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1. 发明授权

US08192642B2 Spin-on protective coatings for wet-etch processing of microelectronic substrates 有权
标题翻译：用于微电子衬底的湿法蚀刻加工的旋涂保护涂层
公开(公告)号：US08192642B2
公开(公告)日：2012-06-05
申请号：US11855036
申请日：2007-09-13
申请人： Gu Xu , Kimberly A. Yess , Tony D. Flaim
发明人： Gu Xu , Kimberly A. Yess , Tony D. Flaim
IPC分类号： C03C15/00 , C03C25/68
CPC分类号： H01L21/0271 , B81C1/00801 , C08L63/04 , C09D125/12 , Y10T428/31511 , Y10T428/31663 , C08L2666/14
摘要： New protective coating layers for use in wet etch processes during the production of semiconductor and MEMS devices are provided. The layers include a primer layer, a first protective layer, and an optional second protective layer. The primer layer preferably comprises an organo silane compound in a solvent system. The first protective layer includes thermoplastic copolymers prepared from styrene, acrylonitrile, and compatible compounds such as monomers, oligomers, and polymers comprising epoxy groups; poly(styrene-co-allyl alcohol); and mixtures thereof. The second protective layer comprises a highly halogenated polymer such as a chlorinated polymer which may or may not be crosslinked upon heating.
摘要翻译：提供了在制造半导体和MEMS器件期间用于湿蚀刻工艺的新的保护涂层。这些层包括底漆层，第一保护层和任选的第二保护层。底漆层优选在溶剂体系中包含有机硅烷化合物。第一保护层包括由苯乙烯，丙烯腈和相容化合物如单体，低聚物和包含环氧基的聚合物制备的热塑性共聚物; 聚（苯乙烯 - 共 - 烯丙醇）; 及其混合物。第二保护层包括高度卤化的聚合物，例如氯化聚合物，其在加热时可以或不会交联。

2. 发明申请

US20120130004A1 SPIN-ON PROTECTIVE COATINGS FOR WET-ETCH PROCESSING OF MICROELECTRONIC SUBSTRATES 有权
标题翻译：用于微电子基板湿蚀刻加工的旋转保护涂层
公开(公告)号：US20120130004A1
公开(公告)日：2012-05-24
申请号：US13361556
申请日：2012-01-30
申请人： Gu Xu , Kimberly A. Yess , Tony D. Flaim
发明人： Gu Xu , Kimberly A. Yess , Tony D. Flaim
IPC分类号： C09D133/20
CPC分类号： H01L21/0271 , B81C1/00801 , C08L63/04 , C09D125/12 , Y10T428/31511 , Y10T428/31663 , C08L2666/14
摘要： New protective coating layers for use in wet etch processes during the production of semiconductor and MEMS devices are provided. The layers include a primer layer, a first protective layer, and an optional second protective layer. The primer layer preferably comprises an organo silane compound in a solvent system. The first protective layer includes thermoplastic copolymers prepared from styrene, acrylonitrile, and compatible compounds such as monomers, oligomers, and polymers comprising epoxy groups; poly(styrene-co-allyl alcohol); and mixtures thereof. The second protective layer comprises a highly halogenated polymer such as a chlorinated polymer to which may or may not be crosslinked upon heating.
摘要翻译：提供了在制造半导体和MEMS器件期间用于湿蚀刻工艺的新的保护涂层。这些层包括底漆层，第一保护层和任选的第二保护层。底漆层优选在溶剂体系中包含有机硅烷化合物。第一保护层包括由苯乙烯，丙烯腈和相容化合物如单体，低聚物和包含环氧基的聚合物制备的热塑性共聚物; 聚（苯乙烯 - 共 - 烯丙醇）; 及其混合物。第二保护层包括高度卤化的聚合物，例如氯化聚合物，其在加热时可能交联或不会交联。

3. 发明授权

US08445591B2 Spin-on protective coatings for wet-etch processing of microelectronic substrates 有权
标题翻译：用于微电子衬底的湿法蚀刻加工的旋涂保护涂层
公开(公告)号：US08445591B2
公开(公告)日：2013-05-21
申请号：US13361556
申请日：2012-01-30
申请人： Gu Xu , Kimberly A. Yess , Tony D. Flaim
发明人： Gu Xu , Kimberly A. Yess , Tony D. Flaim
IPC分类号： C08L9/02 , B32B27/30 , B32B27/38
CPC分类号： H01L21/0271 , B81C1/00801 , C08L63/04 , C09D125/12 , Y10T428/31511 , Y10T428/31663 , C08L2666/14
摘要： New protective coating layers for use in wet etch processes during the production of semiconductor and MEMS devices are provided. The layers include a primer layer, a first protective layer, and an optional second protective layer. The primer layer preferably comprises an organo silane compound in a solvent system. The first protective layer includes thermoplastic copolymers prepared from styrene, acrylonitrile, and compatible compounds such as monomers, oligomers, and polymers comprising epoxy groups; poly(styrene-co-allyl alcohol); and mixtures thereof. The second protective layer comprises a highly halogenated polymer such as a chlorinated polymer to which may or may not be crosslinked upon heating.
摘要翻译：提供了在制造半导体和MEMS器件期间用于湿蚀刻工艺的新的保护涂层。这些层包括底漆层，第一保护层和可选的第二保护层。底漆层优选在溶剂体系中包含有机硅烷化合物。第一保护层包括由苯乙烯，丙烯腈和相容化合物如单体，低聚物和包含环氧基的聚合物制备的热塑性共聚物; 聚（苯乙烯 - 共 - 烯丙醇）; 及其混合物。第二保护层包括高度卤化的聚合物，例如氯化聚合物，其在加热时可能交联或不会交联。

4. 发明申请

US20090075087A1 SPIN-ON PROTECTIVE COATINGS FOR WET-ETCH PROCESSING OF MICROELECTRONIC SUBSTRATES 有权
标题翻译：用于微电子基板湿蚀刻加工的旋转保护涂层
公开(公告)号：US20090075087A1
公开(公告)日：2009-03-19
申请号：US11855036
申请日：2007-09-13
申请人： Gu Xu , Kimberly A. Yess , Tony D. Flaim
发明人： Gu Xu , Kimberly A. Yess , Tony D. Flaim
IPC分类号： B32B27/38 , C08L71/10
CPC分类号： H01L21/0271 , B81C1/00801 , C08L63/04 , C09D125/12 , Y10T428/31511 , Y10T428/31663 , C08L2666/14
摘要： New protective coating layers for use in wet etch processes during the production of semiconductor and MEMS devices are provided. The layers include a primer layer, a first protective layer, and an optional second protective layer. The primer layer preferably comprises an organo silane compound in a solvent system. The first protective layer includes thermoplastic copolymers prepared from styrene, acrylonitrile, and compatible compounds such as monomers, oligomers, and polymers comprising epoxy groups; poly(styrene-co-allyl alcohol); and mixtures thereof. The second protective layer comprises a highly halogenated polymer such as a chlorinated polymer which may or may not be crosslinked upon heating.
摘要翻译：提供了在制造半导体和MEMS器件期间用于湿蚀刻工艺的新的保护涂层。这些层包括底漆层，第一保护层和任选的第二保护层。底漆层优选在溶剂体系中包含有机硅烷化合物。第一保护层包括由苯乙烯，丙烯腈和相容化合物如单体，低聚物和包含环氧基的聚合物制备的热塑性共聚物; 聚（苯乙烯 - 共 - 烯丙醇）; 及其混合物。第二保护层包括高度卤化的聚合物，例如氯化聚合物，其在加热时可以或不会交联。

5. 发明申请

US20110171478A1 ACID-ETCH RESISTANT, PROTECTIVE COATINGS 有权
标题翻译：防酸涂层，防护涂料
公开(公告)号：US20110171478A1
公开(公告)日：2011-07-14
申请号：US12718516
申请日：2010-03-05
申请人： Tingji Tang , Gu Xu , Xing-Fu Zhong , Wenbin Hong , Tony D. Flaim , Kimberly Yess , Ramachandran K. Trichur
发明人： Tingji Tang , Gu Xu , Xing-Fu Zhong , Wenbin Hong , Tony D. Flaim , Kimberly Yess , Ramachandran K. Trichur
IPC分类号： C09D145/00 , B32B13/12 , B32B15/08 , B32B27/00 , B32B27/08 , B32B17/10 , G03F7/20 , G03F7/004 , H05K13/00
CPC分类号： B81C1/00801 , B81C2201/053 , C08G61/08 , C08G2261/3324 , C08G2261/418 , G03F7/033 , G03F7/094 , H01L21/0274 , H01L21/3081 , Y10T428/31645 , Y10T428/31667 , Y10T428/31692 , Y10T428/31855 , Y10T428/31909
摘要： New compositions and methods of using those compositions as protective layers during the production of semiconductor and MEMS devices are provided. The compositions comprise a cycloolefin copolymer dispersed or dissolved in a solvent system, and can be used to form layers that protect a substrate during acid etching and other processing and handling. The protective layer can be photosensitive or non-photosensitive, and can be used with or without a primer layer beneath the protective layer. Preferred primer layers comprise a basic polymer in a solvent system.
摘要翻译：提供了在制造半导体和MEMS器件期间使用这些组合物作为保护层的新组合物和方法。组合物包含分散或溶解在溶剂体系中的环烯烃共聚物，并且可以用于在酸蚀刻和其它加工和处理期间形成保护基材的层。保护层可以是光敏的或非感光的，并且可以在保护层下面使用或不使用底漆层。优选的底漆层在溶剂体系中包含碱性聚合物。

6. 发明授权

US08771927B2 Acid-etch resistant, protective coatings 有权
标题翻译：耐酸蚀，保护涂层
公开(公告)号：US08771927B2
公开(公告)日：2014-07-08
申请号：US12718516
申请日：2010-03-05
申请人： Tingji Tang , Gu Xu , Xing-Fu Zhong , Wenbin Hong , Tony D. Flaim , Kimberly Yess , Ramachandran K. Trichur
发明人： Tingji Tang , Gu Xu , Xing-Fu Zhong , Wenbin Hong , Tony D. Flaim , Kimberly Yess , Ramachandran K. Trichur
IPC分类号： G03F7/26
CPC分类号： B81C1/00801 , B81C2201/053 , C08G61/08 , C08G2261/3324 , C08G2261/418 , G03F7/033 , G03F7/094 , H01L21/0274 , H01L21/3081 , Y10T428/31645 , Y10T428/31667 , Y10T428/31692 , Y10T428/31855 , Y10T428/31909
摘要： New compositions and methods of using those compositions as protective layers during the production of semiconductor and MEMS devices are provided. The compositions comprise a cycloolefin copolymer dispersed or dissolved in a solvent system, and can be used to form layers that protect a substrate during acid etching and other processing and handling. The protective layer can be photosensitive or non-photosensitive, and can be used with or without a primer layer beneath the protective layer. Preferred primer layers comprise a basic polymer in a solvent system.
摘要翻译：提供了在制造半导体和MEMS器件期间使用这些组合物作为保护层的新组合物和方法。组合物包含分散或溶解在溶剂体系中的环烯烃共聚物，并且可以用于在酸蚀刻和其它加工和处理期间形成保护基材的层。保护层可以是光敏的或非感光的，并且可以在保护层下面使用或不使用底漆层。优选的底漆层在溶剂体系中包含碱性聚合物。

7. 发明申请

US20110231347A1 Named Entity Recognition in Query 有权
标题翻译：命名实体识别查询
公开(公告)号：US20110231347A1
公开(公告)日：2011-09-22
申请号：US12725342
申请日：2010-03-16
申请人： Gu Xu , Hang Li , Jiafeng Guo
发明人： Gu Xu , Hang Li , Jiafeng Guo
IPC分类号： G06F15/18 , G06N7/02 , G06F17/30
CPC分类号： G06F17/30864
摘要： Named Entity Recognition in Query (NERQ) involves detection of a named entity in a given query and classification of the named entity into one or more predefined classes. The predefined classes may be based on a predefined taxonomy. A probabilistic approach may be taken to detecting and classifying named entities in queries, the approach using either query log data or click through data and Weakly Supervised Latent Dirichlet Allocation (WS-LDA) to construct and train a topic model.
摘要翻译：查询中的命名实体识别（NERQ）涉及在给定查询中检测命名实体并将命名实体分类为一个或多个预定义类。预定义的类可以基于预定义的分类。可以采用概率方法在查询中检测和分类命名实体，该方法使用查询日志数据或点击数据和弱监督潜在狄更特分配（WS-LDA）来构建和训练主题模型。

8. 发明申请

US20070208703A1 Web forum crawler 有权
标题翻译：网页论坛抓取工具
公开(公告)号：US20070208703A1
公开(公告)日：2007-09-06
申请号：US11368261
申请日：2006-03-03
申请人： Bin Shi , Gu Xu , Wei-Ying Ma
发明人： Bin Shi , Gu Xu , Wei-Ying Ma
IPC分类号： G06F17/30
CPC分类号： G06F17/30864 , Y10S707/99934 , Y10S707/99936
摘要： A crawling system crawls a web site initially in a pattern detection phase and subsequently in a pattern usage phase. The pattern detection phase attempts to identify patterns of references to pages that contain informational content of interest and patterns of references to pages that contain little informational content of interest. During the pattern usage phase, the crawling system crawls the web site. When the crawling system encounters a reference contained on an accessed page, the crawling system determines whether the reference matches a reference pattern. If the reference matches a reference pattern associated with pages that contain informational content of interest, the crawling system accesses the referenced page. If, however, the reference matches a reference pattern of pages with little informational content, then the crawling system discards that reference without accessing the referenced page.
摘要翻译：爬行系统首先在模式检测阶段中抓取网站，然后在模式使用阶段中。模式检测阶段尝试识别对包含感兴趣的信息内容的页面的引用模式，以及对包含很少的感兴趣的信息内容的页面的引用模式。在模式使用阶段，爬网系统抓取网站。当爬网系统遇到访问页面上的引用时，爬网系统会确定引用是否与引用模式匹配。如果引用匹配与包含感兴趣的信息内容的页面相关联的引用模式，则爬行系统访问所引用的页面。但是，如果引用匹配具有少量信息内容的页面的引用模式，则爬行系统将丢弃该引用而不访问引用的页面。

9. 发明申请

US20050025242A1 Sequential motion pattern representation 有权
标题翻译：顺序运动图案表示
公开(公告)号：US20050025242A1
公开(公告)日：2005-02-03
申请号：US10632666
申请日：2003-08-01
申请人： Yu-Fei Ma , Gu Xu , Hong-Jiang Zhang
发明人： Yu-Fei Ma , Gu Xu , Hong-Jiang Zhang
IPC分类号： G06T7/20 , H04N5/14 , H04N7/12
CPC分类号： G06T7/20 , H04N5/145
摘要： Systems and methods for representing sequential motion patterns are described. In one aspect, video frames are converted into a sequence of energy redistribution measurements. One or more motion filters are then applied to the ER measurements to generate one or more temporal sequences of motion patterns, the number of temporal sequences being a function of the number of motion filters.
摘要翻译：描述用于表示顺序运动模式的系统和方法。在一个方面，视频帧被转换成能量再分布测量序列。然后将一个或多个运动滤波器应用于ER测量以产生运动模式的一个或多个时间序列，时间序列的数量是运动滤波器的数量的函数。

10. 发明申请

US20130159318A1 Rule-Based Generation of Candidate String Transformations 有权
标题翻译：基于规则的候选字符串转换生成
公开(公告)号：US20130159318A1
公开(公告)日：2013-06-20
申请号：US13328956
申请日：2011-12-16
申请人： Gu Xu , Hang Li
发明人： Gu Xu , Hang Li
IPC分类号： G06F17/30
CPC分类号： G06F17/273 , G06F17/2282
摘要： Candidate string transformations may be generated from applying applicable transformation rules from a rules index. Candidate string transformations may be eliminated based on a score associated with the candidate string transformation. The score may be based on probabilistic values associated with the applied applicable transformation rules.
摘要翻译：可以通过从规则索引应用适用的转换规则来生成候选字符串转换。可以基于与候选字符串变换相关联的得分来消除候选字符串变换。分数可以基于与所应用的适用变换规则相关联的概率值。

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