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1. 发明授权

US08681316B2 Measurement system, method and lithographic apparatus 有权
标题翻译：测量系统，方法和光刻设备
公开(公告)号：US08681316B2
公开(公告)日：2014-03-25
申请号：US13116934
申请日：2011-05-26
申请人： Henrikus Herman Marie Cox , Willem Herman Gertruda Anna Koenen , Thomas Augustus Mattaar , Martinus Theodorus Jacobus Pieterse , Rob Antonius Andries Verkooijen
发明人： Henrikus Herman Marie Cox , Willem Herman Gertruda Anna Koenen , Thomas Augustus Mattaar , Martinus Theodorus Jacobus Pieterse , Rob Antonius Andries Verkooijen
IPC分类号： G01C9/00 , G03B27/32 , G03B27/42 , H02K41/02
CPC分类号： G03F7/70775 , G03F7/70508
摘要： A measurement system is configured to derive a position quantity of an object, the measurement system includes at least one position quantity sensor configured to provide respective position quantity measurement signals; a position quantity calculator configured to determine a position quantity of the object from the position quantity measurement signal, wherein the position quantity calculator includes a torsion estimator configured to estimate a torsion of the object, the position quantity calculator being configured to correct the determined position quantity of the object for the estimated torsion.
摘要翻译：测量系统被配置为导出物体的位置量，测量系统包括配置成提供各个位置量测量信号的至少一个位置量传感器; 位置量计算器，其被配置为根据所述位置量测量信号确定所述物体的位置量，其中所述位置量计算器包括被配置为估计所述物体的扭转的扭转估计器，所述位置量计算器被配置为校正所确定的位置量的物体估计扭转。

2. 发明申请

US20110317142A1 MEASUREMENT SYSTEM, METHOD AND LITOGRAPHIC APPARATUS 有权
标题翻译：测量系统，方法和仪器设备
公开(公告)号：US20110317142A1
公开(公告)日：2011-12-29
申请号：US13116934
申请日：2011-05-26
申请人： Henrikus Herman Marie Cox , Willem Herman Gertruda Anna Koenen , Thomas Augustus Mattaar , Martinus Theodorus Jacobus Pieterse , Rob Antonius Andries Verkooijen
发明人： Henrikus Herman Marie Cox , Willem Herman Gertruda Anna Koenen , Thomas Augustus Mattaar , Martinus Theodorus Jacobus Pieterse , Rob Antonius Andries Verkooijen
IPC分类号： G03B27/54 , G06F15/00
CPC分类号： G03F7/70775 , G03F7/70508
摘要： A measurement system is configured to derive a position quantity of an object, the measurement system includes at least one position quantity sensor configured to provide respective position quantity measurement signals; a position quantity calculator configured to determine a position quantity of the object from the position quantity measurement signal, wherein the position quantity calculator includes a torsion estimator configured to estimate a torsion of the object, the position quantity calculator being configured to correct the determined position quantity of the object for the estimated torsion.
摘要翻译：测量系统被配置为导出物体的位置量，测量系统包括配置成提供各个位置量测量信号的至少一个位置量传感器; 位置量计算器，其被配置为根据所述位置量测量信号确定所述物体的位置量，其中所述位置量计算器包括被配置为估计所述物体的扭转的扭转估计器，所述位置量计算器被配置为校正所确定的位置量的物体估计扭转。

3. 发明申请

US20110208459A1 LITHOGRAPHIC APPARATUS AND METHOD FOR CORRECTING A POSITION OF A STAGE OF A LITHOGRAPHIC APPARATUS 有权
标题翻译：用于校正平面设备阶段的位置的平面设备和方法
公开(公告)号：US20110208459A1
公开(公告)日：2011-08-25
申请号：US13018226
申请日：2011-01-31
申请人： Hans Butler , Emiel Jozef Melanie Eussen , Willem Herman Gertruda Anna Koenen , Engelbertus Antonius Fransiscus Van Der Pasch , Harmen Klaas Van Der Schoot , Marc Wilhelmus Maria Van Der Wijst , Marcus Martinus Petrus Adrianus Vermeulen , Cornelius Adrianus Lambertus De Hoon
发明人： Hans Butler , Emiel Jozef Melanie Eussen , Willem Herman Gertruda Anna Koenen , Engelbertus Antonius Fransiscus Van Der Pasch , Harmen Klaas Van Der Schoot , Marc Wilhelmus Maria Van Der Wijst , Marcus Martinus Petrus Adrianus Vermeulen , Cornelius Adrianus Lambertus De Hoon
IPC分类号： G06F19/00
CPC分类号： G03F7/70775 , G03F7/70516 , G03F7/70758 , G03F7/70783
摘要： A lithographic apparatus includes a stage to hold an object, the stage being moveable relative to a reference structure in a motion range; a magnet structure to provide a spatially varying magnetic field in at least a part of the motion range, the magnet structure being moveable relative to the reference structure and the stage; a first position measurement system to provide a first measurement signal corresponding to a position of the stage and/or the object in a measurement direction relative to the reference structure; a second position measurement system to provide a second measurement signal corresponding to a position of the stage relative to the magnet structure; and a data processor to correct the first measurement signal with a value dependent on the second measurement signal to provide a corrected first measurement signal representative of the position of the stage and/or the object relative to the reference structure in the measurement direction.
摘要翻译：光刻设备包括用于保持物体的平台，所述平台相对于基准结构在运动范围内可移动; 磁体结构，用于在所述运动范围的至少一部分中提供空间变化的磁场，所述磁体结构可相对于所述参考结构和所述平台移动; 第一位置测量系统，用于相对于参考结构在测量方向上提供对应于舞台和/或物体的位置的第一测量信号; 第二位置测量系统，用于提供对应于舞台相对于磁体结构的位置的第二测量信号; 以及数据处理器，用取决于所述第二测量信号的值来校正所述第一测量信号，以在所述测量方向上提供表示所述平台和/或所述对象相对于所述参考结构的位置的校正的第一测量信号。

4. 发明授权

US07889314B2 Calibration methods, lithographic apparatus and patterning device for such lithographic apparatus 有权
标题翻译：用于这种光刻设备的校准方法，光刻设备和图案形成装置
公开(公告)号：US07889314B2
公开(公告)日：2011-02-15
申请号：US11387050
申请日：2006-03-23
申请人： Willem Herman Gertruda Anna Koenen
发明人： Willem Herman Gertruda Anna Koenen
IPC分类号： G03B27/42
CPC分类号： G03B27/58 , G03F7/70516 , G03F7/70775
摘要： A calibration method to calibrate a substrate table position in a lithographic apparatus, the method including repeatedly irradiating a pattern onto a surface of the substrate so as to create a two dimensional arrangement of patterns on the surface of the substrate, the irradiating including displacing the substrate table between successive irradiations to irradiate the pattern onto different locations on the surface of the substrate, reading out the patterns in the two dimensions to obtain pattern read out results, deriving incremental position deviations from the read out results of neighboring patterns in dependency on the position of the substrate table in the two dimensions, deriving from the incremental position deviations a position error of the substrate table as a function of the two dimensional position of the substrate table and calibrating the position of the substrate table using the position dependent position error.
摘要翻译：一种用于校准光刻设备中的基板台位置的校准方法，所述方法包括将图案重复地照射到所述基板的表面上，以在所述基板的表面上产生图案的二维排列，所述照射包括移动所述基板连续照射之间的表格，以将图案照射到基板表面上的不同位置，读出两维中的图案以获得图案读出结果，从相对于位置的读出结果导出增加的位置偏差在两个维度上，从增量位置偏移导出衬底台的位置误差作为衬底台的二维位置的函数，并使用位置相关位置误差来校准衬底台的位置。

5. 发明授权

US08781775B2 Lithographic apparatus and method for correcting a position of a stage of a lithographic apparatus 有权
标题翻译：用于校正光刻设备的台阶位置的光刻设备和方法
公开(公告)号：US08781775B2
公开(公告)日：2014-07-15
申请号：US13018226
申请日：2011-01-31
申请人： Hans Butler , Emiel Jozef Melanie Eussen , Willem Herman Gertruda Anna Koenen , Engelbertus Antonius Fransiscus Van Der Pasch , Harmen Klaas Van Der Schoot , Marc Wilhelmus Maria Van Der Wijst , Marcus Martinus Petrus Adrianus Vermeulen , Cornelius Adrianus Lambertus De Hoon
发明人： Hans Butler , Emiel Jozef Melanie Eussen , Willem Herman Gertruda Anna Koenen , Engelbertus Antonius Fransiscus Van Der Pasch , Harmen Klaas Van Der Schoot , Marc Wilhelmus Maria Van Der Wijst , Marcus Martinus Petrus Adrianus Vermeulen , Cornelius Adrianus Lambertus De Hoon
IPC分类号： G01C17/38
CPC分类号： G03F7/70775 , G03F7/70516 , G03F7/70758 , G03F7/70783
摘要： A lithographic apparatus includes a stage to hold an object, the stage being moveable relative to a reference structure in a motion range; a magnet structure to provide a spatially varying magnetic field in at least a part of the motion range, the magnet structure being moveable relative to the reference structure and the stage; a first position measurement system to provide a first measurement signal corresponding to a position of the stage and/or the object in a measurement direction relative to the reference structure; a second position measurement system to provide a second measurement signal corresponding to a position of the stage relative to the magnet structure; and a data processor to correct the first measurement signal with a value dependent on the second measurement signal to provide a corrected first measurement signal representative of the position of the stage and/or the object relative to the reference structure in the measurement direction.
摘要翻译：光刻设备包括用于保持物体的平台，所述平台相对于基准结构在运动范围内可移动; 磁体结构，用于在所述运动范围的至少一部分中提供空间变化的磁场，所述磁体结构可相对于所述参考结构和所述平台移动; 第一位置测量系统，用于相对于参考结构在测量方向上提供对应于舞台和/或物体的位置的第一测量信号; 第二位置测量系统，用于提供对应于舞台相对于磁体结构的位置的第二测量信号; 以及数据处理器，用取决于所述第二测量信号的值来校正所述第一测量信号，以在所述测量方向上提供表示所述平台和/或所述对象相对于所述参考结构的位置的校正的第一测量信号。

6. 发明申请

US20130050670A1 POSITION MEASUREMENT SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译：位置测量系统，平面设备和设备制造方法
公开(公告)号：US20130050670A1
公开(公告)日：2013-02-28
申请号：US13589775
申请日：2012-08-20
申请人： Willem Herman Gertruda Anna Koenen , Emiel Jozef Melanie Eussen , Engelbertus Antonius Fransiscus Van Der Pasch , Robbert Edgar Van Leeuwen , Adrianus Hendrik Koevoets
发明人： Willem Herman Gertruda Anna Koenen , Emiel Jozef Melanie Eussen , Engelbertus Antonius Fransiscus Van Der Pasch , Robbert Edgar Van Leeuwen , Adrianus Hendrik Koevoets
IPC分类号： G03B27/52 , G06F19/00
CPC分类号： H01L23/544 , G03F7/70 , G03F7/70775 , G03F9/7019 , H01L21/682 , H01L2223/5442 , H01L2223/54426 , H01L2223/54453 , H01L2223/5446 , H01L2924/0002 , H01L2924/00
摘要： A position measurement system includes a first part and a second part for determining a position of a first member relative to a second member by providing a position signal representing a position of the first part relative to the second part, and a computational unit comprising an input terminal for receiving the position signal. The computational unit is configured to, in use, apply a conversion to the position signal to obtain a signal representing a position of the first member relative to the second member; and apply an adjustment to the conversion to at least partly compensate for a drift of the first part or the second part or both. The adjustment is based on a predetermined drift characteristic of the first part or the second part or both respectively. The predetermined drift characteristic includes one or more base shapes of the first part and/or the second part.
摘要翻译：位置测量系统包括第一部分和第二部分，用于通过提供表示第一部分相对于第二部分的位置的位置信号来确定第一部件相对于第二部件的位置，以及计算单元，包括输入端子用于接收位置信号。计算单元被配置为在使用中将转换应用于位置信号以获得表示第一构件相对于第二构件的位置的信号; 并且对所述转换应用调整以至少部分地补偿所述第一部分或所述第二部分或两者的漂移。该调整基于第一部分或第二部分或两者的预定漂移特性。预定漂移特性包括第一部分和/或第二部分的一个或多个基本形状。

7. 发明授权

US07557903B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07557903B2
公开(公告)日：2009-07-07
申请号：US11296871
申请日：2005-12-08
申请人： Carolus Johannes Catharina Schoormans , Emiel Jozef Melanie Eussen , Willem Herman Gertruda Anna Koenen , Nicolas Alban Lallemant , Engelbertus Antonius Fransiscus Van Der Pasch , Johannes Mathias Theodorus Antonius Adriaens
发明人： Carolus Johannes Catharina Schoormans , Emiel Jozef Melanie Eussen , Willem Herman Gertruda Anna Koenen , Nicolas Alban Lallemant , Engelbertus Antonius Fransiscus Van Der Pasch , Johannes Mathias Theodorus Antonius Adriaens
IPC分类号： G03B27/58 , G03B27/42
CPC分类号： G03F7/70775
摘要： A device manufacturing method includes projecting a patterned beam of radiation onto a substrate, wherein the position of a movable object is determined in a number of degrees of freedom using a number of sensors, the number of sensors being larger than the number of degrees of freedom, wherein the position of the movable object in the number of degrees of freedom is determined using signals of each of the sensors, wherein the signals of the sensors are weighed on the basis of the difference between noise levels of each of the sensors. Accuracy of the position measurement of movable object and/or overlay and focus performance are improved in lithographic apparatus.
摘要翻译：一种器件制造方法包括将图案化的辐射束投射到衬底上，其中可移动物体的位置使用多个传感器以多个自由度确定，传感器的数量大于自由度的数量其中，利用每个传感器的信号来确定可移动物体的位置，其中，所述传感器的信号是基于每个传感器的噪声水平之差而被称重的。在光刻设备中，可移动物体的位置测量精度和/或覆盖和聚焦性能得到改善。

8. 发明授权

US07333174B2 Lithographic apparatus and method for determining Z position errors/variations and substrate table flatness 有权
标题翻译：用于确定Z位置误差/变化和衬底台平面度的平版印刷设备和方法
公开(公告)号：US07333174B2
公开(公告)日：2008-02-19
申请号：US11317230
申请日：2005-12-27
申请人： Willem Herman Gertruda Anna Koenen , Arthur Winfried Eduardus Minnaert , Luberthus Ouwehand , Johannes Mathias Theodorus Antonius Adriens , Wouter Onno Pril
发明人： Willem Herman Gertruda Anna Koenen , Arthur Winfried Eduardus Minnaert , Luberthus Ouwehand , Johannes Mathias Theodorus Antonius Adriens , Wouter Onno Pril
IPC分类号： G03B27/42 , G03B27/58 , G03B27/32
CPC分类号： G03F9/7049 , B23D43/04 , G03F9/7011 , G03F9/7019 , G03F9/7034 , G03F9/7088
摘要： A lithographic projection apparatus including an illumination system configured to provide a beam of radiation, a support configured to support a patterning device, the patterning device configured to impart the beam with a pattern in its cross section, a substrate table configured to hold a substrate, a projection system configured to project the patterned radiation onto a target portion of the substrate, a plurality of level sensors for sensing a level of a substrate carried on the substrate table at a plurality of different positions, and a system for determining the position of the substrate table. Also provided is a controller that is configured to cause relative movement between the substrate and the level sensor array from a first position at which a first measurement is taken to a plurality of overlapping positions at which further measurements are taken, and a calculator for calculating a measure of Z position errors and/or substrate table unflatness and/or a measure of the level sensor position/offset using the plurality of overlapping measurements.
摘要翻译：一种光刻投影设备，包括被配置为提供辐射束的照明系统，被配置为支撑图案形成装置的支撑件，所述图案形成装置被配置为在其横截面中赋予所述光束图案;被配置为保持基板的基板台，投影系统，被配置为将所述图案化的辐射投影到所述基板的目标部分上;多个液位传感器，用于感测在多个不同位置承载在所述基板台上的基板的水平;以及系统，用于确定所述基板的位置底物台。还提供了一种控制器，其被配置为从第一位置引起基板和液位传感器阵列之间的相对移动，在第一位置处，进行进一步测量的多个重叠位置，以及计算器使用多个重叠测量来测量Z位置误差和/或衬底台不平坦度和/或液位传感器位置/偏移的量度。

9. 发明授权

US08451454B2 Stage system, lithographic apparatus including such stage system, and correction method 有权
公开(公告)号：US08451454B2
公开(公告)日：2013-05-28
申请号：US12268659
申请日：2008-11-11
申请人： Willem Herman Gertruda Anna Koenen , Emiel Jozef Melanie Eussen , Engelbertus Antonius Fransiscus Van Der Pasch
发明人： Willem Herman Gertruda Anna Koenen , Emiel Jozef Melanie Eussen , Engelbertus Antonius Fransiscus Van Der Pasch
IPC分类号： G01B11/14 , G03B27/42 , G03B27/58 , G03F7/20
CPC分类号： G03F7/70775 , G03F7/70508 , G03F7/7085
摘要： A position measurement system to measure a position of a movable stage includes a reference plate; a plurality of sensors arranged such that, depending on a position of the movable stage relative to the reference plate, at least a subset of the plurality of sensors is configured to cooperate with the reference plate to provide for each of the sensors in the subset respective sensor signals representative of a position of the respective sensor relative to the reference plate; and a processor arranged to determine from the sensor signals a stage position, the processing device configured so as to, when the stage is in a position where an over-determined number of sensor signals is provided by at least the subset of the sensors that are in operational cooperation with the reference plate, (a) determine the stage position from a subset of the over-determined number of sensor signals, and (b) correct a sensor signal of one or more of the sensors from a discrepancy between the determined stage position and a remainder of the sensors signals.

10. 发明申请

US20090128791A1 Stage system, lithographic apparatus including such stage system, and correction method 有权
标题翻译：舞台系统，包括这种舞台系统的光刻设备和校正方法
公开(公告)号：US20090128791A1
公开(公告)日：2009-05-21
申请号：US12268659
申请日：2008-11-11
申请人： Willem Herman Gertruda Anna Koenen , Emiel Jozef Melanie Eussen , Engelbertus Antonius Fransiscu Van Der Pasch
发明人： Willem Herman Gertruda Anna Koenen , Emiel Jozef Melanie Eussen , Engelbertus Antonius Fransiscu Van Der Pasch
IPC分类号： G03B27/42 , G03B27/32
CPC分类号： G03F7/70775 , G03F7/70508 , G03F7/7085
摘要： A position measurement system to measure a position of a movable stage includes a reference plate; a plurality of sensors arranged such that, depending on a position of the movable stage relative to the reference plate, at least a subset of the plurality of sensors is configured to cooperate with the reference plate to provide for each of the sensors in the subset respective sensor signals representative of a position of the respective sensor relative to the reference plate; and a processor arranged to determine from the sensor signals a stage position, the processing device configured so as to, when the stage is in a position where an over-determined number of sensor signals is provided by at least the subset of the sensors that are in operational cooperation with the reference plate, (a) determine the stage position from a subset of the over-determined number of sensor signals, and (b) correct a sensor signal of one or more of the sensors from a discrepancy between the determined stage position and a remainder of the sensors signals.
摘要翻译：用于测量可移动台的位置的位置测量系统包括：参考板; 多个传感器布置成使得根据可移动台相对于参考板的位置，多个传感器中的至少一个子集被配置为与参考板协作以提供子集中的每个传感器代表相应传感器相对于参考板的位置的传感器信号; 以及处理器，被布置成从传感器信号确定载物台位置，所述处理装置被配置为当所述载物台处于至少所述传感器的子集中提供超过数量的传感器信号的位置时在与参考板的操作协作中，（a）从传感器信号的超过数量的子集中确定舞台位置，以及（b）从所确定的舞台之间的差异校正一个或多个传感器的传感器信号位置和其余的传感器信号。

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