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1. 发明申请

US20060033909A1 Reticle particle calibration standards 审中-公开
标题翻译：标线粒子校准标准
公开(公告)号：US20060033909A1
公开(公告)日：2006-02-16
申请号：US11188382
申请日：2005-07-25
申请人： Gerald Bowers , Eutimio Saporetti , Clarence Thomas , James Tallent
发明人： Gerald Bowers , Eutimio Saporetti , Clarence Thomas , James Tallent
IPC分类号： G01J1/10
CPC分类号： G01N21/8903 , G01N21/278 , G01N21/4738 , G01N21/8806 , G01N21/8851 , G01N21/93 , G01N21/95692 , G01N2021/9513 , G01N2021/95676
摘要： Methods and apparatus are described for reticle particle calibration standards. A method includes making a reticle particle calibration standard including depositing a solution that includes a plurality of particles onto a first plate; drying the solution to evaporate a solvent; bonding the plurality of particles to the first plate; coupling a second plate to the first plate, the plurality of particles located between the first plate and the second plate, wherein the plurality of particles include a plurality of traceable standard particles of substantially known shape and size. An apparatus includes a reticle particle calibration standard including a first plate; a second plate coupled to the first plate, wherein the second plate is substantially parallel to and coincident with the first plate; and a plurality of traceable standard particles of substantially known shape and size i) located between the first plate and the second plate and ii) bonded to at least one plate selected from the group consisting of the first plate and the second plate. A method includes using a reticle particle calibration standard to qualify a metrology instrument or monitor performance of the metrology instrument including: scanning the reticle particle calibration standard using the metrology instrument; compiling a raw data map of the reticle particle calibration standard; comparing the raw data map to a calibration data map associated with the reticle particle calibration standard.
摘要翻译：描述了用于掩模版颗粒校准标准的方法和装置。一种方法包括制作掩模版颗粒校准标准品，包括将包含多个颗粒的溶液沉积到第一板上; 干燥溶液以蒸发溶剂; 将所述多个颗粒粘合到所述第一板上; 将第二板耦合到第一板，多个颗粒位于第一板和第二板之间，其中多个颗粒包括多个基本上已知形状和尺寸的可追溯标准颗粒。一种装置包括：掩模版颗粒校准标准，包括第一板; 耦合到所述第一板的第二板，其中所述第二板基本上平行于并与所述第一板重合; 以及多个基本上已知的形状和尺寸的可追溯标准颗粒，i）位于第一板和第二板之间，并且ii）结合到选自第一板和第二板的至少一个板。一种方法包括使用掩模版颗粒校准标准来限定计量仪器或监测计量仪器的性能，包括：使用计量仪器扫描掩模版颗粒校准标准; 编制标线粒子校准标准的原始数据图; 将原始数据图与与掩模版粒子校准标准相关联的校准数据图进行比较。

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