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1. 发明授权

US07169014B2 Apparatuses for controlling the temperature of polishing pads used in planarizing micro-device workpieces 失效
标题翻译：用于控制用于平面化微器件工件的抛光垫的温度的装置
公开(公告)号：US07169014B2
公开(公告)日：2007-01-30
申请号：US10198881
申请日：2002-07-18
申请人： Theodore M. Taylor , Larry J. Birch , Freddie L. Dunn
发明人： Theodore M. Taylor , Larry J. Birch , Freddie L. Dunn
IPC分类号： B24B29/02
CPC分类号： B24B37/26 , B24B49/14
摘要： Temperature regulation systems and methods for controlling the temperature of polishing pads used in planarizing micro-device workpieces are disclosed herein. In one embodiment, an apparatus for polishing a workpiece includes a platen defining a planarizing zone and a primary duct system. The platen can have a first duct, and the primary duct system can have a second duct operatively coupled to the first duct of the platen. The second duct is configured to direct a gas flow laterally relative to the planarizing zone. The apparatus also includes a pad support carried by the primary duct system, and a polishing pad carried by the pad support. The pad support can have a plurality of apertures that are in fluid communication with the gas flow in the second duct.
摘要翻译：本文公开了用于控制用于平面化微器件工件的抛光垫的温度的温度调节系统和方法。在一个实施例中，用于抛光工件的设备包括限定平坦化区域和主管道系统的压板。压板可以具有第一管道，并且主管道系统可以具有可操作地联接到压板的第一管道的第二管道。第二管道构造成相对于平坦化区域横向引导气流。该装置还包括由主管道系统承载的衬垫支撑件和由衬垫支撑件承载的抛光垫。垫支撑件可以具有与第二管道中的气流流体连通的多个孔。

2. 发明授权

US07033253B2 Polishing pad conditioners having abrasives and brush elements, and associated systems and methods 失效
标题翻译：具有磨料和刷子元件的抛光垫调节器以及相关系统和方法
公开(公告)号：US07033253B2
公开(公告)日：2006-04-25
申请号：US10917180
申请日：2004-08-12
申请人： Freddie L. Dunn
发明人： Freddie L. Dunn
IPC分类号： B24B29/00
CPC分类号： B24B53/017 , B24B53/12
摘要： Systems and methods for conditioning polishing pads are disclosed. A system in accordance with one embodiment of the invention includes a polishing support configured to carry a microfeature workpiece polishing pad, and a conditioner positioned at least proximate to the support to condition a polishing pad carried by the support. The conditioner can include a first portion (e.g., an abrasive portion) having a first hardness and being positioned to contact a polishing pad carried by the support, and a second portion (e.g., a brush portion) having a second hardness less than the first hardness and being positioned proximate to the first portion.
摘要翻译：公开了用于调节抛光垫的系统和方法。根据本发明的一个实施例的系统包括配置成承载微特征工件抛光垫的抛光支撑件和至少靠近支撑件的调节器，以调节由支撑件承载的抛光垫。护发素可以包括具有第一硬度的第一部分（例如，磨料部分），并且定位成接触由支撑件承载的抛光垫，以及具有小于第一硬度的第二硬度的第二部分（例如，刷部分）硬度并靠近第一部分定位。

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