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1. 发明申请

US20070057201A1 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20070057201A1
公开(公告)日：2007-03-15
申请号：US11224303
申请日：2005-09-13
申请人： Hendrik Neerhof , Hako Botma , Marius Ravensbergen
发明人： Hendrik Neerhof , Hako Botma , Marius Ravensbergen
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G03F7/70083
摘要： An attenuation adjustment device is disposed in a radiation system of a lithography device and includes a plurality of members for casting penumbras in the radiation beam illuminating the patterning device. Furthermore an attenuation control device is provided for adjusting the members in such a manner as to control the attenuation of the patterned radiation beam projected onto the target portion of the substrate across the cross-section of the patterned radiation beam. The attenuation control device incorporates a detector for providing an output indicative of the position of each member in dependence on detection of a beam of detecting radiation reaching the angle detector after attenuation by the member.
摘要翻译：衰减调节装置设置在光刻装置的辐射系统中，并且包括多个用于在照射图案形成装置的辐射束中铸造半圆形的构件。此外，提供衰减控制装置，用于以这样的方式调节构件，以便控制在图案化的辐射束的横截面上投射到基板的目标部分上的图案化的辐射束的衰减。该衰减控制装置包括一个检测器，用于根据检测到被成员衰减后到达角度检测器的辐射束的检测，提供指示每个构件的位置的输出。

2. 发明申请

US20070170376A1 Lithographic apparatus and device manufacturing method 审中-公开
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US20070170376A1
公开(公告)日：2007-07-26
申请号：US11591673
申请日：2006-11-02
申请人： Hendrik Neerhof , Hako Botma , Marius Ravensbergen , Gerardus Baas
发明人： Hendrik Neerhof , Hako Botma , Marius Ravensbergen , Gerardus Baas
IPC分类号： G01J3/10
CPC分类号： G03F7/70191 , G03F7/70083
摘要： An attenuation adjustment device is disclosed that includes a plurality of members configured to cast penumbras in a radiation beam illuminating a patterning device in a lithography apparatus. Furthermore, an attenuation control device may be provided to adjust the members in such a manner as to control attenuation of a radiation beam projected onto a target portion of a substrate across the cross-section of the radiation beam.
摘要翻译：公开了一种衰减调节装置，其包括多个构件，所述多个构件构造成在照射光刻设备中的图案形成装置的辐射束中浇铸半圆形。此外，可以提供衰减控制装置以调节部件，以便控制在辐射束的横截面上投影到基板的目标部分上的辐射束的衰减。

3. 发明授权

US07375353B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：光刻设备和器件制造方法
公开(公告)号：US07375353B2
公开(公告)日：2008-05-20
申请号：US11224303
申请日：2005-09-13
申请人： Hendrik Antony Johannes Neerhof , Hako Botma , Marius Ravensbergen
发明人： Hendrik Antony Johannes Neerhof , Hako Botma , Marius Ravensbergen
IPC分类号： G03F7/20 , G03B27/72
CPC分类号： G03F7/70191 , G03F7/70083
摘要： An attenuation adjustment device is disclosed that includes a plurality of members configured to cast penumbras in a radiation beam illuminating a patterning device in a lithography apparatus. Furthermore, an attenuation control device is provided to adjust the members in such a manner as to control the attenuation of the patterned radiation beam projected onto a target portion of a substrate across the cross-section of the patterned radiation beam. The attenuation control device includes a detector configured to provide an output indicative of the position of each member in dependence on detection of a beam of detecting radiation reaching the detector after attenuation by the member.
摘要翻译：公开了一种衰减调节装置，其包括多个构件，所述多个构件构造成在照射光刻设备中的图案形成装置的辐射束中浇铸半圆形。此外，提供衰减控制装置以调节构件以控制在图案化的辐射束的横截面上投射到基板的目标部分上的图案化的辐射束的衰减。所述衰减控制装置包括检测器，其被配置为根据检测到由所述构件衰减后到达所述检测器的辐射束的检测来提供指示每个构件的位置的输出。

4. 发明授权

US07507976B2 Lithographic apparatus, beam delivery systems, prisms and device manufacturing method 失效
标题翻译：光刻设备，光束传输系统，棱镜和器件制造方法
公开(公告)号：US07507976B2
公开(公告)日：2009-03-24
申请号：US11443451
申请日：2006-05-31
申请人： Hako Botma , Ewoud Vreugdenhil , Joe Sakai
发明人： Hako Botma , Ewoud Vreugdenhil , Joe Sakai
IPC分类号： G02B5/04
CPC分类号： G03F7/70941 , G02B5/04 , G02B5/3066 , G03F7/70058 , G03F7/70566
摘要： A beam directing element configured to receive a substantially collimated input beam of predetermined wavelength propagating in a first direction and to output a substantially collimated output beam in a second direction includes a prism formed of a transparent material and having input and output faces, wherein the internal angle between the input face and the output face is such that when the input beam is incident on the input face substantially at Brewster's angle, it is internally incident on the output face at Brewster's angle. The beam directing element is useful in lithography, for example in beam delivery systems.
摘要翻译：射束引导元件，被配置为接收在第一方向上传播的预定波长的基本上准直的输入光束并且沿第二方向输出基本准直的输出光束，包括由透明材料形成并具有输入和输出面的棱镜，其中内部输入面和输出面之间的角度使得当输入光束以布鲁斯特角度入射在输入面上时，其以布鲁斯特角内部入射在输出面上。光束引导元件在光刻中是有用的，例如在光束传送系统中。

5. 发明申请

US20080067424A1 Lithographic apparatus, beam delivery systems, prisms and device manufacturing method 失效
标题翻译：光刻设备，光束传输系统，棱镜和器件制造方法
公开(公告)号：US20080067424A1
公开(公告)日：2008-03-20
申请号：US11443451
申请日：2006-05-31
申请人： Hako Botma , Ewoud Vreugdenhil , Joe Sakai
发明人： Hako Botma , Ewoud Vreugdenhil , Joe Sakai
IPC分类号： G03F7/20
CPC分类号： G03F7/70941 , G02B5/04 , G02B5/3066 , G03F7/70058 , G03F7/70566
摘要： A beam directing element configured to receive a substantially collimated input beam of predetermined wavelength propagating in a first direction and to output a substantially collimated output beam in a second direction includes a prism formed of a transparent material and having input and output faces, wherein the internal angle between the input face and the output face is such that when the input beam is incident on the input face substantially at Brewster's angle, it is internally incident on the output face at Brewster's angle. The beam directing element is useful in lithography, for example in beam delivery systems.
摘要翻译：射束引导元件，被配置为接收在第一方向上传播的预定波长的基本上准直的输入光束并且沿第二方向输出基本准直的输出光束，包括由透明材料形成并具有输入和输出面的棱镜，其中内部输入面和输出面之间的角度使得当输入光束以布鲁斯特角度入射在输入面上时，其以布鲁斯特角内部入射在输出面上。光束引导元件在光刻中是有用的，例如在光束传送系统中。

6. 发明授权

US07130023B2 Lithographic apparatus, mirror element, device manufacturing method, and beam delivery system 失效
标题翻译：平版印刷设备，镜子元件，设备制造方法和光束传送系统
公开(公告)号：US07130023B2
公开(公告)日：2006-10-31
申请号：US10731429
申请日：2003-12-10
申请人： Hako Botma , Ewoud Vreugdenhil
发明人： Hako Botma , Ewoud Vreugdenhil
IPC分类号： G03B27/72 , G03B27/42 , G03B27/54 , G02B5/30
CPC分类号： G03F7/70066 , G03F7/70566
摘要： A lithographic projection apparatus includes a radiation system for providing a projection beam of radiation, a support structure for supporting a patterning device, the patterning device serving to pattern the projection beam according to a desired pattern, a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, an illumination system for conditioning the beam of radiation beam so as to provide a conditioned radiation beam so as to be able to illuminate said patterning means, and a beam delivery system including redirecting elements for redirecting and delivering the projection beam from the radiation system to the illumination system. The radiation beam is arranged to have a predetermined polarization state and the redirecting elements are arranged to provide a minimum radiation loss in relation to the predetermined polarization state of the radiation beam.
摘要翻译：光刻投影设备包括用于提供投影辐射束的辐射系统，用于支撑图案形成装置的支撑结构，用于根据期望图案对投影光束进行图案化的图案形成装置，用于保持基板的基板台，用于将图案化的光束投影到基板的目标部分上的系统，用于调节辐射束束的照明系统，以便提供调节的辐射束以便能够照亮所述图案形成装置;以及光束传送系统，包括重定向将投射光束从辐射系统重定向并传送到照明系统的元件。辐射束被布置成具有预定的偏振状态，并且重定向元件被布置成相对于辐射束的预定偏振状态提供最小的辐射损失。

7. 发明授权

US07148952B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07148952B2
公开(公告)日：2006-12-12
申请号：US10976314
申请日：2004-10-29
申请人： Markus Franciscus Antonius Eurlings , Johannes Jacobus Matheus Baselmans , Hako Botma , Jan Bruining , Marcel Mathijs Theodore Marie Dierichs , Antonius Johannes Josephus Van Dijsseldonk , Judocus Marie Dominicus Stoeldraijer
发明人： Markus Franciscus Antonius Eurlings , Johannes Jacobus Matheus Baselmans , Hako Botma , Jan Bruining , Marcel Mathijs Theodore Marie Dierichs , Antonius Johannes Josephus Van Dijsseldonk , Judocus Marie Dominicus Stoeldraijer
IPC分类号： G03B27/42
CPC分类号： G03F7/70075
摘要： The present invention provides a lithographic apparatus comprising an illumination system for providing a projection beam of radiation. The illumination system comprises at least one movable optical element (7), such that a projection beam of radiation (4) can be shifted around a central position. This ensures that inhomogeneities in the intensity distribution in the projection beam (4) will be smeared out, which in turn provides an improved homogeneity of the exposure of a surface to be illuminated by the system, such as a wafer or other substrate. The optical element (7) may comprise a motor movable mirror, prism, filter, lens, axicon, diffuser, diffractive optical array, optical integrator, etc. The invention further provides a device manufacturing method, using a lithographic apparatus according to the invention, wherein the optical element is moved, in order to provide an optimum homogeneity for the projection beam of radiation.
摘要翻译：本发明提供了一种包括用于提供投影射线束的照明系统的光刻设备。照明系统包括至少一个可移动光学元件（7），使得投影射线束（4）能够围绕中心位置移动。这确保了投影束（4）中的强度分布中的不均匀性将被涂抹，这反过来提供了由诸如晶片或其它基底的系统照射的表面的曝光的改进的均匀性。光学元件（7）可以包括电动机可移动镜，棱镜，滤镜，透镜，旋转三棱镜，漫射器，衍射光学阵列，光学积分器等。本发明还提供了一种使用根据本发明的光刻设备的器件制造方法，其中所述光学元件被移动，以便为所述投影射束提供最佳均匀性。

8. 发明授权

US07116400B2 Illumination assembly, method for providing a radiation beam, lithographic projection apparatus and device manufacturing method 失效
标题翻译：照明组件，提供辐射束的方法，光刻投影装置和装置的制造方法
公开(公告)号：US07116400B2
公开(公告)日：2006-10-03
申请号：US10858409
申请日：2004-06-02
申请人： Hako Botma
发明人： Hako Botma
IPC分类号： G03B27/42
CPC分类号： G03F7/70158 , G03F7/70141
摘要： The invention relates to an illumination assembly, including a beam expander being arranged for receiving from a radiation source a radiation beam directed in a first direction (z) and for expanding the beam with a first magnification factor in a second direction (x) and with a second magnification factor in a third direction (y). The first, second and third directions being substantially mutually orthogonal. The illumination assembly further includes a beam splitter that is arranged for splitting the radiation beam in two split radiation beams split in at least one of the second and third direction, the propagation direction of the split radiation beams being substantially in the first direction. The beam splitter is further arranged for delivering the split radiation beams to the beam expander, of which at least one of the magnification factors is adjustable.
摘要翻译：本发明涉及一种照明组件，其包括光束扩展器，其布置成用于从辐射源接收沿第一方向（z）指向的辐射束，并且用于沿第二方向（x）以第一放大系数扩展光束，并且第三方向（y）的第二放大系数。第一，第二和第三方向基本上相互正交。照明组件还包括分束器，其被布置成用于将辐射束分裂成分成第二和第三方向中的至少一个的两个分裂的辐射束，分束辐射束的传播方向基本上在第一方向上。分束器还被布置成用于将分束辐射束传送到扩束器，其中至少一个放大因子是可调节的。

9. 发明申请

US20050219494A1 Lithographic apparatus, illumination system, and optical element for rotating an intensity distribution 失效
标题翻译：光刻设备，照明系统和用于旋转强度分布的光学元件
公开(公告)号：US20050219494A1
公开(公告)日：2005-10-06
申请号：US10816170
申请日：2004-04-02
申请人： Heine Mulder , Hako Botma
发明人： Heine Mulder , Hako Botma
IPC分类号： G02B19/00 , G03F7/20 , H01L21/027 , G03B27/54
CPC分类号： G03F7/70108
摘要： A lithographic projection apparatus includes an illumination system having a reflective integrator with a rectangular cross-section. An optical element is provided to redistribute an intensity distribution exiting the reflective integrator.
摘要翻译：光刻投影设备包括具有矩形横截面的反射积分器的照明系统。提供光学元件以重新分布离开反射积分器的强度分布。

10. 发明授权

US08576373B2 Lithographic apparatus and method 有权
标题翻译：平版印刷设备和方法
公开(公告)号：US08576373B2
公开(公告)日：2013-11-05
申请号：US12893577
申请日：2010-09-29
申请人： Hako Botma , Johannes Aldegonda Theodorus Marie Van Den Homberg
发明人： Hako Botma , Johannes Aldegonda Theodorus Marie Van Den Homberg
IPC分类号： G03B27/52 , G03B27/54 , G03B27/72
CPC分类号： G03F7/7085 , G03F7/70191 , G03F7/70525 , G03F7/70575
摘要： A lithographic apparatus is provided with a sensor. The sensor comprises a frame that defines a space that is crossed multiple times by wire. Detection electronics are connected to the wire and configured to detect a change of temperature of the wire due to infrared radiation being incident upon the wire. The detection electronics are further configured to provide an output signal in the event that a change of temperature of the wire is detected.
摘要翻译：光刻设备设置有传感器。该传感器包括一个框架，该框架限定通过电线多次交叉的空间。检测电子装置连接到导线并被配置为检测由于红外辐射入射在导线上的导线的温度变化。检测电子设备还被配置为在检测到线的温度变化的情况下提供输出信号。

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