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    • 8. 发明申请
    • Magnetic Sensor and Manufacturing Method Therefor
    • 磁传感器及其制造方法
    • US20080169807A1
    • 2008-07-17
    • US10584666
    • 2006-03-15
    • Hiroshi NaitoHideki SatoYukio WakuiMasayoshi Omura
    • Hiroshi NaitoHideki SatoYukio WakuiMasayoshi Omura
    • G01R33/02H01F7/06
    • H01L27/22B82Y25/00G01R33/09G01R33/093H01L43/12Y10T29/4902Y10T29/49075
    • There is provided a small-size magnetic sensor for detecting the intensity of a magnetic field in three axial directions, in which a plurality of giant magnetoresistive elements are formed on a single semiconductor substrate. A thick film is formed on the semiconductor substrate; giant magnetoresistive elements forming an X-axis sensor and a Y-axis sensor are formed on a planar surface thereof; and giant magnetoresistive elements forming a Z-axis sensor are formed using slopes of channels formed in the thick film. Regarding the channel formation, it is possible to use the reactive ion etching and high-density plasma CVD methods. In addition, an insulating film is formed between the thick film and passivation film and is used as an etching stopper. Each of the slopes of the channels can be constituted of a first slope and a second slope, so that a magneto-sensitive element is formed on the second slope having a larger inclination angle. In order to optimize the slope shape and inclination with respect to each channel, it is possible to form a dummy slope that does not directly relate to the formation of the giant magnetoresistive elements.
    • 提供了一种用于检测三个轴向上的磁场强度的小型磁传感器,其中在单个半导体衬底上形成多个巨磁电阻元件。 在半导体衬底上形成厚膜; 在其平面上形成形成X轴传感器和Y轴传感器的巨磁阻元件; 并且使用形成在厚膜中的通道的斜面形成形成Z轴传感器的巨磁阻元件。 关于通道形成,可以使用反应离子蚀刻和高密度等离子体CVD方法。 此外,在厚膜和钝化膜之间形成绝缘膜,并用作蚀刻停止层。 通道的每个斜面可以由第一斜面和第二斜面构成,使得在具有较大倾斜角的第二斜面上形成磁敏元件。 为了优化相对于每个通道的斜率形状和倾斜度,可以形成与形成巨磁阻元件没有直接关系的虚拟斜率。