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1. 发明授权

US06858549B2 Method for forming wiring structure 失效
标题翻译：形成布线结构的方法
公开(公告)号：US06858549B2
公开(公告)日：2005-02-22
申请号：US10328178
申请日：2002-12-26
申请人： Masashi Hamanaka , Takeshi Harada , Hideaki Yoshida , Tetsuya Ueda
发明人： Masashi Hamanaka , Takeshi Harada , Hideaki Yoshida , Tetsuya Ueda
IPC分类号： H01L21/02 , H01L21/3105 , H01L21/321 , H01L21/768 , H01L21/4763
CPC分类号： H01L21/76832 , H01L21/02074 , H01L21/31053 , H01L21/3212 , H01L21/76801 , H01L21/76807 , H01L21/7684 , Y10S438/906
摘要： After a plurality of grooves are formed in an insulating film and in an antireflection film on the insulating film, a barrier metal film and a conductive film are deposited on the anti-reflection film such that each of the grooves is filled. Subsequently, the portions of the conductive film outside the grooves are removed by a first polishing step and then the portions of the barrier metal film outside the grooves are removed by polishing. Thereafter, foreign matter adhered to the surface of the anti-reflection film is removed and a third polishing step is conducted on the surface of the anti-reflection film using an abrasive agent of the same type as used in the first polishing step of the conductive film.
摘要翻译：在绝缘膜和绝缘膜上的防反射膜中形成多个沟槽之后，在抗反射膜上沉积阻挡金属膜和导电膜，使得每个沟槽被填充。随后，通过第一抛光步骤去除沟槽外部的导电膜的部分，然后通过抛光去除凹槽外部的阻挡金属膜的部分。此后，去除附着在防反射膜表面上的异物，并且使用与导电的第一抛光步骤中使用的相同类型的研磨剂在抗反射膜的表面上进行第三抛光步骤电影。

2. 发明授权

US06881660B2 Method for forming wiring structure 有权
标题翻译：形成布线结构的方法
公开(公告)号：US06881660B2
公开(公告)日：2005-04-19
申请号：US10328170
申请日：2002-12-26
申请人： Takeshi Harada , Hideaki Yoshida , Tetsuya Ueda , Masashi Hamanaka
发明人： Takeshi Harada , Hideaki Yoshida , Tetsuya Ueda , Masashi Hamanaka
IPC分类号： H01L21/02 , H01L21/3105 , H01L21/321 , H01L21/768 , H01L23/522 , H01L23/532 , H01L21/4763
CPC分类号： H01L23/53238 , H01L21/02074 , H01L21/31053 , H01L21/3212 , H01L21/7684 , H01L23/5226 , H01L2924/0002 , H01L2924/00
摘要： After a plurality of grooves are formed in an insulating film, a barrier metal film and a conductive film are deposited successively on the insulating film such that each of the grooves is filled completely therewith. Subsequently, the portions of the conductive film outside the grooves are removed by polishing and then the portions of the barrier metal film outside the grooves are removed by polishing. Thereafter, a foreign matter adhered to the surface to be polished during polishing is removed and then a surface of the insulating film is polished.
摘要翻译：在绝缘膜中形成多个沟槽之后，在绝缘膜上依次沉积阻挡金属膜和导电膜，使得每个槽完全填充。随后，通过研磨去除沟槽外部的导电膜的部分，然后通过抛光除去槽外部的阻挡金属膜的部分。此后，除去在抛光期间附着于抛光表面的异物，然后抛光绝缘膜的表面。

3. 发明授权

US06919267B2 Method for forming wiring structure 失效
标题翻译：形成布线结构的方法
公开(公告)号：US06919267B2
公开(公告)日：2005-07-19
申请号：US10328175
申请日：2002-12-26
申请人： Tetsuya Ueda , Masashi Hamanaka , Takeshi Harada , Hideaki Yoshida
发明人： Tetsuya Ueda , Masashi Hamanaka , Takeshi Harada , Hideaki Yoshida
IPC分类号： H01L21/02 , H01L21/3105 , H01L21/321 , H01L21/768 , H01L21/4763
CPC分类号： H01L21/7684 , H01L21/02074 , H01L21/31053 , H01L21/3212
摘要： After a plurality of grooves are formed in an insulating film and in an anti-reflection film on the insulating film, a barrier metal film and a conductive film are deposited on the anti-reflection film such that each of the grooves is filled therewith. Subsequently, the portions of the conductive film outside the grooves are removed by polishing and then the portions of the barrier metal film outside the grooves are removed by polishing. Thereafter, respective foreign matters adhered to a polishing pad and to a surface to be polished during polishing are removed and then a surface of the anti-reflection film is polished.
摘要翻译：在绝缘膜和绝缘膜上的防反射膜中形成多个沟槽之后，在防反射膜上沉积阻挡金属膜和导电膜，使得每个槽被填充。随后，通过研磨去除沟槽外部的导电膜的部分，然后通过抛光除去槽外部的阻挡金属膜的部分。此后，除去在抛光时附着于抛光垫和抛光表面的各异物，然后抛光防反射膜的表面。

4. 发明授权

US06759322B2 Method for forming wiring structure 有权
标题翻译：形成布线结构的方法
公开(公告)号：US06759322B2
公开(公告)日：2004-07-06
申请号：US10328171
申请日：2002-12-26
申请人： Hideaki Yoshida , Tetsuya Ueda , Masashi Hamanaka , Takeshi Harada
发明人： Hideaki Yoshida , Tetsuya Ueda , Masashi Hamanaka , Takeshi Harada
IPC分类号： H01L214763
CPC分类号： H01L21/76832 , H01L21/02074 , H01L21/31053 , H01L21/31144 , H01L21/3212 , H01L21/76807 , H01L21/7684 , Y10S438/906 , Y10S438/952 , Y10S438/959
摘要： After a plurality of grooves are formed in an insulating film and in an anti-reflection film on the insulating film, a barrier metal film and a conductive film are deposited on the anti-reflection film such that each of the wiring grooves is filled therewith. Subsequently, the portions of the conductive film outside the grooves are removed by polishing and then the portions of the barrier metal film outside the wiring are removed by polishing. Thereafter, a foreign matter adhered to a surface to be polished during polishing is removed and then a surface of the anti-reflection film is polished.
摘要翻译：在绝缘膜和绝缘膜上的抗反射膜中形成多个沟槽之后，在防反射膜上沉积阻挡金属膜和导电膜，使得每个布线槽被填充。随后，通过研磨去除沟槽外部的导电膜的部分，然后通过抛光除去布线外部的阻挡金属膜的部分。此后，除去在抛光期间附着于抛光表面的异物，然后抛光抗反射膜的表面。

5. 发明授权

US06191038B1 Apparatus and method for chemical/mechanical polishing 失效
标题翻译：化学/机械抛光的装置和方法
公开(公告)号：US06191038B1
公开(公告)日：2001-02-20
申请号：US09145126
申请日：1998-09-01
申请人： Hideaki Yoshida , Masashi Hamanaka
发明人： Hideaki Yoshida , Masashi Hamanaka
IPC分类号： H01L21302
CPC分类号： B24B53/017 , B24B37/04 , B24B49/16 , H01L21/30625
摘要： A polishing pad is fixed on a polishing platen mounted to be rotatable. An abrasive supply tube supplies an abrasive onto the polishing pad. A substrate holder is mounted to be rotatable above the polishing pad, holds a substrate to be polished and presses the substrate against the polishing pad, thereby polishing the substrate. A dresser is mounted to be rotatable above the polishing pad, and dresses the polishing pad. A torque detector detects the rotation torque of the polishing platen or the rotation torque of the substrate holder. A dresser controller makes the dresser dress the polishing pad if the rotation torque detected by the torque detector is equal to or smaller than a predetermined value.
摘要翻译：抛光垫固定在安装成可旋转的抛光台上。磨料供应管将磨料供应到抛光垫上。衬底保持器安装成能够在抛光垫上方旋转，保持要抛光的衬底并将衬底压靠在抛光垫上，从而抛光衬底。修整器被安装成可以在抛光垫上方旋转，并且打磨抛光垫。扭矩检测器检测研磨台板的旋转扭矩或基板保持器的旋转扭矩。如果由转矩检测器检测到的转动转矩等于或小于预定值，则修整器控制器使修整器穿着抛光垫。

6. 发明授权

US06737348B2 Method for forming buried interconnect 有权
标题翻译：掩埋互连的形成方法
公开(公告)号：US06737348B2
公开(公告)日：2004-05-18
申请号：US10120385
申请日：2002-04-12
申请人： Mitsunari Satake , Masashi Hamanaka , Hideaki Yoshida
发明人： Mitsunari Satake , Masashi Hamanaka , Hideaki Yoshida
IPC分类号： H01L21461
CPC分类号： H01L21/7684 , H01L21/31053 , H01L21/3212 , H01L21/76819
摘要： Holes are formed in a first insulating film deposited on a substrate. After depositing a first conducting film over the first insulating film including the holes, the first conducting film is subjected to first CMP, so as to form plugs from the first conducting film. Next, the first insulating film is subjected to second CMP with a polishing rate of the first insulating film higher than a polishing rate of the first conducting film, so as to planarize the first insulating film by eliminating erosion caused in a region of the first insulating film where the plugs are densely formed. After depositing a second insulating film on the planarized first insulating film, interconnect grooves are formed in the second insulating film. After depositing a second conducting film over the second insulating film including the interconnect grooves, the second conducting film is subjected to third CMP, so as to form buried interconnects from the second conducting film.
摘要翻译：在沉积在基板上的第一绝缘膜中形成孔。在包括孔的第一绝缘膜上沉积第一导电膜之后，对第一导电膜进行第一CMP，以形成来自第一导电膜的插塞。接下来，对第一绝缘膜进行第二CMP，其中第一绝缘膜的抛光速率高于第一导电膜的抛光速率，以便通过消除在第一绝缘膜的区域中引起的侵蚀而使第一绝缘膜平坦化胶片密集地形成。在平坦化的第一绝缘膜上沉积第二绝缘膜之后，在第二绝缘膜中形成互连槽。在包括互连槽的第二绝缘膜上沉积第二导电膜之后，对第二导电膜进行第三CMP，以形成来自第二导电膜的掩埋互连。

7. 发明授权

US06416617B2 Apparatus and method for chemical/mechanical polishing 失效
标题翻译：化学/机械抛光的装置和方法
公开(公告)号：US06416617B2
公开(公告)日：2002-07-09
申请号：US09725844
申请日：2000-11-30
申请人： Hideaki Yoshida , Masashi Hamanaka
发明人： Hideaki Yoshida , Masashi Hamanaka
IPC分类号： B24B4900
CPC分类号： B24B53/017 , B24B37/04 , B24B49/16 , H01L21/30625
摘要： A polishing pad is fixed on a polishing platen mounted to be rotatable. An abrasive supply tube supplies an abrasive onto the polishing pad. A substrate holder is mounted to be rotatable above the polishing pad, holds a substrate to be polished and presses the substrate against the polishing pad, thereby polishing the substrate. A dresser is mounted to be rotatable above the polishing pad, and dresses the polishing pad. A torque detector detects the rotation torque of the polishing platen or the rotation torque of the substrate holder. A dresser controller makes the dresser dress the polishing pad if the rotation torque detected by the torque detector is equal to or smaller than a predetermined value.
摘要翻译：抛光垫固定在安装成可旋转的抛光台上。磨料供应管将磨料供应到抛光垫上。衬底保持器安装成能够在抛光垫上方旋转，保持要抛光的衬底并将衬底压靠在抛光垫上，从而抛光衬底。修整器被安装成可以在抛光垫上方旋转，并且打磨抛光垫。扭矩检测器检测研磨台板的旋转扭矩或基板保持器的旋转扭矩。如果由转矩检测器检测到的转动转矩等于或小于预定值，则修整器控制器使修整器穿着抛光垫。

8. 发明授权

US08716451B2 Stabilized human IgG2 and IgG3 antibodies 有权
标题翻译：稳定的人IgG2和IgG3抗体
公开(公告)号：US08716451B2
公开(公告)日：2014-05-06
申请号：US11794950
申请日：2006-01-12
申请人： Nobuaki Takahashi , Hideaki Yoshida
发明人： Nobuaki Takahashi , Hideaki Yoshida
IPC分类号： C07K16/00 , C12N15/00
CPC分类号： C07K16/00 , C07K16/2878 , C07K2317/21 , C07K2317/52 , C07K2317/56 , C07K2317/94
摘要： It is intended to provide highly stable variants of human antibody IgG2 and IgG3 subclasses. The present invention provides an IgG heavy chain comprising the constant region of a human IgG2 heavy chain having at least a substitution of Y for F at the 300th position, L for V at the 309th position, or A for T at the 339th position designated by the EU index of Kabat et al. and an IgG heavy chain comprising the constant region of a human IgG3 heavy chain having at least a substitution of K for N at the 392nd position or V for M at the 397th position designated by the EU index of Kabat et al. The present invention also provides monoclonal antibodies comprising these heavy chains.
摘要翻译：旨在提供人抗体IgG2和IgG3亚类的高度稳定的变体。本发明提供一种IgG重链，其包含人IgG2重链的恒定区，其在第300位具有至少取代F的F，在第309位具有至少取代F的L，在第309位具有至少取代F的第三十九位，欧盟指数Kabat等和IgG重链，其包含人类IgG3重链的恒定区，在Kabat等人的EU指数指定的第397位具有至少在第392位具有K取代为N或V代表M。本发明还提供了包含这些重链的单克隆抗体。

9. 发明申请

US20130053547A1 AGONIST ANTIBODY TO HUMAN THROMBOPOIETIN RECEPTOR 审中-公开
标题翻译：人类抗抑郁药受体的激素抗体
公开(公告)号：US20130053547A1
公开(公告)日：2013-02-28
申请号：US13543183
申请日：2012-07-06
申请人： Masayuki KAI , Kazuhiro Motoki , Shiro Kataoka , Hideaki Yoshida , Tetsuya Hagiwara
发明人： Masayuki KAI , Kazuhiro Motoki , Shiro Kataoka , Hideaki Yoshida , Tetsuya Hagiwara
IPC分类号： C07K16/00
CPC分类号： C07K16/2866 , A61K2039/505 , C07K14/524 , C07K14/715 , C07K2317/21 , C07K2317/52 , C07K2317/56 , C07K2317/72 , C07K2317/74 , Y10S424/801 , Y10S424/809
摘要： This invention provides an agonist antibody to a human thrombopoietin receptor (human c-Mpl), and pharmaceutical compositions comprising the same for use in treatment of thrombocytopenia. The disclosed agonist antibody comprises (1) antibody constant regions comprising heavy and light chain constant regions, each of which may optionally contain domain substitutions, or may contain deletions, substitutions, additions, or insertions of amino acid residues, and (2) antibody variable regions capable of binding to and activating a human thrombopoietin receptor. The-agonist antibody further induces colony formation at a concentration of 10,000 ng/ml or lower, and has a maximal activity at least 50% higher than that of PEG-rHuMGDF and an 50% effective concentration (EC50) of 100 nM or less.
摘要翻译：本发明提供了对人类血小板生成素受体（人c-Mpl）的激动剂抗体，以及包含其用于治疗血小板减少症的药物组合物。所公开的激动剂抗体包含（1）包含重链和轻链恒定区的抗体恒定区，每个区可任选地含有结构域取代，或可含有氨基酸残基的缺失，替换，添加或插入，和（2）抗体可变能够结合并激活人血小板生成素受体的区域。激动剂抗体进一步诱导浓度为10,000ng / ml或更低的集落形成，并且具有比PEG-rHuMGDF高至少50％的最大活性和100nM或更低的50％有效浓度（EC 50）。

10. 发明申请

US20120330169A1 BLOOD PRESSURE INFORMATION MEASUREMENT DEVICE CUFF AND BLOOD PRESSURE INFORMATION MEASUREMENT DEVICE PROVIDED THEREWITH 有权
标题翻译：血液压力信息测量装置和血液压力信息测量装置
公开(公告)号：US20120330169A1
公开(公告)日：2012-12-27
申请号：US13538371
申请日：2012-06-29
申请人： Yoshihiko Sano , Hideaki Yoshida , Minoru Taniguchi
发明人： Yoshihiko Sano , Hideaki Yoshida , Minoru Taniguchi
IPC分类号： A61B5/022
CPC分类号： A61B5/02233 , A61B5/02141
摘要： In a blood pressure information measurement device cuff, a first flexion point and a second flexion point at which a curvature radius changes are provided in a curler, and a straight line-shaped connection portion is provided between the first flexion point and the second flexion point so as to be located inside a curve formed by extending a first curved portion and a second curved portion that are located at the ends of the curler at the first flexion point and the second flexion point, according to the respective curvatures. Through this, it is possible to provide a blood pressure information measurement device cuff, and a blood pressure information measurement device provided with such a cuff, that can reduce error in a blood pressure measurement by reducing errors in changes in the volume of a fluid bladder.
摘要翻译：在血压信息测量装置袖带中，在卷曲器中设置曲率半径变化的第一屈曲点和第二屈曲点，并且在第一屈曲点和第二屈曲点之间设置直线状连接部以便位于通过根据各自的曲率在第一弯曲点和第二屈曲点处延伸位于卷曲器的端部处的第一弯曲部分和第二弯曲部分所形成的曲线内部。通过这种方式，可以提供一种血压信息测量装置袖带和具有这种袖带的血压信息测量装置，其可以通过减少流体囊体积的变化的误差来减少血压测量的误差。

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