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1. 发明申请

US20090062580A1 Method for Producing Cyclic Olefin Compound 有权
标题翻译：生产环烯烃化合物的方法
公开(公告)号：US20090062580A1
公开(公告)日：2009-03-05
申请号：US12226356
申请日：2007-04-11
申请人： Hideyuki Takai , Kenji Oka , Kyuhei Kitao
发明人： Hideyuki Takai , Kenji Oka , Kyuhei Kitao
IPC分类号： C07C1/24 , C07C13/28
CPC分类号： C07C13/28 , C07C1/24 , C07C2527/03 , C07C2527/054 , C07C2527/173 , C07C2601/16
摘要： Disclosed is a method for producing a cyclic olefin compound having two or more cyclohexene rings per molecule via intramolecular dehydration of an alicyclic alcohol having two or more hydroxylated cyclohexane rings per molecule. The method includes the step (i) of heating the alicyclic alcohol at a temperature of 130° C. to 230° C. and a pressure greater than 20 Torr in an organic solvent in the presence of a dehydration catalyst, to carry out dehydration of the alicyclic alcohol while distilling off by-product water, which dehydration catalyst is liquid or soluble in a liquid reaction mixture under the reaction conditions; and the subsequent step (ii) of heating the resulting reaction mixture at a temperature of 50° C. to 220° C. and a pressure of 200 Torr or less to recover the cyclic olefin compound as a distillate. According to the method, side reactions such as isomerization are suppressed, and high-purity cyclic olefin compounds with less impurities can be simply and efficiently obtained in high yields.
摘要翻译：公开了通过每分子具有两个或更多个羟基化环己烷环的脂环醇的分子内脱水来制备每分子具有两个或更多个环己烯环的环状烯烃化合物的方法。该方法包括在脱水催化剂存在下，在有机溶剂中，在130℃至230℃的温度和大于20托的压力下加热脂环醇的步骤（i），以进行脱水在反应条件下蒸馏出副产物水的脂环醇，该脱水催化剂为液体或可溶于液体反应混合物; 和随后的步骤（ii）在50℃至220℃的温度和200托或更低的压力下加热所得反应混合物以回收作为馏出物的环状烯烃化合物。根据该方法，可以抑制异构化等副反应，能够以高收率简单高效地得到杂质较少的高纯度环状烯烃化合物。

2. 发明授权

US08115043B2 Method for producing cyclic olefin compound 有权
标题翻译：环烯烃化合物的制备方法
公开(公告)号：US08115043B2
公开(公告)日：2012-02-14
申请号：US12226356
申请日：2007-04-11
申请人： Hideyuki Takai , Kenji Oka , Kyuhei Kitao
发明人： Hideyuki Takai , Kenji Oka , Kyuhei Kitao
IPC分类号： C07C1/20
CPC分类号： C07C13/28 , C07C1/24 , C07C2527/03 , C07C2527/054 , C07C2527/173 , C07C2601/16
摘要： Disclosed is a method for producing a cyclic olefin compound having two or more cyclohexene rings per molecule via intramolecular dehydration of an alicyclic alcohol having two or more hydroxylated cyclohexane rings per molecule. The method includes the step (i) of heating the alicyclic alcohol at a temperature of 130° C. to 230° C. and a pressure greater than 20 Torr in an organic solvent in the presence of a dehydration catalyst, to carry out dehydration of the alicyclic alcohol while distilling off by-product water, which dehydration catalyst is liquid or soluble in a liquid reaction mixture under the reaction conditions; and the subsequent step (ii) of heating the resulting reaction mixture at a temperature of 50° C. to 220° C. and a pressure of 200 Torr or less to recover the cyclic olefin compound as a distillate. According to the method, side reactions such as isomerization are suppressed, and high-purity cyclic olefin compounds with less impurities can be simply and efficiently obtained in high yields.
摘要翻译：公开了通过每分子具有两个或更多个羟基化环己烷环的脂环醇的分子内脱水来制备每分子具有两个或更多个环己烯环的环状烯烃化合物的方法。该方法包括在脱水催化剂存在下，在有机溶剂中，在130℃至230℃的温度和大于20托的压力下加热脂环醇的步骤（i），以进行脱水在反应条件下蒸馏出副产物水的脂环醇，该脱水催化剂为液体或可溶于液体反应混合物; 和随后的步骤（ii）在50℃至220℃的温度和200托或更低的压力下加热所得反应混合物以回收作为馏出物的环状烯烃化合物。根据该方法，可以抑制异构化等副反应，能够以高收率简单高效地得到杂质较少的高纯度环状烯烃化合物。

3. 发明授权

US08649583B2 Pupil detection device and pupil detection method 有权
标题翻译：瞳孔检测装置和瞳孔检测方法
公开(公告)号：US08649583B2
公开(公告)日：2014-02-11
申请号：US13496713
申请日：2011-06-15
申请人： Sotaro Tsukizawa , Kenji Oka
发明人： Sotaro Tsukizawa , Kenji Oka
IPC分类号： G06K9/00
CPC分类号： A61B3/113 , A61B5/18 , G06K9/00604 , G06T7/73 , G06T2207/30201
摘要： A pupil detection device and a pupil detection method, which are capable of stably detecting the pupil by actively using information of cornea-reflected image even when most of the pupil is hidden by the cornea-reflected image. In pupil detection device (100), peripheral state evaluating section (105) sets a plurality of line segments having a reference point of a cornea-reflected image as one end and having a predetermined length, and calculates a luminance evaluation value based on luminance of each pixel in each line segment and reference luminance. Pupil center straight line calculation section (106) specifies a pupil center straight line passing through a center of a pupil image from among a plurality of line segments based on a luminance evaluation value. Pupil search section (107) detects a pupil image based on a luminance state around the pupil center straight line.
摘要翻译：瞳孔检测装置和瞳孔检测方法，即使当大部分瞳孔被角膜反射图像隐藏时，也能够通过主动使用角膜反射图像的信息来稳定地检测瞳孔。在瞳孔检测装置（100）中，周边状态评价部（105）将具有角膜反射图像的基准点的多个线段设定为一端并具有规定长度，并且基于亮度每个线段中的每个像素和参考亮度。瞳孔中心直线计算部分（106）基于亮度评估值指定从多个线段中通过瞳孔图像的中心的瞳孔中心直线。瞳孔搜索部（107）基于瞳孔中心直线周围的亮度状态来检测瞳孔图像。

4. 发明申请

US20130335189A1 COMPONENT WITH COUNTERMEASURE AGAINST STATIC ELECTRICITY AND METHOD OF MANUFACTURING SAME 审中-公开
标题翻译：具有防静电功能的组件及其制造方法
公开(公告)号：US20130335189A1
公开(公告)日：2013-12-19
申请号：US13985473
申请日：2012-04-16
申请人： Yuuichi Abe , Kenji Oka , Fuyuki Abe , Kazuhiro Miura , Mikinori Amisawa , Atsumi Miyakawa , Takahiro Senshu , Yuji Yamagishi , Jun Ootsuki
发明人： Yuuichi Abe , Kenji Oka , Fuyuki Abe , Kazuhiro Miura , Mikinori Amisawa , Atsumi Miyakawa , Takahiro Senshu , Yuji Yamagishi , Jun Ootsuki
IPC分类号： H02H9/04 , H01C17/30
CPC分类号： H02H9/04 , H01C1/014 , H01C7/1006 , H01C7/102 , H01C7/112 , H01C17/30 , Y10T29/49082
摘要： An electrostatic discharge (ESD) protector includes a first high heat-conductive substrate, a second high heat-conductive substrate, a varistor layer, and a plurality of via-hole electrodes. The first high heat-conductive substrate is provided with a plurality of first through-holes. The second high heat-conductive substrate is provided with a plurality of second through-holes. The varistor layer that is mainly composed of zinc oxide is disposed between the first high heat-conductive substrate and the second high heat-conductive substrate. The varistor layer includes internal electrodes. Each of via-hole electrodes penetrates the varistor layer and fills both one of the first through-holes and one of the second through-holes to couple both the ones to each other.
摘要翻译：静电放电（ESD）保护器包括第一高导热衬底，第二高导热衬底，变阻器层和多个通孔电极。第一高导热基板设置有多个第一通孔。第二高导热基板设置有多个第二通孔。主要由氧化锌构成的变阻器层配置在第一高导热性基板和第二高导热性基板之间。压敏电阻层包括内部电极。每个通孔电极穿透压敏电阻层，并且填充第一通孔和第二通孔中的一个，以将两者彼此连接。

5. 发明授权

US08559000B2 Method of inspecting a semiconductor device and an apparatus thereof 有权
标题翻译：检查半导体器件的方法及其装置
公开(公告)号：US08559000B2
公开(公告)日：2013-10-15
申请号：US13593171
申请日：2012-08-23
申请人： Akira Hamamatsu , Minori Noguchi , Yoshimasa Ohshima , Hidetoshi Nishiyama , Kenji Oka , Takanori Ninomiya , Maki Tanaka , Kenji Watanabe , Tetsuya Watanabe , Yoshio Morishige
发明人： Akira Hamamatsu , Minori Noguchi , Yoshimasa Ohshima , Hidetoshi Nishiyama , Kenji Oka , Takanori Ninomiya , Maki Tanaka , Kenji Watanabe , Tetsuya Watanabe , Yoshio Morishige
IPC分类号： G01N21/00 , G06K9/00
CPC分类号： G06T7/001 , G01N21/8851 , G01N21/9501 , G01N2021/8861 , G01N2021/8867 , G06T7/97 , G06T2207/10152 , G06T2207/30148
摘要： A method and apparatus of inspecting a sample, in which the sample is inspected under a plurality of inspection conditions, and inspection data obtained by inspecting the sample under each of the plurality of inspection conditions and position information on the sample of the inspection date in correspondence with the respective inspection conditions, are stored. The inspection data for each of the plurality of inspection conditions is against each other by the use of the position information on the sample to determine a position to be inspected in detail, and an image of the sample at a position to be inspected in detail is obtained. The obtained image is classified, the inspection condition of the sample by the use of information of classification of the image is determined.
摘要翻译：在多个检查条件下对样本进行检查的检查方法和装置以及在多个检查条件下检查样本而获得的检查数据和对应于检查日期样本的位置信息具有相应的检查条件。多个检查条件中的每一个的检查数据通过使用关于样本的位置信息彼此相对来确定待检查的位置，并且在待检查位置处的样本的图像是详细的获得。对所获得的图像进行分类，确定通过使用图像分类信息的样本的检查条件。

6. 发明申请

US20120170027A1 EXTERNAL LIGHT GLARE ASSESSMENT DEVICE, LINE OF SIGHT DETECTION DEVICE AND EXTERNAL LIGHT GLARE ASSESSMENT METHOD 有权
标题翻译：外部光眼评估装置，视线检测装置和外部光眼评估方法
公开(公告)号：US20120170027A1
公开(公告)日：2012-07-05
申请号：US13390169
申请日：2011-06-07
申请人： Sotaro Tsukizawa , Kenji Oka
发明人： Sotaro Tsukizawa , Kenji Oka
IPC分类号： G01N21/55
CPC分类号： G06K9/0061 , G06T1/00 , G06T7/00 , G06T7/11 , G06T2207/10016 , G06T2207/30201 , G06T2207/30268
摘要： Disclosed are an ambient light reflection determination apparatus and an ambient light reflection determination method enabling to determine reflection without using an edge and even in a case where luminance of a reflection generating part in eyeglasses is low. In a reflection determination apparatus (100), a luminance histogram calculation section (102) calculates a luminance histogram representing a luminance distribution of an eye area image, a difference calculation section (104) calculates a difference histogram by finding a difference between the two luminance histograms calculated from the two eye area images having different photographing timings, an evaluation value calculation section (105) calculates an evaluation value regarding reflection of ambient light based on the difference histogram and a weight in accordance with luminance, and a reflection determination section (107) determines the reflection of ambient light based on the calculated evaluation value.
摘要翻译：公开了环境光反射确定装置和环境光反射确定方法，其能够在不使用边缘的情况下确定反射，并且即使在眼镜中的反射产生部的亮度低的情况下也是如此。在反射判定装置（100）中，亮度直方图计算部（102）计算表示眼睛区域图像的亮度分布的亮度直方图，差分计算部（104）通过求出两个亮度根据具有不同拍摄定时的两个眼睛区域图像计算的直方图，评估值计算部（105）根据差异直方图和根据亮度的权重来计算关于环境光的反射的评价值，以及反射判定部）根据计算的评估值确定环境光的反射。

7. 发明申请

US20120046884A1 SURFACE INSPECTING APPARATUS AND METHOD FOR CALIBRATING SAME 有权
标题翻译：表面检查装置及其校准方法
公开(公告)号：US20120046884A1
公开(公告)日：2012-02-23
申请号：US13202734
申请日：2010-02-02
申请人： Kenji Oka , Kenji Mitomo , Kenichiro Komeda
发明人： Kenji Oka , Kenji Mitomo , Kenichiro Komeda
IPC分类号： G01N21/94 , G01N21/93
CPC分类号： G01N21/9501 , G01N21/93 , G01N2201/103
摘要： While an illumination optical system 2 is irradiating the surface of a contaminated standard wafer 110 with illumination light, this illumination light is scanned over the surface of the contaminated standard wafer 110, then detectors 31 to 34 of a detection optical system 3 each detect the light scattered from the surface of the contaminated standard wafer 110, next a predefined reference value in addition to detection results on the scattered light is used to calculate a compensation parameter “Comp” for detection sensitivity correction of photomultiplier tubes 331 to 334 of the detectors 31 to 34, and the compensation parameter “Comp” is separated into a time-varying deterioration parameter “P”, an optical characteristics parameter “Opt”, and a sensor characteristics parameter “Lr”, and correspondingly managed.This makes it easy to calibrate the detection sensitivity.
摘要翻译：当照明光学系统2用照明光照射受污染的标准晶片110的表面时，该照明光被扫描在污染的标准晶片110的表面上，然后检测光学系统3的检测器31至34检测光从受污染的标准晶片110的表面散射的下一个预定的参考值，除了散射光的检测结果之外，还用于计算用于检测器31到...的光电倍增管331至334的检测灵敏度校正的补偿参数“Comp” 34，补偿参数“Comp”被分离为时变劣化参数“P”，光学特性参数“Opt”和传感器特性参数“Lr”，并相应地被管理。这样可以轻松校准检测灵敏度。

8. 发明授权

US08040503B2 Method of inspecting a semiconductor device and an apparatus thereof 有权
标题翻译：检查半导体器件的方法及其装置
公开(公告)号：US08040503B2
公开(公告)日：2011-10-18
申请号：US12652427
申请日：2010-01-05
申请人： Akira Hamamatsu , Minori Noguchi , Yoshimasa Ohshima , Hidetoshi Nishiyama , Kenji Oka , Takanori Ninomiya , Maki Tanaka , Kenji Watanabe , Tetsuya Watanabe , Yoshio Morishige
发明人： Akira Hamamatsu , Minori Noguchi , Yoshimasa Ohshima , Hidetoshi Nishiyama , Kenji Oka , Takanori Ninomiya , Maki Tanaka , Kenji Watanabe , Tetsuya Watanabe , Yoshio Morishige
IPC分类号： G01N21/00 , G06K9/00
CPC分类号： G06T7/001 , G01N21/8851 , G01N21/9501 , G01N2021/8861 , G01N2021/8867 , G06T7/97 , G06T2207/10152 , G06T2207/30148
摘要： A method and apparatus of inspecting a sample, in which the sample is inspected under a plurality of inspection conditions, and inspection data obtained by inspecting the sample under each of the plurality of inspection conditions and position information on the sample of the inspection date in correspondence with the respective inspection conditions, are stored. The inspection data for each of the plurality of inspection conditions is against each other by the use of the position information on the sample to determine a position to be inspected in detail, and an image of the sample at a position to be inspected in detail is obtained. The obtained image is classified, the inspection condition of the sample by the use of information of classification of the image is determined.
摘要翻译：在多个检查条件下对样本进行检查的检查方法和装置以及在多个检查条件下检查样本而获得的检查数据和对应于检查日期样本的位置信息具有相应的检查条件。多个检查条件中的每一个的检查数据通过使用关于样本的位置信息彼此相对来确定待检查的位置，并且在待检查位置处的样本的图像是详细的获得。对所获得的图像进行分类，确定通过使用图像分类信息的样本的检查条件。

9. 发明申请

US20100140474A1 METHOD OF INSPECTING A SEMICONDUCTOR DEVICE AND AN APPARATUS THEREOF 有权
标题翻译：检查半导体器件的方法及其装置
公开(公告)号：US20100140474A1
公开(公告)日：2010-06-10
申请号：US12652427
申请日：2010-01-05
申请人： Akira HAMAMATSU , Minori Noguchi , Yoshimasa Ohshima , Hidetoshi Nishiyama , Kenji Oka , Takanori Ninomya , Maki Tanaka , Kenji Watanabe , Tetsuya Watanabe , Yoshio Morishige
发明人： Akira HAMAMATSU , Minori Noguchi , Yoshimasa Ohshima , Hidetoshi Nishiyama , Kenji Oka , Takanori Ninomya , Maki Tanaka , Kenji Watanabe , Tetsuya Watanabe , Yoshio Morishige
IPC分类号： G01N23/00 , G01N21/00
CPC分类号： G06T7/001 , G01N21/8851 , G01N21/9501 , G01N2021/8861 , G01N2021/8867 , G06T7/97 , G06T2207/10152 , G06T2207/30148
摘要： A method and apparatus of inspecting a sample, in which the sample is inspected under a plurality of inspection conditions, and inspection data obtained by inspecting the sample under each of the plurality of inspection conditions and position information on the sample of the inspection date in correspondence with the respective inspection conditions, are stored. The inspection data for each of the plurality of inspection conditions is against each other by the use of the position information on the sample to determine a position to be inspected in detail, and an image of the sample at a position to be inspected in detail is obtained. The obtained image is classified, the inspection condition of the sample by the use of information of classification of the image is determined.
摘要翻译：在多个检查条件下检查样本的样本的检查方法和装置以及在多个检查条件下检查样本而获得的检查数据和对应于检查日期的样本的位置信息具有相应的检查条件。多个检查条件中的每一个的检查数据通过使用关于样本的位置信息彼此相对来确定待检查的位置，并且在待检查位置处的样本的图像是详细的获得。对所获得的图像进行分类，确定通过使用图像分类信息的样本的检查条件。

10. 发明授权

US07643138B2 Method of inspecting a semiconductor device and an apparatus thereof 有权
标题翻译：检查半导体器件的方法及其装置
公开(公告)号：US07643138B2
公开(公告)日：2010-01-05
申请号：US12182438
申请日：2008-07-30
申请人： Akira Hamamatsu , Minori Noguchi , Yoshimasa Ohshima , Hidetoshi Nishiyama , Kenji Oka , Takanori Ninomiya , Maki Tanaka , Kenji Watanabe , Tetsuya Watanabe , Yoshio Morishige
发明人： Akira Hamamatsu , Minori Noguchi , Yoshimasa Ohshima , Hidetoshi Nishiyama , Kenji Oka , Takanori Ninomiya , Maki Tanaka , Kenji Watanabe , Tetsuya Watanabe , Yoshio Morishige
IPC分类号： G01N21/00 , G06K9/00
CPC分类号： G06T7/001 , G01N21/8851 , G01N21/9501 , G01N2021/8861 , G01N2021/8867 , G06T7/97 , G06T2207/10152 , G06T2207/30148
摘要： A method and apparatus of inspecting a sample, in which the sample is inspected under a plurality of inspection conditions, and inspection data obtained by inspecting the sample under each of the plurality of inspection conditions and position information on the sample of the inspection date in correspondence with the respective inspection conditions, are stored. The inspection data for each of the plurality of inspection conditions is against each other by the use of the position information on the sample to determine a position to be inspected in detail, and an image of the sample at a position to be inspected in detail is obtained. The obtained image is classified, the inspection condition of the sample by the use of information of classification of the image is determined.
摘要翻译：在多个检查条件下对样本进行检查的检查方法和装置以及在多个检查条件下检查样本而获得的检查数据和对应于检查日期样本的位置信息具有相应的检查条件。多个检查条件中的每一个的检查数据通过使用关于样本的位置信息彼此相对来确定待检查的位置，并且在待检查位置处的样本的图像是详细的获得。对所获得的图像进行分类，确定通过使用图像分类信息的样本的检查条件。

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