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    • 4. 发明授权
    • Oxygen atom containing film for a thin-film electroluminescent element
    • 用于薄膜电致发光元件的含氧原子的膜
    • US4188565A
    • 1980-02-12
    • US884475
    • 1978-03-08
    • Etsuo MizukamiHiroshi KishishitaMasashi KawaguchiYoshihiro EndoKinichi Isaka
    • Etsuo MizukamiHiroshi KishishitaMasashi KawaguchiYoshihiro EndoKinichi Isaka
    • H05B33/22H05B33/02
    • H05B33/22
    • At least one silicon-oxynitride film is deposited on an electroluminescence layer for providing a uniform and stable dielectric layer for an electroluminescence display panel. The silicon-oxynitride film is deposited using a sputtering technique by mixing a small amount (1 mol%) of nitrous oxide (N.sub.2 O) gas into a sputtering gas such as nitrogen (N.sub.2) gas. Oxygen (O.sub.2) gas may be substituted for the N.sub.2 O gas mingled within the sputtering gas in the amount of five mol%. A target for sputtering is a pure silicon or sintered Si.sub.3 N.sub.4 plate. An R.F. discharge is provided so that the power flux density on the target becomes several to several ten W. The silicon-oxynitride film is derived by means of the reaction between ion sputtering and the sputtering gas. A dielectric layer is further provided for establishing high reliabiltiy high dielectric properties of the electroluminescence display panel, the dielectric layer being disposed together with the silicon-oxynitride film and being one of the group consisting of Al.sub.2 O.sub.3, SiO.sub.2, Ta.sub.2 O.sub.5, Si.sub.3 N.sub.4 and Y.sub.2 O.sub.3. The silicon-oxynitride flm which is injected by suitable ions such as P.sup.+, H.sup.+, He.sup.+, Ne.sup.+, or Ar.sup.+ may be further provided as the dielectric layer.
    • 在电致发光层上沉积至少一个氧氮化硅膜,为电致发光显示面板提供均匀稳定的电介质层。 通过将少量(1mol%)的一氧化二氮(N 2 O)气体混合到诸如氮气(N 2)的溅射气体中,使用溅射技术沉积氮氧化硅膜。 氧(O 2)气体可以以5mol%的量代替溅射气体内混合的N2O气体。 溅射靶是纯硅或烧结Si3N4板。 一个R.F. 提供放电,使得靶上的功率通量密度达到数十至几十W.通过离子溅射和溅射气体之间的反应导出氧氮化硅膜。 还提供了一种用于建立电致发光显示面板的高可靠性高介电特性的电介质层,该电介质层与氧氮化硅膜一起设置,并且是由Al 2 O 3,SiO 2,Ta 2 O 5,Si 3 N 4和Y 2 O 3组成的组之一。 可以进一步提供由适当的离子如P +,H +,He +,Ne +或Ar +注入的氧氮化硅flm作为电介质层。
    • 8. 发明授权
    • Thin-film electroluminescent display panel sealed by glass substrates
and the fabrication method thereof
    • 由玻璃基板密封的薄膜电致发光显示面板及其制造方法
    • US4213074A
    • 1980-07-15
    • US915447
    • 1978-06-14
    • Masashi KawaguchiHiroshi KishishitaEtsuo MizukamiYoshiharu Kanatani
    • Masashi KawaguchiHiroshi KishishitaEtsuo MizukamiYoshiharu Kanatani
    • H05B33/10B65B3/04H05B33/04
    • H05B33/04
    • A thin-film electroluminescent display panel is sealed by a pair of glass substrates for protecting itself from the environment. A protective liquid is introduced between a counter glass substrate and a substrate for supporting the electroluminescent display panel. The protective liquid comprises silicon oil or grease which assures the thin-film electroluminescent panel of preservation of the electroluminescent display panel. The counter glass substrate is bonded to the substrate through an adhesive of, for example, photocuring resin. A capillary tube is provided within the substrate for injecting the liquid under vacuum conditions. The counter glass substrate can be plate-shaped thereby eliminating a spacer. The liquid has the ability of spreading into pin holes generated on dielectric layers, and is resistant to high voltage, high humidity and high temperature, and is inert to layers constituting the thin-film electroluminescent display panel and has a small vapor pressure and a small coefficient of thermal expansion.
    • 薄膜电致发光显示面板由一对玻璃基板密封,以保护自身免受环境影响。 在对置玻璃基板和用于支撑电致发光显示面板的基板之间引入保护液。 保护液体包括硅油或润滑脂,其确保了电致发光显示面板的保存的薄膜电致发光面板。 反玻璃基板通过例如光固化树脂的粘合剂粘合到基板上。 在衬底内设置毛细管,用于在真空条件下注入液体。 反玻璃基板可以是板状的,从而消除间隔件。 该液体具有扩展到在电介质层上产生的针孔的能力,并且耐高压,高湿度和高温,并且对构成薄膜电致发光显示面板的层是惰性的,并且具有小的蒸气压和小的 热膨胀系数。