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1. 发明申请

US20090097259A1 METHOD FOR MANUFACTURE OF REFLECTING MIRROR, REFLECTING MIRROR, ILLUMINATION DEVICE, AND PROJECTOR 失效
标题翻译：反射镜，反射镜，照明装置和投影仪的制造方法
公开(公告)号：US20090097259A1
公开(公告)日：2009-04-16
申请号：US12334963
申请日：2008-12-15
申请人： Hirotaka YANAGISAWA , Kazuhiro NISHIDA
发明人： Hirotaka YANAGISAWA , Kazuhiro NISHIDA
IPC分类号： F21V7/00
CPC分类号： H01J9/20 , C03B23/0493 , C03B23/07 , C03B33/06 , C03C17/001 , C03C17/09 , C03C17/36 , C03C17/3663 , F21V7/0025 , F21V7/10 , G02B5/0808 , G02B5/10 , G03B21/2026 , G03B21/2066 , H01J9/247 , H01J61/025 , H01J61/35 , H04N9/315
摘要： An auxiliary reflecting mirror is manufactured by heating the central portion of a quartz glass tube and compressing the central portion by pushing two end portions of the quartz glass tube so that the wall thickness of the central portion thickens, accommodating the quartz glass tube after thickening the wall thickness of the central portion in a mold having inner surfaces formed to the reflecting surface shape, which is to be formed in an auxiliary reflecting mirror, and forming an expanded portion by expanding the central portion, of which the wall thickness was thickened, by introducing a gas from the two ends of the quartz glass tube, cutting the quartz glass tube in at least the central portion of the expanded portion, evaporating a reflecting film on the outer surface of the expanded portion and forming a reflecting surface.
摘要翻译：通过加热石英玻璃管的中心部分并且通过推动石英玻璃管的两个端部来压缩中心部分来制造辅助反射镜，使得中心部分的壁厚增厚，在增厚石墨玻璃管之后容纳石英玻璃管在具有形成为反射面形状的内表面的模具中的中心部分的壁厚，其将形成在辅助反射镜中，并且通过使壁厚变厚的中心部分膨胀而形成扩张部分从石英玻璃管的两端引入气体，至少在膨胀部分的中心部分切割石英玻璃管，蒸发膨胀部分的外表面上的反射膜并形成反射表面。

2. 发明申请

US20090180081A1 PROJECTOR 有权
标题翻译：投影机
公开(公告)号：US20090180081A1
公开(公告)日：2009-07-16
申请号：US12345156
申请日：2008-12-29
申请人： Hirotaka YANAGISAWA , Kenshi SAKAI
发明人： Hirotaka YANAGISAWA , Kenshi SAKAI
IPC分类号： G03B21/28
CPC分类号： G03B21/2026 , G03B21/208 , G03B33/12
摘要： A projector includes a first light source section a second light source section, a light combining section adapted to combine the first light beam and the second light beam, an adjustment device adapted to adjust a light path of the first light beam and a light path of the second light beam, respectively, in two steps, an homogenizing optical system adapted to equalize the first light beam and the second light beam processed by the light combining section, a light modulation section adapted to modulate the light beam from the homogenizing optical system in accordance with image information, and a projection optical system adapted to project an image beam processed by the light modulation section.
摘要翻译：投影仪包括第一光源部分，第二光源部分，适于组合第一光束和第二光束的光合并部分，适于调整第一光束的光路和调整第一光束的光路的调整装置所述第二光束分别在两个步骤中，均匀化光学系统，其适于均衡由所述光合成部分处理的所述第一光束和所述第二光束;光调制部分，适于调制来自所述均匀化光学系统的光束以及投影光学系统，其适于投影由光调制部处理的图像束。

3. 发明申请

US20090194018A1 APPARATUS AND METHOD FOR MANUFACTURING EPITAXIAL WAFER 审中-公开
标题翻译：装置及其制造方法
公开(公告)号：US20090194018A1
公开(公告)日：2009-08-06
申请号：US12354530
申请日：2009-01-15
申请人： Shinya HIGASHI , Hirotaka YANAGISAWA , Shinichi MITANI , Hironobu HIRATA
发明人： Shinya HIGASHI , Hirotaka YANAGISAWA , Shinichi MITANI , Hironobu HIRATA
IPC分类号： C30B25/10
CPC分类号： C23C16/46 , C30B25/10 , C30B25/12
摘要： An apparatus for manufacturing an epitaxial wafer, includes: a chamber; a gas inlet provided in the chamber and introducing a reaction gas into the chamber; a gas outlet provided in the chamber and exhausting the reaction gas; a rotator unit provided inside the chamber; a wafer holder provided on an upper portion of the rotator unit and holding a wafer; an inner heater provided inside the rotator unit; and an outer heater provided between the rotator unit and an inner wall of the chamber.
摘要翻译：一种用于制造外延晶片的装置，包括：腔室; 设置在所述室中的气体入口并将反应气体引入所述室中; 气体出口，设置在室中并排出反应气体; 设置在所述腔室内的旋转器单元; 设置在旋转体单元的上部并保持晶片的晶片保持器; 设置在旋转体单元内的内部加热器; 以及设置在所述转子单元和所述室的内壁之间的外部加热器。

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