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1. 发明授权

US07358546B2 Heterobipolar transistor and method of fabricating the same 有权
标题翻译：异相晶体管及其制造方法
公开(公告)号：US07358546B2
公开(公告)日：2008-04-15
申请号：US11445240
申请日：2006-06-02
申请人： Hidekazu Sato , Takae Sukegawa , Kousuke Suzuki
发明人： Hidekazu Sato , Takae Sukegawa , Kousuke Suzuki
IPC分类号： H01L29/06
CPC分类号： H01L29/66242 , H01L29/1004 , H01L29/1608 , H01L29/7378
摘要： The present invention realizes a heterobipolar transistor using a SiGeC base layer in order to improve its electric characteristics. Specifically, the distribution of carbon and boron within the base layer is controlled so that the concentration of boron is higher than the concentration of carbon on the side bordering on the emitter layer, and upon the formation of the emitter layer, both boron and carbon are dispersed into a portion of the emitter layer that comes into contact with the base layer.
摘要翻译：本发明实现了使用SiGeC基层的异双极晶体管，以改善其电特性。具体地说，控制基底层内的碳和硼的分布，使得硼的浓度高于与发射极层相邻的一侧的碳浓度，并且在形成发射极层时，硼和碳都是分散到与基底层接触的发射极层的一部分。

2. 发明授权

US07119382B2 Heterobipolar transistor and method of fabricating the same 有权
公开(公告)号：US07119382B2
公开(公告)日：2006-10-10
申请号：US10413394
申请日：2003-04-15
申请人： Hidekazu Sato , Takae Sukegawa , Kousuke Suzuki
发明人： Hidekazu Sato , Takae Sukegawa , Kousuke Suzuki
IPC分类号： H01L31/0328 , H01L29/06
CPC分类号： H01L29/66242 , H01L29/1004 , H01L29/1608 , H01L29/7378
摘要： The present invention realizes a heterobipolar transistor using a SiGeC base layer in order to improve its electric characteristics. Specifically, the distribution of carbon and boron within the base layer is controlled so that the concentration of boron is higher than the concentration of carbon on the side bordering on the emitter layer, and upon the formation of the emitter layer, both boron and carbon are dispersed into a portion of the emitter layer that comes into contact with the base layer.

3. 发明申请

US20070181910A1 Heterobipolar transistor and method of fabricating the same 有权
标题翻译：异相晶体管及其制造方法
公开(公告)号：US20070181910A1
公开(公告)日：2007-08-09
申请号：US11445240
申请日：2006-06-02
申请人： Hidekazu Sato , Takae Sukegawa , Kousuke Suzuki
发明人： Hidekazu Sato , Takae Sukegawa , Kousuke Suzuki
IPC分类号： H01L31/00
CPC分类号： H01L29/66242 , H01L29/1004 , H01L29/1608 , H01L29/7378
摘要： The present invention realizes a heterobipolar transistor using a SiGeC base layer in order to improve its electric characteristics. Specifically, the distribution of carbon and boron within the base layer is controlled so that the concentration of boron is higher than the concentration of carbon on the side bordering on the emitter layer, and upon the formation of the emitter layer, both boron and carbon are dispersed into a portion of the emitter layer that comes into contact with the base layer.
摘要翻译：本发明实现了使用SiGeC基层的异双极晶体管，以改善其电特性。具体地说，控制基底层内的碳和硼的分布，使得硼的浓度高于与发射极层相邻的一侧的碳浓度，并且在形成发射极层时，硼和碳都是分散到与基底层接触的发射极层的一部分。

4. 发明授权

US11079700B2 Image forming apparatus and image forming method 有权
公开(公告)号：US11079700B2
公开(公告)日：2021-08-03
申请号：US16811483
申请日：2020-03-06
申请人： Keiji Makabe , Tsuneyasu Nagatomo , Kohsuke Satoh , Daichi Hisakuni , Kousuke Suzuki , Shintaro Akiyama
发明人： Keiji Makabe , Tsuneyasu Nagatomo , Kohsuke Satoh , Daichi Hisakuni , Kousuke Suzuki , Shintaro Akiyama
IPC分类号： G03G9/00 , G03G15/08 , G03G9/08 , G03G9/087 , G03G9/097
摘要： An image forming apparatus is provided that includes: an image bearer; a charger; an irradiator; a developing device containing a toner; and a transfer device. The image bearer has a Martens hardness of from 185 to 250 N/m2. The toner satisfies a relation 0.13≤X/Dn≤0.16, where X [μm] represents an average value of an amount of deformation of the toner by micro-indentation at when a load reaches 3.00×10−4 N at a loading rate of 3.0×10−5 N/sec under an environment of 32 degrees C. and 40% RH, and Dn [μm] represents a number average particle diameter of the toner. The toner contains an external additive comprising silica particles and particles composed mainly of strontium titanate. The particles composed mainly of strontium titanate further contain a third element M selected from the group consisting of La, Mg, Ca, Sn, and Si.

5. 发明授权

US08647804B2 Method of preparing carrier for electrophotography, carrier for electrophotography, developer for electrophotography, process cartridge and image forming apparatus 有权
标题翻译：制备电子照相用载体，电子照相用载体，电子照相用显影剂，处理盒和成像装置的方法
公开(公告)号：US08647804B2
公开(公告)日：2014-02-11
申请号：US13483494
申请日：2012-05-30
申请人： Yuuki Mizutani , Shinichiro Yagi , Kousuke Suzuki , Masato Taikoji
发明人： Yuuki Mizutani , Shinichiro Yagi , Kousuke Suzuki , Masato Taikoji
IPC分类号： G03G5/00 , G03G9/00
CPC分类号： G03G9/1131 , G03G9/1132
摘要： A method of preparing carrier for electrophotography, which includes a core material and a coating material layer formed on the surface of the core material, including coating a coating material of the coating material layer on the core material; and burning the coating material by an induction heater, wherein the induction heater applies an alternative current to parallely-located plural coil circuits including a conductive wire including the shape of a coil to generate a magnetic line changing its direction and intensity for inductively heating the core material to heat the coating material.
摘要翻译：一种制备电子照相载体的方法，其包括在芯材表面上形成的芯材和涂层材料层，包括在芯材上涂覆涂层材料层的涂层材料; 并且通过感应加热器燃烧涂层材料，其中感应加热器向平行放置的多个线圈电路施加替代电流，所述多个线圈电路包括包括线圈形状的导线，以产生改变其方向和强度的磁线，用于感应加热芯材料加热涂料。

6. 发明授权

US08253924B2 Exposure method, exposure apparatus and device manufacturing method 有权
标题翻译：曝光方法，曝光装置和装置制造方法
公开(公告)号：US08253924B2
公开(公告)日：2012-08-28
申请号：US11919669
申请日：2006-05-23
申请人： Yusaku Uehara , Kousuke Suzuki , Katsushi Nakano , Yasuhiro Omura
发明人： Yusaku Uehara , Kousuke Suzuki , Katsushi Nakano , Yasuhiro Omura
IPC分类号： G03B27/32 , G03B27/42 , G03B27/54
CPC分类号： G03F7/70341 , G03F7/70258 , G03F7/705 , G03F7/70558
摘要： An exposure apparatus is provided with an optical system including a liquid, a sensor system for acquiring energy information of an energy beam which is incident on the liquid, and a controller which predicts variation of optical properties of the optical system including the liquid due to energy absorption of the liquid based on the energy information acquired using the sensor system and controls exposure operation with respect to an object based on the prediction results. According to the exposure apparatus, exposure operation without being influenced by the variation of the optical properties of the optical system including the liquid due to the energy absorption of the liquid becomes possible.
摘要翻译：曝光装置设置有包括液体的光学系统，用于获取入射在液体上的能量束的能量信息的传感器系统，以及控制器，其预测由于能量而包括液体的光学系统的光学特性的变化基于使用传感器系统获取的能量信息来吸收液体，并且基于预测结果控制相对于物体的曝光操作。根据曝光装置，不会受到由液体的能量吸收引起的包括液体的光学系统的光学特性的变化的影响的曝光操作成为可能。

7. 发明授权

US07553598B2 Electrophotographic carrier, developer, developer container, process cartridge, image forming apparatus and image forming method 有权
标题翻译：电子照相载体，显影剂，显影剂容器，处理盒，成像装置和图像形成方法
公开(公告)号：US07553598B2
公开(公告)日：2009-06-30
申请号：US11378424
申请日：2006-03-20
申请人： Kousuke Suzuki , Tomio Kondoh , Shinichiro Yagi , Hitoshi Iwatsuki
发明人： Kousuke Suzuki , Tomio Kondoh , Shinichiro Yagi , Hitoshi Iwatsuki
IPC分类号： G03G9/113
CPC分类号： G03G9/1139 , G03G9/10 , G03G9/1138
摘要： A carrier contains a core; and a cover layer located overlying the core, wherein the cover layer comprises a binder resin, a first particulate material and a second particulate material, wherein the following relationships are satisfied: 1
摘要翻译：载体包含核心; 覆盖层位于芯的上方，其中覆盖层包括粘合剂树脂，第一颗粒材料和第二颗粒材料，其中满足以下关系：1 <（D1 / h）<10和0.001 <（D2 / h）<1，其中D1（mum）表示第一颗粒材料的体积平均粒径，D2（母体）表示第二颗粒材料的体积平均粒径，h（mum）表示覆盖物的厚度层，并且其中所述第二颗粒材料具有不大于1.0×10 12Ω·cm的体积电阻率。

8. 发明申请

US20070291243A1 Exposure apparatus, exposure method, and device manufacturing method 有权
标题翻译：曝光装置，曝光方法和装置制造方法
公开(公告)号：US20070291243A1
公开(公告)日：2007-12-20
申请号：US11785715
申请日：2007-04-19
申请人： Kousuke Suzuki
发明人： Kousuke Suzuki
IPC分类号： G03B27/52
CPC分类号： G03F7/70875 , G03F7/70225 , G03F7/70258 , G03F7/70783
摘要： An exposure apparatus includes a projection optical system, which projects a pattern of a mask onto a prescribed exposure area on a substrate at a prescribed projection magnification. The optical axis center of the projection optical system is set to a position different from that of the center of the projection area onto which the pattern is projected. The exposure apparatus further includes a magnification modification device, which modifies the projection magnification of the projection optical system; a calculation device, which calculates a shift length of the center of the projection area associated with modification of the projection magnification; and a correction device, which corrects the position information of the exposure area based on the shift length of the center of the projection area.
摘要翻译：曝光装置包括投影光学系统，其以规定的投影倍率将掩模的图案投影到基板上的规定的曝光区域上。将投影光学系统的光轴中心设定为与投影图案的投影区域的中心不同的位置。所述曝光装置还具备能够改变所述投影光学系统的投影倍率的倍率变更装置，计算装置，其计算与投影倍率的修改相关联的投影区域的中心的移动长度; 以及校正装置，其基于投影区域的中心的移动长度校正曝光区域的位置信息。

9. 发明授权

US07230682B2 Image forming state adjusting system, exposure method and exposure apparatus, and program and information storage medium 有权
标题翻译：图像形成状态调整系统，曝光方法和曝光装置以及程序和信息存储介质
公开(公告)号：US07230682B2
公开(公告)日：2007-06-12
申请号：US10901209
申请日：2004-07-29
申请人： Yasuo Shimizu , Shigeru Hirukawa , Kousuke Suzuki , Tomoyuki Matsuyama
发明人： Yasuo Shimizu , Shigeru Hirukawa , Kousuke Suzuki , Tomoyuki Matsuyama
IPC分类号： G03B27/32 , G03B27/68
CPC分类号： G03B21/18 , G03B27/42 , G03F7/70258 , G03F7/705 , G03F7/70508 , G03F7/70525 , G03F7/706
摘要： An exposure method of forming pattern on object via projection optical system, including deciding optimal adjustment amount of adjustment device which adjusts image forming property of the projection optical system to optimize the image forming property under pattern to be formed and exposure condition of the pattern, based on information related to wavefront aberration of the projection optical system, Zernike Sensitivity Chart corresponding to the pattern and the exposure condition, wavefront aberration variation table that denotes relation between adjustment amount of the adjustment device and change in coefficients of terms in the Zernike polynomial, and restraint condition with respect to the adjustment amount of the adjustment device, and exposing the pattern on the object under the exposure condition via the projection optical system of which the image forming property is adjusted by the adjustment device based on the decided optimal adjustment amount.
摘要翻译：一种通过投影光学系统在物体上形成图案的曝光方法，包括确定调整投影光学系统的图像形成特性的调整装置的最佳调节量，以优化待形成的图案下的图像形成特性和图案的曝光条件关于与投影光学系统的波前像差相关的信息，对应于图案和曝光条件的Zernike感光度图，表示调节装置的调整量与Zernike多项式中的项的系数的变化之间的关系的波前像差变化表，以及基于调整装置的调整量，通过调整装置调整图像形成特性的投影光学系统，根据所确定的最佳调整量，在曝光条件下将图案曝光在物体上。

10. 发明申请

US20060251982A1 Carrier, developer, developer container, image forming method and process cartridge 有权
公开(公告)号：US20060251982A1
公开(公告)日：2006-11-09
申请号：US11398662
申请日：2006-04-06
申请人： Hitoshi Iwatsuki , Tomio Kondou , Shinichiro Yagi , Kousuke Suzuki
发明人： Hitoshi Iwatsuki , Tomio Kondou , Shinichiro Yagi , Kousuke Suzuki
IPC分类号： G03G9/10
CPC分类号： G03G9/1131 , G03G9/1075 , G03G9/1133 , G03G9/1136 , G03G9/1139
摘要： A carrier contains a core material; and a coated film containing a binder resin, and a particulate material, the coated film covering the core material, wherein a ratio (D/h) of an average particle diameter (D) of the particulate material to an average thickness (h) of the coated film is from 0.01 to 1, and wherein the carrier has concavities and convexities on the surface of the carrier, the concavities and convexities having a difference of elevation of from 0.05 to 2.0 μm.

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