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    • 1. 发明授权
    • Low threshold current laser
    • 低阈值电流激光器
    • US5172384A
    • 1992-12-15
    • US695062
    • 1991-05-03
    • Herbert GoronkinMichael S. LebbySaied N. Tehrani
    • Herbert GoronkinMichael S. LebbySaied N. Tehrani
    • G02F1/017H01L33/00H01S5/34
    • H01S5/34B82Y20/00G02F1/017H01S5/3403
    • A thin layer, typically a monolayer, of a small band gap material (37) is inserted into the active layer (14) of a quantum well semiconductor device (36, 51). The band gap of the thin layer (37) is smaller than the band gap of the material in the active layer (14), thereby shifting carrier concentrations in the quantum well (26d, 26e, 26h, 26n) of the active layer (14) toward the thin layer (37). This shift increases alignment between the electron wave function (42, 54) and the hole wave function (44, 57) in the quantum well (26d, 26e, 26h, 26n) which increases the probability of stimulated photon emissions thereby reducing the threshold current and threshold voltage of the quantum well semiconductor device (36, 51).
    • 将小带隙材料(37)的薄层(通常为单层)插入量子阱半导体器件(36,51)的有源层(14)中。 薄层(37)的带隙比有源层(14)中的材料的带隙小,从而使有源层(14)的量子阱(26d,26e,26h,26n)中的载流子浓度移位 )朝向薄层(37)。 这种移动增加了量子阱(26d,26e,26h,26n)中的电子波函数(42,54)和空穴波函数(44,57)之间的对准,这增加了被激发的光子发射的概率,从而降低阈值电流 和量子阱半导体器件(36,51)的阈值电压。
    • 5. 发明授权
    • Bipolar doped semiconductor structure and method for making
    • 双极掺杂半导体结构及其制造方法
    • US5326985A
    • 1994-07-05
    • US951994
    • 1992-09-28
    • Herbert GoronkinJun ShenSaied N. Tehrani
    • Herbert GoronkinJun ShenSaied N. Tehrani
    • H01L29/778H01L29/161H01L29/205
    • H01L29/7783
    • A semiconductor structure that provides both N-type and P-type doping from a single dopant source is provided. A first doping region (13) comprising a first material composition includes holes and electrons in a doping energy level (E.sub.D)- A first undoped spacer region (12) comprising the first material composition covers the doping region (13). An undoped channel (11,14) comprising a second material composition covers the first spacer region (12) and a second undoped spacer region (12) comprising the first material composition covers the undoped channel (11,14). The first material composition has a wider bandgap than the second material composition and the doping energy level (E.sub.D) is selected to provide electrons to the undoped channel (11,14) when the second material composition has a conduction band minimum less than the doping energy level (E.sub.D) and to provide holes to the first undoped channel (11,14) when the second material composition has a valence band maximum greater than the doping energy level (E.sub.D).
    • 提供了从单个掺杂剂源提供N型和P型掺杂的半导体结构。 包括第一材料组合物的第一掺杂区域(13)包括掺杂能级(ED)的空穴和电子 - 包含第一材料组合物的第一未掺杂间隔区域(12)覆盖掺杂区域(13)。 包括第二材料组合物的未掺杂通道(11,14)覆盖第一间隔区域(12),并且包括第一材料组合物的第二未掺杂间隔区域(12)覆盖未掺杂沟道(11,14)。 第一材料组合物具有比第二材料组成更宽的带隙,并且当第二材料组合物具有小于掺杂能量的导带最小值时,选择掺杂能级(ED)以向未掺杂沟道(11,14)提供电子 (ED),并且当第二材料组合物具有大于掺杂能级(ED)的价带最大值时,向第一未掺杂通道(11,14)提供孔。