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    • 2. 发明申请
    • METHOD FOR MANUFACTURING A MAGNETIC SENSOR HAVING A FLAT UPPER SHIELD
    • 用于制造具有平坦上层屏蔽的磁传感器的方法
    • US20120187079A1
    • 2012-07-26
    • US13010908
    • 2011-01-21
    • Hideki MashimaNobuo Yoshida
    • Hideki MashimaNobuo Yoshida
    • G11B5/127C23F1/00
    • G11B5/398G01R33/098G11B5/3163G11B5/3912G11B5/3932
    • A method for manufacturing a magnetic sensor that has a flat upper shield. A sensor stack is formed with a sensor capping layer at its top and a first CMP stop layer over the sensor capping layer and a mask formed over the CMP stop layer. A hard bias layer and second CMP stop layer are deposited over the sensor stack, capping layer, first CMP stop layer and mask. A chemical mechanical polishing process is then performed to remove the mask, leaving a portion of the hard bias layer exposed between the first and second CMP stop layers. An ion milling is then performed to etch back the exposed portions of the hard magnetic bias layer. A reactive ion etching is then performed to remove the remaining first and second CMP top layers. An upper shield can then be formed on a substantially flat surface.
    • 一种制造具有平坦的上屏蔽的磁传感器的方法。 传感器堆叠在其顶部形成有传感器覆盖层,并且在传感器覆盖层上方形成第一CMP停止层,并且在CMP停止层上形成掩模。 在传感器堆叠,封盖层,第一CMP停止层和掩​​模上沉积硬偏压层和第二CMP停止层。 然后执行化学机械抛光工艺以去除掩模,使得一部分硬偏压层暴露在第一和第二CMP停止层之间。 然后进行离子铣削以蚀刻硬磁偏置层的暴露部分。 然后执行反应离子蚀刻以去除剩余的第一和第二CMP顶层。 然后可以在基本平坦的表面上形成上屏蔽。