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    • 6. 发明申请
    • INFORMATION PROCESSING SYSTEM AND ELECTRONIC PEN
    • 信息处理系统和电子笔
    • US20110141067A1
    • 2011-06-16
    • US12903604
    • 2010-10-13
    • Junichiro MISAWAYoshio ItoYasushi Itoshiro
    • Junichiro MISAWAYoshio ItoYasushi Itoshiro
    • G06F3/033
    • G06F3/03545G06F3/0304G06F3/043G06F17/242
    • An information processing system includes an electronic pen, a position detection unit configured to detect the position of a pen tip of the electronic pen and to acquire positional information indicating the position of the pen tip of the electronic pen, a modification ID storage unit configured to store a modification ID for identifying modification of the position indicated by the positional information, a modification ID updating unit configured to update the modification ID, and a reception device including a storage unit and a registration processing unit configured to register the modification ID stored by the modification ID storage unit and the positional information acquired by the position detection unit in the storage unit as associated information.
    • 一种信息处理系统,包括电子笔,位置检测单元,被配置为检测电子笔的笔尖的位置,并获取指示电子笔的笔尖的位置的位置信息;修改ID存储单元,被配置为 存储用于识别由所述位置信息指示的位置的修改的修改ID,修改ID更新单元,被配置为更新所述修改ID;以及接收装置,包括存储单元和注册处理单元,所述注册处理单元被配置为登记由所述修改ID存储的修改ID 修改ID存储单元和由存储单元中的位置检测单元获取的位置信息作为关联信息。
    • 8. 发明授权
    • SDH add-drop multiplexer that can realize both optical and radio networks by the same device
    • SDH分插复用器可以通过同一设备实现光网络和无线网络
    • US07480313B2
    • 2009-01-20
    • US11262925
    • 2005-11-01
    • Yoshio ItoKatsushi Yamamoto
    • Yoshio ItoKatsushi Yamamoto
    • H04J3/24
    • H04J3/08H04J2203/0035
    • In an ADM device, first and second modulators and first and second demodulators are provided as a mod/demod device for radio communication, first to fourth SDH interface circuits and first and second SDH mapping/demapping circuits are provided for processing SDH signals, and path switching is performed by means of first and second signal branch circuits and first and second signal switches to enable simultaneous processing of both modulated signals and SDH signals. This configuration eliminates the need for outside mod/demod devices for radio communication when forming a radio network and therefore reduces the cost of constructing a system. In addition, the ability to simultaneously process modulated signals and SDH signals enables the simultaneous construction of an optical and radio network.
    • 在ADM装置中,第一和第二调制器以及第一和第二解调器被提供为用于无线电通信的模/解调器,第一至第四SDH接口电路和第一和第二SDH映射/解映射电路被提供用于处理SDH信号,并且路径 通过第一和第二信号分支电路以及第一和第二信号开关执行切换以使得能够同时处理调制信号和SDH信号。 该配置消除了在形成无线电网络时对外部用于无线电通信的mod /解调器件的需要,因此降低了构建系统的成本。 此外,同时处理调制信号和SDH信号的能力使得能够同时构建光学和无线电网络。
    • 9. 发明授权
    • Heat treatment apparatus
    • 热处理设备
    • US06518547B2
    • 2003-02-11
    • US09788086
    • 2001-02-16
    • Mitsukazu TakahashiHideo NishiharaYoshio Ito
    • Mitsukazu TakahashiHideo NishiharaYoshio Ito
    • F27B514
    • H01L21/67115H05B3/0047
    • A substrate heat treatment apparatus irradiating a substrate such as a semiconductor wafer with light and performing heat treatment is provided. 19 lamps 82 are arranged on a plane in the form of a honeycomb to form a lamp group 81. The lamp group 81 has 6-fold rotation symmetry about a symmetry axis XR. A substrate W is rotated about a rotation axis XW in a plane parallel to that formed by the lamp group 81. The symmetry axis XR of the lamp group 81 and the rotation axis XW of the substrate W are displaced for relaxing peaks and bottoms of illuminance distribution on the substrate W resulting from regularity of arrangement of the lamp group 81. Consequently, fluctuation of radial illuminance distribution on the substrate W is reduced and improving uniformity is improved. When the uniformity of radial illuminance distribution on the substrate W is improved, temperature uniformity of the substrate W in heat treatment can be ensured.
    • 提供了用光照射诸如半导体晶片的基板并进行热处理的基板热处理设备。 19个灯82布置在蜂窝形式的平面上以形成灯组81.灯组81围绕对称轴XR具有6倍的旋转对称性。 基板W在与灯组81形成的平面平行的平面内绕旋转轴线XW旋转。灯组81的对称轴XR和基板W的旋转轴XW移位,以放宽照度的峰值和底部 由于灯组81的布置的规则性而导致的基板W上的分布。因此,基板W上的径向照度分布的波动减小,并且提高了均匀性。 当基板W上的径向照度分布的均匀性提高时,能够确保热处理时的基板W的温度均匀性。