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    • 6. 发明申请
    • Method and apparatus for data backup
    • 数据备份的方法和装置
    • US20060015698A1
    • 2006-01-19
    • US11226204
    • 2005-09-15
    • Jin-min KimHan-sub Park
    • Jin-min KimHan-sub Park
    • G06F12/16
    • G06F11/1441
    • A data backup method and a data backup apparatus in which a part of a user data area in a volatile memory, wherein data is lost when the power is turned off, is predesignated as a backup area and data is rapidly backed up in an emergency. The data backup method includes the operations of: receiving a command related to data backup through a user interface; obtaining a backup area which is a continuous space of a desired size by adjusting backup priorities between pieces of backup object data when the backup area is to be adjusted in order to execute the command; moving and storing data of the obtained backup area to a non-volatile memory according to a predetermined condition. Accordingly, the user data backup can be rapidly and automatically executed to prevent permanent loss of a database, document file, and the like.
    • 数据备份方法和数据备份装置,其中在电源关闭时数据丢失的易失性存储器中的用户数据区域的一部分被预先指定为备份区域,并且在紧急情况下快速备份数据。 数据备份方法包括:通过用户界面接收与数据备份有关的命令; 通过调整备份对象数据之间的备份优先级来执行命令,从而获得作为期望大小的连续空间的备份区域; 根据预定条件将所获得的备份区域的数据移动和存储到非易失性存储器。 因此,可以快速且自动地执行用户数据备份,以防止数据库,文档文件等的永久丢失。
    • 7. 发明授权
    • Method of repairing an opaque defect in a photomask
    • 修复光掩模中不透明缺陷的方法
    • US06506525B2
    • 2003-01-14
    • US09816364
    • 2001-03-26
    • Yo-han ChoiJin-min Kim
    • Yo-han ChoiJin-min Kim
    • G03F900
    • G03F1/74
    • A three-step method is used to repair an opaque defect in a photomask having a transparent substrate, and a light transmission portion disposed on the substrate and defining an opening the image of which is to be transferred to a layer on a semiconductor substrate. First, the thickness of the opaque defect is reduced by etching away only some of the defect. Second, a correction film is selectively formed over the entire surface of the substrate of the photomask in the opening defined by the light transmission portion with the exception of the region occupied by the pre-etched defect. Next, the correction film and the pre-etched defect are simultaneously etched away.
    • 使用三步法来修复具有透明基板的光掩模中的不透明缺陷,以及设置在基板上的光传输部分,并且限定其图像将被转印到半导体基板上的层的开口。 首先,通过仅蚀刻掉一些缺陷来减小不透明缺陷的厚度。 其次,除了由预蚀刻缺陷占据的区域之外,在由光传输部分限定的开口中的光掩模的基板的整个表面上选择性地形成校正膜。 接下来,同时蚀刻掉校正膜和预蚀刻缺陷。