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1. 发明申请

US20050093182A1 Continuous dissolving device, continuous dissolving method, and gas-dissolved water supply 审中-公开
标题翻译：连续溶解装置，连续溶解法和气溶水供水
公开(公告)号：US20050093182A1
公开(公告)日：2005-05-05
申请号：US10507539
申请日：2003-03-18
申请人： Hiroshi Morita , Junichi Ida , Kazumi Tsukamoto
发明人： Hiroshi Morita , Junichi Ida , Kazumi Tsukamoto
IPC分类号： C02F1/00 , B01F1/00 , B01F3/04 , B01F3/08 , B01F15/00 , B01F15/04 , C02F1/68 , H01L21/304 , B01D47/00
CPC分类号： B01F15/0412 , B01F3/0446 , B01F3/04985 , B01F15/00123 , B01F15/00136 , B01F15/00344 , B01F15/0479 , B01F2201/01 , B01F2215/0036 , B01F2215/0096 , C02F2103/346
摘要： An apparatus for continuous dissolution comprising a dissolution portion for dissolving a gas into a main stream liquid, which comprises a flow meter measuring the flow rate of the main stream liquid and outputting a signal of the value obtained by the measurement and a mechanism for controlling the flow rate which controls the amount of supply of the gas based on the input signal; and a process for continuously dissolving a gas into the main stream liquid, wherein the amount of the gas is controlled based on the flow rate of the main stream liquid. Since a solution having a constant concentration can be obtained with stability even when the flow rate of the main stream liquid changes, cleaning water or surface treatment water used for electronic materials which particularly require a precisely clean surface can be supplied without loss.
摘要翻译：一种用于连续溶解的装置，包括用于将气体溶解到主流液体中的溶解部分，其包括测量主流体液体的流量并输出通过测量获得的值的信号的流量计，以及用于控制基于输入信号控制气体供给量的流量; 以及将气体连续地溶解到主流液体中的方法，其中基于主流体液体的流量来控制气体的量。由于即使主流液体的流量变化，也可以稳定地获得具有恒定浓度的溶液，因此可以不损失地提供用于特别需要精确清洁表面的电子材料的清洗水或表面处理水。

2. 发明申请

US20070114682A1 Apparatus for supplying water containing dissolved gas 有权
标题翻译：用于供给含有溶解气体的水的装置
公开(公告)号：US20070114682A1
公开(公告)日：2007-05-24
申请号：US11653664
申请日：2007-01-16
申请人： Hiroshi Morita , Junichi Ida , Kazumi Tsukamoto
发明人： Hiroshi Morita , Junichi Ida , Kazumi Tsukamoto
IPC分类号： B01D47/00
CPC分类号： B01F15/0412 , B01F3/0446 , B01F3/04985 , B01F15/00123 , B01F15/00136 , B01F15/00344 , B01F15/0479 , B01F2201/01 , B01F2215/0036 , B01F2215/0096 , C02F2103/346
摘要： An apparatus for supplying water containing dissolved gas comprising a flowmeter for measuring a flowrate of pure or ultra-pure water and a mechanism for controlling a flowrate, a means for adjusting an amount of water which adjusts an amount of the pure or ultra-pure water supplied to the apparatus for dissolving a gas, a tank which receives the water containing dissolved gas in an excessive amount which is not used at a point of use, a piping system through which the water containing dissolved gas glows from the tank towards the point of use and the water containing dissolved gas in an excessive amount returns to the tank, a piping system for supplying the water containing dissolved gas to the tank, and a controlling means for adjusting an amount of water based on a water level in the tank.
摘要翻译：一种用于供给含有溶解气体的水的装置，包括用于测量纯净水或超纯水的流量的流量计和用于控制流量的机构，用于调节调节纯水或超纯水量的水量的装置供给到用于溶解气体的装置，容纳含有溶解气体的水的罐，其中过量的水在未使用的点上被使用;管道系统，其中含有溶解气体的水从罐发出朝向并且含有过量的溶解气体的水返回到罐中，用于将含有溶解气体的水供给到罐中的管道系统，以及用于基于罐中的水位调节水量的控制装置。

3. 发明授权

US07329312B2 Apparatus for supplying water containing dissolved gas 有权
标题翻译：用于供给含有溶解气体的水的装置
公开(公告)号：US07329312B2
公开(公告)日：2008-02-12
申请号：US11653664
申请日：2007-01-16
申请人： Hiroshi Morita , Junichi Ida , Kazumi Tsukamoto
发明人： Hiroshi Morita , Junichi Ida , Kazumi Tsukamoto
IPC分类号： B01D19/00 , B01F1/00 , C02F1/20
CPC分类号： B01F15/0412 , B01F3/0446 , B01F3/04985 , B01F15/00123 , B01F15/00136 , B01F15/00344 , B01F15/0479 , B01F2201/01 , B01F2215/0036 , B01F2215/0096 , C02F2103/346
摘要： An apparatus for supplying water containing dissolved gas comprising a flowmeter for measuring a flowrate of pure or ultra-pure water and a mechanism for controlling a flowrate, a means for adjusting an amount of water which adjusts an amount of the pure or ultra-pure water supplied to the apparatus for dissolving a gas, a tank which receives the water containing dissolved gas in an excessive amount which is not used at a point of use, a piping system through which the water containing dissolved gas glows from the tank towards the point of use and the water containing dissolved gas in an excessive amount returns to the tank, a piping system for supplying the water containing dissolved gas to the tank, and a controlling means for adjusting an amount of water based on a water level in the tank.
摘要翻译：一种用于供给含有溶解气体的水的装置，包括用于测量纯净水或超纯水的流量的流量计和用于控制流量的机构，用于调节调节纯水或超纯水量的水量的装置供给到用于溶解气体的装置，容纳含有溶解气体的水的罐，其中过量的水在未使用的点上被使用;管道系统，其中含有溶解气体的水从罐发出朝向并且含有过量的溶解气体的水返回到罐中，用于将含有溶解气体的水供给到罐的管道系统，以及用于基于罐中的水位调节水量的控制装置。

4. 发明授权

US06464867B1 Apparatus for producing water containing dissolved ozone 有权
标题翻译：用于生产含有溶解臭氧的水的装置
公开(公告)号：US06464867B1
公开(公告)日：2002-10-15
申请号：US09958890
申请日：2001-10-12
申请人： Hiroshi Morita , Osamu Ota , Tetsuo Mizuniwa , Kazumi Tsukamoto
发明人： Hiroshi Morita , Osamu Ota , Tetsuo Mizuniwa , Kazumi Tsukamoto
IPC分类号： C02F178
CPC分类号： C02F1/78 , B01F3/04099 , B01F3/04985 , B01F2003/04886 , C01B13/10 , C02F1/32 , C02F1/44 , C02F1/68 , C02F1/725 , C02F2103/04 , C02F2103/12 , C02F2201/782 , Y10S210/90
摘要： An apparatus for producing water containing dissolved ozone which comprises (A) a piping for supplying ultrapure water through which ultrapure water is supplied, (B) a catalytic reaction portion which is connected with the piping for supplying ultrapure water and in which the ultrapure water is brought into contact with an oxidation-reduction catalyst, (C) a filtration apparatus by which the ultrapure water treated in the catalytic reaction portion is filtered and (D) an apparatus for dissolving ozone in which ozone is dissolved into the ultrapure water discharged from the filtration apparatus; and an apparatus for producing water containing dissolved ozone which comprises an apparatus for producing ultrapure water which is equipped with an apparatus for irradiating with ultraviolet light, an apparatus for dissolving ozone in which ozone is dissolved into the ultrapure water produced in the apparatus for producing ultrapure water and a catalytic reaction portion which is packed with an oxidation-reduction catalyst and disposed between the apparatus for irradiating with ultraviolet light and the apparatus for dissolving ozone. Substances promoting decomposition of ozone which are contained in ultrapure water in very small amounts are removed and water containing dissolved ozone which shows little decrease in the concentration of ozone and has a great residual fraction of ozone dissolved in water after transportation for a long distance can be obtained.
摘要翻译：一种含有溶解臭氧的水的制造装置，其特征在于，包括：（A）供给超纯水的超纯水的配管，（B）与供给超纯水的管道连接的催化反应部，超纯水与氧化还原催化剂接触，（C）将在催化反应部分处理的超纯水过滤的过滤装置和（D）将臭氧溶解在臭氧中的臭氧溶解装置（D）过滤装置; 以及含有溶解臭氧的水的制造装置，其特征在于，包括：设置有紫外线照射装置的超纯水的制造装置，将臭氧溶解在超纯水装置中生成的超纯水中的臭氧溶解装置水和催化反应部分，其被填充有氧化还原催化剂并且设置在用于照射紫外线的装置和用于溶解臭氧的装置之间。可以除去非常少量促进超纯水中包含的臭氧分解的物质，并且在长距离运输后，溶解臭氧浓度几乎不降低，臭氧溶解在水中的溶解臭氧的含有溶解臭氧的水可以是获得。

5. 发明申请

US20120012134A1 METHOD FOR CLEANING ELECTRONIC MATERIAL AND DEVICE FOR CLEANING ELECTRONIC MATERIAL 审中-公开
标题翻译：用于清洁电子材料的方法和用于清洁电子材料的装置
公开(公告)号：US20120012134A1
公开(公告)日：2012-01-19
申请号：US13138697
申请日：2010-03-04
申请人： Kazumi Tsukamoto , Hiroshi Morita
发明人： Kazumi Tsukamoto , Hiroshi Morita
IPC分类号： B08B3/08 , B08B7/00
CPC分类号： G03F7/423 , H01L21/02057 , H01L21/31133
摘要： A resist on an electronic material is surely separated and removed in a short time. The electronic material is cleaned with a sulfuric acid solution containing persulfuric acid to separate and clean the resist, and thereafter wet cleaning is performed with gas dissolved water. By using gas dissolved water for performing wet cleaning after the resist separation with the sulfuric acid solution containing persulfuric acid, the time required for cleaning can be sharply reduced as compared with that of a former method. The sulfuric acid solution containing persulfuric acid is preferably one produced by electrolyzing a sulfuric acid solution. A sulfuric acid solution which is discharged from a resist separation and cleaning device and in which the persulfuric acid concentration has decreased is supplied to an electrolytic reactor for regeneration, and then the sulfuric acid solution, in which the persulfuric acid concentration has been sufficiently increased, is circulated to the cleaning device, whereby the resist can be efficiently separated and removed with the high-concentration persulfuric acid and the repeated use of the sulfuric acid can be achieved.
摘要翻译：电子材料上的抗蚀剂在短时间内可靠地分离和去除。电子材料用含有硫酸的硫酸溶液进行清洗以分离和清洁抗蚀剂，然后用气体溶解的水进行湿法清洗。在使用含有过硫酸的硫酸溶液进行抗蚀剂分离后，通过使用气体溶解水进行湿式清洗，与前一方法相比，清洗所需的时间可以大大降低。含有过硫酸的硫酸溶液优选通过电解硫酸溶液而制备的硫酸溶液。将从抗蚀剂分离清洗装置排出的硫酸浓度降低的硫酸溶液供给到再生用电解反应器中，然后将过硫酸浓度充分提高的硫酸溶液，循环到清洁装置，由此可以用高浓度过硫酸有效地分离和去除抗蚀剂，并且可以重复使用硫酸。

6. 发明授权

US06409918B1 Apparatus for supplying ozonated ultrapure water 有权
标题翻译：用于提供臭氧超纯水的设备
公开(公告)号：US06409918B1
公开(公告)日：2002-06-25
申请号：US09185836
申请日：1998-11-04
申请人： Hiroshi Morita , Tetsuo Mizuniwa , Junichi Ida
发明人： Hiroshi Morita , Tetsuo Mizuniwa , Junichi Ida
IPC分类号： C02F178
CPC分类号： C02F1/78 , C02F2103/04 , Y10S210/90
摘要： An ozonated ultrapure water supply system that prevents reduction of the dissolved ozone concentration in the supply pipe system and maintains the dissolved ozone at points of use along the supply system at desired concentrations. This permits the system to supply ozonated water in long pipes. The system includes a sequential arrangement of a circulatory main pipe 3 for supplying ultrapure water, an ozonated gas supplying device 4, and at least two output branch lines 8 each having a gas/liquid separation device 9 and an ultimate point of use 7. The output branch lines are spaced downstream from the ozonated gas supplying device such that the ozone concentration in the ultrapure water has increased to a stable level and the ozonated ultrapure water at each output branch line is at this same stable ozone concentration.
摘要翻译：一种臭氧化的超纯水供应系统，其防止降低供应管系统中的溶解臭氧浓度，并在所需浓度下沿供应系统的使用点维持溶解的臭氧。这允许系统在长管道中提供臭氧水。该系统包括用于提供超纯水的循环主管3，臭氧化气体供应装置4和至少两个输出分支管线8的顺序排列，每个输出分支管线8具有气/液分离装置9和最终使用点7。输出分支管线与臭氧化气体供给装置的下游隔开，使得超纯水中的臭氧浓度增加到稳定水平，并且每个输出分支管线处的臭氧化超纯水处于相同的稳定的臭氧浓度。

7. 发明授权

US06346505B1 Cleaning solution for electromaterials and method for using same 有权
标题翻译：电子材料清洗液及其使用方法
公开(公告)号：US06346505B1
公开(公告)日：2002-02-12
申请号：US09229877
申请日：1999-01-14
申请人： Hiroshi Morita , Tetsuo Mizuniwa , Junichi Ida
发明人： Hiroshi Morita , Tetsuo Mizuniwa , Junichi Ida
IPC分类号： H01L21306
CPC分类号： C11D3/3947 , C11D7/08 , C11D11/0047 , H05K3/26
摘要： A cleaning solution for electromaterials including hydrogen fluoride and either oxygen or hydrogen gas dissolved in water. The cleaning solution may alternatively include hydrogen fluoride, hydrochloric acid or nitric acid, and hydrogen or oxygen gas dissolved in water. Alternatively, the cleaning solution includes hydrogen fluoride, hydrogen peroxide and oxygen gas dissolved in water. The present invention also provides a method for cleaning electromaterials including applying an ultrasonic vibration to cleaning solution applied to electromaterials.
摘要翻译：用于包括氟化氢和溶解在水中的氧气或氢气的电子材料的清洁溶液。清洁溶液可以替代地包括氟化氢，盐酸或硝酸，以及溶解在水中的氢或氧气。或者，清洁溶液包括溶解在水中的氟化氢，过氧化氢和氧气。本发明还提供了一种清洁电子材料的方法，包括对施加到电子材料上的清洁溶液施加超声波振动。

8. 发明授权

US06372699B1 Cleaning solution for electronic materials and method for using same 有权
标题翻译：电子材料清洗液及其使用方法
公开(公告)号：US06372699B1
公开(公告)日：2002-04-16
申请号：US09215872
申请日：1998-12-18
申请人： Hiroshi Morita , Tetsuo Mizuniwa , Junichi Ida
发明人： Hiroshi Morita , Tetsuo Mizuniwa , Junichi Ida
IPC分类号： C11D1310
CPC分类号： H01L21/02052 , C11D3/0042 , C11D3/3947 , C11D7/06 , C11D11/0047 , H05K3/26 , H05K2201/0761 , H05K2203/0793 , H05K2203/0796
摘要： A cleaning solution for electronic materials contains dissolved oxygen gas at a concentration greater than atmospheric saturation concentration, 0.1-10,000 mg/liter of ammonia, and 0.1-10,000 mg/liter of hydrogen peroxide in water. Alternatively, the cleaning solution contains dissolved reducing agents, 0.1-10,000 mg/liter of ammonia, and 0.1-10,000 mg/liter of hydrogen peroxide in water. A method for making the cleaning solution of the present invention is provided. A method for cleaning electronic materials using the cleaning solution of the present invention is also provided.
摘要翻译：用于电子材料的清洁溶液含有浓度大于大气饱和浓度的溶解氧气，0.1-10,000mg /升氨和0.1-10,000mg /升过氧化氢水溶液。或者，清洁溶液含有溶解的还原剂，0.1-10,000mg /升氨和0.1-10,000mg /升过氧化氢在水中。提供了制造本发明的清洗溶液的方法。还提供了使用本发明的清洁溶液清洁电子材料的方法。

9. 发明申请

US20090014028A1 METHOD OF CLEANING SUBSTRATES AND SUBSTRATE CLEANER 审中-公开
标题翻译：清洗基板和基板清洗器的方法
公开(公告)号：US20090014028A1
公开(公告)日：2009-01-15
申请号：US12170823
申请日：2008-07-10
申请人： Yusaku Hirota , Itaru Kanno , Hiroshi Morita , Junichi Ida
发明人： Yusaku Hirota , Itaru Kanno , Hiroshi Morita , Junichi Ida
IPC分类号： B08B3/10 , B08B3/12 , B08B3/08
CPC分类号： H01L21/67086 , H01L21/6708
摘要： There is provided a method of efficiently cleaning substrates without damaging a fine pattern formed thereon. It is a method of cleaning one or more substrates in a system processing one or more substrates as one batch by dipping one or more substrates as one batch, including the steps of: immersing one or more substrates as one batch in a wet etching solution; ultrasonically cleaning one or more substrates as one batch; and drying one or more substrates as one batch. The step of ultrasonically cleaning employs a cleaning solution having a gas dissolved therein to have a degree of saturation of 60% to 100% at an atmospheric pressure, and an ultrasonic wave having a frequency of at least 500 kHz and an energy of 0.02 W/cm2 to 0.5 W/cm2.
摘要翻译：提供了一种有效地清洁基板而不损害其上形成的精细图案的方法。它是通过一次浸渍一个或多个基材来清洗一个或多个基材作为一个批次的系统中的一个或多个基材的方法，包括以下步骤：将一个或多个基材作为一批在一个湿蚀刻溶液中浸渍; 超声波清洗一个或多个基材作为一批; 并将一个或多个基材作为一批干燥。超声波清洗的步骤使用溶解有气体的清洗液在大气压下具有60〜100％的饱和度，超声波的频率至少为500kHz，能量为0.02W / cm2〜0.5W / cm 2。

10. 发明授权

US06450181B1 Cleaning solution for electronic materials and method for using same 有权
公开(公告)号：US06450181B1
公开(公告)日：2002-09-17
申请号：US09542305
申请日：2000-04-04
申请人： Hiroshi Morita , Tetsuo Mizuniwa , Junichi Ida
发明人： Hiroshi Morita , Tetsuo Mizuniwa , Junichi Ida
IPC分类号： H01L21306
CPC分类号： H01L21/02052 , C11D3/0042 , C11D3/3947 , C11D7/06 , C11D11/0047 , H05K3/26 , H05K2201/0761 , H05K2203/0793 , H05K2203/0796
摘要： A cleaning solution for electronic materials contains dissolved oxygen gas at a concentration greater than atmospheric saturation concentration, 0.1-10,000 mg/liter of ammonia, and 0.1-10,000 mg/liter of hydrogen peroxide in water. Alternatively, the cleaning solution contains dissolved reducing agents, 0.1-10,000 mg/liter of ammonia, and 0.1-10,000 mg/liter of hydrogen peroxide in water. A method for making the cleaning solution of the present invention is provided. A method for cleaning electronic materials using the cleaning solution of the present invention is also provided.

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