专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US07874783B2 Multi-chamber vacuum processing and transfer system 有权
标题翻译：多室真空处理和输送系统
公开(公告)号：US07874783B2
公开(公告)日：2011-01-25
申请号：US12406961
申请日：2009-03-19
申请人： George Xinsheng Guo , Kai-an Wang
发明人： George Xinsheng Guo , Kai-an Wang
IPC分类号： H01L21/677
CPC分类号： H01L21/67751 , H01L21/6719 , H01L21/67196 , Y10S414/139
摘要： An apparatus for processing a work piece in a vacuum environment includes a master process chamber that can be exhausted to a sub-atmospheric air pressure or to be filled with a desirable gas, a transfer chamber configured to receive the work piece from outside of the master process chamber, one or more processing stations inside the master process chamber, a rotation plate configured to receive the work piece and to move the work piece to receive one or more processing operations, and a first transport mechanism configured to transfer the work piece from the transfer chamber on to the rotation plate. The transfer chamber is at least partially enclosed in the master process chamber and can be vacuum sealed off from the master process chamber.
摘要翻译：一种用于在真空环境中处理工件的设备包括：主处理室，其能够被排出到次大气压或者填充有所需的气体;传送室，被配置为从母板的外部接收工件处理室，主处理室内的一个或多个处理站，配置成接收工件并移动工件以接收一个或多个处理操作的旋转板，以及第一传送机构，其被配置为将工件从传送室到旋转板上。传送室至少部分地封闭在主处理室中，并且可以从主处理室真空密封。

2. 发明申请

US20090180847A1 MULTI-CHAMBER VACUUM PROCESSING AND TRANSFER SYSTEM 有权
标题翻译：多室真空加工和传送系统
公开(公告)号：US20090180847A1
公开(公告)日：2009-07-16
申请号：US12406961
申请日：2009-03-19
申请人： George Xinsheng Guo , Kai-an Wang
发明人： George Xinsheng Guo , Kai-an Wang
IPC分类号： H01L21/677 , H01L21/68
CPC分类号： H01L21/67751 , H01L21/6719 , H01L21/67196 , Y10S414/139
摘要： An apparatus for processing a work piece in a vacuum environment includes a master process chamber that can be exhausted to a sub-atmospheric air pressure or to be filled with a desirable gas, a transfer chamber configured to receive the work piece from outside of the master process chamber, one or more processing stations inside the master process chamber, a rotation plate configured to receive the work piece and to move the work piece to receive one or more processing operations, and a first transport mechanism configured to transfer the work piece from the transfer chamber on to the rotation plate. The transfer chamber is at least partially enclosed in the master process chamber and can be vacuum sealed off from the master process chamber.
摘要翻译：一种用于在真空环境中处理工件的设备包括：主处理室，其能够被排出到次大气压或者填充有所需的气体;传送室，被配置为从母板的外部接收工件处理室，主处理室内的一个或多个处理站，配置成接收工件并移动工件以接收一个或多个处理操作的旋转板，以及第一传送机构，其被配置为将工件从传送室到旋转板上。传送室至少部分地封闭在主处理室中，并且可以从主处理室真空密封。

3. 发明授权

US08152975B2 Deposition system with improved material utilization 有权
标题翻译：材料利用率提高的沉积系统
公开(公告)号：US08152975B2
公开(公告)日：2012-04-10
申请号：US11694843
申请日：2007-03-30
申请人： George X. Guo , Kai-an Wang
发明人： George X. Guo , Kai-an Wang
IPC分类号： C23C14/34
CPC分类号： C23C14/3407 , H01J37/3405 , H01J37/3423 , H01J37/3426 , H01J37/3435
摘要： A target assembly for material deposition includes a first target piece having a first sputtering surface and comprising a first target material that is to be sputtered off the first sputtering surface and to deposit on a substrate. The target assembly also includes a second target piece juxtaposed to the first target piece. The second target piece comprises a second sputtering surface and a second target material that can be sputtered off the second sputtering surface and to deposit on the substrate. The first target piece and the second target piece are configured to be switched in positions and/or orientations after a period of sputtering operations.
摘要翻译：用于材料沉积的目标组件包括具有第一溅射表面的第一靶部件，并且包括要从第一溅射表面溅射并沉积在基板上的第一靶材料。目标组件还包括与第一目标件并置的第二目标件。第二目标件包括可以从第二溅射表面溅射并沉积在基底上的第二溅射表面和第二靶材料。第一目标件和第二靶件被构造成在溅射操作一段时间之后切换成位置和/或取向。

4. 发明授权

US08500962B2 Deposition system and methods having improved material utilization 有权
标题翻译：沉积系统和方法具有改善的材料利用率
公开(公告)号：US08500962B2
公开(公告)日：2013-08-06
申请号：US13160511
申请日：2011-06-15
申请人： George X. Guo , Kai-an Wang
发明人： George X. Guo , Kai-an Wang
IPC分类号： C23C14/00 , C23C14/32 , C25B9/00 , C25B11/00 , C25B13/00
CPC分类号： C23C14/35 , H01J37/3408 , H01J37/3455 , H01J37/347
摘要： A method for substrate processing includes producing a magnetic field by a magnetron across the full width of a sputtering surface of a target in a first direction. The magnetron can produce two erosion grooves separated by a distance S on the sputtering surface. The method includes moving the magnetron continuously at a first speed by the distance S in a first segment along a linear travel path. The linear travel path is along a second direction perpendicular to the first direction. The method includes continuously sputtering a material off the sputtering surface and depositing the material on the substrate during the first segment, and moving the magnetron by the distance S in a second segment along the linear travel path at a second speed higher than the first speed without sputtering the material off the sputtering surface or sputtering materials off at significant lower rate.
摘要翻译：一种用于衬底处理的方法包括：通过磁控管在靶的溅射表面的整个宽度上沿第一方向产生磁场。磁控管可以产生在溅射表面上分开距离S的两个侵蚀槽。该方法包括沿着线性行进路径沿着第一段连续地将磁控管连续移动第一段距离S。线性行进路径沿着垂直于第一方向的第二方向。该方法包括将材料连续溅射溅射表面，并在第一段期间将材料沉积在衬底上，并且以高于第一速度的第二速度沿着线性行进路径将磁控管移动到第二段中的距离S，而没有将材料溅射溅射表面或以显着较低的速率溅射材料。

5. 发明授权

US08236152B2 Deposition system 有权
标题翻译：沉积系统
公开(公告)号：US08236152B2
公开(公告)日：2012-08-07
申请号：US11563116
申请日：2006-11-24
申请人： George X. Guo , Kai-an Wang
发明人： George X. Guo , Kai-an Wang
IPC分类号： C25B9/00 , C25B11/00 , C25B13/00 , C23C14/00
CPC分类号： C23C14/352 , H01J37/3405 , H01J37/3408 , H01J37/3423
摘要： A deposition system includes a chamber, a plurality of targets in a center region in the chamber and a plurality of substrates in the chamber. The targets are sequentially positioned when viewed in a first direction. At least one of the targets includes a sputtering surface facing outward. The substrates are sequentially positioned when viewed in the first direction. At least one of the substrates includes a deposition surface configured to receive material sputtered off the sputtering surface.
摘要翻译：沉积系统包括腔室，腔室中心区域中的多个靶和腔室中的多个基底。当从第一方向观看时，目标被顺序定位。目标中的至少一个包括面向外的溅射表面。当从第一方向观察时，基板顺序地定位。衬底中的至少一个包括沉积表面，其被配置为接收从溅射表面溅射的材料。

6. 发明授权

US08092601B2 System and process for fabricating photovoltaic cell 有权
标题翻译：制造光伏电池的系统和工艺
公开(公告)号：US08092601B2
公开(公告)日：2012-01-10
申请号：US11953069
申请日：2007-12-09
申请人： George X. Guo , Kai-an Wang
发明人： George X. Guo , Kai-an Wang
IPC分类号： C23C16/00
CPC分类号： C23C14/042 , H01L31/022425 , H01L31/046 , H01L31/18 , Y02E10/50
摘要： A substrate processing system includes a source unit configured to supply a deposition material to a substrate, a substrate holder configured to hold a substrate to receive the deposition material, a shadow mask comprising a frame that includes two opposing arms; and a crossbar configured to be mounted to the two opposing arms. The frame and the crossbar define a plurality of openings that allow the deposition material supplied by the source unit to be deposited on the substrate. A transport mechanism can produce relative movement between the shadow mask and the substrate.
摘要翻译：衬底处理系统包括被配置为向衬底提供沉积材料的源单元，被配置为保持衬底以接收沉积材料的衬底保持器，包括包括两个相对臂的框架的荫罩; 以及构造成安装到所述两个相对臂的横杆。框架和横杆限定允许由源单元供应的沉积材料沉积在基板上的多个开口。传送机构可以在荫罩和基底之间产生相对运动。

7. 发明申请

US20110240461A1 DEPOSITION SYSTEM AND METHODS HAVING IMPROVED MATERIAL UTILIZATION 有权
标题翻译：具有改进的材料利用的沉积系统和方法
公开(公告)号：US20110240461A1
公开(公告)日：2011-10-06
申请号：US13160511
申请日：2011-06-15
申请人： George X. Guo , Kai-an Wang
发明人： George X. Guo , Kai-an Wang
IPC分类号： C23C14/35
CPC分类号： C23C14/35 , H01J37/3408 , H01J37/3455 , H01J37/347
摘要： A method for substrate processing includes producing a magnetic field by a magnetron across the full width of a sputtering surface of a target in a first direction. The magnetron can produce two erosion grooves separated by a distance S on the sputtering surface. The method includes moving the magnetron continuously at a first speed by the distance S in a first segment along a linear travel path. The linear travel path is along a second direction perpendicular to the first direction. The method includes continuously sputtering a material off the sputtering surface and depositing the material on the substrate during the first segment, and moving the magnetron by the distance S in a second segment along the linear travel path at a second speed higher than the first speed without sputtering the material off the sputtering surface or sputtering materials off at significant lower rate.
摘要翻译：一种用于衬底处理的方法包括：通过磁控管在靶的溅射表面的整个宽度上沿第一方向产生磁场。磁控管可以产生在溅射表面上分开距离S的两个侵蚀槽。该方法包括沿着线性行进路径沿着第一段连续地将磁控管连续移动第一段距离S。线性行进路径沿着垂直于第一方向的第二方向。该方法包括将材料连续溅射溅射表面，并在第一段期间将材料沉积在衬底上，并且以高于第一速度的第二速度沿着线性行进路径将磁控管移动到第二段中的距离S，而没有将材料溅射溅射表面或以显着较低的速率溅射材料。

8. 发明授权

US07806641B2 Substrate processing system having improved substrate transport system 有权
标题翻译：具有改进的基板输送系统的基板处理系统
公开(公告)号：US07806641B2
公开(公告)日：2010-10-05
申请号：US11847956
申请日：2007-08-30
申请人： George X. Guo , Kai-an Wang
发明人： George X. Guo , Kai-an Wang
IPC分类号： H01L21/677
CPC分类号： H01L21/67742 , C23C14/566 , H01L21/67748
摘要： A substrate processing system includes a first load lock, a process chamber having a first opening to allow an exchange of a substrate between the first load lock and the first process chamber, first rollers in the process chamber; and second rollers in the first load lock, wherein the first rollers and the second rollers are configured to transport a substrate thereon through the first opening between the first load lock and the process chamber. The first rollers and the second rollers are not rotated by an active transport mechanism.
摘要翻译：衬底处理系统包括第一负载锁定，具有第一开口以允许在第一负载锁和第一处理室之间更换衬底的处理室，处理室中的第一辊; 以及第一负载锁中的第二辊，其中第一辊和第二辊构造成通过第一加载锁和处理室之间的第一开口在其上运送基板。第一辊和第二辊不被主动运输机构旋转。

9. 发明授权

US08408858B2 Substrate processing system having improved substrate transport system 有权
标题翻译：具有改进的基板输送系统的基板处理系统
公开(公告)号：US08408858B2
公开(公告)日：2013-04-02
申请号：US12860907
申请日：2010-08-22
申请人： George X. Guo , Kai-an Wang
发明人： George X. Guo , Kai-an Wang
IPC分类号： H01L21/677
CPC分类号： C23C14/566 , H01L21/67742 , H01L21/67748
摘要： A substrate processing system includes a first load lock, a process chamber having a first opening to allow an exchange of a substrate between the first load lock and the first process chamber, first rollers in the process chamber; and second rollers in the first load lock, wherein the first rollers and the second rollers are configured to transport a substrate thereon through the first opening between the first load lock and the process chamber. At least some of the first rollers and the second rollers are idler rollers.
摘要翻译：衬底处理系统包括第一负载锁定，具有第一开口以允许在第一负载锁和第一处理室之间更换衬底的处理室，处理室中的第一辊; 以及第一负载锁中的第二辊，其中第一辊和第二辊构造成通过第一加载锁和处理室之间的第一开口在其上运送基板。至少一些第一辊和第二辊是惰辊。

10. 发明申请

US20110230010A1 SYSTEM AND METHOD FOR FABRICATING PHOTOVOLTAIC CELLS 审中-公开
标题翻译：制造光伏电池的系统和方法
公开(公告)号：US20110230010A1
公开(公告)日：2011-09-22
申请号：US13151406
申请日：2011-06-02
申请人： George X. Guo , Kai-an Wang
发明人： George X. Guo , Kai-an Wang
IPC分类号： H01L31/18 , B05C13/00 , C23C16/44 , B05C9/14 , B05C11/00
CPC分类号： C23C14/042 , H01L31/022425 , H01L31/046 , H01L31/18 , Y02E10/50
摘要： A substrate processing system includes a source unit configured to supply a deposition material to a substrate, a substrate holder configured to hold a substrate to receive the deposition material, a shadow mask comprising a frame that includes two opposing arms; and a crossbar configured to be mounted to the two opposing arms. The frame and the crossbar define a plurality of openings that allow the deposition material supplied by the source unit to be deposited on the substrate. A transport mechanism can produce relative movement between the shadow mask and the substrate.
摘要翻译：衬底处理系统包括被配置为向衬底提供沉积材料的源单元，被配置为保持衬底以接收沉积材料的衬底保持器，包括包括两个相对臂的框架的荫罩; 以及构造成安装到所述两个相对臂的横杆。框架和横杆限定允许由源单元供应的沉积材料沉积在基板上的多个开口。传送机构可以在荫罩和基底之间产生相对运动。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式