03F1/50 , H05K1/034 , H05K3/0002 , H05K3/0082 , H05K3/107 , H05K3/185 , H05K3/422 , H05K2201/0116 , H05K2201/015 , H05K2203/056 , H05K2203/107 , H05K2203/1147 , Y10T428/12042
摘要： A mask used for exposing a porous substrate to form a first region and a second region, the first region being filled with a conductive material piercing through the entire thickness of the porous substrate to constitute an interfacial conductive portion, the second region being filled with a conductive material not piercing the entire thickness of the porous substrate to constitute a non-interfacial conductive portion. The mask includes a first light-transmitting region for exposing the first region, and a second light-transmitting region for exposing the second region, said second light-transmitting region including an aggregation of fine patterns of which an average aperture ratio is not more than 50% of an average aperture ratio of the first light-transmitting region and a size of said fine patterns of the second light-transmitting region being in the range of 0.1 μm to 10 μm.
摘要翻译：一种用于暴露多孔基底以形成第一区域和第二区域的掩模，所述第一区域填充有穿透所述多孔基材的整个厚度的导电材料以构成界面导电部分，所述第二区域填充有导电材料不刺穿多孔基材的整个厚度以构成非界面导电部分。掩模包括用于暴露第一区域的第一透光区域和用于曝光第二区域的第二透光区域，所述第二透光区域包括平均孔径比不大于的细微图案的聚集第一透光区域的平均开口率的50％和第二透光区域的所述精细图案的尺寸在0.1μm至10μm的范围内。

8. 发明授权

US06899999B2 Method of manufacturing composite member, photosensitive composition, porous base material, insulating body and composite member 失效
标题翻译：制造复合构件，感光组合物，多孔基材，绝缘体和复合构件的方法
公开(公告)号：US06899999B2
公开(公告)日：2005-05-31
申请号：US10091481
申请日：2002-03-07
申请人： Toshiro Hiraoka , Koji Asakawa , Yasuyuki Hotta , Shigeru Matake
发明人： Toshiro Hiraoka , Koji Asakawa , Yasuyuki Hotta , Shigeru Matake
IPC分类号： G03F7/027 , G03F7/075 , G03F7/38 , H05K3/18 , G03F7/00 , G03F7/04
CPC分类号： H05K3/185 , G03F7/027 , G03F7/0755 , G03F7/38
摘要： Disclosed is a method of manufacturing a composite member having a conductive pattern, comprising (1) forming on a surface of an insulating body a photosensitive layer containing both a photosensitive compound forming an ion-exchange group upon irradiation with an energy beam and a crosslinkable compound having a crosslinkable group, (2) forming a pattern of ion-exchange groups by selectively exposing the photosensitive layer to an energy beam so as to form an ion-exchange group in the exposed portion, (3) crosslinking the crosslinkable compound contained in at least the exposed portion of the photosensitive layer, (4) allowing metal ions, or a metal colloid to be adsorbed on the pattern of ion-exchange groups formed by the selectively exposing, and (5) forming a composite member having conductive pattern by depositing a conductive material on the pattern of ion-exchange groups having the metal ions, or the metal colloid adsorbed thereon using an electroless plating.
摘要翻译：公开了一种制造具有导电图案的复合构件的方法，包括（1）在绝缘体的表面上形成含有能量束和形成离子交换基团的感光性化合物的光敏层和可交联化合物具有可交联基团，（2）通过选择性地将感光层暴露于能量束以形成离子交换基团的图案，以在暴露部分中形成离子交换基团，（3）将包含在其中的可交联化合物交联至少曝光部分感光层，（4）允许金属离子或金属胶体被吸附在通过选择性曝光形成的离子交换基团的图案上，和（5）通过沉积形成具有导电图案的复合构件在具有金属离子的离子交换基团的图案上的导电材料或使用无电解电镀吸附在其上的金属胶体。

9. 发明授权

US06649516B2 Method for manufacturing a composite member from a porous substrate by selectively infiltrating conductive material into the substrate to form via and wiring regions 有权
标题翻译：通过选择性地将导电材料渗透到基板中以形成通孔和布线区域，从多孔基板制造复合构件的方法
公开(公告)号：US06649516B2
公开(公告)日：2003-11-18
申请号：US10161707
申请日：2002-06-05
申请人： Koji Asakawa , Yasuyuki Hotta , Shigeru Matake , Toshiro Hiraoka
发明人： Koji Asakawa , Yasuyuki Hotta , Shigeru Matake , Toshiro Hiraoka
IPC分类号： H05K310
CPC分类号： H05K3/10 , H05K1/034 , H05K3/0002 , H05K3/0082 , H05K3/107 , H05K3/185 , H05K3/422 , H05K2201/0116 , H05K2201/015 , H05K2203/056 , H05K2203/107 , H05K2203/1147 , Y10T29/49155 , Y10T29/49215
摘要： Disclosed is a method for manufacturing a composite member comprising a porous substrate, a via, and a wiring. The method comprises exposing a first region and a second region in the porous substrate to a exposure beam through a mask, the second region exposed by the exposure beam not more than 50% of the exposure of the first region, the exposure beam having the wavelength that an average size of voids of the porous substrate is, as expressed by a radius of gyration, {fraction (1/20)} to 10 times, and forming the via and the wiring by infiltrating a conductive material into the first region and the second region respectively.
摘要翻译：公开了一种用于制造包括多孔基底，通孔和布线的复合构件的方法。该方法包括将多孔基底中的第一区域和第二区域暴露于通过掩模的曝光光束，由曝光光束曝光的第二区域不大于第一区域的曝光的50％，曝光光束具有波长多孔基材的空隙的平均尺寸是以回转半径表示的{分数（1/20至10倍，并且通过将导电材料渗透到第一区域和第二区域中形成通孔和布线分别。

10. 发明授权

US06565764B2 Method of manufacturing a material having a fine structure 有权
公开(公告)号：US06565764B2
公开(公告)日：2003-05-20
申请号：US09927937
申请日：2001-08-13
申请人： Toshiro Hiraoka , Koji Asakawa , Yasuyuki Hotta
发明人： Toshiro Hiraoka , Koji Asakawa , Yasuyuki Hotta
IPC分类号： B44C122
CPC分类号： B29C35/08 , B29C59/16 , B29C71/0009 , B29C2035/0877 , B29C2071/0045 , B29C2071/0054 , B29K2096/02 , B29K2096/04 , Y02P20/582
摘要： Molded products may be made by a process comprising preparing a structure comprising a block copolymer or a graft copolymer having two or more phases, wherein each phase is comprised of polymer chains, decomposing the polymer chains of at least one phase of the structure, and cleaning the structure with a supercritical fluid or a sub-critical fluid, thereby removing the decomposed polymer chains from the structure. Molded products made by this method have very low levels of residual solvents, can be manufactured at a relatively low temperature in a short period of time without using large amounts of organic solvents, and without discharging large amounts of liquid waste.

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