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1. 发明申请

US20160203940A1 Anti-Contamination Trap, and Vacuum Application Device 审中-公开
标题翻译：抗污染捕集阱和真空应用装置
公开(公告)号：US20160203940A1
公开(公告)日：2016-07-14
申请号：US14911960
申请日：2014-09-18
申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION
发明人： Takashi MIZUO , Yusuke TAMBA , Haruhiko HATANO , Kazutaka NIMURA
IPC分类号： H01J37/18 , F25B45/00 , F25B19/00
CPC分类号： H01J37/18 , F25B19/005 , F25B45/00 , H01J2237/002 , H01J2237/022 , H01J2237/028 , H01J2237/182 , H01J2237/2001 , H01J2237/2002
摘要： In conventional structures, a space between a dual cooling tank is vacuum insulated, and a cooling part is cooled via a highly thermally conductive material connected to an inner container. Such structures are affected by heat infiltrating into the highly thermally conductive material and the cooling part. For instance, in cases when liquid nitrogen is used as a coolant, it takes approximately 30 minutes for the temperature to reach −120° C. Even in cases when a significant amount of time has been spent, the temperature only reaches approximately −150° C., and thus falls significantly short of the temperature of liquid nitrogen, namely −196° C. Accordingly, an anti-contamination trap and a vacuum application device according to the present invention are provided with a structure in which a device-internal cooling part in the vacuum application device is cooled, and are characterized by being provided with: a cooling tank filled with a coolant for cooling a cooling part; and a cooling pipe extending from the cooling tank to the vicinity of the cooling part. The anti-contamination trap and the vacuum application device are further characterized in that: the coolant is supplied to an end of the cooling part; and a tube for releasing air bubbles inside the cooling pipe is inserted so as to extend to the cooling part.
摘要翻译：在常规结构中，双重冷却罐之间的空间是真空绝缘的，并且通过连接到内部容器的高导热性材料冷却冷却部件。这种结构受到热量渗入高导热材料和冷却部分的影响。例如，在使用液氮作为冷却剂的情况下，温度达到-120℃需要约30分钟。即使花费了大量时间的情况下，温度仅达到约-150° 因此，显着低于液氮的温度即-196℃。因此，根据本发明的抗污染捕集器和真空施加装置设置有其中装置内部冷却真空应用装置中的一部分被冷却，其特征在于设有：填充有用于冷却冷却部件的冷却剂的冷却罐; 以及从冷却槽延伸到冷却部附近的冷却管。抗污染捕集器和真空施加装置的特征还在于：将冷却剂供给到冷却部件的一端; 并且用于释放冷却管内的气泡的管被插入以延伸到冷却部。

2. 发明申请

US20180350554A1 CHARGED PARTICLE BEAM APPARATUS AND CONTROL METHOD THEREOF 审中-公开
公开(公告)号：US20180350554A1
公开(公告)日：2018-12-06
申请号：US15777121
申请日：2016-11-29
申请人： HITACHI HIGH-TECHNOLOGIES CORPORATION
发明人： Takeshi SUNAOSHI , Yoshihisa ORAI , Haruhiko HATANO , Takashi MIZUO
IPC分类号： H01J37/20 , F25B19/00
摘要： The invention is directed to a charged particle beam apparatus that enables temperature maintenance in a cooling unit provided inside a vacuum application apparatus using a refrigerant. The charged particle beam apparatus includes a cooling tank that contains a refrigerant for cooling a cooling unit, a cooling pipe that supplies the refrigerant from the cooling tank to the cooling unit, and a unit that leads the refrigerant to liquefy when the refrigerant is biased to a solid.

3. 发明申请

US20150340199A1 Specimen Cryo Holder and Dewar 有权
标题翻译：标本冷冻架和杜瓦
公开(公告)号：US20150340199A1
公开(公告)日：2015-11-26
申请号：US14410235
申请日：2013-06-04
申请人： Hitachi High-Technologies Corporation
发明人： Yasuhira NAGAKUBO , Takashi MIZUO
IPC分类号： H01J37/20 , H01J37/26
CPC分类号： H01J37/20 , H01J37/26 , H01J2237/184 , H01J2237/2001 , H01J2237/2002 , H01J2237/20207
摘要： In view of that in an existing specimen cryo holder a change in the orientation of a specimen would lead to tilting of a dewar together with the specimen and hence to bubbling of a cooling source contained in the dewar, provided is a specimen cryo holder (13) including a mechanism (14, 15, 17, 18) capable of cooling a specimen (1) while keeping the posture of a dewar in a fixed direction even when the specimen (1) is tilted into a direction suitable for processing or observation thereof. Also provided is a dewar wherein a vacuum maintenance mechanism (24, 25) is mounted to an outer vessel (21) by which an inner vessel (23) holding a cooling source therein is vacuum-insulated from the outside air.
摘要翻译：鉴于在现有样品冷冻保持器中，样品的取向的变化将导致杜瓦瓶与样品一起倾斜，并因此产生包含在杜瓦瓶中的冷却源的起泡，只要样品冷冻保持器（13 ）包括能够冷却试样（1）同时保持杜瓦瓶的姿势在固定方向的机构（14,15,17,18），即使当试样（1）倾斜到适于加工或观察的方向。还提供了一种杜瓦瓶，其中真空维护机构（24,25）安装到外部容器（21）上，其中容纳冷却源的内部容器（23）通过外部容器（23）与外部空气真空绝缘。

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