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1. 发明授权

US5009738A Apparatus for plasma etching 失效
标题翻译：等离子体蚀刻装置
公开(公告)号：US5009738A
公开(公告)日：1991-04-23
申请号：US444293
申请日：1989-12-01
申请人： Heinrich Gruenwald , Hans Ramisch , Anton Pawlakowitsch
发明人： Heinrich Gruenwald , Hans Ramisch , Anton Pawlakowitsch
IPC分类号： H01J37/32 , H01L21/00
CPC分类号： H01L21/67069 , H01J37/3244
摘要： An apparatus for the implementation of plasma etching processes providing a process chamber, an upper electrode, and a lower electrode. The upper electrode comprises an anode member, movable with respect to the process chamber, and provides a gas shower for delivering a highly reactive gas, such as a gas containing fluorine or chlorine, into the process chamber. The lower electrode provides a surface for holding a substrate to be etched, the lower electrode being supplied with a high-frequency negative voltage and cooled by an outside source. The process chamber is shaped to press the substrate to the lower electrode when the process chamber is lowered upon the substrate in preparation for operation. The process chamber presses the substrate around a continuous periphery of the substrate. The process chamber is provided with exhaust gas export holes which can be progressively aligned with matching holes in a perforated disk rotatably mounted to an outside surface of the process chamber. An accordion bellows seals the interface between the first electrode stem and process chamber, to prevent penetration of particles into the process chamber. The above-described apparatus is all preferably situated in a vacuum chamber.
摘要翻译：一种用于实现提供处理室，上电极和下电极的等离子体蚀刻工艺的装置。上电极包括可相对于处理室移动的阳极构件，并且提供用于将高反应性气体（例如含有氟或氯的气体）输送到处理室中的气体淋浴。下电极提供用于保持要蚀刻的衬底的表面，下电极被提供高频负电压并由外源冷却。当处理室下降到基板上以准备操作时，处理室被成形为将基板压到下电极。处理室围绕基板的连续周边挤压基板。处理室设置有排气出口孔，排气出口孔可以与可旋转地安装到处理室的外表面的多孔盘中的匹配孔逐渐对准。手风琴波纹管密封第一电极杆和处理室之间的界面，以防止颗粒渗透到处理室中。上述装置都优选位于真空室中。

2. 发明授权

US4869801A Apparatus for mounting workpieces 失效
标题翻译：用于安装工件的装置
公开(公告)号：US4869801A
公开(公告)日：1989-09-26
申请号：US170716
申请日：1988-03-21
申请人： Dirk Helms , Werner Katzschner , Anton Pawlakowitsch , Friedrich Anderle
发明人： Dirk Helms , Werner Katzschner , Anton Pawlakowitsch , Friedrich Anderle
IPC分类号： C23C14/34 , C23C14/50 , H01L21/00 , H01L21/683
CPC分类号： H01L21/68792 , C23C14/50 , Y10S414/139
摘要： In an apparatus for mounting discoidal substrates in a vacuum chamber for reactive ionic etching purposes, a substrate holder joined to a hollow shaft and a bottom plate under the substrate holder are disposed, which together with spacers and a clamping ring form a displaceable cage partially surrounding the substrate holder and held coaxial to the latter, while the substrate which can be introduced through a gap in the lateral wall of the cage betwen two spacers can be laid on the substrate holder and locked in place there by the clamping ring after a relative movement between the substrate holder and the cage.
摘要翻译：在用于反应离子蚀刻目的的真空室中安装盘形基板的装置中，设置了一个连接到中空轴和衬底保持架下方的底板的衬底保持器，它们与间隔件和夹紧环一起形成一个部分环绕的位移保持架衬底保持器并与之保持同轴，同时可以通过两个间隔件之间的保持架的侧壁中的间隙引入的衬底可以被放置在衬底保持器上并且在相对运动之后被夹紧环锁定在那里在基板支架和保持架之间。

3. 发明授权

US5266117A Apparatus for the evaporative coating of substrates 失效
标题翻译：用于基材蒸发涂层的装置
公开(公告)号：US5266117A
公开(公告)日：1993-11-30
申请号：US6900
申请日：1993-01-21
申请人： Siegfried Beisswenger , Anton Pawlakowitsch , Reiner Kukla
发明人： Siegfried Beisswenger , Anton Pawlakowitsch , Reiner Kukla
IPC分类号： C23C14/24 , C23C14/26
CPC分类号： C23C14/246 , C23C14/243
摘要： A vacuum chamber contains means for transferring a substrate for an information disc such as a CD from a loading station to a coating station, where material such as aluminum in wire form is evaporated in order to coat the substrate from above. An evaporation nozzle is continuously supplied with wire at a rate according to the coating thickness. The nozzle may be heated either resistively in order to evaporate the wire therein, or the wire may be directly heated by an induction coil.
摘要翻译：真空室包含用于将诸如CD的信息盘的基板从装载站传送到涂布站的装置，其中诸如线形铝的材料被蒸发以从上面涂覆基板。蒸发喷嘴以与涂层厚度相应的速率连续地供应线。可以电阻地加热喷嘴以使其中的电线蒸发，或者线可以被感应线圈直接加热。

4. 发明授权

US5348313A Radial shaft sealing ring 失效
标题翻译：径向轴密封圈
公开(公告)号：US5348313A
公开(公告)日：1994-09-20
申请号：US20851
申请日：1993-02-19
申请人： Anton Pawlakowitsch
发明人： Anton Pawlakowitsch
IPC分类号： F16J15/324 , F16J15/40
CPC分类号： F16J15/324 , F16J15/40 , Y10S277/904 , Y10S277/913
摘要： The invention relates to a shaft seal for sealing a shaft pass-through (3) of vacuum apparatus, which accommodates a shaft (2), having at least one annular seal (4) which is disposed in a housing part and with which a barrier liquid (5) is associated, while the sealing part (6) of the annular seal facing the shaft (2) forms with the shaft an annular chamber (8) in which the barrier liquid (5) is provided, in order in this manner to bind particles formed by attrition.
摘要翻译：本发明涉及一种用于密封真空装置的轴穿通（3）的轴密封件，其容纳轴（2），所述轴（2）具有设置在壳体部分中的至少一个环形密封件（4）液体（5）相关联，而面向轴（2）的环形密封件的密封部分（6）与轴形成环形室（8），其中设置有阻挡液体（5），以此方式以结合由磨损形成的颗粒。

5. 发明授权

US5228917A Apparatus to reduce the sagging of the outside walls of vacuum tanks 失效
标题翻译：设备减少真空罐外面的波澜壮大
公开(公告)号：US5228917A
公开(公告)日：1993-07-20
申请号：US798631
申请日：1991-11-26
申请人： Anton Pawlakowitsch , Bernhard Schonherr
发明人： Anton Pawlakowitsch , Bernhard Schonherr
IPC分类号： C23C14/22 , B01J3/00 , C23C14/56
CPC分类号： B01J3/002 , C23C14/56 , C23C14/562
摘要： Apparatus for reducing the sagging of essentially planar outside walls (3, 13) on a vacuum tank (1) under operating conditions, and for preventing displacements, resulting therefrom, of components fastened to these outside walls (3, 13), such as rollers (7, 8) of a winding apparatus (2) which is movable with respect to the vacuum tank (1) in a vacuum tape coating apparatus, wherein spacers (12, 14) are provided between two opposite outside walls (3, 13).
摘要翻译：一种用于在操作条件下减少真空罐（1）上的基本上平面的外壁（3,13）的下垂的装置，并且用于防止由紧固到这些外壁（3,13）的部件（例如辊）产生的位移（2）的卷绕装置（7,8），其在真空带涂布装置中可相对于真空罐（1）移动，其中间隔件（12,14）设置在两个相对的外壁（3,13）之间，。

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