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    • 7. 发明授权
    • System and method for making a LDMOS device with electrostatic discharge protection
    • 制造具有静电放电保护功能的LDMOS器件的系统和方法
    • US07414287B2
    • 2008-08-19
    • US11063312
    • 2005-02-21
    • Sameer P. PendharkarJonathan S. Brodsky
    • Sameer P. PendharkarJonathan S. Brodsky
    • H01L29/94
    • H01L29/66681H01L27/088H01L29/086H01L29/42368H01L29/7436H01L29/749H01L29/7816
    • A semiconductor device includes one or more LDMOS transistors and one of more SCR-LDMOS transistors. Each LDMOS transistor includes a LDMOS well of a first conductivity type, a LDMOS source region of a second conductivity type formed in the LDMOS well, and a LDMOS drain region of a second conductivity type separated from the LDMOS well by a LDMOS drift region of the second conductivity type. Each SCR-LDMOS transistor comprising a SCR-LDMOS well of the first conductivity type, a SCR-LDMOS source region of the second conductivity type formed in the SCR-LDMOS well, a SCR-LDMOS drain region of a second conductivity type, and a anode region of the first conductivity type between the SCR-LDMOS drain region and the SCR-LDMOS drift region. The anode region is separated from the SCR-LDMOS well by a SCR-LDMOS drift region of the second conductivity type.
    • 半导体器件包括一个或多个LDMOS晶体管和一个更多的SCR-LDMOS晶体管。 每个LDMOS晶体管包括第一导电类型的LDMOS阱,在LDMOS阱中形成的第二导电类型的LDMOS源极区,以及由LDMOS阱的LDMOS漂移区分离的第二导电类型的LDMOS漏极区, 第二导电类型。 每个SCR-LDMOS晶体管包括第一导电类型的SCR-LDMOS阱,形成在SCR-LDMOS阱中的第二导电类型的SCR-LDMOS源区,第二导电类型的SCR-LDMOS漏极区和 SCR-LDMOS漏区和SCR-LDMOS漂移区之间的第一导电类型的阳极区。 阳极区域通过第二导电类型的SCR-LDMOS漂移区与SCR-LDMOS阱分离。
    • 8. 发明授权
    • System and method for making a LDMOS device with electrostatic discharge protection
    • 制造具有静电放电保护功能的LDMOS器件的系统和方法
    • US07687853B2
    • 2010-03-30
    • US12173418
    • 2008-07-15
    • Sameer P PendharkarJonathan S. Brodsky
    • Sameer P PendharkarJonathan S. Brodsky
    • H01L29/94
    • H01L29/66681H01L27/088H01L29/086H01L29/42368H01L29/7436H01L29/749H01L29/7816
    • A semiconductor device includes one or more LDMOS transistors and one of more SCR-LDMOS transistors. Each LDMOS transistor includes a LDMOS well of a first conductivity type, a LDMOS source region of a second conductivity type formed in the LDMOS well, and a LDMOS drain region of a second conductivity type separated from the LDMOS well by a LDMOS drift region of the second conductivity type. Each SCR-LDMOS transistor comprising a SCR-LDMOS well of the first conductivity type, a SCR-LDMOS source region of the second conductivity type formed in the SCR-LDMOS well, a SCR-LDMOS drain region of a second conductivity type, and a anode region of the first conductivity type between the SCR-LDMOS drain region and the SCR-LDMOS drift region. The anode region is separated from the SCR-LDMOS well by a SCR-LDMOS drift region of the second conductivity type.
    • 半导体器件包括一个或多个LDMOS晶体管和一个更多的SCR-LDMOS晶体管。 每个LDMOS晶体管包括第一导电类型的LDMOS阱,在LDMOS阱中形成的第二导电类型的LDMOS源极区,以及由LDMOS阱的LDMOS漂移区分离的第二导电类型的LDMOS漏极区, 第二导电类型。 每个SCR-LDMOS晶体管包括第一导电类型的SCR-LDMOS阱,形成在SCR-LDMOS阱中的第二导电类型的SCR-LDMOS源区,第二导电类型的SCR-LDMOS漏极区和 SCR-LDMOS漏区和SCR-LDMOS漂移区之间的第一导电类型的阳极区。 阳极区域通过第二导电类型的SCR-LDMOS漂移区与SCR-LDMOS阱分离。
    • 10. 发明申请
    • SYSTEM AND METHOD FOR MAKING A LDMOS DEVICE WITH ELECTROSTATIC DISCHARGE PROTECTION
    • 用于制造具有静电放电保护的LDMOS器件的系统和方法
    • US20080296669A1
    • 2008-12-04
    • US12173418
    • 2008-07-15
    • Sameer P. PendharkarJonathan S. Brodsky
    • Sameer P. PendharkarJonathan S. Brodsky
    • H01L29/78
    • H01L29/66681H01L27/088H01L29/086H01L29/42368H01L29/7436H01L29/749H01L29/7816
    • A semiconductor device includes one or more LDMOS transistors and one of more SCR-LDMOS transistors. Each LDMOS transistor includes a LDMOS well of a first conductivity type, a LDMOS source region of a second conductivity type formed in the LDMOS well, and a LDMOS drain region of a second conductivity type separated from the LDMOS well by a LDMOS drift region of the second conductivity type. Each SCR-LDMOS transistor comprising a SCR-LDMOS well of the first conductivity type, a SCR-LDMOS source region of the second conductivity type formed in the SCR-LDMOS well, a SCR-LDMOS drain region of a second conductivity type, and a anode region of the first conductivity type between the SCR-LDMOS drain region and the SCR-LDMOS drift region. The anode region is separated from the SCR-LDMOS well by a SCR-LDMOS drift region of the second conductivity type.
    • 半导体器件包括一个或多个LDMOS晶体管和一个更多的SCR-LDMOS晶体管。 每个LDMOS晶体管包括第一导电类型的LDMOS阱,在LDMOS阱中形成的第二导电类型的LDMOS源极区,以及由LDMOS阱的LDMOS漂移区分离的第二导电类型的LDMOS漏极区, 第二导电类型。 每个SCR-LDMOS晶体管包括第一导电类型的SCR-LDMOS阱,形成在SCR-LDMOS阱中的第二导电类型的SCR-LDMOS源区,第二导电类型的SCR-LDMOS漏极区和 SCR-LDMOS漏区和SCR-LDMOS漂移区之间的第一导电类型的阳极区。 阳极区域通过第二导电类型的SCR-LDMOS漂移区与SCR-LDMOS阱分离。