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1. 发明申请

US20080044745A1 PROCESS FOR PRODUCTION OF PATTERN-FORMING BODY 审中-公开
公开(公告)号：US20080044745A1
公开(公告)日：2008-02-21
申请号：US11926215
申请日：2007-10-29
申请人： Hironori KOBAYASHI , Masato OKABE , Manabu YAMAMOTO
发明人： Hironori KOBAYASHI , Masato OKABE , Manabu YAMAMOTO
IPC分类号： G03F1/00
CPC分类号： G02B3/0012 , G02B5/201 , G03F7/0007 , G03F7/0042 , G03F7/0043 , G03F7/09 , G03F7/11
摘要： A primary object of the present invention is to provide a process for the production of a pattern-forming body, the process enabling the formation of a highly precise pattern, requiring no post-exposure treatment and being free from a fear as to the deterioration of the pattern-forming body itself because no photocatalyst is contained in the produced pattern-forming body. In the present invention, the above problem can be solved by providing a process for the production of a pattern-forming body, the process comprising disposing a catalyst-containing layer-side substrate containing at least a photocatalyst-containing layer and a pattern-forming body substrate containing a characteristic-changeable layer which is changed in characteristics by the action of the photocatalyst in at least said photocatalyst-containing layer such that the photocatalyst-containing layer is in contact with the characteristic-changeable layer, followed by performing exposure to thereby change the characteristics of the exposed portion of the characteristic-changeable layer and thereafter dismounting the photocatalyst-containing layer-side substrate, thereby obtaining a pattern-forming body having a pattern which has been changed in characteristics on the characteristic-changeable layer.

2. 发明申请

US20080050662A1 PROCESS FOR PRODUCTION OF PATTERN-FORMING BODY 审中-公开
标题翻译：生产图案形状体的方法
公开(公告)号：US20080050662A1
公开(公告)日：2008-02-28
申请号：US11926209
申请日：2007-10-29
申请人： Hironori KOBAYASHI , Masato OKABE , Manabu YAMAMOTO
发明人： Hironori KOBAYASHI , Masato OKABE , Manabu YAMAMOTO
IPC分类号： G03F5/00
CPC分类号： G02B3/0012 , G02B5/201 , G03F7/0007 , G03F7/0042 , G03F7/0043 , G03F7/09 , G03F7/11
摘要： A primary object of the present invention is to provide a process for the production of a pattern-forming body, the process enabling the formation of a highly precise pattern, requiring no post-exposure treatment and being free from a fear as to the deterioration of the pattern-forming body itself because no photocatalyst is contained in the produced pattern-forming body. In the present invention, the above problem can be solved by providing a process for the production of a pattern-forming body, the process comprising disposing a catalyst-containing layer-side substrate containing at least a photocatalyst-containing layer and a pattern-forming body substrate containing a characteristic-changeable layer which is changed in characteristics by the action of the photocatalyst in at least said photocatalyst-containing layer such that the photocatalyst-containing layer is in contact with the characteristic-changeable layer, followed by performing exposure to thereby change the characteristics of the exposed portion of the characteristic-changeable layer and thereafter dismounting the photocatalyst-containing layer-side substrate, thereby obtaining a pattern-forming body having a pattern which has been changed in characteristics on the characteristic-changeable layer.
摘要翻译：本发明的主要目的是提供一种用于生产图案形成体的方法，该方法能够形成高精度图案，不需要曝光后处理，并且不会对于劣化图案形成体本身，因为在所产生的图案形成体中不含有光催化剂。在本发明中，上述问题可以通过提供一种用于制造图案形成体的方法来解决，该方法包括设置含有至少含有光催化剂层的含催化剂层侧基材和图案形成其特征在于，所述特征变化层通过所述光催化剂层的至少所述光催化剂层的作用而变化，使得所述光催化剂层与所述特征变化层接触，然后进行曝光改变特征变化层的露出部分的特性，然后拆卸含光催化剂的层侧基板，从而获得具有在特征可变层上的特性变化的图案的图案形成体。

3. 发明申请

US20100112311A1 STRUCTURE FOR PATTERN FORMATION, METHOD FOR PATTERN FORMATION, AND APPLICATION THEREOF 审中-公开
标题翻译：图案形成结构，图案形成方法及其应用
公开(公告)号：US20100112311A1
公开(公告)日：2010-05-06
申请号：US12652843
申请日：2010-01-06
申请人： Hironori KOBAYASHI , Manabu YAMAMOTO , Daigo AOKI , Hironori KAMIYAMA , Shinichi HIKOSAKA , Mitsuhiro KASHIWABARA
发明人： Hironori KOBAYASHI , Manabu YAMAMOTO , Daigo AOKI , Hironori KAMIYAMA , Shinichi HIKOSAKA , Mitsuhiro KASHIWABARA
IPC分类号： B32B3/00 , G03F7/00 , B05D5/06
CPC分类号： B41N1/006 , B29D11/00365 , B41C1/1041 , G02B3/0012 , G02B3/0056 , G02B5/201 , G03F7/0005 , G03F7/0007 , G03F7/001 , G03F7/0043 , G03F7/0757 , G03F7/095 , G03F7/11
摘要： A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.
摘要翻译：一种用于图案形成的结构，用于光学地形成图案，其特征在于包括：设置在基底上的含光催化剂的层，所述含光催化剂的层含有通过在图案曝光时的光催化作用可润湿性的材料。

4. 发明申请

US20080070156A1 STRUCTURE FOR PATTERN FORMATION, METHOD FOR PATTERN FORMATION, AND APPLICATION THEREOF 审中-公开
公开(公告)号：US20080070156A1
公开(公告)日：2008-03-20
申请号：US11867799
申请日：2007-10-05
申请人： Hironori KOBAYASHI , Manabu YAMAMOTO , Daigo AOKI , Hironori KAMIYAMA , Shinichi HIKOSAKA , Mitsuhiro KASHIWABARA
发明人： Hironori KOBAYASHI , Manabu YAMAMOTO , Daigo AOKI , Hironori KAMIYAMA , Shinichi HIKOSAKA , Mitsuhiro KASHIWABARA
IPC分类号： G03F1/00
CPC分类号： B41N1/006 , B29D11/00365 , B41C1/1041 , G02B3/0012 , G02B3/0056 , G02B5/201 , G03F7/0005 , G03F7/0007 , G03F7/001 , G03F7/0043 , G03F7/0757 , G03F7/095 , G03F7/11
摘要： A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.

5. 发明申请

US20080026304A1 STRUCTURE FOR PATTERN FORMATION, METHOD FOR PATTERN FORMATION, AND APPLICATION THEREOF 有权
公开(公告)号：US20080026304A1
公开(公告)日：2008-01-31
申请号：US11867820
申请日：2007-10-05
申请人： Hironori KOBAYASHI , Manabu YAMAMOTO , Daigo AOKI , Hironori KAMIYAMA , Shinichi HIKOSAKA , Mitsuhiro KASHIWABARA
发明人： Hironori KOBAYASHI , Manabu YAMAMOTO , Daigo AOKI , Hironori KAMIYAMA , Shinichi HIKOSAKA , Mitsuhiro KASHIWABARA
IPC分类号： G03F1/00
CPC分类号： B41N1/006 , B29D11/00365 , B41C1/1041 , G02B3/0012 , G02B3/0056 , G02B5/201 , G03F7/0005 , G03F7/0007 , G03F7/001 , G03F7/0043 , G03F7/0757 , G03F7/095 , G03F7/11
摘要： A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.

6. 发明申请

US20090233243A1 STRUCTURE FOR PATTERN FORMATION, METHOD FOR PATTERN FORMATION, AND APPLICATION THEREOF 有权
标题翻译：图案形成结构，图案形成方法及其应用
公开(公告)号：US20090233243A1
公开(公告)日：2009-09-17
申请号：US12472585
申请日：2009-05-27
申请人： Hironori KOBAYASHI , Manabu YAMAMOTO , Daigo AOKI , Hironori KAMIYAMA , Shinichi HIKOSAKA , Mitsuhiro KASHIWABARA
发明人： Hironori KOBAYASHI , Manabu YAMAMOTO , Daigo AOKI , Hironori KAMIYAMA , Shinichi HIKOSAKA , Mitsuhiro KASHIWABARA
IPC分类号： G03F7/20
CPC分类号： B41N1/006 , B29D11/00365 , B41C1/1041 , G02B3/0012 , G02B3/0056 , G02B5/201 , G03F7/0005 , G03F7/0007 , G03F7/001 , G03F7/0043 , G03F7/0757 , G03F7/095 , G03F7/11
摘要： A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.
摘要翻译：一种用于图案形成的结构，用于光学地形成图案，其特征在于包括：设置在基底上的含光催化剂的层，所述含光催化剂的层含有通过在图案曝光时的光催化作用可润湿性的材料。

7. 发明申请

US20080043337A1 STRUCTURE FOR PATTERN FORMATION, METHOD FOR PATTERN FORMATION, AND APPLICATION THEREOF 有权
公开(公告)号：US20080043337A1
公开(公告)日：2008-02-21
申请号：US11867842
申请日：2007-10-05
申请人： Hironori KOBAYASHI , Manabu YAMAMOTO , Daigo AOKI , Hironori KAMIYAMA , Shinichi HIKOSAKA , Mitsuhiro KASHIWABARA
发明人： Hironori KOBAYASHI , Manabu YAMAMOTO , Daigo AOKI , Hironori KAMIYAMA , Shinichi HIKOSAKA , Mitsuhiro KASHIWABARA
IPC分类号： G02B27/10
CPC分类号： B41N1/006 , B29D11/00365 , B41C1/1041 , G02B3/0012 , G02B3/0056 , G02B5/201 , G03F7/0005 , G03F7/0007 , G03F7/001 , G03F7/0043 , G03F7/0757 , G03F7/095 , G03F7/11
摘要： A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.

8. 发明申请

US20080254394A1 STRUCTURE FOR PATTERN FORMATION, METHOD FOR PATTERN FORMATION, AND APPLICATION THEREOF 失效
公开(公告)号：US20080254394A1
公开(公告)日：2008-10-16
申请号：US12122833
申请日：2008-05-19
申请人： Hironori KOBAYASHI , Manabu YAMAMOTO , Daigo AOKI , Hironori KAMIYAMA , Shinichi HIKOSAKA , Mitsuhiro KASHIWABARA
发明人： Hironori KOBAYASHI , Manabu YAMAMOTO , Daigo AOKI , Hironori KAMIYAMA , Shinichi HIKOSAKA , Mitsuhiro KASHIWABARA
IPC分类号： G03F7/20
CPC分类号： B41N1/006 , B29D11/00365 , B41C1/1041 , G02B3/0012 , G02B3/0056 , G02B5/201 , G03F7/0005 , G03F7/0007 , G03F7/001 , G03F7/0043 , G03F7/0757 , G03F7/095 , G03F7/11
摘要： A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.

9. 发明申请

US20080085478A1 STRUCTURE FOR PATTERN FORMATION, METHOD FOR PATTERN FORMATION, AND APPLICATION THEREOF 审中-公开
标题翻译：图案形成结构，图案形成方法及其应用
公开(公告)号：US20080085478A1
公开(公告)日：2008-04-10
申请号：US11867791
申请日：2007-10-05
申请人： Hironori KOBAYASHI , Manabu YAMAMOTO , Daigo AOKI , Hironori KAMIYAMA , Shinichi HIKOSAKA , Mitsuhiro KASHIWABARA
发明人： Hironori KOBAYASHI , Manabu YAMAMOTO , Daigo AOKI , Hironori KAMIYAMA , Shinichi HIKOSAKA , Mitsuhiro KASHIWABARA
IPC分类号： G03C1/00 , G02B5/20 , G02B3/00
CPC分类号： B41N1/006 , B29D11/00365 , B41C1/1041 , G02B3/0012 , G02B3/0056 , G02B5/201 , G03F7/0005 , G03F7/0007 , G03F7/001 , G03F7/0043 , G03F7/0757 , G03F7/095 , G03F7/11
摘要： A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.
摘要翻译：一种用于图案形成的结构，用于光学地形成图案，其特征在于包括：设置在基底上的含光催化剂的层，所述含光催化剂的层含有通过在图案曝光时的光催化作用可润湿性的材料。

10. 发明申请

US20080081283A1 STRUCTURE FOR PATTERN FORMATION, METHOD FOR PATTERN FORMATION, AND APPLICATION THEREOF 失效
公开(公告)号：US20080081283A1
公开(公告)日：2008-04-03
申请号：US11867781
申请日：2007-10-05
申请人： Hironori KOBAYASHI , Manabu YAMAMOTO , Daigo AOKI , Hironori KAMIYAMA , Shinichi HIKOSAKA , Mitsuhiro KASHIWABARA
发明人： Hironori KOBAYASHI , Manabu YAMAMOTO , Daigo AOKI , Hironori KAMIYAMA , Shinichi HIKOSAKA , Mitsuhiro KASHIWABARA
IPC分类号： G03F7/00 , G03F1/00
CPC分类号： B41N1/006 , B29D11/00365 , B41C1/1041 , G02B3/0012 , G02B3/0056 , G02B5/201 , G03F7/0005 , G03F7/0007 , G03F7/001 , G03F7/0043 , G03F7/0757 , G03F7/095 , G03F7/11
摘要： A structure for pattern formation adapted for optically forming a pattern, characterized by comprising: a photocatalyst-containing layer provided on a substrate, the photocatalyst-containing layer containing a material of which the wettability is variable through photocatalytic action upon pattern-wise exposure.

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