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    • 1. 发明申请
    • Cleaning apparatus
    • 清洁装置
    • US20080035181A1
    • 2008-02-14
    • US11888689
    • 2007-08-02
    • Hirohiko TakahashiTakashi Fujita
    • Hirohiko TakahashiTakashi Fujita
    • B08B3/10
    • H01L21/67219H01L21/67173H01L21/67178H01L21/6719
    • It is an object of the invention to provide a cleaning apparatus which can subject wafers that have undergone polishing to various cleaning processes while reducing the usage amount of pure water, increase the processing speed of wafers per unit floor area and significantly improve the operating rate, enable change or rearrangement of a plurality of cleaning processing chambers to more optimum arrangement in accordance with the cleaning treatment processes and the like, prevent generation of defects in wafers that are in process of, for example, pre-treatment, and simplify the configuration of the apparatus.In order to achieve the above described object, the present invention provides a cleaning apparatus comprising cleaning lines 2A and 2B comprised of lower and upper two levels, each of the levels comprising a plurality of cleaning processing chambers 2a to 2d or 2e to 2h; a center transporting means 6 comprising a function of transporting a wafer to be processed into or a function of transporting the processed wafer from each of the cleaning processing chambers 2a to 2h in the lower-layer and upper-layer cleaning lines 2A and 2B; an inter-chamber transporting means 16 for sequentially transporting the wafer to the adjacent cleaning processing chamber in each of the lower-layer and upper-layer cleaning lines 2A and 2B; and an introducing means for introducing pure water used in the cleaning processing chamber, which carries out precision cleaning in the upper-layer cleaning line 2B, into the cleaning processing chamber, which carries out rough cleaning in the lower-layer cleaning line 2A, as washing water for the rough cleaning.
    • 本发明的目的是提供一种可以将经过抛光的晶片进行各种清洗处理的清洗装置,同时减少纯水的使用量,增加每单位面积的晶片的处理速度并显着地提高工作速率, 能够根据清洁处理过程等使多个清洁处理室的更改或重新布置成更优化的布置,防止在例如预处理过程中生成晶片中的缺陷,并且简化 该装置。 为了实现上述目的,本发明提供了一种清洁装置,其包括由下部和上部两个层构成的清洁线2A和2B,每个层包括多个清洁处理室2a至2d或2 e至2小时; 中央传送装置6,其包括将待处理的晶片输送到或者从下一层清洁线路2A中的每个清洁处理室2a至2h输送经处理的晶片的功能;以及 2 B; 用于将晶片顺序地输送到下层和上层清洁线路2A和2B中的每一层中的相邻清洁处理室的腔室间传送装置16; 以及引入装置,用于将在上层清洁管线B中执行精密清洁的清洁处理室中使用的纯水引入到在下层清洁管线2A中进行粗略清洁的清洁处理室 ,作为洗涤水进行粗洗。
    • 8. 发明申请
    • Article Transfer Device and Stacker Crane Having Same
    • 文具传送装置和堆垛机起重机相同
    • US20120201642A1
    • 2012-08-09
    • US13390607
    • 2010-07-15
    • Takashi Fujita
    • Takashi Fujita
    • B65G1/04
    • B65G1/0407B65G1/0435
    • An article transfer device includes a placement support portion that is provided to a base platform and includes a pair of divided placement support portions for separately receiving and supporting both side portions, in the article lateral direction, of the bottom surface of an article, and a pair of clamp portions that can be projected and retracted along an article transfer direction with respect to the placement support portion and can be moved toward and away from each other by a clamp actuator between gripping positions and releasing positions that are spaced apart wider. The pair of divided placement support portions can be moved toward and away from each other within a movable range defined in the article lateral direction by a placement support portion actuator and to face each other in close proximity when located in approach limit positions of the movable range.
    • 一种物品传送装置,包括:设置在基座平台上的放置支撑部,其具有一对分割放置支撑部,用于分别容纳和支撑物品的底面的物品横向方向的两侧部, 一对夹持部分可以沿物品传送方向相对于放置支撑部分伸出和缩回,并且可以通过夹持致动器之间的夹紧致动器彼此移动并远离彼此间隔开较宽的释放位置。 一对分开的放置支撑部分可以在通过放置支撑部分致动器在物品横向方向上限定的可移动范围内彼此移动并远离彼此并且当位于可移动范围的接近极限位置时彼此面对 。