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    • 1. 发明授权
    • Display device
    • 显示设备
    • US07939830B2
    • 2011-05-10
    • US12477981
    • 2009-06-04
    • Hiroki TakahashiShigeru OhnoKunihiko WatanabeJunichi UeharaTsuyoshi UchidaYasuko Gotoh
    • Hiroki TakahashiShigeru OhnoKunihiko WatanabeJunichi UeharaTsuyoshi UchidaYasuko Gotoh
    • H01L23/52H01L23/535
    • H01L27/124H01L27/1288
    • An object of the present invention is to provide a display device where a semiconductor layer pattern formed between a pair of electrodes can be formed to a predetermined size, even in the case where the distance between the electrodes on top of a semiconductor layer pattern is relatively large in elements formed in accordance with a photoresist reflow technology. The present invention provides a display device where elements are formed on an insulating substrate, characterized in that the above described elements comprise: a semiconductor layer pattern formed on a main surface of the above described insulating substrate or an insulating film layer formed on the main surface; and a number of electrodes provided in parallel at a distance from each other on the above described semiconductor layer pattern, the above described number of electrodes are a first electrode, a second electrode and dummy electrodes located between the first electrode and the second electrode, and the above described number of electrodes are patterned so that a protrusion is formed, in which the above described electrodes are aligned at on least one end side of at least one of the facing sides.
    • 本发明的目的是提供一种显示装置,其中形成在一对电极之间的半导体层图案可以形成为预定尺寸,即使在半导体层图案顶部的电极之间的距离相对较小的情况下 大量的元件根据光致抗蚀剂回流技术形成。 本发明提供了一种在绝缘基板上形成元件的显示装置,其特征在于,上述元件包括:形成在上述绝缘基板的主表面上的半导体层图案或形成在主表面上的绝缘膜层 ; 以及在上述半导体层图案上彼此平行设置的多个电极,上述数量的电极是位于第一电极和第二电极之间的第一电极,第二电极和虚设电极, 将上述数量的电极图案化,从而形成突起,其中上述电极在至少一个相对侧的至少一个端侧对齐。
    • 2. 发明申请
    • Display Device
    • 显示设备
    • US20090302320A1
    • 2009-12-10
    • US12477981
    • 2009-06-04
    • Hiroki TAKAHASHIShigeru OhnoKunihiko WatanabeJunichi UeharaTsuyoshi UchidaYasuko Gotoh
    • Hiroki TAKAHASHIShigeru OhnoKunihiko WatanabeJunichi UeharaTsuyoshi UchidaYasuko Gotoh
    • H01L33/00H01L29/786
    • H01L27/124H01L27/1288
    • An object of the present invention is to provide a display device where a semiconductor layer pattern formed between a pair of electrodes can be formed to a predetermined size, even in the case where the distance between the electrodes on top of a semiconductor layer pattern is relatively large in elements formed in accordance with a photoresist reflow technology. The present invention provides a display device where elements are formed on an insulating substrate, characterized in that the above described elements comprise: a semiconductor layer pattern formed on a main surface of the above described insulating substrate or an insulating film layer formed on the main surface; and a number of electrodes provided in parallel at a distance from each other on the above described semiconductor layer pattern, the above described number of electrodes are a first electrode, a second electrode and dummy electrodes located between the first electrode and the second electrode, and the above described number of electrodes are patterned so that a protrusion is formed, in which the above described electrodes are aligned at on least one end side of at least one of the facing sides.
    • 本发明的目的是提供一种显示装置,其中形成在一对电极之间的半导体层图案可以形成为预定尺寸,即使在半导体层图案顶部的电极之间的距离相对较小的情况下 大量的元件根据光致抗蚀剂回流技术形成。 本发明提供了一种在绝缘基板上形成元件的显示装置,其特征在于,上述元件包括:形成在上述绝缘基板的主表面上的半导体层图案或形成在主表面上的绝缘膜层 ; 以及在上述半导体层图案上彼此平行设置的多个电极,上述数量的电极是位于第一电极和第二电极之间的第一电极,第二电极和虚设电极, 将上述数量的电极图案化,从而形成突起,其中上述电极在至少一个相对侧的至少一个端侧对齐。
    • 5. 发明申请
    • DISPLAY DEVICE AND MANUFACTURING METHOD OF THE SAME
    • 其显示装置及其制造方法
    • US20080173873A1
    • 2008-07-24
    • US12017384
    • 2008-01-22
    • Miyo IshiiJunichi UeharaKunihiko Watanabe
    • Miyo IshiiJunichi UeharaKunihiko Watanabe
    • H01L29/04H01L21/336
    • H01L29/41733H01L27/124H01L27/1288
    • The present invention provides a method for manufacturing a display device which can reliably form electrodes in a thin film transistor. A method for manufacturing a display device includes the steps of: preparing a substrate having a sequentially stacked body formed of a gate signal line, an insulation film, a semiconductor layer and a conductor layer; forming a drain electrode and a source electrode of a thin film transistor at least in a region where the thin film transistor is formed in a pattern in which one of the drain electrode and the source electrode is formed in an approximately U shape having an open-ended one end side and a connecting portion on another end side such that one electrode surrounds a distal end portion of another electrode as viewed in a plan view and a projecting portion is formed on a side of the connecting portion opposite to another electrode, wherein the respective electrodes are formed by selectively etching the conductor layer using a photoresist film as a mask; and etching the semiconductor layer using a deformed photoresist film which is formed by directly reflowing the photoresist film as a mask.
    • 本发明提供一种制造能够可靠地在薄膜晶体管中形成电极的显示装置的方法。 一种制造显示装置的方法包括以下步骤:制备具有由栅极信号线,绝缘膜,半导体层和导体层形成的顺序层叠体的基板; 至少在形成有薄膜晶体管的区域中形成薄膜晶体管的漏电极和源电极,其中漏极电极和源极电极中的一个形成为具有开路的大致U形的图案, 在另一端侧端部一端侧和连接部分,使得一个电极围绕另一电极的远端部分,如在平面图中所示,并且突出部分形成在与另一电极相对的连接部分的一侧,其中, 通过使用光致抗蚀剂膜作为掩模选择性地蚀刻导体层来形成各个电极; 并使用通过直接回流光致抗蚀剂膜作为掩模形成的变形的光致抗蚀剂膜来蚀刻半导体层。
    • 6. 发明授权
    • Display device and manufacturing method of the same
    • 显示装置及其制造方法相同
    • US08089575B2
    • 2012-01-03
    • US12881560
    • 2010-09-14
    • Miyo IshiiJunichi UeharaKunihiko Watanabe
    • Miyo IshiiJunichi UeharaKunihiko Watanabe
    • H01L27/14
    • H01L29/41733H01L27/124H01L27/1288
    • A display device includes a sequentially stacked body formed of a gate signal line, an insulation film, a semiconductor layer and a conductor layer on a substrate. The conductive layer forms a drain electrode and a source electrode of a thin film transistor which are arranged with a channel region of the semiconductor layer therebetween, and one of the drain and source electrode is formed in an approximately U shape having an open-ended one end side and a connecting portion on another end side so that the one electrode surrounds a distal end portion of another electrode as viewed in a plan view, and a projecting portion is formed on a side of the connecting portion opposite to the another electrode.
    • 显示装置包括在基板上由栅极信号线,绝缘膜,半导体层和导体层形成的顺序层叠体。 导电层形成漏极电极和薄膜晶体管的源电极,其间设置有半导体层的沟道区域,漏极和源极之一形成为具有开口端的大致U形 端部侧和另一端侧的连接部分,使得一个电极围绕另一个电极的远端部分,如在平面图中所示,并且突出部分形成在与另一个电极相对的连接部分的一侧上。
    • 7. 发明授权
    • Display device and manufacturing method of the same
    • 显示装置及其制造方法相同
    • US07829395B2
    • 2010-11-09
    • US12017384
    • 2008-01-22
    • Miyo IshiiJunichi UeharaKunihiko Watanabe
    • Miyo IshiiJunichi UeharaKunihiko Watanabe
    • H01L21/00
    • H01L29/41733H01L27/124H01L27/1288
    • The present invention provides a method for manufacturing a display device which can reliably form electrodes in a thin film transistor. A method for manufacturing a display device includes the steps of: preparing a substrate having a sequentially stacked body formed of a gate signal line, an insulation film, a semiconductor layer and a conductor layer; forming a drain electrode and a source electrode of a thin film transistor at least in a region where the thin film transistor is formed in a pattern in which one of the drain electrode and the source electrode is formed in an approximately U shape having an open-ended one end side and a connecting portion on another end side such that one electrode surrounds a distal end portion of another electrode as viewed in a plan view and a projecting portion is formed on a side of the connecting portion opposite to another electrode, wherein the respective electrodes are formed by selectively etching the conductor layer using a photoresist film as a mask; and etching the semiconductor layer using a deformed photoresist film which is formed by directly reflowing the photoresist film as a mask.
    • 本发明提供一种制造能够可靠地在薄膜晶体管中形成电极的显示装置的方法。 一种制造显示装置的方法包括以下步骤:制备具有由栅极信号线,绝缘膜,半导体层和导体层形成的顺序层叠体的基板; 至少在形成有薄膜晶体管的区域中形成薄膜晶体管的漏电极和源电极,其中漏极电极和源极电极中的一个形成为具有开路的大致U形的图案, 在另一端侧端部一端侧和连接部分,使得一个电极围绕另一电极的远端部分,如在平面图中所示,并且突出部分形成在与另一电极相对的连接部分的一侧,其中, 通过使用光致抗蚀剂膜作为掩模选择性地蚀刻导体层来形成各个电极; 并使用通过直接回流光致抗蚀剂膜作为掩模形成的变形的光致抗蚀剂膜来蚀刻半导体层。
    • 8. 发明授权
    • Display device
    • 显示设备
    • US07825412B2
    • 2010-11-02
    • US12000854
    • 2007-12-18
    • Kunihiko WatanabeJunichi UeharaMiyo Ishii
    • Kunihiko WatanabeJunichi UeharaMiyo Ishii
    • H01L31/14
    • H01L27/124H01L29/41733H01L29/78609H01L29/78669H01L29/78696
    • The present invention provides a display device which can obviate the occurrence of a leak current in a thin film transistor. In a display device including a substrate, and gate signal lines, an insulation film, semiconductor layers and conductor layers which are sequentially stacked on the substrate, the conductor layer forms at least a drain electrode which is connected to a drain signal line and a source electrode which is connected to a pixel electrode, and the semiconductor layer is formed in a pattern in which the semiconductor layer has a protruding portion which protrudes outwardly from the conductor layer at a portion thereof except for a distal end of the drain electrode as viewed in a plan view.
    • 本发明提供一种能够避免在薄膜晶体管中产生漏电流的显示装置。 在包括基板和栅极信号线的显示装置中,依次层叠在基板上的绝缘膜,半导体层和导体层,导体层至少形成连接到漏极信号线和源极的漏电极 电极,其连接到像素电极,并且半导体层形成为其中半导体层具有突出部分的图案,其中,除了漏电极的远端之外,半导体层具有从导体层向外突出的部分, 一个平面图。