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1. 发明授权

US5360857A Polymer scale preventive agent from naphthoquinone dye 失效
标题翻译：萘醌染料的聚合物防垢剂
公开(公告)号：US5360857A
公开(公告)日：1994-11-01
申请号：US32692
申请日：1993-03-17
申请人： Hajime Kitamura , Susumu Ueno , Mikio Watanabe , Masahiro Usuki , Toshihiko Nakano
发明人： Hajime Kitamura , Susumu Ueno , Mikio Watanabe , Masahiro Usuki , Toshihiko Nakano
IPC分类号： C08F2/00 , C08K5/07
CPC分类号： C08F2/004
摘要： A polymer scale preventive agent for use in polymerization of vinyl chloride monomer or a monomer mixture containing vinyl chloride monomer as a major component, comprising:(A) a naphthoquinone natural dye and(B) a polyvinyl alcohol with a saponification degree of at least 50 mol %. The polymer scale preventive agent is formed as coating on the inner wall, etc. of a polymerization vessel. Deposition of polymer scale can be always effectively prevented. Polymers with a high whiteness can be produced, and products formed from the polymer have only a small number of fish eyes.
摘要翻译：一种用于聚合氯乙烯单体或含有氯乙烯单体作为主要成分的单体混合物的聚合物防垢剂，包括：（A）萘醌天然染料和（B）皂化度至少为50的聚乙烯醇 mol％。聚合物垢防止剂形成为聚合容器的内壁等上的涂层。总能有效防止聚合物垢的沉积。可以生产高白度的聚合物，由聚合物形成的产品只有少量的鱼眼。

2. 发明授权

US5574115A Process for polymerization with suppressed polymer scale formation 失效
标题翻译：具有抑制聚合物垢形成的聚合方法
公开(公告)号：US5574115A
公开(公告)日：1996-11-12
申请号：US355281
申请日：1994-12-12
申请人： Toshihide Shimizu , Mikio Watanabe , Toshihiko Nakano
发明人： Toshihide Shimizu , Mikio Watanabe , Toshihiko Nakano
IPC分类号： C08F2/00 , C08F2/20 , C09K3/00
CPC分类号： C08F2/004
摘要： A polymer scale preventive agent for use in polymerization of a monomer having an ethylenically unsaturated double bond, comprising an alkaline solution containing: (A) a condensation product of (A-1) a condensate of acetone with a hydroxybenzene compound having at least two hydroxyl groups, and (A-2) an aldehyde compound; (B) an inorganic colloid; and (C) a water-soluble polymeric compound. This agent is used for forming a coating on the inner wall, etc. of a polymerization vessel. Such a vessel is effective in preventing polymer scale deposition, not only on the areas in the liquid-phase region but also on the areas around the interface between the gas and liquid phases in the vessel, and useful in producing a polymer that shows very few fish eyes and good whiteness when formed into sheets or the like.
摘要翻译：一种用于聚合具有烯键式不饱和双键的单体的聚合物防垢剂，其包含碱性溶液，该碱性溶液含有：（A）（A-1）缩合产物与丙酮的缩合物与具有至少两个羟基的羟基苯化合物基团和（A-2）醛化合物; （B）无机胶体; 和（C）水溶性聚合物。该试剂用于在聚合容器的内壁等上形成涂层。这样的容器不仅可以有效地防止聚合物垢沉积，而且不仅在液相区域中，而且在容器中的气相和液相之间的界面周围的区域上也是有效的，并且可用于制备显示非常少的聚合物当形成片材等时，鱼眼睛和白度良好。

3. 发明授权

US5576370A Polymer scale preventive agent containing a condensation product of a hydroxynaphthalene 失效
标题翻译：含有羟基萘的缩合物的聚合物防垢剂
公开(公告)号：US5576370A
公开(公告)日：1996-11-19
申请号：US321467
申请日：1994-10-11
申请人： Toshihide Shimizu , Mikio Watanabe , Toshihiko Nakano
发明人： Toshihide Shimizu , Mikio Watanabe , Toshihiko Nakano
IPC分类号： C08F2/00 , C08F2/24 , C08K3/22 , C08K3/36 , C08K2/20
CPC分类号： C08F2/004
摘要： A polymer scale preventive agent for use in polymerization of a monomer having an ethylenically unsaturated double bond, comprising an alkaline solution containing (A) a condensation product of (A-1) a hydroxynaphthalene compound and (A-2) an aldehyde compound, and (B) an inorganic colloid. This agent is used for forming a coating on the inner wall, etc. of a polymerization vessel. Such a vessel is effective in preventing polymer scale deposition, not only in the liquid-phase region but also in the vicinity of the interface between the gas and liquid phases in the vessel, and useful in producing a polymer that shows very few fish eyes and good whiteness when formed into sheets or the like.
摘要翻译：包含含有（A）（A-1）羟基萘化合物和（A-2）醛化合物的缩合物的碱性溶液的含有乙烯性不饱和双键的单体聚合的聚合物防垢剂，以及（B）无机胶体。该试剂用于在聚合容器的内壁等上形成涂层。这样的容器不仅在液相区域中，而且在容器中的气相和液相之间的界面附近都有效地防止聚合物垢沉积，并且可用于制备显示非常少的鱼眼的聚合物，当形成片材等时，白度好。

4. 发明授权

US5616660A Polymerization of ethylenic monomer with scale preventive agent 失效
标题翻译：乙烯单体与防垢剂的聚合
公开(公告)号：US5616660A
公开(公告)日：1997-04-01
申请号：US672371
申请日：1996-06-25
申请人： Toshihide Shimizu , Mikio Watanabe , Toshihiko Nakano
发明人： Toshihide Shimizu , Mikio Watanabe , Toshihiko Nakano
IPC分类号： C08F2/00 , C08F2/24 , C08F2/20
CPC分类号： C08F2/004
摘要： A polymer scale preventive agent for use in polymerization of a monomer having an ethylenically unsaturated double bond, comprising an alkaline solution containing (A) a condensation product of (A-1) a hydroxynaphthalene compound and (A-2) an aldehyde compound, and (B) an inorganic colloid. This agent is used for forming a coating on the inner wall, etc. of a polymerization vessel. Such a vessel is effective in preventing polymer scale deposition, not only in the liquid-phase region but also in the vicinity of the interface between the gas and liquid phases in the vessel, and useful in producing a polymer that shows very few fish eyes and good whiteness when formed into sheets or the like.
摘要翻译：包含含有（A）（A-1）羟基萘化合物和（A-2）醛化合物的缩合物的碱性溶液的含有乙烯性不饱和双键的单体聚合的聚合物防垢剂，以及（B）无机胶体。该试剂用于在聚合容器的内壁等上形成涂层。这样的容器不仅在液相区域中，而且在容器中的气相和液相之间的界面附近都有效地防止聚合物垢沉积，并且可用于制备显示非常少的鱼眼的聚合物，当形成片材等时，白度好。

5. 发明授权

US06515549B2 Semiconductor device having critical path connected by feedback ring oscillator 失效
标题翻译：具有通过反馈环形振荡器连接的关键路径的半导体器件
公开(公告)号：US06515549B2
公开(公告)日：2003-02-04
申请号：US09793655
申请日：2001-02-27
申请人： Toshihiko Nakano
发明人： Toshihiko Nakano
IPC分类号： H03B524
CPC分类号： H03K3/0315 , Y10S331/03
摘要： In a semiconductor integrated circuit, a selector 1 selects a signal FB at the input thereof by giving a proper level to a signal EN. By setting two-phase scan clocks SC1, SC2 of F/F 2,4 so that F/F 2,4 are set to the through state, a signal can be passed from F/F 2 to F/F 4 under a through state in the above circuit. Further, there can be fabricated a critical path-ring oscillator which is self-oscillated in the critical path by negatively feeding back the output of F/F 4 to F/F 2 through the signal FB. The logic in the ring is required to be an inverted logic. In a test other than a speed screening test or at the normal operation time, a proper level is given to the signal EN so that the selector 1 is switched to select the input side, thereby cutting a negative feedback path through which the output of F/F 4 is negatively fed back to F/F2.
摘要翻译：在半导体集成电路中，选择器1通过给信号EN赋予适当的电平来选择其输入端的信号FB。通过设置F / F 2,4的两相扫描时钟SC1，SC2使得F / F 2,4被设置为通过状态，可以在直通下通过F / F 2将信号从F / F 2传递到F / F 4 状态在上述电路。此外，可以制造关键路径环形振荡器，其通过信号FB将F / F 4的输出负向反馈到F / F 2而在关键路径中自振荡。环中的逻辑必须是反向逻辑。在除了速度筛选测试之外的测试中或在正常操作时间，对信号EN给出适当的电平，使得选择器1被切换以选择输入侧，从而切割负反馈路径，通过该负路反馈路径输出F / F 4反馈回F / F2。

6. 发明授权

US5754915A Automatic photosensitive material developing machine and photographic processing solution replenishing apparatus 失效
标题翻译：自动感光材料显影机和摄影处理液补充装置
公开(公告)号：US5754915A
公开(公告)日：1998-05-19
申请号：US750676
申请日：1996-12-13
申请人： Shigeru Masuda , Tsukasa Nakano , Masayuki Kojima , Masayuki Nakanishi , Toshihiko Nakano , Haruo Hakamada , Hideo Ishii
发明人： Shigeru Masuda , Tsukasa Nakano , Masayuki Kojima , Masayuki Nakanishi , Toshihiko Nakano , Haruo Hakamada , Hideo Ishii
IPC分类号： G03D3/06
CPC分类号： G03D3/065
摘要： An automatic photosensitive material developing machine supplies a solid processing solution to be dissolved according to consumption of processing solution for a silver halide photosensitive material to be treated. The developing machine includes a solid processing solution supplying section for supplying the solid processing solution from a solid processing solution cartridge containing the solid processing solution, and a solid processing solution transferring section for receiving the solid processing solution supplied by the solid processing solution supplying section in a bucket, and for transferring the bucket upward.
摘要翻译： PCT No.PCT / JP95 / 01188 Sec。 371日期1996年12月13日第 102（e）日期1996年12月13日PCT提交1995年6月12日PCT公布。 WO95 / 34844 PCT出版物日期1995年12月21日自动感光材料显影机根据消费用于待处理的卤化银感光材料的处理溶液提供待溶解的固体处理溶液。显影机包括：固体处理剂供给部，用于从固体处理溶液的固体处理液筒供给固体处理液;固体处理液转移部，其用于接收由固体处理剂供给部供给的固体处理液一个铲斗，并将铲斗向上传送。

7. 发明授权

US5487130A Fuzzy rule acquisition method and apparatus for fuzzy inference system and fuzzy inference system using the apparatus 失效
标题翻译：用于模糊推理系统的模糊规则获取方法和装置以及使用该装置的模糊推理系统
公开(公告)号：US5487130A
公开(公告)日：1996-01-23
申请号：US140665
申请日：1993-10-21
申请人： Toshihide Ichimori , Akira Maeda , Motohisa Funabashi , Toshihiko Nakano
发明人： Toshihide Ichimori , Akira Maeda , Motohisa Funabashi , Toshihiko Nakano
IPC分类号： G06F9/44 , G05B13/02 , G06N5/04 , G06N7/02 , G06F15/18 , G06F15/00
CPC分类号： G06N7/023 , G05B13/0285
摘要： A fuzzy rule acquisition method for a fuzzy inference system in which a fuzzy inference is achieved based on fuzzy knowledge including fuzzy rules each described in a format having an IF part and a THEN part, and membership functions defining meanings of respective propositions described in the IF part and THEN part, and in which a fuzzy inference is performed for at least one input value by using the fuzzy rules of the fuzzy knowledge to obtain a result of the execution of the fuzzy inference, the result of the execution of the fuzzy inference is compared with a teaching value to obtain an inference error, the errors of the fuzzy rules are obtained by using the inference error, it is judged whether each of the fuzzy rules is contradictory, based on the errors of corresponding rules of the fuzzy rules, and a fuzzy rule judged as contradictory is modified to dissolve the contradiction.
摘要翻译：一种用于模糊推理系统的模糊规则获取方法，其中基于模糊知识实现模糊推理，所述模糊知识包括以具有IF部分和THEN部分的格式描述的模糊规则，以及定义IF中描述的各自命题的含义的隶属函数通过使用模糊知识的模糊规则来获取模糊推理的执行结果，对至少一个输入值执行模糊推理，模糊推理的执行结果为与教学值相比，获得推理误差，通过使用推理误差来获得模糊规则的误差，根据模糊规则的相应规则的错误判断每个模糊规则是否矛盾，以及判断为矛盾的模糊规则被修改为消除矛盾。

8. 发明授权

US5422980A Inference processing method and apparatus 失效
标题翻译：推理处理方法和装置
公开(公告)号：US5422980A
公开(公告)日：1995-06-06
申请号：US145299
申请日：1993-11-03
申请人： Kenichi Kurosawa , Masaru Shimada , Tadaaki Bandoh , Toshihiko Nakano , Toshihiro Hayashi
发明人： Kenichi Kurosawa , Masaru Shimada , Tadaaki Bandoh , Toshihiko Nakano , Toshihiro Hayashi
IPC分类号： G06F9/44 , G06F9/45 , G06N5/04
CPC分类号： G06N5/046
摘要： A storage area for holding instantiation is provided together with a work area in order to rapidly generate a conflict set. When a condition of a rule is met, the instantiation of the rule is stored in the storage area in a form of data structure. The instantiation having an element whose attribute has been modified in an execution part of the rule is deleted from the conflict set.
摘要翻译：用于保持实例化的存储区域与工作区域一起提供，以便快速生成冲突集。当满足规则的条件时，规则的实例化以数据结构的形式存储在存储区域中。具有在规则的执行部分中其属性被修改的元素的实例被从冲突集中删除。

9. 发明授权

US09550254B2 Pure Ar gas shielded welding MIG flux-cored wire and MIG arc welding method 有权
标题翻译：纯氩气保护焊MIG药芯焊丝和MIG电弧焊接法
公开(公告)号：US09550254B2
公开(公告)日：2017-01-24
申请号：US12417849
申请日：2009-04-03
申请人： Reiichi Suzuki , Yu Umehara , Toshihiko Nakano
发明人： Reiichi Suzuki , Yu Umehara , Toshihiko Nakano
IPC分类号： B23K35/02 , B23K35/30 , B23K9/173 , B23K35/362 , B23K35/368 , B23K35/38
CPC分类号： B23K35/3053 , B23K9/173 , B23K35/0244 , B23K35/0266 , B23K35/362 , B23K35/368 , B23K35/383
摘要： A pure Ar-MIG welding wire for welding steel according to the present invention is formed of a flux-cored wire. The flux-cored wire is formed in the manner that a formation formed by welding a carbon steel hoop into a pipe shape or a seamless pipe is used as an outer sheath, the outer sheath is filled with a flux, and a wire drawing process is performed. The flux accounts for 7 to 27 mass % of the total wire mass. The wire contains graphite in the amount of 0.16 to 2.00 mass % on the basis of the total wire mass and iron powder in the amount of 20 mass % on the basis of the total flux mass. According to the construction, neither expensive metal resource nor a greenhouse effect gas is used, slag and fume generation is inhibited, and a weld joint having a high static tensile strength and fatigue strength can be obtained.
摘要翻译：根据本发明的用于焊接钢的纯Ar-MIG焊丝由药芯焊丝形成。药芯焊丝的形成方式是将碳钢箍焊接成管状或无缝管形成的地层作为外护套，外护套填充焊剂，拉丝工序为执行。通量占总线质量的7〜27质量％。基于总线质量，以总质量为基准，以总质量为20质量％的铁粉为基准，含有0.16〜2.00质量％的石墨。根据该结构，既不昂贵的金属资源也不使用温室效应气体，因此能够抑制炉渣和烟气产生，能够获得具有高静电抗张强度和疲劳强度的焊接接头。

10. 发明申请

US20090042107A1 PELLICLE FOR HIGH NUMERICAL APERTURE EXPOSURE DEVICE 审中-公开
标题翻译：高数值孔径曝光装置用透镜
公开(公告)号：US20090042107A1
公开(公告)日：2009-02-12
申请号：US12162420
申请日：2007-01-30
申请人： Masahiro Kondou , Toshihiko Nakano
发明人： Masahiro Kondou , Toshihiko Nakano
IPC分类号： G03F1/00
CPC分类号： G03F1/62
摘要： A pellicle that is used in a semiconductor lithography process and that can be used in an exposure device with an optical system having a numerical aperture of 1.0 or above, is provided. The pellicle of the present invention uses a pellicle film that has had its film thickness adjusted so as to exhibit transmittance of 95% or above at angles of incidence of exposure light with respect to the pellicle film in the range of from 0° to 20°. By using the pellicle of the present invention, it is possible to produce a semiconductor having an unprecedented fine circuit pattern at good yield while preventing adherence of dust to a reticle.
摘要翻译：提供了用于半导体光刻工艺中并且可以用于具有数值孔径为1.0或更大的光学系统的曝光装置中的防护薄膜组件。本发明的防护薄膜组件使用其薄膜厚度调整为使曝光光相对于防护薄膜的入射角在0°〜20°范围内的透射率为95％以上的防护薄膜组件。通过使用本发明的防护薄膜组件，可以以良好的成品率制造具有前所未有的微细电路图案的半导体，同时防止灰尘附着在掩模版上。

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