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1. 发明授权

US6114695A Scanning electron microscope and method for dimension measuring by using the same 失效
标题翻译：扫描电子显微镜及其使用的尺寸测量方法
公开(公告)号：US6114695A
公开(公告)日：2000-09-05
申请号：US307789
申请日：1999-05-10
申请人： Hideo Todokoro , Kenji Takamoto , Tadashi Otaka , Fumio Mizuno , Satoru Yamada , Sadao Terakado , Katsuhiro Kuroda , Ken Ninomiya , Tokuo Kure
发明人： Hideo Todokoro , Kenji Takamoto , Tadashi Otaka , Fumio Mizuno , Satoru Yamada , Sadao Terakado , Katsuhiro Kuroda , Ken Ninomiya , Tokuo Kure
IPC分类号： G01Q30/02 , G01B15/00 , G01B15/04 , G01Q30/04 , H01J37/26
CPC分类号： G01B15/00 , G01B15/04 , H01J2237/2448 , H01J2237/24495 , H01J2237/281
摘要： An electron beam which can transmit through part of a specimen and can reach a portion not exposing to the electron beam is irradiated and a scanning image is obtained on the basis of a signal secondarily generated from a portion irradiated with the electron beam. Dimension-measuring start and end points are set on the scanning image and a dimension therebetween is measured. A cubic model is assumed, the cubic model is modified so as to match the scanning image, and dimension measurement is carried out on the basis of a modified cubic model.
摘要翻译：照射可以透过部分试样并且可以到达不暴露于电子束的部分的电子束，并且基于从照射电子束的部分二次产生的信号获得扫描图像。在扫描图像上设置尺寸测量开始点和终点，并测量它们之间的尺寸。假设立方模型，修改立方体模型以匹配扫描图像，并且基于修改的立方体模型进行尺寸测量。

2. 发明授权

US5969357A Scanning electron microscope and method for dimension measuring by using the same 失效
公开(公告)号：US5969357A
公开(公告)日：1999-10-19
申请号：US979327
申请日：1997-11-26
申请人： Hideo Todokoro , Kenji Takamoto , Tadashi Otaka , Fumio Mizuno , Satoru Yamada , Sadao Terakado , Katsuhiro Kuroda , Ken Ninomiya , Tokuo Kure
发明人： Hideo Todokoro , Kenji Takamoto , Tadashi Otaka , Fumio Mizuno , Satoru Yamada , Sadao Terakado , Katsuhiro Kuroda , Ken Ninomiya , Tokuo Kure
IPC分类号： G01Q30/02 , G01B15/00 , G01B15/04 , G01Q30/04 , H01J37/26
CPC分类号： G01B15/00 , G01B15/04 , H01J2237/2448 , H01J2237/24495 , H01J2237/281
摘要： An electron beam which can transmit through part of a specimen and can reach a portion not exposing to the electron beam is irradiated and a scanning image is obtained on the basis of a signal secondarily generated from a portion irradiated with the electron beam. Dimension-measuring start and end points are set on the scanning image and a dimension therebetween is measured. A cubic model is assumed, the cubic model is modified so as to match the scanning image, and dimension measurement is carried out on the basis of a modified cubic model.

3. 发明授权

US5866904A Scanning electron microscope and method for dimension measuring by using the same 失效
公开(公告)号：US5866904A
公开(公告)日：1999-02-02
申请号：US970201
申请日：1997-11-14
申请人： Hideo Todokoro , Kenji Takamoto , Tadashi Otaka , Fumio Mizuno , Satoru Yamada , Sadao Terakado , Katsuhiro Kuroda , Ken Ninomiya , Tokuo Kure
发明人： Hideo Todokoro , Kenji Takamoto , Tadashi Otaka , Fumio Mizuno , Satoru Yamada , Sadao Terakado , Katsuhiro Kuroda , Ken Ninomiya , Tokuo Kure
IPC分类号： G01Q30/02 , G01B15/00 , G01B15/04 , G01Q30/04 , H01J37/26
CPC分类号： G01B15/00 , G01B15/04 , H01J2237/2448 , H01J2237/24495 , H01J2237/281
摘要： An electron beam which can transmit through part of a specimen and can reach a portion not exposing to the electron beam is irradiated and a scanning image is obtained on the basis of a signal secondarily generated from a portion irradiated with the electron beam. Dimension-measuring start and end points are set on the scanning image and a dimension therebetween is measured. A cubic model is assumed, the cubic model is modified so as to match the scanning image, and dimension measurement is carried out on the basis of a modified cubic model.

4. 发明授权

US5594245A Scanning electron microscope and method for dimension measuring by using the same 失效
标题翻译：扫描电子显微镜及其使用的尺寸测量方法
公开(公告)号：US5594245A
公开(公告)日：1997-01-14
申请号：US386766
申请日：1995-02-10
申请人： Hideo Todokoro , Kenji Takamoto , Tadashi Otaka , Fumio Mizuno , Satoru Yamada , Sadao Terakado , Katsuhiro Kuroda , Ken Ninomiya , Tokuo Kure
发明人： Hideo Todokoro , Kenji Takamoto , Tadashi Otaka , Fumio Mizuno , Satoru Yamada , Sadao Terakado , Katsuhiro Kuroda , Ken Ninomiya , Tokuo Kure
IPC分类号： G01B15/00 , G01B15/04 , H01J37/28 , H01J37/30 , H01J37/26
CPC分类号： H01J37/3005 , G01B15/00 , G01B15/04 , H01J37/28 , H01J2237/2448 , H01J2237/24495 , H01J2237/281
摘要： An electron beam, which can transmit through part of a specimen and can reach a portion that is not exposed to the electron beam, is irradiated, and a scanning image is obtained on the basis of a signal secondarily generated from a portion irradiated with the electron beam. Dimension-measuring start and end points are set on the scanning image and a dimension therebetween is measured. A three-dimensional model is assumed, the three-dimensional model is modified so as to match the scanning image, and dimension measurement is carried out on the basis of a modified three-dimensional model.
摘要翻译：照射可以透过部分试样并且可以到达未暴露于电子束的部分的电子束，并且基于从照射电子的部分二次产生的信号获得扫描图像光束。在扫描图像上设置尺寸测量开始点和终点，并测量它们之间的尺寸。假设三维模型，修改三维模型以匹配扫描图像，并且基于修改的三维模型进行尺寸测量。

5. 发明授权

US5412210A Scanning electron microscope and method for production of semiconductor device by using the same 失效
标题翻译：扫描电子显微镜及其制造方法
公开(公告)号：US5412210A
公开(公告)日：1995-05-02
申请号：US160336
申请日：1993-12-02
申请人： Hideo Todokoro , Kenji Takamoto , Tadashi Otaka , Fumio Mizuno , Satoru Yamada , Katsuhiro Kuroda , Ken Ninomiya , Tokuo Kure
发明人： Hideo Todokoro , Kenji Takamoto , Tadashi Otaka , Fumio Mizuno , Satoru Yamada , Katsuhiro Kuroda , Ken Ninomiya , Tokuo Kure
IPC分类号： G01B15/04 , G01Q30/02 , G01Q30/04 , G01Q30/12 , G01Q30/16 , G01Q30/18 , G01Q70/00 , H01J37/28 , H01J37/30 , H01J37/26
CPC分类号： G01B15/04 , H01J37/28 , H01J37/3005 , H01J2237/226 , H01J2237/2448 , H01J2237/24495 , H01J2237/281
摘要： A technique for displaying a scanned specimen image permits non-destructive observation of a surface structure having large or precipitous unevenness, an internal structure of a specimen or a specific structure of a defect or foreign matter, which non-destructive observation has hitherto been considered to be difficult to achieve. The technique can be applied to inspection and measurement so as to economically provide devices and parts of high quality and high reliability. Thus, secondary information such as secondary electrons resulting from interaction of primary information with a specimen, the primary information being generated as a result of interaction of a scanning electron beam with the specimen, is utilized as an image signal to form an image.
摘要翻译：用于显示扫描的样本图像的技术允许对具有大的或陡峭的不均匀性，样本的内部结构或缺陷或异物的特定结构的表面结构进行非破坏性观察，迄今为止已经认为非破坏性观察难以实现。该技术可以应用于检测和测量，从而经济地提供高质量和高可靠性的设备和部件。因此，作为图像信号利用作为扫描电子束与样本的相互作用的结果而生成的主要信息的次要信息，例如由主要信息与样本的相互作用产生的二次电子。

6. 发明授权

US5202564A Scanning electron microscope and method and production of semi-conductor device by using the same 失效
公开(公告)号：US5202564A
公开(公告)日：1993-04-13
申请号：US773729
申请日：1991-10-09
申请人： Hideo Todokoro , Kenji Takamoto , Tadashi Otaka
发明人： Hideo Todokoro , Kenji Takamoto , Tadashi Otaka
摘要： An SEM can inspect a groove or hole in the surface of a specimen by irradiating the specimen with a high energy electron beam. The SEM is used in the manufacturing process of a semiconductor device to observe the configuration of the bottom of a deep hole.

7. 发明授权

US5894345A Optical method of detecting defect and apparatus used therein 失效
标题翻译：检测缺陷的光学方法及其中使用的装置
公开(公告)号：US5894345A
公开(公告)日：1999-04-13
申请号：US859423
申请日：1997-05-20
申请人： Kenji Takamoto , Kanji Nishii , Masami Ito , Atsushi Fukui , Kazumasa Takata
发明人： Kenji Takamoto , Kanji Nishii , Masami Ito , Atsushi Fukui , Kazumasa Takata
IPC分类号： G01B11/30 , G01N21/88 , G01N21/89 , G01N21/956 , G01N21/00
CPC分类号： G01N21/8903
摘要： An array light source 1 with semiconductor laser sources disposed one-dimensionally and a projective lens 2 are used to illuminate an inspected object so that light beams projected from the array light source form a dotted line on the object. A line sensor is used to receive through an objective lens 3 light emitted from an imaging area 11 away from an illuminated area 12. An image signal, fed to an image processing unit 8 through a pre-processing unit 7 producing an image from signals from the line sensor 4 and a stage 5 is processed, while the stage 5 bearing the object 6 is being gradually moved, to inspect the object 6 for crack defects 9 and 10 by detecting an optically nonhomogeneous portion of the object. The method allows a crack defect of an object, such as a ceramic substrate or a sintered metal product, to be detected fast with high accuracy.
摘要翻译：使用具有一维设置的半导体激光源的阵列光源1和投射透镜2来照射被检查物体，使得从阵列光源投射的光束在物体上形成虚线。线传感器用于通过物镜3接收从成像区域11发出的远离照明区域12的光。图像信号，通过预处理单元7馈送到图像处理单元8，从预处理单元7产生来自在承载物体6的台架5正在逐渐移动的同时，对线传感器4和台5进行处理，通过检测物体的光学非均匀部分来检查物体6的裂纹缺陷9和10。该方法允许以高精度快速检测诸如陶瓷基板或烧结金属产品的物体的裂纹缺陷。

8. 发明授权

US5754341A Phase grating, its fabricating method, optical encoder, motor using the optical encoder, and robot using the motor 失效
标题翻译：相位光栅，其制造方法，光学编码器，使用光学编码器的电动机和使用电动机的机器人
公开(公告)号：US5754341A
公开(公告)日：1998-05-19
申请号：US661154
申请日：1996-06-10
申请人： Kazumasa Takata , Kanji Nishii , Kenji Takamoto , Masami Ito , Atsushi Fukui
发明人： Kazumasa Takata , Kanji Nishii , Kenji Takamoto , Masami Ito , Atsushi Fukui
IPC分类号： G01D5/38 , G02B5/18 , G02B27/46
CPC分类号： G02B5/1871 , G02B27/46 , Y10S359/90
摘要： A phase grating has a concave part of rectangular shape type substantially, of which grating depth is deeper in a specific range than depth d' calculated in a formula .vertline.n-n.sub.0 .vertline..times.(p-d'/e)/p.times.d'=(.lambda./2).times.(1+2m) (where m=0, .+-.1, .+-.2, . . . ) in terms of center wavelength .lambda. of light having partial interference to be diffracted by the phase grating, pitch length p of the phase grating, refractive index n of base material of the phase grating, refractive index n.sub.0 of medium surrounding the phase grating, and shape ratio e as the ratio of grating depth to width of slope of the concave part.
摘要翻译：相位光栅具有基本上为矩形形状类型的凹部，光栅深度在与公式| n-n0 | x（p-d'/ e）/ pxd'=（ λ/ 2）x（1 + 2m）（其中m = 0，+/- 1，+/- 2，...）就具有待被相位光栅衍射的部分干涉的光的中心波长λ 相位光栅的长度p，相位光栅的基材的折射率n，围绕相位光栅的介质的折射率n0，以及作为凹部的光栅深度与斜率宽度的比率的形状比e。

9. 发明授权

US5696373A Optical encoder with dual diffraction grating 失效
$Optical encoder with dual diffraction grating$
标题翻译：具有双衍射光栅的光学编码器
公开(公告)号：US5696373A
公开(公告)日：1997-12-09
申请号：US711513
申请日：1996-09-10
申请人： Atsushi Fukui , Kanji Nishii , Kenji Takamoto , Masami Ito
发明人： Atsushi Fukui , Kanji Nishii , Kenji Takamoto , Masami Ito
IPC分类号： G01B11/00 , G01D5/38 , G02B5/18 , G02B27/42 , G03F9/00 , H01J3/14
CPC分类号： G03F9/70 , G01D5/38
摘要： An optical encoder including a light source and a first grating plate having a first diffraction grating for diffracting a light beam emitted from the light source. The optical encoder further includes a second grating plate having a second diffraction grating including a blazed diffraction grating for further diffracting the light beam diffracted by the first diffraction grating so as to allow the light beam to be incident on the first grating plate. The optical encoder also includes a light-receiving portion for receiving the light beam reentering the first grating plate and diffracted by the first grating plate. The second diffraction grating is designed so that the greater part of the diffracted light is concentrated in diffracted light beam of a predetermined order among the light beams from the first diffraction grating, and the diffracted light beam of the predetermined order travels from the second diffraction grating in a direction which is parallel with a direction in which the light beam is incident on the second diffraction grating from the first grating plate. The light-receiving portion generates an electric signal in accordance with an amount of plus and minus mth-order diffracted light beams of the further diffracted light beam.
摘要翻译：一种光学编码器，包括光源和具有用于衍射从光源发射的光束的第一衍射光栅的第一光栅板。光学编码器还包括具有第二衍射光栅的第二光栅板，第二衍射光栅包括闪耀的衍射光栅，用于进一步衍射由第一衍射光栅衍射的光束，以允许光束入射在第一光栅板上。光学编码器还包括用于接收重新进入第一光栅板并被第一光栅板衍射的光束的光接收部分。第二衍射光栅被设计成使得衍射光的大部分集中在来自第一衍射光栅的光束之间的预定次数的衍射光束中，并且预定次数的衍射光束从第二衍射光栅行进在与第一光栅板上的光束入射到第二衍射光栅上的方向平行的方向上。光接收部分根据进一步的衍射光束的正和负的第m级衍射光束的量产生电信号。

10. 发明授权

US5699153A Method and apparatus for optical inspection 失效
标题翻译：光学检测方法和装置
公开(公告)号：US5699153A
公开(公告)日：1997-12-16
申请号：US550682
申请日：1995-10-31
申请人： Kenji Takamoto , Kanji Nishii , Masami Ito , Atsushi Fukui
发明人： Kenji Takamoto , Kanji Nishii , Masami Ito , Atsushi Fukui
IPC分类号： G01B11/00 , G01N21/88 , G01N21/896 , G01N21/952 , G01N21/958
CPC分类号： G01N21/4795 , G01N21/88 , G01N2021/4735
摘要： The present invention provides an inspecting method and an apparatus therefor. A light illuminates an object to be inspected having optical diffusive characteristics such as a ceramics plate. A part of the light diffuses in the object from an illumination area is reflected at or passes through a defect such as a crack and reaches an imaging area. An image sensor detects the image of the imaging area. A signal showing a larger change is processed thereby to inspect the defect. The object is displaced stepwise relative to the light source and the image sensor. Thus, a crack or the like in an object can be inspected with high accuracy and at a high speed.
摘要翻译：本发明提供一种检查方法及其装置。光照射具有诸如陶瓷板的光漫射特性的待检查物体。来自照明区域的物体中的光的一部分被反射或穿过诸如裂纹的缺陷，并到达成像区域。图像传感器检测成像区域的图像。处理显示较大变化的信号，从而检查缺陷。物体相对于光源和图像传感器逐步移位。因此，可以高精度和高速度地检查物体中的裂纹等。

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