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1. 发明申请

US20080278541A1 LIQUID EJECTING HEAD UNIT AND LIQUID EJECTING APPARATUS 审中-公开
标题翻译：液体喷射头和液体喷射装置
公开(公告)号：US20080278541A1
公开(公告)日：2008-11-13
申请号：US12118293
申请日：2008-05-09
申请人： Hiroshige OWAKI , Yuichi WATANABE , Kazutoshi GOTO
发明人： Hiroshige OWAKI , Yuichi WATANABE , Kazutoshi GOTO
IPC分类号： B41J2/135
CPC分类号： B41J2/14233 , B41J2/161 , B41J2/1626 , B41J2/1631 , B41J2/1634
摘要： The invention provides a liquid ejecting head unit that includes: a liquid ejecting head that has pressure generation chambers and pressure generators, the pressure generation chambers being in communication with nozzle openings from which liquid is ejected, the pressure generator causing a pressure change in the pressure generation chamber; a fixing member that is adhered to the liquid ejecting surface of the liquid ejecting head, the liquid ejecting surface having the nozzle openings formed therein, the fixing member having an exposure opening portion that exposes the nozzle openings; and a recording portion that has convexity and concavity so as to record head information, the recording portion being provided at a region of the liquid ejecting surface at which the fixing member is adhered.
摘要翻译：本发明提供了一种液体喷射头单元，其包括：液体喷射头，其具有压力产生室和压力发生器，所述压力产生室与喷射出的喷嘴开口连通，所述压力发生器引起压力变化一代室; 固定构件，其粘附到液体喷射头的液体喷射表面，其中形成有喷嘴开口的液体喷射表面，所述固定构件具有暴露喷嘴开口的曝光开口部; 以及具有凸起和凹陷以记录头部信息的记录部分，记录部分设置在粘附有固定部件的液体喷射表面的区域。

2. 发明申请

US20080068420A1 ALIGNMENT METHOD, ALIGNMENT METHOD OF LIQUID-JET HEAD UNIT, AND ALIGNMENT MASK FOR LIQUID-JET HEAD 有权
标题翻译：对流方法，液体喷嘴单元的对准方法和液体喷头的对准面
公开(公告)号：US20080068420A1
公开(公告)日：2008-03-20
申请号：US11854800
申请日：2007-09-13
申请人： Isao YANAGISAWA , Yasuo INAOKA , Takuma OKAMURO , Kazutoshi GOTO
发明人： Isao YANAGISAWA , Yasuo INAOKA , Takuma OKAMURO , Kazutoshi GOTO
IPC分类号： B41J29/393
CPC分类号： B41J29/393
摘要： An alignment method includes: disposing an alignment mark provided to a positioned member and a reference mark provided to a surface of an alignment mask so that the alignment mark and the reference mark can face each other; capturing an image from the other surface side of the alignment mask, which is the opposite surface of the alignment mask from the surface where the reference mark is disposed, the image concurrently showing the alignment mark and the reference mark; performing a surface treatment on at least a region of the positioned member side of the alignment mask, which is captured as the image, rather than on the reference mark side thereof, the surface treatment providing a high contrast ratio to each alignment mark and reference mark on the captured image; and thereafter aligning the alignment mark with the reference mark, while checking the image.
摘要翻译：对准方法包括：设置提供给定位构件的对准标记和设置到对准掩模的表面的参考标记，使得对准标记和参考标记可以彼此面对; 从对准掩模的与配置基准标记的表面相反的表面的对准掩模的另一个表面侧拍摄图像，同时示出对准标记和参考标记的图像; 在作为图像被捕获的对准掩模的定位构件侧的至少一个区域上进行表面处理，而不是在其参考标记侧，对每个对准标记和参考标记提供高对比度的表面处理拍摄图像; 然后在校对图像的同时将对准标记与基准标记对齐。

3. 发明申请

US20090201346A1 LIQUID EJECTING HEAD AND LIQUID EJECTING APPARATUS 有权
标题翻译：液体喷射和液体喷射装置
公开(公告)号：US20090201346A1
公开(公告)日：2009-08-13
申请号：US12367364
申请日：2009-02-06
申请人： Yoshinao MIYATA , Kazutoshi GOTO , Satoshi NAKAJIMA , Toshiaki KORI , Tomoaki TAKAHASHI
发明人： Yoshinao MIYATA , Kazutoshi GOTO , Satoshi NAKAJIMA , Toshiaki KORI , Tomoaki TAKAHASHI
IPC分类号： B41J2/045
CPC分类号： B41J2/14233 , B41J2/055 , B41J2002/14241 , B41J2002/14419 , B41J2002/14491
摘要： A liquid ejecting head which includes a flow passage forming substrate that has pressure generating chambers which communicate with nozzles capable of ejecting a liquid, pressure generating elements which apply pressure to the pressure generating chambers in order to eject the liquid from the nozzles, lead electrodes that supply electric signals to the pressure generating elements, wiring substrates that supply the electric signals to the lead electrodes, and a supporting member that supports the wiring substrates so as to raise the wiring substrates from a surface of the liquid ejecting head having the lead electrodes provided thereon.
摘要翻译：一种液体喷射头，其包括具有与能够喷射液体的喷嘴连通的压力产生室的流路形成基板，向压力发生室施加压力以从喷嘴喷射液体的压力产生元件，引出电极向压力发生元件供给电信号，向引线电极供给电信号的布线基板和支撑部件，支撑部件支撑布线基板，以从配备有引线电极的液体喷射头的表面升起布线基板上。

4. 发明申请

US20080062436A1 LIQUID EJECTING HEAD ALIGNMENT APPARATUS AND LIQUID EJECTING HEAD ALIGNMENT METHOD 有权
标题翻译：液体喷射对齐装置和液体喷射头对齐方法
公开(公告)号：US20080062436A1
公开(公告)日：2008-03-13
申请号：US11851999
申请日：2007-09-07
申请人： Yasuo INAOKA , Motonori OKUMURA , Mutsuhiko OTA , Kazutoshi GOTO , Isao YANAGISAWA , Takuma OKAMURO
发明人： Yasuo INAOKA , Motonori OKUMURA , Mutsuhiko OTA , Kazutoshi GOTO , Isao YANAGISAWA , Takuma OKAMURO
IPC分类号： G01B11/14
CPC分类号： G01B11/272 , B41J2/161 , B41J2/1623 , B41J2002/14362
摘要： The invention provides a liquid ejecting head alignment apparatus that is used for positional determination and adhesion of nozzle plates and a fixation member, each of the nozzle plates having nozzle openings through which each of a plurality of liquid ejecting heads ejects liquid and further having alignment marks for positional alignment, the fixation member holding the nozzle-plate side of the plurality of liquid ejecting heads. The liquid ejecting head alignment apparatus according to the invention includes: a mask made of a transparent material, the mask having reference marks each of which is aligned with the corresponding alignment mark; a spacer jig that is provided between the fixation member and the mask in such a manner that the reference marks and the alignment marks are opposed to each other with a space being left therebetween, one surface of the spacer jig being in contact with the fixation member; and a bifocal microscope having an optical axis and two optical systems that shares the optical axis, the optical axis being oriented from a face of the mask that is opposite to the spacer jig side thereof toward the alignment mark via the reference mark and the space, one of the optical systems being capable of focusing on the reference mark, and the other thereof being capable of focusing on the alignment mark.
摘要翻译：本发明提供了一种液体喷射头对准装置，其用于喷嘴板和固定部件的位置确定和粘附，每个喷嘴板具有喷嘴开口，多个喷液头中的每一个喷射口喷射液体并且还具有对准标记用于位置对准，固定构件保持多个液体喷射头的喷嘴板侧。根据本发明的液体喷射头对准装置包括：由透明材料制成的掩模，所述掩模具有与对应的对准标记对准的参考标记; 间隔夹具，其设置在所述固定构件和所述掩模之间，使得所述基准标记和所述对准标记在其间留有空间的情况下彼此相对，所述间隔夹具的一个表面与所述固定构件接触 ; 以及具有光轴和共享光轴的两个光学系统的双焦显微镜，所述光轴通过所述基准标记和所述空间朝向所述对准标记从所述掩模的与所述间隔物夹具侧相反的面取向，光学系统中的一个能够聚焦在参考标记上，另一个能够聚焦在对准标记上。

5. 发明申请

US20080062420A1 ALIGNMENT APPARATUS AND ALIGNMENT METHOD 有权
标题翻译：对准装置和对准方法
公开(公告)号：US20080062420A1
公开(公告)日：2008-03-13
申请号：US11854075
申请日：2007-09-12
申请人： Takuma OKAMURO , Motonori OKUMURA , Mutsuhiko OTA , Kazutoshi GOTO , Isao YANAGISAWA , Yasuo INAOKA
发明人： Takuma OKAMURO , Motonori OKUMURA , Mutsuhiko OTA , Kazutoshi GOTO , Isao YANAGISAWA , Yasuo INAOKA
IPC分类号： G01B11/00
CPC分类号： G01B11/272 , B41J2/161 , B41J2/1623 , B41J29/393 , B41J2002/14362
摘要： An alignment apparatus, which is used when positioning and joining a plurality of workpieces relative to each other, each workpiece having a plurality of alignment marks for alignment, the alignment apparatus includes: a transparent mask provided with reference marks with which the alignment marks are aligned; a mirror disposed between the mask and the workpiece; an optical unit having an optical axis pointed in a direction of the mirror via the reference mark from a side of the mask opposite to the mirror, the optical unit enabling the reference mark and a virtual image of the reference mark reflected in the mirror to be observed simultaneously; and an adjusting unit for making optical axis adjustment of the optical axis, based on the observation by the optical unit, such that a real image of the reference mark and the virtual image of the reference mark reflected in the mirror are superposed.
摘要翻译：一种对准装置，其在多个工件相对于彼此定位和接合时使用，每个工件具有多个用于对准的对准标记，所述对准装置包括：具有对准标记对准的参考标记的透明掩模 ; 设置在掩模和工件之间的反射镜; 光学单元，其光轴经过基准标记从掩模的与反射镜相反的一侧指向反射镜的方向，光学单元使参考标记和反射镜中参考标记的虚像成为同时观察; 以及调整单元，用于基于光学单元的观察来进行光轴的光轴调节，使得反射在反射镜中的基准标记的实际图像和参考标记的虚像被叠加。

6. 发明申请

US20120081476A1 LIQUID EJECTING HEAD AND LIQUID EJECTING APPARATUS 审中-公开
标题翻译：液体喷射和液体喷射装置
公开(公告)号：US20120081476A1
公开(公告)日：2012-04-05
申请号：US13324719
申请日：2011-12-13
申请人： Yoshinao MIYATA , Kazutoshi GOTO , Satoshi NAKAJIMA , Toshiaki KORI , Tomoaki TAKAHASHI
发明人： Yoshinao MIYATA , Kazutoshi GOTO , Satoshi NAKAJIMA , Toshiaki KORI , Tomoaki TAKAHASHI
IPC分类号： B41J2/045
CPC分类号： B41J2/14233 , B41J2/055 , B41J2002/14241 , B41J2002/14419 , B41J2002/14491
摘要： A liquid ejecting head which includes a flow passage forming substrate that has pressure generating chambers which communicate with nozzles capable of ejecting a liquid, pressure generating elements which apply pressure to the pressure generating chambers in order to eject the liquid from the nozzles, lead electrodes that supply electric signals to the pressure generating elements, wiring substrates that supply the electric signals to the lead electrodes, and a supporting member that supports the wiring substrates so as to raise the wiring substrates from a surface of the liquid ejecting head having the lead electrodes provided thereon.
摘要翻译：一种液体喷射头，其包括具有与能够喷射液体的喷嘴连通的压力产生室的流路形成基板，向压力发生室施加压力以从喷嘴喷射液体的压力产生元件，引出电极向压力发生元件供给电信号，向引线电极供给电信号的布线基板和支撑部件，支撑部件支撑布线基板，以从配备有引线电极的液体喷射头的表面升起布线基板上。

7. 发明申请

US20080068610A1 ALIGNMENT APPARATUS AND ALIGNMENT METHOD 有权
标题翻译：对准装置和对准方法
公开(公告)号：US20080068610A1
公开(公告)日：2008-03-20
申请号：US11855644
申请日：2007-09-14
申请人： Takuma OKAMURO , Motonori OKUMURA , Mutsuhiko OTA , Kazutoshi GOTO , Isao YANAGISAWA , Yasuo INAOKA
发明人： Takuma OKAMURO , Motonori OKUMURA , Mutsuhiko OTA , Kazutoshi GOTO , Isao YANAGISAWA , Yasuo INAOKA
IPC分类号： G01B11/00
CPC分类号： B41J2/161 , B41J2/14233 , B41J2/1623 , B41J2/1635 , B41J2002/14362
摘要： An adjusting unit for making positional adjustment of the optical axis adjustment mask, based on the observation by the one optical unit, such that the reference mark at the one location or the other location and the optical axis adjusting alignment mark corresponding positionally thereto are superposed, and for making optical axis adjustment of the other optical axis, based on the observation by the other optical unit, such that the reference mark at the one location or the other location and the optical axis adjusting alignment mark corresponding positionally thereto are superposed.
摘要翻译：一种调整单元，用于基于所述一个光学单元的观察来进行所述光轴调节掩模的位置调整，使得所述一个位置或另一个位置处的参考标记以及与其对应的光轴调整对准标记相叠加，并且基于另一光学单元的观察来进行另一光轴的光轴调整，使得在一个位置或另一位置处的参考标记和与其位置对应的光轴调整对准标记重叠。

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