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1. 发明授权

US08119517B2 Chemical mechanical polishing method and method of manufacturing semiconductor device 有权
标题翻译：化学机械抛光方法及制造半导体器件的方法
公开(公告)号：US08119517B2
公开(公告)日：2012-02-21
申请号：US12477332
申请日：2009-06-03
申请人： Hirotaka Shida , Yukiteru Matsui , Atsushi Shigeta , Shinichi Hirasawa , Hirokazu Kato , Masako Kinoshita , Takeshi Nishioka , Hiroyuki Yano
发明人： Hirotaka Shida , Yukiteru Matsui , Atsushi Shigeta , Shinichi Hirasawa , Hirokazu Kato , Masako Kinoshita , Takeshi Nishioka , Hiroyuki Yano
IPC分类号： H01L21/4763 , H01L21/461
CPC分类号： H01L21/7681 , C09G1/02 , H01L21/31058 , H01L21/31144 , H01L21/76835
摘要： A chemical mechanical polishing method comprises polishing an organic film using a slurry including polymer particles having a surface functional group and a water-soluble polymer.
摘要翻译：化学机械抛光方法包括使用包含具有表面官能团的聚合物颗粒和水溶性聚合物的浆料来抛光有机膜。

2. 发明申请

US20090239373A1 CHEMICAL MECHANICAL POLISHING METHOD AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE 有权
标题翻译：化学机械抛光方法及制造半导体器件的方法
公开(公告)号：US20090239373A1
公开(公告)日：2009-09-24
申请号：US12477332
申请日：2009-06-03
申请人： Hirotaka Shida , Yukiteru Matsui , Atsushi Shigeta , Shinichi Hirasawa , Hirokazu Kato , Masako Kinoshita , Takeshi Nishioka , Hiroyuki Yano
发明人： Hirotaka Shida , Yukiteru Matsui , Atsushi Shigeta , Shinichi Hirasawa , Hirokazu Kato , Masako Kinoshita , Takeshi Nishioka , Hiroyuki Yano
IPC分类号： H01L21/768 , H01L21/306
CPC分类号： H01L21/7681 , C09G1/02 , H01L21/31058 , H01L21/31144 , H01L21/76835
摘要： A chemical mechanical polishing method comprises polishing an organic film using a slurry including polymer particles having a surface functional group and a water-soluble polymer.
摘要翻译：化学机械抛光方法包括使用包含具有表面官能团的聚合物颗粒和水溶性聚合物的浆料来抛光有机膜。

3. 发明申请

US20050266355A1 Method of manufacturing semiconductor device 失效
标题翻译：制造半导体器件的方法
公开(公告)号：US20050266355A1
公开(公告)日：2005-12-01
申请号：US11118316
申请日：2005-05-02
申请人： Yukiteru Matsui , Gaku Minamihaba , Atsushi Shigeta , Hiroyuki Yano , Satoko Seta , Hirokazu Kato
发明人： Yukiteru Matsui , Gaku Minamihaba , Atsushi Shigeta , Hiroyuki Yano , Satoko Seta , Hirokazu Kato
IPC分类号： G03F7/00 , G03F7/09 , H01L21/033 , H01L21/3105 , H01L21/311 , H01L21/768
CPC分类号： G03F7/094 , H01L21/0332 , H01L21/0337 , H01L21/31058 , H01L21/31116 , H01L21/31138 , H01L21/31144 , H01L21/76811 , H01L21/76813 , H01L21/76825 , H01L21/76835
摘要： Disclosed is a method of manufacturing a semiconductor device comprising forming an insulating film above a substrate, forming a recess in the insulating film, successively forming an underlying layer, an immediate layer and a resist film above the insulating film having the recess formed thereon, the underlying layer being formed by a process comprising forming a first organic film above the insulating film, chemically mechanically polishing the first organic film to expose a surface of the insulating film and to remain the first organic film selectively in the recess, and forming a second organic film above the insulating film and above the first organic film, and subjecting the resist film to patterning exposure.
摘要翻译：公开了一种制造半导体器件的方法，包括在衬底上形成绝缘膜，在绝缘膜中形成凹陷，在其上形成有凹部的绝缘膜上依次形成下层，立即层和抗蚀剂膜，通过包括在绝缘膜上形成第一有机膜的方法形成下层，对第一有机膜进行化学机械抛光以暴露绝缘膜的表面，并在第一有机膜中选择性地保留第一有机膜，并形成第二有机膜在绝缘膜之上和第一有机膜之上，并且对抗蚀剂膜进行图案曝光。

4. 发明授权

US07435682B2 Method of manufacturing semiconductor device 失效
标题翻译：制造半导体器件的方法
公开(公告)号：US07435682B2
公开(公告)日：2008-10-14
申请号：US11118316
申请日：2005-05-02
申请人： Yukiteru Matsui , Gaku Minamihaba , Atsushi Shigeta , Hiroyuki Yano , Satoko Seta , Hirokazu Kato
发明人： Yukiteru Matsui , Gaku Minamihaba , Atsushi Shigeta , Hiroyuki Yano , Satoko Seta , Hirokazu Kato
IPC分类号： H01L21/302
CPC分类号： G03F7/094 , H01L21/0332 , H01L21/0337 , H01L21/31058 , H01L21/31116 , H01L21/31138 , H01L21/31144 , H01L21/76811 , H01L21/76813 , H01L21/76825 , H01L21/76835
摘要： Disclosed is a method of manufacturing a semiconductor device comprising forming an insulating film above a substrate, forming a recess in the insulating film, successively forming an underlying layer, an immediate layer and a resist film above the insulating film having the recess formed thereon, the underlying layer being formed by a process comprising forming a first organic film above the insulating film, chemically mechanically polishing the first organic film to expose a surface of the insulating film and to remain the first organic film selectively in the recess, and forming a second organic film above the insulating film and above the first organic film, and subjecting the resist film to patterning exposure.
摘要翻译：公开了一种制造半导体器件的方法，包括在衬底上形成绝缘膜，在绝缘膜中形成凹陷，在其上形成有凹部的绝缘膜上依次形成下层，立即层和抗蚀剂膜，通过包括在绝缘膜上形成第一有机膜的方法形成下层，对第一有机膜进行化学机械抛光以暴露绝缘膜的表面，并在第一有机膜中选择性地保留第一有机膜，并形成第二有机膜在绝缘膜之上和第一有机膜之上，并且对抗蚀剂膜进行图案曝光。

5. 发明授权

US09789875B2 Brake/drive force controlling apparatus for vehicle 有权
公开(公告)号：US09789875B2
公开(公告)日：2017-10-17
申请号：US12676235
申请日：2008-09-03
申请人： Yoji Mizoguchi , Koji Taguchi , Hirokazu Kato
发明人： Yoji Mizoguchi , Koji Taguchi , Hirokazu Kato
IPC分类号： B60W30/18 , B60W10/184 , B60W10/06 , B60W10/16 , B60K23/04 , B60T8/1755
CPC分类号： B60W30/18109 , B60K23/04 , B60T8/1755 , B60T2201/14 , B60T2260/08 , B60W10/06 , B60W10/16 , B60W10/184 , B60W2520/14 , B60W2540/12
摘要： A brake/drive force controlling apparatus for a vehicle includes an engine for applying drive forces to driving wheels of the vehicles, a control diff for distributing the drive forces to the left and right driving wheels independently, and an electronic control system brake device for applying brake forces to the left and right driving wheels independently. An ECU is configured so as to be able to control the engine, the control diff, and the electronic control system brake device according to an operating state of the vehicle. When the electronic control system brake device is operated, this ECU stops the operation of the control diff, thereby avoiding a sudden input of load on the drive force distribution mechanism, regardless of the running state of the vehicle. This makes the apparatus simpler and more lightweight.

6. 发明授权

US08614144B2 Method for fabrication of interconnect structure with improved alignment for semiconductor devices 失效
标题翻译：用于制造具有改进的半导体器件对准的互连结构的方法
公开(公告)号：US08614144B2
公开(公告)日：2013-12-24
申请号：US13157744
申请日：2011-06-10
申请人： Hirokazu Kato
发明人： Hirokazu Kato
IPC分类号： H01L21/31 , H01L21/469
CPC分类号： H01L21/76811 , H01L21/31144 , H01L21/76813 , H01L21/76816
摘要： Methods and structure are provided for creating and utilizing hard masks to facilitate creation of a grating effect to control an anisotropic etching process for the creation of an opening, and subsequent formation of a interconnect structure (e.g., a via) in a multilayered semiconductor device. A first hard mask can be patterned to control etching in a first dimension, and a second hard mask can be patterned to control etching in a second dimension, wherein the second hard mask is patterned orthogonally opposed to the first hard mask. A resist can be patterned by inverting the pattern of a metal line patterning. Interconnects can be formed with critical dimension(s) and also self-aligned.
摘要翻译：提供了用于创建和利用硬掩模的方法和结构，以便于创建光栅效应以控制用于产生开口的各向异性蚀刻工艺，以及随后在多层半导体器件中形成互连结构（例如通孔）。可以对第一硬掩模进行图案化以控制第一维度的蚀刻，并且可以对第二硬掩模进行图案化以控制第二维度中的蚀刻，其中第二硬掩模被图案与第一硬掩模垂直相对。通过反转金属线图案的图案可以对抗蚀剂进行图案化。互连可以形成临界尺寸，也可以自对准。

7. 发明授权

US08391589B2 Information processing apparatus and method for calculating the position and orientation of an image sensing device 有权
标题翻译：用于计算图像感测装置的位置和取向的信息处理装置和方法
公开(公告)号：US08391589B2
公开(公告)日：2013-03-05
申请号：US12013123
申请日：2008-01-11
申请人： Daisuke Kotake , Shinji Uchiyama , Hirokazu Kato
发明人： Daisuke Kotake , Shinji Uchiyama , Hirokazu Kato
IPC分类号： G06K9/00
CPC分类号： G01C11/00 , G01S5/16 , G06T7/20 , G06T7/73
摘要： Three pieces of candidate position information are calculated based on a plurality of pieces of sensing position information, and three pieces of candidate orientation information are calculated based on a plurality of pieces of sensing orientation information. Sets each of which combines one candidate position information and one candidate orientation information are prepared for all combinations. For each set, the candidate position information and candidate orientation information which configure that set are corrected. An evaluation value is calculated for each corrected set, and one of the sets is selected based on the calculated evaluation values. The candidate position information and candidate orientation information which configure the selected set are respectively recorded in a memory as sensing position information and sensing orientation information.
摘要翻译：基于多条感测位置信息计算三条候选位置信息，并且基于多条感测取向信息来计算三条候选方向信息。对于所有组合，为每个组合一个候选位置信息和一个候选方向信息。对于每个集合，配置该组的候选位置信息和候选方向信息被校正。针对每个校正组计算评估值，并且基于所计算的评估值来选择一组。配置所选择的集合的候选位置信息和候选方向信息分别作为感测位置信息和感测取向信息记录在存储器中。

8. 发明申请

US20110274767A1 PRODUCTION METHOD OF TITANIUM OXIDE SOL 有权
标题翻译：氧化钛溶胶的生产方法
公开(公告)号：US20110274767A1
公开(公告)日：2011-11-10
申请号：US13128496
申请日：2009-10-27
申请人： Hirokazu Kato , Natsumi Tsuihiji
发明人： Hirokazu Kato , Natsumi Tsuihiji
IPC分类号： A01N59/16 , B01J21/06 , H01B1/02 , A01P1/00
CPC分类号： B01J13/0047 , C01G23/053 , C01P2002/70 , C09C1/3669
摘要： There is provided a method for efficiently producing an anatase-type titanium oxide sol in an extremely advantageous dispersion state. The method comprises mixing a titanium alkoxide, an organic acid, and a quaternary ammonium hydroxide with water in a molar ratio of the organic acid of 0.4 to 4.0 relative to 1 mol of a titanium atom of the titanium alkoxide and in a molar ratio of the quaternary ammonium hydroxide of 0.8 to 1.9 relative to 1 mol of the organic acid to prepare an aqueous mixed solution having a concentration in terms of TiO2 of 0.5 to 10% by mass; heating the aqueous mixed solution to 50 to 100° C. to remove an alcohol; and subjecting the resulting titanium-containing aqueous solution to a hydrothermal treatment at 110 to 170° C.
摘要翻译：提供了一种在非常有利的分散状态下有效地生产锐钛矿型氧化钛溶胶的方法。该方法包括使钛醇盐，有机酸和季铵氢氧化物与水相比，相对于1摩尔钛醇钛的钛原子，有机酸的摩尔比为0.4-4.0摩尔比，相对于1摩尔有机酸为0.8〜1.9的季铵氢氧化物，以制备TiO 2浓度为0.5〜10质量％的水性混合溶液; 将含水混合溶液加热至50至100℃以除去醇; 并将所得含钛水溶液在110〜170℃进行水热处理。

9. 发明授权

US07987079B2 Tracking a surface in a 3-dimensional scene using natural visual features of the surface 有权
标题翻译：使用表面的自然视觉特征来跟踪三维场景中的曲面
公开(公告)号：US07987079B2
公开(公告)日：2011-07-26
申请号：US12046389
申请日：2008-03-11
申请人： Mark N. Billinghurst , Hirokazu Kato
发明人： Mark N. Billinghurst , Hirokazu Kato
IPC分类号： G06F9/455
CPC分类号： G06K9/32 , G06T7/248 , G06T7/74 , G06T2207/10016
摘要： A facility for determining the 3-dimensional location and orientation of a subject surface in a distinguished perspective image of the subject surface is described. The subject surface has innate visual features, a subset of which are selected. The facility uses the location of the selected visual features in a perspective image of the subject surface that precedes the distinguished perspective image in time to identify search zones in the distinguished perspective image. The facility searches the identified search zones for the selected visual features to determine the 2-dimensional locations at which the selected visual features occur. Based on the determined 2-dimensional locations, the facility determines the 3-dimensional location and orientation of the subject surface in the distinguished perspective image.
摘要翻译：描述用于确定被摄体表面的区别透视图像中的被摄体表面的三维位置和取向的设备。主体表面具有先天的视觉特征，其中一部分被选择。该设施使用所选择的视觉特征的位置在时间上在辨别的透视图像之前的主题表面的透视图像中，以识别区分的透视图像中的搜索区域。设备搜索所识别的搜索区域以获得所选择的视觉特征以确定所选视觉特征出现的二维位置。基于确定的二维位置，设备确定在尊贵的透视图像中的被摄体表面的三维位置和取向。

10. 发明申请

US20100168953A1 BRAKE/DRIVE FORCE CONTROLLING APPARATUS FOR VEHICLE 有权
标题翻译：制动/驱动力控制装置
公开(公告)号：US20100168953A1
公开(公告)日：2010-07-01
申请号：US12676235
申请日：2008-09-03
申请人： Yoji Mizoguchi , Koji Taguchi , Hirokazu Kato
发明人： Yoji Mizoguchi , Koji Taguchi , Hirokazu Kato
IPC分类号： B60W10/00 , B60W10/04 , B60W10/12 , B60W10/18 , B60W30/02
CPC分类号： B60W30/18109 , B60K23/04 , B60T8/1755 , B60T2201/14 , B60T2260/08 , B60W10/06 , B60W10/16 , B60W10/184 , B60W2520/14 , B60W2540/12
摘要： A brake/drive force controlling apparatus for a vehicle includes an engine for applying drive forces to driving wheels of the vehicles, a control diff for distributing the drive forces to the left and right driving wheels independently, and an electronic control system brake device for applying brake forces to the left and right driving wheels independently. An ECU is configured so as to be able to control the engine, the control diff, and the electronic control system brake device according to an operating state of the vehicle. When the electronic control system brake device is operated, this ECU stops the operation of the control diff, thereby avoiding a sudden input of load on the drive force distribution mechanism, regardless of the running state of the vehicle. This makes the apparatus simpler and more lightweight.
摘要翻译：用于车辆的制动/驱动力控制装置包括用于向车辆的驱动轮施加驱动力的发动机，用于将驱动力独立地分配到左右驱动轮的控制差异，以及用于施加制动力独立于左右驱动轮。 ECU被配置为能够根据车辆的运行状态来控制发动机，控制差和电子控制系统制动装置。当电子控制系统制动装置被操作时，该ECU停止控制差速器的操作，从而避免了驱动力分配机构的负载的突然输入，而不管车辆的行驶状态如何。这使得设备更简单，更轻巧。

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