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    • 9. 发明申请
    • MAGNETIC-FIELD-GENERATING APPARATUS FOR MAGNETRON SPUTTERING
    • 磁场溅射用磁场发生装置
    • US20130299349A1
    • 2013-11-14
    • US13981252
    • 2011-01-12
    • Yoshihiko KuriyamaMasahiro Mita
    • Yoshihiko KuriyamaMasahiro Mita
    • C23C14/35
    • C23C14/351C23C14/35H01J37/3405H01J37/3408H01J37/345H01J37/3452H01J37/3461
    • A racetrack-shaped magnetic-field-generating apparatus for magnetron sputtering comprising a linear portion and corner portions, the linear portion comprising a magnetic base, a center permanent magnet disposed on its surface, and side permanent magnets disposed on both sides thereof with a gap; the center and side permanent magnets being vertically magnetized with opposite polarities; the corner portions comprising a non-magnetic base, a center magnetic pole member disposed on its surface, a semicircular or semi-polygonal, peripheral magnetic pole member, and plural permanent magnets arranged between both magnetic pole members with their magnetization directions in parallel to a target surface; and the magnetic poles of plural permanent magnets opposing the center magnetic pole member having the same polarity as those of the center permanent magnet opposing the target.
    • 一种用于磁控溅射的赛道形磁场产生装置,包括直线部分和角部分,线性部分包括磁性基座,设置在其表面上的中心永磁​​体和设置在其两侧的侧面永久磁体,间隙 ; 中心和侧面永磁体以相反的极性垂直磁化; 所述角部包括非磁性基座,设置在其表面上的中心磁极部件,半圆形或半多边形的外围磁极部件,以及布置在两个磁极部件之间的多个永磁体,其磁化方向与 目标表面 以及与中心磁极构件相对的多个永久磁铁的磁极与与靶相对的中心永磁​​体的极性相同。