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1. 发明授权

US4802823A Stress relief support structures and assemblies 失效
标题翻译：应力消除支撑结构和组件
公开(公告)号：US4802823A
公开(公告)日：1989-02-07
申请号：US191324
申请日：1988-05-09
申请人： Gary W. Decko , Yao Peng , Herman Vogel
发明人： Gary W. Decko , Yao Peng , Herman Vogel
IPC分类号： F01D5/14 , F01D5/18
CPC分类号： F01D5/147 , Y02T50/673
摘要： An improved design for a structure such as a turbine vane or blade subjected to extreme temperature levels and/or gradients resulting in extreme deformation stresses within the structure. The present structures comprise an interior skeletal support having a plurality of spaced, flexible support legs which extend out and are attached to spaced areas of a flexible outer surface skin which is subjected to extreme temperature levels or temperature gradients during use. The extreme stresses normally developed by the expansion of the surface skin are avoided by the ability of the skin to move minutely and flex the spaced support legs to variable extents and in predetermined directions.
摘要翻译：用于诸如涡轮叶片或叶片经过极端温度水平和/或梯度的结构的改进的设计，导致结构内的极端变形应力。本结构包括具有多个间隔开的柔性支撑腿的内部骨架支撑件，其伸出并附接到在使用期间经受极端温度水平或温度梯度的柔性外表皮的间隔区域。通过表皮的膨胀而通常产生的极端压力通过皮肤微小移动并使间隔开的支撑腿弯曲到可变的范围并沿预定方向的能力来避免。

2. 发明申请

US20090303455A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20090303455A1
公开(公告)日：2009-12-10
申请号：US12541755
申请日：2009-08-14
申请人： Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Marco Polizzi , Edwin Augustinus Matheus Van Gompel , Stefan Philip Christiaan Belfroid , Johannes Petrus Maria Smeulers , Herman Vogel , Martinus Hendrikus Antonius Leenders , Joost Jeroen Ottens
发明人： Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Marco Polizzi , Edwin Augustinus Matheus Van Gompel , Stefan Philip Christiaan Belfroid , Johannes Petrus Maria Smeulers , Herman Vogel , Martinus Hendrikus Antonius Leenders , Joost Jeroen Ottens
IPC分类号： G03B27/54
CPC分类号： G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
摘要： A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
摘要翻译：在浸没式光刻投影装置的液体去除系统中使用多孔构件来平滑不均匀的流动。多孔构件上的压差可以保持在多孔构件的起泡点以下，从而获得单相液体流。或者，多孔构件可以用于减少两相流中的不均匀性。

3. 发明授权

US5590537A Dry gas curtain for cryogenic surface 失效
标题翻译：用于低温表面的干燥气幕
公开(公告)号：US5590537A
公开(公告)日：1997-01-07
申请号：US524555
申请日：1995-09-07
申请人： Herman Vogel
发明人： Herman Vogel
IPC分类号： F24F9/00 , G01K17/00 , F25B19/00
CPC分类号： G01K17/00 , F24F9/00
摘要： An apparatus to provide a laminar curtain of dry gas over a cryogenic working surface includes a housing duct extending longitudinally from the working surface. A honeycomb member fills a section of the duct adjacent to the working surface, each honeycomb cell having a through channel in the longitudinal direction. A porous foam with through porosity fills a section of the duct adjacent to the honeycomb member oppositely from the working surface. A plenum is adjacent to the porous member oppositely from the honeycomb. Dry gas is supplied to the plenum to flow through the foam and honeycomb to effect the laminar curtain.
摘要翻译：在低温工作表面上提供干燥气体的层状帘幕的装置包括从工作表面纵向延伸的壳体管道。蜂窝构件填充与工作表面相邻的管道的一部分，每个蜂窝单元在纵向方向上具有通道。具有通孔孔隙的多孔泡沫填充与蜂窝构件相邻的工作表面相邻的管道的一部分。气室与蜂窝体相对的多孔构件相邻。干燥的气体被供应到集气室以流过泡沫和蜂窝以实现层流帘。

4. 发明申请

US20110188049A1 Assembly Comprising a Conditioning System and at Least One Object, a Conditioning System, a Lithographic Apparatus and Methods 失效
标题翻译：包括调节系统和至少一个对象的组装，调节系统，平版印刷设备和方法
公开(公告)号：US20110188049A1
公开(公告)日：2011-08-04
申请号：US13084372
申请日：2011-04-11
申请人： Ronald VAN DER HAM , Tjarko Adriaan Rudolf Van Empel , Herman Vogel , Niek Jacobus Johannes Roset
发明人： Ronald VAN DER HAM , Tjarko Adriaan Rudolf Van Empel , Herman Vogel , Niek Jacobus Johannes Roset
IPC分类号： G01B11/02
CPC分类号： G03F7/70933 , G03F7/70775 , G03F7/70858 , G03F7/70866 , Y10T137/8593
摘要： An assembly including a conditioning system and an object moveable into and/or out of an area to be conditioned is disclosed. The conditioning system has fluid outlet passages to supply conditioning fluid to the area to be conditioned and is configured to adjust outflow of the conditioning fluid from the fluid outlet passages depending on a position of the object.
摘要翻译：公开了一种组件，其包括调节系统和可移动到待调节区域中和/或之外的物体。调节系统具有流体出口通道，以将调节流体供应到待调节的区域，并且构造成根据物体的位置调节调节流体与流体出口通道的流出。

5. 发明授权

US07924399B2 Assembly comprising a conditioning system and at least one object, a conditioning system, a lithographic apparatus and methods 有权
标题翻译：组件包括调节系统和至少一个物体，调节系统，光刻设备和方法
公开(公告)号：US07924399B2
公开(公告)日：2011-04-12
申请号：US11389493
申请日：2006-03-27
申请人： Ronald Van Der Ham , Tjarko Adriaan Rudolf Van Empel , Herman Vogel , Niek Jacobus Johannes Roset
发明人： Ronald Van Der Ham , Tjarko Adriaan Rudolf Van Empel , Herman Vogel , Niek Jacobus Johannes Roset
IPC分类号： A61N5/00 , G03B27/32 , G03B27/42 , G03B27/52 , G03B27/58 , G03B27/62
CPC分类号： G03F7/70933 , G03F7/70775 , G03F7/70858 , G03F7/70866 , Y10T137/8593
摘要： An assembly including a conditioning system and an object movable into and/or out of an area to be conditioned is disclosed. The conditioning system has fluid outlet passages to supply conditioning fluid to the area to be conditioned and is configured to adjust outflow of the conditioning fluid from the fluid outlet passages depending on a position of the object.
摘要翻译：公开了一种组件，其包括调节系统和可移动到待调节区域中和/或之外的物体。调节系统具有流体出口通道，以将调节流体供应到待调节的区域，并且构造成根据物体的位置调节调节流体与流体出口通道的流出。

6. 发明申请

US20100149514A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20100149514A1
公开(公告)日：2010-06-17
申请号：US12714829
申请日：2010-03-01
申请人： Nicolaas Rudolf KEMPER , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Stefan Philip Christiaan Belfroid , Johannes Petrus Maria Smeulers , Herman Vogel
发明人： Nicolaas Rudolf KEMPER , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Stefan Philip Christiaan Belfroid , Johannes Petrus Maria Smeulers , Herman Vogel
IPC分类号： G03B27/58
CPC分类号： G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
摘要： A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
摘要翻译：在浸没式光刻投影装置的液体去除系统中使用多孔构件来平滑不均匀的流动。多孔构件上的压差可以保持在多孔构件的起泡点以下，从而获得单相液体流。或者，多孔构件可以用于减少两相流中的不均匀性。

7. 发明授权

US07602470B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07602470B2
公开(公告)日：2009-10-13
申请号：US11212921
申请日：2005-08-29
申请人： Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christian Alexander Hoogendam , Nicolaas Ten Kate , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Joost Jeroen Ottens , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Marco Polizzi , Edwin Augustinus Matheus Van Gompel , Stefan Philip Christiaan Belfroid , Johannes Petrus Maria Smeulers , Herman Vogel
发明人： Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christian Alexander Hoogendam , Nicolaas Ten Kate , Martinus Hendrikus Antonius Leenders , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Joost Jeroen Ottens , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelis Maria Verhagen , Marco Polizzi , Edwin Augustinus Matheus Van Gompel , Stefan Philip Christiaan Belfroid , Johannes Petrus Maria Smeulers , Herman Vogel
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
摘要： A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
摘要翻译：在浸没式光刻投影装置的液体去除系统中使用多孔构件来平滑不均匀的流动。多孔构件上的压差可以保持在多孔构件的起泡点以下，从而获得单相液体流。或者，多孔构件可以用于减少两相流中的不均匀性。

8. 发明授权

US07578168B2 Increasing gas gauge pressure sensitivity using nozzle-face surface roughness 有权
标题翻译：使用喷嘴面表面粗糙度增加气表压力灵敏度
公开(公告)号：US07578168B2
公开(公告)日：2009-08-25
申请号：US11769421
申请日：2007-06-27
申请人： Herman Vogel
发明人： Herman Vogel
IPC分类号： G01B13/08
CPC分类号： G01B13/12
摘要： A gas gauge for sensing distance to an object includes a gas supply system and a nozzle that supplies the gas from the gas supply system to a space between the nozzle and the object. For example, the gas supply system supplies the gas with a flow rate that corresponds to a flow in a transitional region between laminar flow and turbulent flow. A surface of the nozzle may be roughened so as to increase a friction factor across the surface, which increases gas pressure drop and also a gain of the nozzle. Noise generated by the increased flow rate may be attenuated using one or more strategically placed Helmholtz attenuators and/or snubbers.
摘要翻译：用于感测到物体的距离的气量计包括气体供应系统和将气体从气体供应系统供应到喷嘴和物体之间的空间的喷嘴。例如，气体供应系统为气体提供与层流和湍流之间的过渡区域中的流动相对应的流量。喷嘴的表面可以被粗糙化，以便增加穿过表面的摩擦系数，这增加了气体压降以及喷嘴的增益。由增加的流量产生的噪声可以使用一个或多个策略性放置的亥姆霍兹衰减器和/或缓冲器来衰减。

9. 发明授权

US07411650B2 Immersion photolithography system and method using microchannel nozzles 有权
标题翻译：浸入式光刻系统和使用微通道喷嘴的方法
公开(公告)号：US07411650B2
公开(公告)日：2008-08-12
申请号：US11053328
申请日：2005-02-09
申请人： Herman Vogel , Klaus Simon , Antonius Theodorus Anna Maria Derksen
发明人： Herman Vogel , Klaus Simon , Antonius Theodorus Anna Maria Derksen
IPC分类号： G03B27/52 , G03B27/54
CPC分类号： G03F7/70341 , G03F7/20 , G03F7/70358 , G03F7/709 , H01L21/027
摘要： A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. An optional plurality of micronozzles are arranged around the periphery of one side of the projection optical system so as to provide a substantially uniform velocity distribution of the liquid flow in an area where the substrate is being exposed.
摘要翻译：液浸式光刻系统包括：用电磁辐射曝光基板的曝光系统，包括将电磁辐射聚焦在基板上的投影光学系统。液体供应系统在投影光学系统和基板之间提供液体流动。可选的多个微喷嘴布置在投影光学系统的一侧的周边周围，以便在衬底被暴露的区域中提供基本均匀的液流速度分布。

10. 发明申请

US20060123889A1 Immersion lithography proximity sensor having a nozzle shroud with flow curtain 失效
公开(公告)号：US20060123889A1
公开(公告)日：2006-06-15
申请号：US11353007
申请日：2006-02-14
申请人： Herman Vogel
发明人： Herman Vogel
IPC分类号： G01B13/12
CPC分类号： G03F7/70933 , G03F7/70341 , G03F9/7023
摘要： The present invention is directed to an immersion lithography proximity sensor having a nozzle shroud with a flow curtain. The immersion lithography proximity sensor includes a shroud that affixes to the nozzle. A plenum is located inside the shroud that holds a shroud liquid, which is fed into the plenum through one or more intake holes. The shroud liquid is emitted out through a series of openings, such as holes or slots, along a bottom surface of the shroud in a direction away from the nozzle. The shroud liquid that is emitted forms a curtain around the nozzle to prevent cross currents from impacting the flow of liquid out of the nozzle.

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