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    • 4. 发明授权
    • Thin film transistor and display
    • 薄膜晶体管和显示屏
    • US06252248B1
    • 2001-06-26
    • US09326288
    • 1999-06-07
    • Keiichi SanoYasuo SegawaNorio TabuchiTsutomu Yamada
    • Keiichi SanoYasuo SegawaNorio TabuchiTsutomu Yamada
    • H01L2904
    • H01L29/78696G02F1/136227G02F1/1368H01L29/78621H01L29/78645H01L29/78648
    • A gate electrode (2), a gate insulating film (3), and an active layer (4) made of a poly silicon film and having a source (5), a channel (7), and a drain (6) are formed on an insulating substrate (1) and an interlayer insulating film (9) is formed over the whole of the gate insulating film (3), the active layer (4), and a stopper insulating film (8). A drain electrode (10) is formed by filling a contact hole made in the interlayer insulating film (9), the position of which corresponds to the drain (6), with a metal, such as Al. Simultaneously with the drain electrode (10), a conductive layer (11) is formed on the interlayer insulating film (9) over the channel (7). The conductive layer (11) is connected to gate signal line G on the insulating substrate (1) via a contact hole (15) made in the gate insulating film (3) and the interlayer insulating film (9). The width of the conductive layer (11) along the length of the channel (7) is narrower than the actual length of the channel (7) and narrower than the width along the channel length of the gate electrode (2). The conductive layer (11) can therefore shield the channel (7). As a result, even if impurities or the like become attached to the surface of the interlayer insulating film (9), the occurrence of a back channel, for example, is reliably prevented.
    • 形成栅极电极(2),栅极绝缘膜(3)和由多晶硅膜制成并具有源极(5),沟道(7)和漏极(6)的有源层(4) 在整个栅极绝缘膜(3),有源层(4)和阻挡绝缘膜(8)上形成绝缘基板(1)和层间绝缘膜(9)。 漏极电极(10)通过用金属(例如Al)填充其位置与漏极(6)相对应的层间绝缘膜(9)中形成的接触孔而形成。 与漏电极(10)同时,在沟道(7)上的层间绝缘膜(9)上形成导电层(11)。 导电层(11)通过栅极绝缘膜(3)和层间绝缘膜(9)中形成的接触孔(15)连接到绝缘基板(1)上的栅极信号线G. 导电层(11)沿着沟道(7)的长度的宽度比通道(7)的实际长度窄,并且窄于沿栅极电极(2)的沟道长度的宽度。 因此,导电层(11)可以屏蔽通道(7)。 结果,即使杂质等附着到层间绝缘膜(9)的表面,可以可靠地防止例如背面通道的发生。
    • 7. 发明授权
    • Light-emitting display device and manufacturing method for light-emitting display device
    • 发光显示装置及发光显示装置的制造方法
    • US08575611B2
    • 2013-11-05
    • US13370842
    • 2012-02-10
    • Yasuo Segawa
    • Yasuo Segawa
    • H01L29/04
    • H01L27/1233H01L27/1288H01L27/3262
    • In the light-emitting display device according to the present invention, a side-contact structure is adopted in order to secure a TFT characteristic in a linear region (on-current). In a TFT configuring a switching transistor, a thickness of a semiconductor layer (channel layer) in a region corresponding to the source/drain electrodes is increased. In contrast, in a TFT configuring a driving transistor, in order to maintain an on current, a thickness of a semiconductor layer (channel layer) in a region corresponding to the source/drain electrodes is reduced. This configuration is manufactured using a half-tone mask. With this, it is possible to suppress the off-current in the switching transistor, while securing the on-current in the driving transistor.
    • 在根据本发明的发光显示装置中,为了确保线性区域(导通电流)中的TFT特性,采用侧接触结构。 在配置开关晶体管的TFT中,与源极/漏极对应的区域中的半导体层(沟道层)的厚度增加。 相反,在构成驱动晶体管的TFT中,为了保持导通电流,与源极/漏极对应的区域的半导体层(沟道层)的厚度减小。 该配置使用半色调蒙版制造。 由此,可以在确保驱动晶体管中的导通电流的同时,抑制开关晶体管的截止电流。
    • 9. 发明授权
    • Display device
    • 显示设备
    • US07154117B2
    • 2006-12-26
    • US10758321
    • 2004-01-15
    • Yasuo SegawaKeiichi SanoKazuto Noritake
    • Yasuo SegawaKeiichi SanoKazuto Noritake
    • H01L29/04
    • H01L29/78648G02F1/136227G02F1/1368G02F2203/02H01L27/12H01L29/78645
    • A display device in which variations of characteristics of a TFT are eliminated and the aperture ratio is improved is provided. A display device has a thin film transistor on an insulating substrate 10. The thin film transistor includes first gate electrodes 11, a gate insulating film 12, a semiconductor film 13 which is formed on the first gate electrode 11, and a interlayer insulating film 15. The thin film transistor further includes second gate electrodes 70 which are on the interlayer insulating film 15 and at least above channels 13c, and which are connected to the first gate electrodes 11. A reflective display electrode 19 connected to the source of the thin film transistor is elongated to extend above the thin film transistor.
    • 提供了消除TFT的特性变化和改善开口率的显示装置。 显示装置在绝缘基板10上具有薄膜晶体管。 薄膜晶体管包括第一栅极11,栅极绝缘膜12,形成在第一栅电极11上的半导体膜13和层间绝缘膜15。 薄膜晶体管还包括在层间绝缘膜15上并且至少在通道13c上方并且连接到第一栅电极11的第二栅电极70。 连接到薄膜晶体管的源极的反射显示电极19被拉长以在薄膜晶体管的上方延伸。