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1. 发明授权

US5629127A Positive electron beam resist composition containing cresolnovolak resin, select additive and methyl gallate/1,2-naphthoquinonediazido-4-sulfonyl chloride reaction product 失效
标题翻译：含有甲酚新酚树脂的正电子束抗蚀剂组合物，选择的添加剂和没食子酸甲酯/ 1,2-萘醌二叠氮基-4-磺酰氯反应产物
公开(公告)号：US5629127A
公开(公告)日：1997-05-13
申请号：US360806
申请日：1995-05-25
申请人： Hiroki Oosedo , Mutsuo Kataoka, deceased , Mayumi Kataoka, legal representative , Shigeyoshi Kanetsuki , Kazutaka Tamura , Masaya Asano
发明人： Hiroki Oosedo , Mutsuo Kataoka, deceased , Mayumi Kataoka, legal representative , Shigeyoshi Kanetsuki , Kazutaka Tamura , Masaya Asano
IPC分类号： G03F7/022 , G03F7/20 , G03F7/32 , G03F7/023 , G03C1/61
CPC分类号： G03F7/322 , G03F7/022 , G03F7/0226 , G03F7/32 , Y10S430/143
摘要： The present invention relates to a positive electron beam resist composition containing a cresolnovolak resin, a lower molecular additive with a specific structure and a quinonediazide compound with a specific structure, and a developer for the positive electron beam resist, containing specific amounts of alkali metal ions, weak acid radical ions and a water soluble organic compound. The present invention can provide a positive electron beam resist composition with a novolak and a quinonediazide as main ingredients, excellent in dry etching resistance and resolution, and it if is used, a fine pattern can be obtained at high sensitivity especially when the developer of the present invention is used.
摘要翻译： PCT No.PCT / JP94 / 00720 Sec。 371日期：1995年5月25日 102（e）日期1995年5月25日PCT 1994年4月28日PCT PCT。第WO94 / 25904号公报日期：1994年11月10日本发明涉及一种正电子束抗蚀剂组合物，其含有甲酚新戊酸树脂，具有特定结构的低分子添加剂和具有特定结构的醌二叠氮化合物，以及用于正电子束抗蚀剂的显影剂，碱金属离子，弱酸根离子和水溶性有机化合物的量。本发明可以提供一种具有酚醛清漆和醌二叠氮化物的正电子束抗蚀剂组合物作为主要成分，具有优异的耐干蚀刻性和分辨率，并且如果使用，可以以高灵敏度获得精细图案，特别是当使用本发明。

2. 发明授权

US5851739A Quinonediazide/novolak positive electron beam resist developer 失效
标题翻译：醌二叠氮化物/酚醛清漆正电子束抗蚀显影剂
公开(公告)号：US5851739A
公开(公告)日：1998-12-22
申请号：US979370
申请日：1997-11-26
申请人： Hiroki Oosedo , Mutsuo Kataoka, deceased , Shigeyoshi Kanetsuki , Kazutaka Tamura , Masaya Asano
发明人： Hiroki Oosedo , Mutsuo Kataoka, deceased , Shigeyoshi Kanetsuki , Kazutaka Tamura , Masaya Asano
IPC分类号： G03F7/022 , G03F7/20 , G03F7/32 , G03C5/00
CPC分类号： G03F7/322 , G03F7/022 , G03F7/0226 , G03F7/32 , Y10S430/143
摘要： A developer for quinonediazide/novlak positive electron beam resists including alkali metal ions, weak acid ions and a water soluble organic compound subject to the following conditions: 0.05.ltoreq.a.ltoreq.0.5, 0.07.ltoreq.bn.ltoreq.1.5 and a bn, wherein a is the concentration of the alkali metal in mol/kg, b is the concentration of the weak acid in mol/kg and n is the valence of the weak acid ions, and the concentration of the water soluble organic compound is 0.5 to 10 wt %, based on the total weight of the developer.
摘要翻译：醌二叠氮化物/诺瓦拉克正电子束的显影剂包括碱金属离子，弱酸性离子和水溶性有机化合物，经受下列条件：0.05≤a≤0.5,0.07 bn，其中a是碱金属的浓度，mol / kg，b是弱酸的浓度，mol / kg，n是弱酸离子的化合价，水溶性有机化合物占显影剂总重量的0.5〜10重量％。

3. 发明授权

US06919157B2 Positive type radiation-sensitive composition and process for producing pattern with the same 失效
标题翻译：正型辐射敏感组合物及其制作方法
公开(公告)号：US06919157B2
公开(公告)日：2005-07-19
申请号：US10069136
申请日：2001-01-19
申请人： Hiroyuki Niwa , Kazutaka Tamura , Masahide Senoo
发明人： Hiroyuki Niwa , Kazutaka Tamura , Masahide Senoo
IPC分类号： C08F20/26 , C08F220/04 , C08F220/14 , C08F220/26 , G03F7/039 , G03F7/075 , G03F7/004
CPC分类号： C08F220/26 , C08F20/26 , C08F220/04 , C08F220/14 , G03F7/0392 , G03F7/0758 , C08F2220/281 , C08F220/06
摘要： The present invention relates to a positive-working radiation-sensitive composition which is characterized in that it contains a compound meeting any of conditions a1) to a3), and b) an acid generator which generates acid by irradiation with radiation; and also to a method for the production of a resist pattern employing same.a1) A compound wherein a carboxyl group is protected by an acid labile group represented by general formula (1) (R1 and R2 are aromatic rings, and R3 represents an alkyl group, a substituted alkyl group, a cycloalkyl group or an aromatic ring. R1 to R3 may be the same or different.) a2) A compound in which an alkali-soluble group is protected by an acid labile group represented by general formula (2) (R4 to R6 are each an alkyl group, a substituted alkyl group, a cycloalkyl group or an aromatic ring, and at least one of R4 to R6 is an aromatic ring with an electron-donating group. R4 to R6 may be the same or different.) a3) A compound in which an alkali-soluble group is protected by an acid labile group a, and either acid labile group a has an alkali-soluble group or acid labile group a has an alkali-soluble group protected by an acid labile group b.With this constitution, it is possible by means of the present invention to obtain a positive-working radiation-sensitive composition of high sensitivity having a resolution which enables sub-quarter micron pattern processing to be carried out.
摘要翻译：本发明涉及一种正性辐射敏感性组合物，其特征在于，其含有满足条件a1〜a3）中任一项所述的化合物，以及b）通过辐射照射产生酸的酸发生剂; 还涉及制备使用其的抗蚀剂图案的方法。 a1）其中羧基被通式（1）表示的酸不稳定基团（R 1和R 2）保护的化合物是芳环，R SUP > 3表示烷基，取代的烷基，环烷基或芳香环。R 1至R 3可以相同或不同。）a2）其中碱溶性基团被通式（2）表示的酸不稳定基团（R 4〜R 6）保护的化合物各自为烷基基团，取代的烷基，环烷基或芳香环，并且R 4至R 6中的至少一个是具有给电子基团的芳香环。 R 4〜R 6可以相同或不同。）a3）其中碱溶性基团被酸不稳定基团a保护的化合物和酸不稳定基团a具有碱溶性基团或酸不稳定基团a具有被酸不稳定基团b保护的碱溶性基团。利用该结构，可以通过本发明获得具有能够进行二分之一微米图案处理的分辨率的高灵敏度的正性辐射敏感性组合物。

4. 发明授权

US4326743A Weeding tool 失效
标题翻译：除草工具
公开(公告)号：US4326743A
公开(公告)日：1982-04-27
申请号：US164352
申请日：1980-06-30
申请人： Kazutaka Tamura
发明人： Kazutaka Tamura
IPC分类号： A01B1/16 , A01D9/06 , A01D9/02
CPC分类号： A01B1/16 , A01D9/06
摘要： A weeding tool is provided in the form of a fork having a plurality of tines, each tine having teeth which project outwardly and rearwardly from lateral edges thereof. The tines are employed for breaking up and loosening soil around relatively large weed roots. The teeth along the tine edges collect and withdraw small, hair-like rootlets dispersed throughout the soil in association with the larger roots. In a preferred embodiment the rearwardly directed teeth are offset in a crosscut configuration and are staggered along edges of adjacent tines to increase their effectiveness. The removal of rootlets during the course of ordinary weeding with the tool reduces regeneration of weeds by propagation of the rootlets.
摘要翻译：以具有多个齿的叉子的形式提供除草工具，每个叉齿具有从其侧边缘向外和向后突出的齿。用于在相对较大的杂草根下分解和松动土壤。沿着牙齿边缘的牙齿收集并抽出与较大根相关联的整个土壤中的小的，类似毛状的根。在优选实施例中，向后定向的齿以横切构型偏移并且沿着相邻齿的边缘交错以增加它们的有效性。在采用该工具进行普通除草过程中去除根管可以通过生长根管来减少杂草的再生。

5. 发明授权

US06576400B1 Positive-working radiation-sensitive composition and process for forming a pattern 失效
标题翻译：积极工作的辐射敏感组合物和形成图案的方法
公开(公告)号：US06576400B1
公开(公告)日：2003-06-10
申请号：US09567432
申请日：2000-05-10
申请人： Kazutaka Tamura
发明人： Kazutaka Tamura
IPC分类号： G03C516
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/111 , Y10S430/143 , Y10S430/167
摘要： The present invention relates to a positive-working radiation-sensitive composition which is characterized in that it is a positive-working radiation-sensitive composition containing polymer the solubility of which is increased in aqueous alkali by the action of acid, and a compound which generates acid by irradiation with radiation, and the ease of occurrence of main chain scission of said polymer by means of radiation is greater than that of polymethyl methacrylate, and it also relates to a positive-working radiation-sensitive composition which is characterized in that it contains an alkali-soluble polymer, a compound having the effect of suppressing the alkali-solubility of said alkali-soluble polymer and the suppression effect of which is lowered or eliminated by the action of acid, and a compound which generates acid by irradiation with radiation, and the ease of occurrence of main chain scission of said alkali-soluble polymer by radiation is greater than that of polymethyl methacrylate. By means of the present invention it is possible to obtain a high sensitivity positive-working radiation-sensitive composition of resolution which makes possible sub quarter micron pattern processing.
摘要翻译：本发明涉及一种正性辐射敏感性组合物，其特征在于，它是一种正性辐射敏感性组合物，其含有通过酸的作用使其在碱性水溶液中的溶解度增加的聚合物，以及产生通过辐射照射产生酸性，通过辐射容易地发生所述聚合物的主链断裂，大于聚甲基丙烯酸甲酯，并且还涉及正性辐射敏感性组合物，其特征在于其包含碱溶性聚合物，具有抑制所述碱溶性聚合物的碱溶性的效果的化合物，其抑制效果由于酸的作用而降低或消除，以及通过辐射照射产生酸的化合物，并且通过辐射易发生所述碱溶性聚合物的主链断裂大于聚甲基甲基丙烯酸酯的主链断裂通过本发明的方式，可以获得高分辨率的高灵敏度正性辐射敏感组合物，其使得可以进行亚微米级的图案处理。

6. 发明授权

US5582338A Tool holder for storing pruning and cutting implements 失效
标题翻译：用于存储修剪和切割工具的刀架
公开(公告)号：US5582338A
公开(公告)日：1996-12-10
申请号：US436081
申请日：1995-05-08
申请人： Kazutaka Tamura
发明人： Kazutaka Tamura
IPC分类号： A45F5/02 , A45F3/00
CPC分类号： A45F5/02 , A45F5/021 , A45F2200/0566 , A45F2200/0575 , Y10S224/904 , Y10S224/907
摘要： In accordance with the present invention, a tool holder 10 is provided for carrying a cutting implement, such as a pair of lopping shears 15, having a plurality of blades 16a and 16b attached by a pivot 18 to a pair of elongated handles 20a and 20b. The tool holder includes a support backing 12, containing a plurality of vertically extending slots 34a and 34b. A waist belt 32 may be passed through the vertically extending slots so that the tool holder may be suspended from the waist belt. A support frame 42 is also attached to the support backing. A rigid cap 14 for housing the blades 16a and 16b of the lopping shears 15 is fastened to the support frame 42 and the support backing 12. The rigid cap comprises a convex surface having a longitudinal edge 14a and a latitudinal edge 14b, wherein the longitudinal edge is attached to the support backing 12. The convex surface of the rigid cap projects outwardly from the longitudinal edge 14a and is attached to the support backing 12 to define a cavity for receiving the blades of the shears. In addition, a tool hook 24 is attached to the support frame 42 and spaced below the rigid cap 14 for supporting and securing the lopping shears 15. The tool hook is substantially L-shaped in cross-section including a shorter horizontal leg 28 projecting from the support backing and a longer vertical leg 26 extending upwardly from the shorter horizontal leg and spaced from the support backing. The shorter horizontal leg, the longer vertical leg and the support backing define a recess between the tool hook 24 and the support backing 12 for receiving the pivot 18 of the cutting implement. Preferably, the tool holder also includes a pouch 40 attached to the support backing 12 for storing various other types of cutting implements.
摘要翻译：根据本发明，提供了一种工具架10，用于承载切割工具，例如一对切割剪15，其具有通过枢轴18附接到一对细长把手20a和20b的多个刀片16a和16b 。工具架包括支撑背衬12，其包含多个垂直延伸的槽34a和34b。腰带32可以穿过垂直延伸的狭槽，使得工具保持器可以从腰带悬挂。支撑框架42也附接到支撑背衬。用于容纳切割剪15的刀片16a和16b的刚性帽14被紧固到支撑框架42和支撑背衬12.刚性帽包括具有纵向边缘14a和纬向边缘14b的凸形表面，其中纵向边缘附接到支撑背衬12.刚性盖的凸形表面从纵向边缘14a向外突出并且附接到支撑背衬12以限定用于接收剪切刀片的空腔。此外，工具钩24附接到支撑框架42并且在刚性盖14的下方间隔开，用于支撑和固定切割剪15.工具钩的横截面基本上为L形，包括较短的水平腿28，其从支撑背衬和从较短水平腿向上延伸并与支撑背衬间隔开的较长的垂直腿26。较短的水平腿，较长的垂直腿和支撑背衬在工具钩24和支撑背衬12之间限定凹槽，用于接收切割工具的枢轴18。优选地，工具保持器还包括附接到支撑背衬12的袋40，用于存储各种其它类型的切割工具。

7. 发明授权

US5506776A Steering control system for vehicle 失效
标题翻译：车辆转向控制系统
公开(公告)号：US5506776A
公开(公告)日：1996-04-09
申请号：US396723
申请日：1995-03-01
申请人： Takehiko Fushimi , Hisayasu Mase , Takeshi Hatano , Tadaichi Matsumoto , Kazutaka Tamura
发明人： Takehiko Fushimi , Hisayasu Mase , Takeshi Hatano , Tadaichi Matsumoto , Kazutaka Tamura
IPC分类号： B62D6/00 , B62D7/14
CPC分类号： B62D7/148
摘要： The amount of wiring required in a steering control system is reduced, and a power loss which occurs in the wiring of the power system is also reduced. The influences of electric noises upon the wiring between sensors and a control unit is reduced, thus improving the reliability. The control unit 9 connected with sensors and a servo unit SVU each include an independent computer 1, 8, and are connected to each other through a communication line. The control unit 9 is disposed adjacent to the sensors, while the servo unit SVU is disposed adjacent to an actuator. Information relating to a target steer angle and which is transmitted is chosen to be a variance T.DELTA. thereof, and on the receiving end, T.DELTA. is accumulated to obtain a target steer angle T.theta.. A steer angle deviation 0e is transmitted from SVU to the control unit 9. The presence or absence of any abnormality occurring is examined by checking the period of signal reception and signal values.
摘要翻译：转向控制系统所需的接线量减少，并且在电力系统的布线中发生的功率损耗也降低。电噪声对传感器与控制单元之间接线的影响减小，提高了可靠性。与传感器连接的控制单元9和伺服单元SVU各自包括独立计算机1,8，并且通过通信线路彼此连接。控制单元9邻近传感器设置，同时伺服单元SVU邻近致动器设置。与目标转向角相关的信息被选择为其方差T DELTA，并且在接收端，累积T DELTA以获得目标转向角θθ。转向角偏差0e从SVU发送到控制单元9.通过检查信号接收的周期和信号值来检查发生的任何异常的存在或不存在。

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