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1. 发明授权

US08221827B2 Patterning method 有权
标题翻译：图案化方法
公开(公告)号：US08221827B2
公开(公告)日：2012-07-17
申请号：US12549232
申请日：2009-08-27
申请人： Hiroshi Tokue , Ikuo Yoneda , Shinji Mikami , Takumi Ota
发明人： Hiroshi Tokue , Ikuo Yoneda , Shinji Mikami , Takumi Ota
IPC分类号： B05D5/00
CPC分类号： B29C33/424 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： A patterning method according to an embodiment of the present invention comprises: acquiring information about a surface state of an underlying film formed on a substrate; determining, based on the surface state, whether irregularity/foreign matter is present in each shot region in which a pattern is to be formed; and solidifying a resist agent while a first template, when it is determined that no irregularity/foreign matter is present in the shot region, or a second template that is different from the first template, when it is determined that irregularity/foreign matter is present in the shot region, is brought close to the underlying film on the shot region at a certain distance with the resist agent therebetween.
摘要翻译：根据本发明的实施例的图案化方法包括：获取关于形成在基板上的底层膜的表面状态的信息; 基于表面状态确定在要形成图案的每个拍摄区域中是否存在不规则/异物; 并且当确定存在不规则/异物时，当确定在射击区域中不存在不规则/异物或与第一模板不同的第二模板时，第一模板固化抗蚀剂在射出区域中，与其间的抗蚀剂在一定距离处使其与射出区域上的底层膜接近。

2. 发明申请

US20090315223A1 TEMPLATE AND PATTERN FORMING METHOD 审中-公开
标题翻译：模式和图案形成方法
公开(公告)号：US20090315223A1
公开(公告)日：2009-12-24
申请号：US12483705
申请日：2009-06-12
申请人： Ikuo Yoneda , Shinji Mikami , Takumi Ota , Tetsuro Nakasugi
发明人： Ikuo Yoneda , Shinji Mikami , Takumi Ota , Tetsuro Nakasugi
IPC分类号： B29C35/08 , B29C59/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A template includes a substrate, an element pattern formed on a surface of the substrate, and a light absorbing portion formed on or inside the substrate.
摘要翻译：模板包括基板，形成在基板的表面上的元件图案，以及形成在基板上或内部的光吸收部。

3. 发明申请

US20090267268A1 IMPRINT SYSTEM AND IMPRINT METHOD 有权
标题翻译：印刷系统和印刷方法
公开(公告)号：US20090267268A1
公开(公告)日：2009-10-29
申请号：US12237435
申请日：2008-09-25
申请人： Ikuo YONEDA , Shinji Mikami
发明人： Ikuo YONEDA , Shinji Mikami
IPC分类号： B29C43/58 , B29C43/32
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10S977/887
摘要： An imprint system has a design data storing section which stores template information and remaining film thickness set value information, a vaporization-to-be-compensated storing section which stores a plurality of distributions of applied amounts for compensating vaporization, an arithmetic section which calculates a distribution of an applied amount for filling a pattern based upon said template information, calculates a distribution of an applied amount for forming a remaining film thickness based upon said remaining film thickness set value information, calculates a pattern density of the template from said template information, extracts a distribution of an applied amount for compensating vaporization, corresponding to this pattern density, from said vaporization-to-be-compensated storing section, and adds up this extracted distribution of an applied amount for compensating vaporization, said distribution of an applied amount for filling a pattern, and said distribution of an applied amount for forming a remaining film thickness, to calculate a distribution of an applied amount of the imprint member, and an application section which applies the imprint member on the substrate based upon said distribution of an applied amount of the imprint member.
摘要翻译：压印系统具有存储模板信息和剩余膜厚设定值信息的设计数据存储部，存储用于补偿蒸发的施加量的多个分布的蒸发补偿存储部，算出运算部基于所述模板信息分配用于填充图案的施加量，基于所述剩余膜厚设定值信息计算形成剩余膜厚度的涂布量的分布，根据所述模板信息计算模板的图案密度，从所述蒸发待补偿存储部分中提取与该图案密度相对应的补偿蒸发量的分布，并将所提取的用于补偿蒸发的施加量的提取分布相加，将所分配的施加量分配给填充一个模式，并表示一个应用程序的分配形成剩余膜厚的量，计算压印构件的施加量的分布;以及施加部，其基于压印构件的施加量的分布，将压印构件施加在基板上。

4. 发明授权

US08485624B2 Droplet dispensing control method, droplet dispensing control device, and method of manufacturing semiconductor devices 有权
标题翻译：液滴分配控制方法，液滴分配控制装置以及制造半导体装置的方法
公开(公告)号：US08485624B2
公开(公告)日：2013-07-16
申请号：US13235054
申请日：2011-09-16
申请人： Shinji Mikami , Ikuo Yoneda
发明人： Shinji Mikami , Ikuo Yoneda
IPC分类号： B41J29/38
CPC分类号： B41J2/2135
摘要： According to one embodiment, a droplet dispensing control method includes detecting an amount of positional deviation between a stage on which a substrate is mounted and a template as a template positional deviation amount and detecting an amount of positional deviation between a movement direction of the stage and a nozzle array direction as a nozzle positional deviation amount. The method further includes calculating a stage movement direction correction value and an ejection timing correction value of the imprint material as correction values for eliminating the positional deviation of the landing position of the imprint material. The method further includes controlling the movement direction of the stage using the stage movement direction correction value and controlling the ejection timing of the imprint material using the ejection timing correction value.
摘要翻译：根据一个实施例，液滴分配控制方法包括检测安装有基板的台与模板之间的位置偏移量作为模板位置偏差量，并且检测台的移动方向和台的移动方向之间的位置偏差量喷嘴排列方向作为喷嘴位置偏差量。该方法还包括计算压印材料的平台移动方向校正值和喷射定时校正值作为用于消除压印材料的着陆位置的位置偏差的校正值。该方法还包括使用平台移动方向校正值来控制舞台的移动方向，并使用喷射定时校正值来控制压印材料的喷射定时。

5. 发明授权

US08480946B2 Imprint method and template for imprinting 有权
标题翻译：印记的印记方法和模板
公开(公告)号：US08480946B2
公开(公告)日：2013-07-09
申请号：US12398479
申请日：2009-03-05
申请人： Shinji Mikami , Ikuo Yoneda
发明人： Shinji Mikami , Ikuo Yoneda
IPC分类号： B29C33/40 , B29C33/46 , B29C35/08
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprint method, in which pattern forming is performed by having a light curable material applied on a sample face of a substrate being a processing target hardened by being exposed to light in a state where the light curable material and a pattern formed surface of a template contact each other, the pattern formed surface having a concave-convex pattern formed thereon; wherein in one exposure performed with respect to a predetermined shot of the light curable material, an exposure amount at a light curable material on a first region which contacts a pattern formed region including the concave-convex pattern of the template is greater than an exposure amount at a light curable material on a second region which at least contacts a part of a pattern periphery region of the template, the pattern periphery region existing in a periphery of the pattern formed region of the template.
摘要翻译：一种压印方法，其中图案形成是通过使光涂布在基板的样品面上的光固化材料，该基材是通过在可光固化材料和模板形成表面的模板的状态下被曝光而硬化的加工对象所述图案形成表面具有形成在其上的凹凸图案; 其特征在于，相对于所述光固化材料的预定照射进行一次曝光，与包含所述模板的凹凸图案的图案形成区域接触的第一区域上的光固化性材料的曝光量大于曝光量在至少与模板的图案周边区域的一部分接触的第二区域上的光固化材料上，存在于模板的图案形成区域的外围的图案周边区域。

6. 发明授权

US08019462B2 Imprint system and imprint method 有权
标题翻译：印记系统和印记法
公开(公告)号：US08019462B2
公开(公告)日：2011-09-13
申请号：US12926360
申请日：2010-11-12
申请人： Ikuo Yoneda , Shinji Mikami
发明人： Ikuo Yoneda , Shinji Mikami
IPC分类号： G06F19/00 , G05B13/02 , A01J21/00 , B27N3/18
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10S977/887
摘要： An imprint system has a design data storing section which stores template information and remaining film thickness set value information, a vaporization-to-be-compensated storing section which stores a plurality of distributions of applied amounts for compensating vaporization, an arithmetic section which calculates a distribution of an applied amount for filling a pattern based upon the template information, calculates a distribution of an applied amount for forming a remaining film thickness based upon the remaining film thickness set value information, calculates a pattern density of the template from the template information, extracts a distribution of an applied amount for compensating vaporization, corresponding to this pattern density, from the vaporization-to-be-compensated storing section, and adds up this extracted distribution of an applied amount for compensating vaporization, the distribution of an applied amount for filling a pattern, and the distribution of an applied amount for forming a remaining film thickness, to calculate a distribution of an applied amount of the imprint member, and an application section which applies the imprint member on the substrate based upon the distribution of an applied amount of the imprint member.
摘要翻译：压印系统具有存储模板信息和剩余膜厚设定值信息的设计数据存储部，存储用于补偿蒸发的施加量的多个分布的蒸发补偿存储部，算出运算部基于模板信息分配用于填充图案的施加量，基于剩余的膜厚设定值信息计算用于形成剩余膜厚度的涂布量的分布，根据模板信息计算模板的图案密度，从待蒸发的待补偿存储部分提取与该图案密度相对应的用于补偿蒸发的施加量的分布，并且将用于补偿蒸发的施加量的提取分布相加，将用于补偿蒸发的施加量的分布，填写一个模式，并分配一个应用的am 用于形成剩余的膜厚度，以计算压印构件的施加量的分布;以及施加部，其基于压印构件的施加量的分布，将压印构件施加在基板上。

7. 发明授权

US08202463B2 Imprint method 有权
标题翻译：印记法
公开(公告)号：US08202463B2
公开(公告)日：2012-06-19
申请号：US12426527
申请日：2009-04-20
申请人： Ikuo Yoneda , Tetsuro Nakasugi , Shinji Mikami
发明人： Ikuo Yoneda , Tetsuro Nakasugi , Shinji Mikami
IPC分类号： B29C59/00
CPC分类号： B29C37/006 , B29C35/0888 , B29C37/0053 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An imprint method includes contacting a template on a first substrate. The template includes a pattern to be transferred on the first substrate. The first substrate includes a first semiconductor substrate, and a first light curable resin coated on the first semiconductor substrate. The method further includes separating the template from the first substrate, and removing particles adhered on the template. The particle removal includes: pressing the template on an adhesive member which is distinct from the first substrate. The adhesive member includes a dummy substrate, a particle removing film formed on the dummy substrate and configured to remove the particles, and a second light curable resin coated on the particle removing film. The second light curable resin is thicker than the first light curable resin.
摘要翻译：压印方法包括在第一衬底上接触模板。模板包括要在第一基板上转印的图案。第一基板包括第一半导体基板和涂覆在第一半导体基板上的第一光固化树脂。该方法还包括从第一基底分离模板，以及除去附着在模板上的颗粒。颗粒去除包括：将模板压在与第一基板不同的粘合剂构件上。所述粘合部件包括虚拟基板，形成在所述虚设基板上并构成为除去所述粒子的除粒膜，以及涂覆在所述除粒膜上的第二光固化树脂。第二光固化树脂比第一光固化树脂厚。

8. 发明申请

US20110066273A1 Imprint system and imprint method 有权
标题翻译：印记系统和印记法
公开(公告)号：US20110066273A1
公开(公告)日：2011-03-17
申请号：US12926360
申请日：2010-11-12
申请人： Ikuo Yoneda , Shinji Mikami
发明人： Ikuo Yoneda , Shinji Mikami
IPC分类号： G06F19/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10S977/887
摘要： An imprint system has a design data storing section which stores template information and remaining film thickness set value information, a vaporization-to-be-compensated storing section which stores a plurality of distributions of applied amounts for compensating vaporization, an arithmetic section which calculates a distribution of an applied amount for filling a pattern based upon said template information, calculates a distribution of an applied amount for forming a remaining film thickness based upon said remaining film thickness set value information, calculates a pattern density of the template from said template information, extracts a distribution of an applied amount for compensating vaporization, corresponding to this pattern density, from said vaporization-to-be-compensated storing section, and adds up this extracted distribution of an applied amount for compensating vaporization, said distribution of an applied amount for filling a pattern, and said distribution of an applied amount for forming a remaining film thickness, to calculate a distribution of an applied amount of the imprint member, and an application section which applies the imprint member on the substrate based upon said distribution of an applied amount of the imprint member.
摘要翻译：压印系统具有存储模板信息和剩余膜厚设定值信息的设计数据存储部，存储用于补偿蒸发的施加量的多个分布的蒸发补偿存储部，算出运算部基于所述模板信息分配用于填充图案的施加量，基于所述剩余膜厚设定值信息计算形成剩余膜厚度的涂布量的分布，根据所述模板信息计算模板的图案密度，从所述蒸发待补偿存储部分中提取与该图案密度相对应的补偿蒸发量的分布，并将所提取的用于补偿蒸发的施加量的提取分布相加，将所分配的施加量分配给填充一个模式，并表示一个应用程序的分配形成剩余膜厚的量，计算压印构件的施加量的分布;以及施加部，其基于压印构件的施加量的分布，将压印构件施加在基板上。

9. 发明授权

US07856288B2 Imprint system and imprint method 有权
标题翻译：印记系统和印记法
公开(公告)号：US07856288B2
公开(公告)日：2010-12-21
申请号：US12237435
申请日：2008-09-25
申请人： Ikuo Yoneda , Shinji Mikami
发明人： Ikuo Yoneda , Shinji Mikami
IPC分类号： G06F19/00 , G05B13/02 , B28B3/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10S977/887
摘要： An imprint system has a design data storing section which stores template information and remaining film thickness set value information, a vaporization-to-be-compensated storing section which stores a plurality of distributions of applied amounts for compensating vaporization, an arithmetic section which calculates a distribution of an applied amount for filling a pattern based upon the template information, calculates a distribution of an applied amount for forming a remaining film thickness based upon said remaining film thickness set value information, calculates a pattern density of the template from the template information, extracts a distribution of an applied amount for compensating vaporization, corresponding to this pattern density, from the vaporization-to-be-compensated storing section, and adds up this extracted distribution of an applied amount for compensating vaporization, the distribution of an applied amount for filling a pattern, and the distribution of an applied amount for forming a remaining film thickness, to calculate a distribution of an applied amount of the imprint member, and an application section which applies the imprint member on the substrate based upon the distribution of an applied amount of the imprint member.
摘要翻译：压印系统具有存储模板信息和剩余膜厚设定值信息的设计数据存储部，存储用于补偿蒸发的施加量的多个分布的蒸发补偿存储部，算出运算部基于模板信息分配用于填充图案的施加量，基于所述剩余膜厚设定值信息计算形成剩余膜厚度的涂布量的分布，根据模板信息计算模板的图案密度，从待蒸发的待补偿存储部分中提取与该图案密度相对应的用于补偿蒸发的施加量的分布，并且将用于补偿蒸发的施加量的提取分布相加，将用于补偿蒸发的施加量的分布，填写一个模式，并分配一个应用程序用于形成剩余膜厚度，以计算压印构件的施加量的分布;以及施加部，其基于压印构件的施加量的分布，将压印构件施加在基板上。

10. 发明申请

US20090267267A1 IMPRINT METHOD 有权
标题翻译： IMPRINT方法
公开(公告)号：US20090267267A1
公开(公告)日：2009-10-29
申请号：US12426527
申请日：2009-04-20
申请人： Ikuo Yoneda , Tetsuro Nakasugi , Shinji Mikami
发明人： Ikuo Yoneda , Tetsuro Nakasugi , Shinji Mikami
IPC分类号： B29C59/00
CPC分类号： B29C37/006 , B29C35/0888 , B29C37/0053 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An imprint method includes contacting a template on a substrate, the template including a pattern to be transferred on the substrate, separating the template from the substrate, and removing particle adhered on the template before contacting the template on the substrate, the removing the particle including pressing the template on an adhesive member and separating the pressed template from the adhesive member, wherein adhesiveness of the adhesive member to the template is higher than adhesiveness of the adhesive member to the substrate.
摘要翻译：压印方法包括使基板上的模板接触，所述模板包括要在基板上转印的图案，将模板与基板分离，以及在与基板之间的模板接触之前除去附着在模板上的颗粒，除去包括将模板压在粘合剂构件上并将压制模板与粘合构件分离，其中粘合剂与模板的粘合性高于粘合剂与基材的粘合性。

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