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1. 发明授权

US4948485A Cascade arc plasma torch and a process for plasma polymerization 失效
标题翻译：级联电弧等离子体焰炬和等离子体聚合法
公开(公告)号：US4948485A
公开(公告)日：1990-08-14
申请号：US274775
申请日：1988-11-23
申请人： Hans I. Wallsten , Hirotsugu K. Yasuda
发明人： Hans I. Wallsten , Hirotsugu K. Yasuda
IPC分类号： C08J7/18 , B01J19/08 , C08F2/00 , C08F2/52 , H05H1/34 , H05H1/42 , H05H1/48
CPC分类号： B01J19/088 , H05H1/42 , H05H1/48 , B01J2219/0894 , C01P2004/61 , C01P2004/80 , C01P2006/11 , H05H2001/3452
摘要： The present invention is directed to an arrangement of cascade arc plasma torches in a process for plasma polymerization. The arrangement is utilized in low temperature plasma polymerization coating and utilizes a plasma reactor with concentric electroconductive rings separated by insulator rings. The rings are positioned between electrode connectors and form a central passage through the plasma reactor. A voltage supply source provides a voltage across the plasma reactor so as to initiate and continue the polymerization coating process. Downstream of the plasma reactor, an arrangement is provided by which monomeric gas is fed into a passage at a downstream end of the reactor so as to enable plasma polymerization.
摘要翻译：本发明涉及一种用于等离子体聚合的级联电弧等离子体炬的布置。该装置用于低温等离子体聚合涂层，并且利用具有由绝缘体环隔开的同心导电环的等离子体反应器。环位于电极连接器之间并形成通过等离子体反应器的中心通道。电压源提供等离子体反应器两端的电压，以引发和继续聚合涂覆过程。在等离子体反应器的下游，提供了将单体气体供给到反应器下游端的通道中以进行等离子体聚合的装置。

2. 发明授权

US5278384A Apparatus and process for the treatment of powder particles for modifying the surface properties of the individual particles 失效
标题翻译：用于处理粉末颗粒以改变单个颗粒的表面性质的装置和方法
公开(公告)号：US5278384A
公开(公告)日：1994-01-11
申请号：US985277
申请日：1992-12-03
申请人： Yasuo Matsuzawa , Hans I. Wallsten , Hirotsugu K. Yasuda
发明人： Yasuo Matsuzawa , Hans I. Wallsten , Hirotsugu K. Yasuda
IPC分类号： B01D45/02 , B01J19/08 , B22F1/00 , C09C3/04 , H01J37/32 , H05H1/26 , H05H1/42 , B23K9/00
CPC分类号： C09C3/048 , H05H1/26 , H05H1/42 , C01P2004/52 , C01P2004/61 , C01P2004/62 , C01P2004/80 , C01P2006/90
摘要： An apparatus for low temperature plasma treatment of powder particles for modifying the surface properties thereof, comprising means for the creation of a low pressure zone and, in association therewith, at least one cascade arc torch generator to form a plasma torch which is directed into said low pressure zone, means for the supply by gravity of powder particles to be treated into said low pressure zone and conduit means for the removal of the treated powder particles from said low pressure zone, said cascade arc generator having an orientation such that said plasma torch enters said low pressure zone at a downward angle (.alpha.) to the horizontal of from about 15.degree. to about 60.degree., and said conduit means being directed away from said plasma torch at an upward angle (.beta.) to the horizontal of from about 15.degree. to about 80.degree.;a process for low temperature plasma treatment of powder particles;said apparatus and process enabling a high degree of reproducability and uniform particle size distribution.
摘要翻译：一种用于低温等离子体处理用于改变其表面性质的粉末颗粒的装置，包括用于产生低压区的装置，以及与其相关联的至少一个级联电弧割炬发生器，以形成等离子体焰炬，其被引导到所述低压区域，用于通过重力将要处理的粉末颗粒供给到所述低压区域的装置和用于从所述低压区域去除处理的粉末颗粒的管道装置，所述级联电弧发生器具有使得所述等离子体焰炬以约15度至约60度的水平向下的角度（（α））进入所述低压区域，并且所述导管装置以向上的角度（（β））远离所述等离子体焰炬与水平约15度至约80度; 粉末颗粒的低温等离子体处理工艺; 所述装置和方法能够实现高度的再现性和均匀的粒度分布。

3. 发明授权

US5176938A Process for surface treatment of pulverulent material 失效
标题翻译：粉状材料表面处理工艺
公开(公告)号：US5176938A
公开(公告)日：1993-01-05
申请号：US527315
申请日：1990-05-23
申请人： Hans I. Wallsten , Hirotsugu K. Yasuda
发明人： Hans I. Wallsten , Hirotsugu K. Yasuda
IPC分类号： B22F1/02 , B01J19/08 , B22F1/00 , C04B35/626 , C04B35/628 , C09C3/04 , C23C16/44 , C23C16/442 , C23C16/50 , C23C16/513 , H05H1/42 , H05H1/48
CPC分类号： B22F1/0062 , B01J19/088 , B22F1/0085 , B22F1/0088 , C04B35/626 , C09C3/048 , C23C16/4417 , C23C16/513 , H05H1/42 , H05H1/48 , B01J2219/0894 , B22F2998/00 , C01P2004/61 , C01P2004/80 , C01P2004/84 , C01P2006/10 , C01P2006/11
摘要： A process for the surface treatment of individual particles of a pulverulent material to improve the surface properties thereof. The process includes a plasma-generating apparatus for generating a plasma in a plasmagenerator while supplying an inert gas at a high drift velocity into the generator to form a low temperature plasma flame which is directed into a low pressure zone. Subsequently, the pulverulent material is injected into the high velocity inert gas or into the base of the plasma flame to disintegrate any particle aggregate present in the material. The low temperature plasma acts on the surface of each individual particle to improve the properties thereof. The treated particles can then be recovered from the zone.
摘要翻译：用于表面处理粉状材料的单个颗粒以改善其表面性质的方法。该方法包括用于在等离子体发生器中产生等离子体的等离子体产生装置，同时以高漂移速度将惰性气体供应到发生器中以形成被引导到低压区域中的低温等离子体火焰。随后，将粉状材料注入高速惰性气体或等离子体火焰的底部，以分散材料中存在的任何颗粒聚集体。低温等离子体作用于各个颗粒的表面以提高其性能。然后可以从该区域回收经处理的颗粒。

4. 发明授权

US4994298A Method of making a biocompatible prosthesis 失效
标题翻译：制造生物相容假体的方法
公开(公告)号：US4994298A
公开(公告)日：1991-02-19
申请号：US512543
申请日：1990-04-18
申请人： Hirotsugu K. Yasuda
发明人： Hirotsugu K. Yasuda
IPC分类号： A61L33/00 , B05D7/24
CPC分类号： B05D1/62 , A61L33/0088 , Y10S623/901
摘要： A method of making a biocompatible hollow artifact with perforated walls made from a substrate of electro-conductive material whose surface is exposed to a biological environment, such as living animal tissue or blood, to impart to said material biocompatibility at the site of exposure, comprising:subjecting said exposed surface of the substrate to exposure to a plasma gas discharge in a plasma zone containing a plasma polymerizable monomeric gas to form a thin flexible coating on said substrate, said exposure being performed for a sufficient period of time and under relative movement between said plasma zone and said substrate, the volume of said plasma zone being capable of complete immersion of the substrate and being of such a magnitude in relation to the volume of the substrate as to enable the substrate to travel in or through the plasma zone under plasma polymerization without disturbing the plasma generation.
摘要翻译：一种制造具有多孔壁的生物相容性中空假象的方法，该多孔壁由其表面暴露于诸如活的动物组织或血液的生物环境的导电材料的基底制成，以赋予暴露部位的所述材料生物相容性，包括：使所述衬底的所述暴露表面暴露于含有等离子体可聚合单体气体的等离子体气体中，以在所述衬底上形成薄的柔性涂层，所述曝光进行足够的时间并在相对运动之间进行所述等离子体区域和所述衬底，所述等离子体区域的体积能够完全浸没衬底并且相对于衬底的体积具有如此大的量级，以使得衬底能够在等离子体中等离子体区域内或穿过等离子体区域聚合而不影响等离子体产生。

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