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    • 3. 发明授权
    • Method of manufacturing thin film transistor array panel
    • 制造薄膜晶体管阵列面板的方法
    • US07754549B2
    • 2010-07-13
    • US11839683
    • 2007-08-16
    • Jae-Beom ChoiYoung-jin ChangYoon-Seok ChoiSeung-Hwan ShimHan-Na JoJung-Hoon ShinJoon-Young Koh
    • Jae-Beom ChoiYoung-jin ChangYoon-Seok ChoiSeung-Hwan ShimHan-Na JoJung-Hoon ShinJoon-Young Koh
    • H01L29/786
    • H01L21/02672H01L21/02532H01L27/1277H01L27/1281
    • A method of manufacturing a thin film transistor array panel includes forming an amorphous silicon film on an insulating substrate; forming a sacrificial film having an embossed surface on the amorphous silicon film; contacting a metal plate with the sacrificial film and performing heat-treatment for crystallizing the amorphous silicon film to change the amorphous silicon film to a polycrystalline silicon film; removing the metal plate and the sacrificial film; patterning the polycrystalline silicon film to form a semiconductor; forming a gate insulating layer which covers the semiconductor; forming a gate line on the gate insulating layer, a portion of the gate line overlapping the semiconductor; heavily doping a conductive impurity into portions of the semiconductor to form a source region and a drain region; forming an interlayer insulating layer which covers the gate line and the semiconductor; and forming a data line and an output electrode connected to the source and drain regions, respectively, on the interlayer insulating layer.
    • 制造薄膜晶体管阵列面板的方法包括在绝缘基板上形成非晶硅膜; 在所述非晶硅膜上形成具有压花表面的牺牲膜; 使金属板与牺牲膜接触,并进行热处理以使非晶硅膜结晶,将非晶硅膜改变为多晶硅膜; 去除金属板和牺牲膜; 图案化多晶硅膜以形成半导体; 形成覆盖半导体的栅极绝缘层; 在所述栅极绝缘层上形成栅极线,所述栅极线的一部分与所述半导体重叠; 将导电杂质重掺杂到半导体的部分中以形成源极区和漏极区; 形成覆盖所述栅极线和所述半导体的层间绝缘层; 以及分别在层间绝缘层上形成连接到源区和漏区的数据线和输出电极。