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1. 发明授权

US08284517B1 Perpendicular magnetic recording head 有权
标题翻译：垂直磁记录头
公开(公告)号：US08284517B1
公开(公告)日：2012-10-09
申请号：US13372775
申请日：2012-02-14
申请人： Hai Sun , Jinqiu Zhang , Hongping Yuan , Donghong Li , Liubo Hong , Yong Shen
发明人： Hai Sun , Jinqiu Zhang , Hongping Yuan , Donghong Li , Liubo Hong , Yong Shen
IPC分类号： G11B5/127
CPC分类号： G11B5/3163 , G11B5/1278 , G11B5/3116 , Y10T29/49041
摘要： A perpendicular magnetic recording (PMR) head comprises a PMR pole having at least one side, a bottom, and a top wider than the bottom, a first portion of the at least one side being substantially vertical, a second portion of the at least one side being nonvertical, the top portion having a width not greater than one hundred fifty nanometers. The PMR head further comprises a nonmagnetic layer surrounding the bottom and the at least one side of the PMR pole, an intermediate layer substantially surrounding at least the second portion of the at least one side of the PMR pole, and a planarization stop layer adjacent to the first portion of the at least one side of the PMR pole.
摘要翻译：垂直磁记录（PMR）头包括具有至少一个侧面，底部和顶部宽于底部的PMR极，所述至少一个侧面的第一部分基本上垂直，所述至少一个的第二部分侧面是非垂直的，顶部具有不大于一百五十纳米的宽度。 PMR头还包括围绕PMR极的底部和至少一侧的非磁性层，基本上围绕PMR极的至少一个侧面的至少第二部分的中间层和与PMR极的相邻的平坦化停止层 PMR极点的至少一侧的第一部分。

2. 发明授权

US08136224B1 Method and system for providing a perpendicular magnetic recording head utilizing a mask having an undercut line 有权
标题翻译：用于使用具有底切线的掩模来提供垂直磁记录头的方法和系统
公开(公告)号：US08136224B1
公开(公告)日：2012-03-20
申请号：US12121540
申请日：2008-05-15
申请人： Hai Sun , Jinqiu Zhang , Hongping Yuan , Donghong Li , Liubo Hong , Yong Shen
发明人： Hai Sun , Jinqiu Zhang , Hongping Yuan , Donghong Li , Liubo Hong , Yong Shen
IPC分类号： G11B5/127
CPC分类号： G11B5/3163 , G11B5/1278 , G11B5/3116 , Y10T29/49041
摘要： A method and system for providing a PMR pole in a magnetic recording transducer including an intermediate layer are disclosed. The method and system include providing a mask including a line on the intermediate layer. The line has at least one side, a top, and a bottom. The side(s) have an undercut such that the top of the line is wider than the bottom. The method further include providing a hard mask on the PMR transducer. The hard mask includes an aperture corresponding to the line. Thus, an aperture in the hard mask corresponding to the line is provided. The method and system also include forming a trench in the intermediate layer under the aperture. The trench has a bottom and a top wider than the bottom. The method further includes providing a PMR pole, at least a portion of which resides in the trench.
摘要翻译：公开了一种用于在包括中间层的磁记录换能器中提供PMR极的方法和系统。该方法和系统包括在中间层上提供包括线的掩模。该线至少有一边，顶部和底部。侧面具有底切，使得线的顶部比底部更宽。该方法还包括在PMR传感器上提供硬掩模。硬掩模包括对应于该线的孔。因此，提供了对应于该线的硬掩模中的孔。该方法和系统还包括在孔下方的中间层中形成沟槽。沟槽的底部和顶部宽于底部。该方法还包括提供PMR极，其至少一部分位于沟槽中。

3. 发明授权

US08166632B1 Method for providing a perpendicular magnetic recording (PMR) transducer 有权
标题翻译：提供垂直磁记录（PMR）传感器的方法
公开(公告)号：US08166632B1
公开(公告)日：2012-05-01
申请号：US12057611
申请日：2008-03-28
申请人： Jinqiu Zhang , Liubo Hong , Yong Shen , Donghong Li
发明人： Jinqiu Zhang , Liubo Hong , Yong Shen , Donghong Li
IPC分类号： G11B5/127 , H04R31/00
CPC分类号： G11B5/3163 , G11B5/1278 , G11B5/3116 , Y10T29/49039 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A method and system for providing a PMR transducer including an intermediate layer. The method and system include providing a hard mask layer on the intermediate layer. The hard mask layer is for a reactive ion etch of the intermediate layer. The method and system also include providing a bottom antireflective coating (BARC) layer on the hard mask layer. The BARC layer is also a masking layer for the hard mask layer. The method and system also include forming a trench in the intermediate layer using at least one reactive ion etch (RIE). The trench has a bottom and a top wider than the bottom. The method and system also include providing a PMR pole. At least a portion of the PMR pole resides in the trench.
摘要翻译：一种用于提供包括中间层的PMR换能器的方法和系统。该方法和系统包括在中间层上提供硬掩模层。硬掩模层用于中间层的反应离子蚀刻。该方法和系统还包括在硬掩模层上提供底部抗反射涂层（BARC）层。 BARC层也是硬掩模层的掩模层。该方法和系统还包括使用至少一个反应离子蚀刻（RIE）在中间层中形成沟槽。沟槽的底部和顶部宽于底部。该方法和系统还包括提供PMR极点。 PMR极的至少一部分位于沟槽中。

4. 发明授权

US08835546B2 Finishing glaze for decorative texturing medium 有权
标题翻译：装饰纹理介质的完成釉
公开(公告)号：US08835546B2
公开(公告)日：2014-09-16
申请号：US12502337
申请日：2009-07-14
申请人： Donghong Li
发明人： Donghong Li
IPC分类号： C09D133/00 , C09D175/04 , C09D125/06 , C08L33/08 , C09D133/08 , C09D127/06 , C08L91/08 , C08L1/00 , C08L75/04
CPC分类号： C09D127/06 , C08L1/00 , C08L33/08 , C08L75/04 , C08L91/08 , C08L2205/02 , C08L2205/035 , C09D133/08 , C08L2666/02 , C08L2666/06
摘要： A glaze composition for application to a substrate includes a dry powder latex, a liquid latex emulsion, a coalescing solvent, a wax, a thickener and water. The glaze is rewettable during application and is extremely durable after fully dry. Optionally, the glaze also includes one or more of a surfactant, a dispersant, one or more pigments, a dispersant, a defoamer, a slow drying solvent, and a slow drying hydrocarbon resin.
摘要翻译：用于基材的釉料组合物包括干粉胶乳，液体胶乳乳液，聚结溶剂，蜡，增稠剂和水。釉料在使用过程中可再润湿，完全干燥后非常耐用。任选地，釉料还包括一种或多种表面活性剂，分散剂，一种或多种颜料，分散剂，消泡剂，缓慢干燥溶剂和缓慢干燥的烃树脂。

5. 发明申请

US20100016479A1 FINISHING GLAZE FOR DECORATIVE TEXTURING MEDIUM 有权
标题翻译：完成装饰纹理的玻璃
公开(公告)号：US20100016479A1
公开(公告)日：2010-01-21
申请号：US12502337
申请日：2009-07-14
申请人： Donghong Li
发明人： Donghong Li
IPC分类号： C09D133/00 , C09D175/04 , C09D125/06
CPC分类号： C09D127/06 , C08L1/00 , C08L33/08 , C08L75/04 , C08L91/08 , C08L2205/02 , C08L2205/035 , C09D133/08 , C08L2666/02 , C08L2666/06
摘要： A glaze composition for application to a substrate includes a dry powder latex, a liquid latex emulsion, a coalescing solvent, a wax, a thickener and water. The glaze is rewettable during application and is extremely durable after fully dry. Optionally, the glaze also includes one or more of a surfactant, a dispersant, one or more pigments, a dispersant, a defoamer, a slow drying solvent, and a slow drying hydrocarbon resin.
摘要翻译：用于基材的釉料组合物包括干粉胶乳，液体胶乳乳液，聚结溶剂，蜡，增稠剂和水。釉料在使用过程中可再润湿，完全干燥后非常耐用。任选地，釉料还包括一种或多种表面活性剂，分散剂，一种或多种颜料，分散剂，消泡剂，缓慢干燥溶剂和缓慢干燥的烃树脂。

6. 发明申请

US20090298968A1 DECORATIVE COMPOSITION AND METHOD OF USING IT 审中-公开
标题翻译：装饰性组合物及其使用方法
公开(公告)号：US20090298968A1
公开(公告)日：2009-12-03
申请号：US12132204
申请日：2008-06-03
申请人： Rafael Bury , Donghong Li
发明人： Rafael Bury , Donghong Li
IPC分类号： C04B103/67 , C08L33/24 , C08K3/10 , C08L1/00 , C08L33/00
CPC分类号： C08L33/08 , C04B26/02 , C04B2111/1037 , C08L35/00 , C08L35/06 , C09D133/08 , C09D135/06 , C04B14/28 , C04B2103/44 , C04B2103/67 , C08L2666/02
摘要： A composition includes a first filler in amounts of at least 50% based on the total composition weight and an optional second filler. Other components of the decorative composition include a polymeric resin, a coalescent solvent and water. This composition is substantially free of stucco, cement or other hydraulic component where the setting action would act as the binder for the composition. It is useful for creating textures on the surface of interior walls or ceilings.
摘要翻译：组合物包括基于总组合物重量至少50％的量的第一填料和任选的第二填料。装饰组合物的其它组分包括聚合物树脂，聚结剂溶剂和水。该组合物基本上不含灰泥，水泥或其它液压组分，其中凝固作用将用作组合物的粘合剂。它可用于在内墙或天花板的表面上创建纹理。

7. 发明授权

US07313863B2 Method to form a cavity having inner walls of varying slope 有权
标题翻译：形成具有不同斜率内壁的腔体的方法
公开(公告)号：US07313863B2
公开(公告)日：2008-01-01
申请号：US11146583
申请日：2005-06-07
申请人： Donghong Li , Yoshitaka Sasaki
发明人： Donghong Li , Yoshitaka Sasaki
IPC分类号： H01R9/00 , H05K3/00
CPC分类号： G11B5/3116 , G11B5/1278 , G11B5/3163 , H01F41/34 , Y10T29/49032 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052 , Y10T29/49124 , Y10T29/49147
摘要： An improved mold, for use in the formation of a perpendicular magnetic write head, is described, together with a process for its manufacture. Conventional alumina is replaced by tantalum in the yoke portion of the mold. When both the tantalum and the alumina areas are simultaneously subjected to reactive ion etching, sloping sidewalls are obtained in the alumina area (write pole tip portion) whereas the sidewalls are almost vertical in the tantalum (yoke) area, resulting in a uniform neck height.
摘要翻译：描述了用于形成垂直磁性写入头的改进的模具，以及其制造方法。传统氧化铝在模具的磁轭部分被钽代替。当钽和氧化铝区域同时进行反应离子蚀刻时，在氧化铝区域（写磁极尖端部分）中获得倾斜的侧壁，而在钽（磁轭）区域中侧壁几乎是垂直的，从而形成均匀的颈部高度。

8. 发明申请

US20060002021A1 Using bilayer lithography process to define neck height for PMR 有权
标题翻译：使用双层光刻工艺来定义PMR的颈部高度
公开(公告)号：US20060002021A1
公开(公告)日：2006-01-05
申请号：US10881444
申请日：2004-06-30
申请人： Donghong Li , Yoshitaka Sasaki
发明人： Donghong Li , Yoshitaka Sasaki
IPC分类号： G11B5/147
CPC分类号： G11B5/3163 , G11B5/1278 , Y10T29/49021
摘要： A method for independently forming neck height (NH) and pole width dimensions in a main pole layer of a PMR write head is described. A main pole layer with a pole tip region is formed on a bottom yoke. The pole tip region is trimmed by an ion milling process to give a pole width. A bilayer resist is patterned to form an opening with an undercut on the main pole layer. The opening uncovers the pole tip region except for an NH length adjacent to the pole tip. A top yoke comprised of CoFeN with a thickness of about 0.2 microns is deposited in the opening and the bilayer resist is removed by a lift-off process. Thereafter, a write gap layer is formed on the pole tip region and then first, second, and third write shield layers are formed above the write gap layer along the ABS.
摘要翻译：描述了在PMR写头的主极层中独立地形成颈部高度（NH）和极宽度尺寸的方法。具有极尖区域的主极层形成在底架上。通过离子铣削工艺修剪极尖区域以产生极宽度。图案化双层抗蚀剂以在主极层上形成具有底切的开口。除了与极尖相邻的NH长度之外，开口露出磁极尖端区域。由厚度约0.2微米的CoFeN组成的顶部磁轭沉积在开口中，并通过剥离过程去除双层抗蚀剂。此后，在极尖区域上形成写间隙层，然后沿着ABS形成在写间隙层上方的第一，第二和第三写屏蔽层。

9. 发明申请

US20110250359A1 PROTECTIVE AQUEOUS TREATMENT FOR WOOD AND METHOD FOR PRODUCING TREATMENT 审中-公开
标题翻译：用于木材的保护性水性处理和用于生产处理的方法
公开(公告)号：US20110250359A1
公开(公告)日：2011-10-13
申请号：US13163109
申请日：2011-06-17
申请人： JOHN SINKO , Donghong Li , Darryl L. Cielinski , John A. Hennes
发明人： JOHN SINKO , Donghong Li , Darryl L. Cielinski , John A. Hennes
IPC分类号： B05D3/02 , C09D5/16
CPC分类号： C09D5/14 , B27K3/16
摘要： A multi-functional aqueous protective treatment for wood substrates. The treatment comprises an aqueous solution of a zirconyl compound and incorporated bio-active constituents, providing protection against bio-degradation of wood and against degradation of aesthetic value of applied wood coatings by spontaneous staining and also protects against termites or other “in-depth” bio-degradation factors.
摘要翻译：木质底物的多功能水性保护处理。该处理包括氧化锆化合物的水溶液和掺入的生物活性组分，提供防止木材生物降解的保护性，并通过自发染色降低施用的木材涂层的美观价值，并且还防止白蚁或其他“深入” 生物降解因子。

10. 发明授权

US07672079B2 Pole width control on plated bevel main pole design of a perpendicular magnetic recording head 有权
标题翻译：极板宽度控制电镀斜面主极设计的垂直磁记录头
公开(公告)号：US07672079B2
公开(公告)日：2010-03-02
申请号：US10886284
申请日：2004-07-07
申请人： Donghong Li , Yoshitaka Sasaki
发明人： Donghong Li , Yoshitaka Sasaki
IPC分类号： G11B5/127
CPC分类号： G11B5/3163 , G11B5/1278 , Y10T29/49032 , Y10T29/49043 , Y10T29/49044 , Y10T29/49046 , Y10T29/49048 , Y10T29/49052
摘要： A main pole layer is deposited within an opening in a patterned photoresist layer on a substrate. The photoresist is thinned to expose an upper portion of a pole tip region that is then trimmed to a rectangular shape while a lower portion retains an inverted trapezoidal shape. Thereafter, a second trimming process forms a pole tip with a first width in the upper rectangular portion and a second thickness and second width which is less than the first width in the lower portion. A CMP step subsequently thins the upper portion to a first thickness of 0.04 to 0.08 microns while the second thickness remains at 0.16 to 0.32 microns. The bottom surface of the lower portion along the ABS becomes the trailing edge in a recording operation. The pole tip has a consistent first width (track width) that is not influenced by CMP process variations.
摘要翻译：主极层沉积在衬底上的图案化光致抗蚀剂层的开口内。光致抗蚀剂变薄以暴露极尖区域的上部，然后将其修剪成矩形，而下部保持倒梯形形状。此后，第二修整处理在上部矩形部分中形成具有第一宽度的极尖，并且在下部形成小于第一宽度的第二厚度和第二宽度。 CMP步骤随后将上部部分变薄至0.04至0.08微米的第一厚度，而第二厚度保持在0.16至0.32微米。沿着ABS的下部的底面在记录操作中成为后缘。极尖具有不受CMP工艺变化影响的一致的第一宽度（轨道宽度）。

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