会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 7. 发明申请
    • PLASMA DISPLAY PANEL
    • 等离子显示面板
    • US20090102378A1
    • 2009-04-23
    • US12065229
    • 2007-08-07
    • Morio FujitaniKeisuke SumidaShinichiro IshinoKenichi Kusaka
    • Morio FujitaniKeisuke SumidaShinichiro IshinoKenichi Kusaka
    • H01J17/49
    • H01J11/12H01J11/36H01J2211/361
    • A plasma display panel comprises front plate (20) having display electrode (24) formed on a glass substrate with discharge gap (50), and back plate (30) having barrier ribs (34) formed to divide discharge cells, and arranged in a manner to confront the front plate (20). The barrier ribs (34) comprise vertical barrier rib (34a) arranged in parallel to an address electrode and horizontal barrier rib (34b) arranged in a manner to cross the vertical barrier rib (34a), and the vertical barrier rib (34a) has a shape satisfying the formula of H1>H2>H3, where H1 denotes a height of it at crossing portion (56) with the horizontal barrier rib (34b), H2 a height at a position of the discharge gap (50) of the display electrode (24), and H3 a height at a predetermined point between the position of the discharge gap (50) and the position of the crossing portion (56) with the horizontal barrier rib (34b).
    • 等离子体显示面板包括具有形成在具有放电间隙(50)的玻璃基板上的显示电极(24)的前板(20)和形成有分隔放电单元的隔壁(34)的背板(30) 方式面对前板(20)。 隔壁(34)包括与寻址电极平行布置的垂直隔壁(34a)和以横过垂直隔壁(34a)的方式布置的水平隔壁(34b),并且垂直隔壁(34a)具有 满足公式H1> H2> H3的形状,其中H1表示其与水平障肋(34b)的交叉部分(56)处的高度,H2表示显示器的放电间隙(50)的位置处的高度 电极(24)和H3在放电间隙(50)的位置与交叉部分(56)与水平障肋(34b)的位置之间的预定点处的高度。
    • 8. 发明申请
    • Scanning laser microscope
    • 扫描激光显微镜
    • US20080185533A1
    • 2008-08-07
    • US12011947
    • 2008-01-30
    • Hiroyuki KimuraKenichi KusakaKatashi Ishihara
    • Hiroyuki KimuraKenichi KusakaKatashi Ishihara
    • G01J1/58
    • G02B21/002G02B21/16G02B2207/113
    • Provided is a scanning laser microscope including a first laser light source for emitting ultrashort pulsed laser light; a scanning unit for two-dimensionally scanning the ultrashort pulsed laser light on a specimen; a second laser light source for emitting continuous laser light; an irradiation-position adjusting unit for performing two-dimensional adjustment of an irradiation position of the continuous laser light on the specimen; an objective lens for focusing the ultrashort pulsed laser light and the continuous laser light onto the specimen and for collecting fluorescence generated in the specimen; a light-detecting unit for detecting the fluorescence, which is split off from a light path between the objective lens and the scanning unit; and a continuous-laser-light switching unit for permitting radiation of the continuous laser light when the light-detecting unit is not detecting required fluorescence from the specimen on the basis of the ultrashort pulsed laser light.
    • 本发明提供一种扫描激光显微镜,其包括用于发射超短脉冲激光的第一激光光源; 用于在样本上二维扫描超短脉冲激光的扫描单元; 用于发射连续激光的第二激光光源; 照射位置调整单元,其对所述检体上的所述连续激光的照射位置进行二维调整; 用于将超短脉冲激光和连续激光聚焦到样本上并用于收集在样本中产生的荧光的物镜; 用于检测从物镜和扫描单元之间的光路分离的荧光的光检测单元; 以及连续激光切换单元,用于当光检测单元基于超短脉冲激光不检测来自样本的所需荧光时,允许连续激光的照射。
    • 10. 发明申请
    • MICROSCOPE ILLUMINATION OPTICAL SYSTEM
    • 显微照明光学系统
    • US20050088733A1
    • 2005-04-28
    • US10988610
    • 2004-11-16
    • Kenichi KusakaKazuhiro Hayashi
    • Kenichi KusakaKazuhiro Hayashi
    • G02B19/00G02B21/02G02B21/06G02B21/08
    • G02B21/06
    • An illumination optical system for a microscope is provided wherein the illumination state can be successively changed between Koehler illumination and critical illumination while ensuring one or more conditions are satisfied so that the image of the light source illuminates an appropriately large region of the field of view of the microscope during critical illumination. Preferably, no cemented lens elements are used so that degradation of the cement caused by ultraviolet light sources is avoided, thereby enabling an appropriate illumination type to be provided at will and without degradation of the optical components of the illumination optical system over time.
    • 提供了一种用于显微镜的照明光学系统,其中可以在确保满足一个或多个条件的同时,在Koehler照明和临界照明之间连续地改变照明状态,使得光源的图像照亮适当大的视场范围 显微镜在临界照明期间。 优选地,不使用胶合透镜元件,从而避免了由紫外线光源引起的水泥的劣化,从而能够随时随地提供照明光学系统的光学部件的随意且不劣化的适当的照明类型。