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1. 发明申请

US20120193218A1 DEVICE FOR SUPPORTING A ROTATABLE TARGET AND SPUTTERING APPARATUS 有权
标题翻译：支持可旋转目标和喷射装置的装置
公开(公告)号：US20120193218A1
公开(公告)日：2012-08-02
申请号：US13019843
申请日：2011-02-02
申请人： Frank SCHNAPPENBERGER , Jürgen MULTERER
发明人： Frank SCHNAPPENBERGER , Jürgen MULTERER
IPC分类号： C23C14/34
CPC分类号： H01J37/3405 , H01J37/3435 , H01J37/3441
摘要： It is provided a device for supporting a rotatable target of a deposition apparatus for sputtering material onto a substrate, wherein the device includes a drive unit for rotating the rotatable target; a ring-shaped part connected to the drive unit for attaching the drive unit to the rotatable target; and, a shield for covering the ring-shaped part. The shield is adapted for rotating together with the ring-shaped part and includes a plurality of parts assembled together. Furthermore, a sputtering apparatus and a method for supporting a rotatable target are provided.
摘要翻译：提供了一种用于将用于溅射材料的沉积设备的可旋转靶支撑到基底上的装置，其中该装置包括用于旋转可旋转靶的驱动单元; 连接到所述驱动单元的环形部分，用于将所述驱动单元附接到所述可旋转靶; 以及用于覆盖环形部件的护罩。屏蔽件适于与环形部件一起旋转并且包括组装在一起的多个部件。此外，提供了一种用于支撑可旋转靶的溅射装置和方法。

2. 发明申请

US20110241272A1 DEVICE FOR SUPPORTING A ROTATABLE TARGET AND SPUTTERING INSTALLATION 审中-公开
标题翻译：支持可旋转目标和飞溅安装的设备
公开(公告)号：US20110241272A1
公开(公告)日：2011-10-06
申请号：US12757765
申请日：2010-04-09
申请人： Frank SCHNAPPENBERGER
发明人： Frank SCHNAPPENBERGER
IPC分类号： B23Q1/64
CPC分类号： H01J37/3497 , H01J37/3435
摘要： A device for supporting a rotatable target and deposition apparatus having such a device are provided. The device includes a main body, a first fluid conduit in the main body for receiving a fluid from the rotatable target, and a second fluid conduit in the main body for providing the fluid to the rotatable target. The projections of the first fluid conduit and the second fluid conduit onto a projection plane that extends in the direction of the rotational axis of the rotatable target overlap each other.
摘要翻译：提供一种用于支撑可旋转靶的装置和具有这种装置的沉积装置。该装置包括主体，主体中的用于接收来自可旋转靶的流体的第一流体导管，以及主体中用于将流体提供给可旋转靶的第二流体导管。第一流体导管和第二流体导管在可旋转靶的旋转轴线方向上延伸的投影平面上的突起彼此重叠。

3. 发明申请

US20110005924A1 TARGET BACKING TUBE, CYLINDRICAL TARGET, AND CYLINDRICAL TARGET ASSEMBLY 审中-公开
标题翻译：目标支管，圆柱目标和圆柱目标组件
公开(公告)号：US20110005924A1
公开(公告)日：2011-01-13
申请号：US12505363
申请日：2009-07-17
申请人： Frank SCHNAPPENBERGER , Roland WEBER , Joerg KREMPEL-HESSE , Anke HELLMICH
发明人： Frank SCHNAPPENBERGER , Roland WEBER , Joerg KREMPEL-HESSE , Anke HELLMICH
IPC分类号： C23C14/34
CPC分类号： H01J37/3405 , H01J37/3435
摘要： A target backing tube is described. The target backing tube is for a rotatable target and includes a tube adapted for one or more non-bonded target cylinders to be disposed around the tube, the tube having an exterior surface adapted to face the at least one target cylinder and at least three or more protrusion receiving positions; and protrusions mounted on the exterior surface of the tube at each of the protrusion receiving positions for centering the target cylinders.
摘要翻译：描述了目标背衬管。目标背衬管用于可旋转的靶，并且包括适于一个或多个未粘合的目标圆柱体的管以围绕管布置，所述管具有适于面对至少一个目标圆柱体的外表面和至少三个或更多突出接收位置; 以及在用于使目标气缸对中的每个突起接收位置处安装在管的外表面上的突起。

4. 发明申请

US20160244870A1 METHOD FOR CONTROLLING A GAS SUPPLY AND CONTROLLER 审中-公开
标题翻译：用于控制气体供应和控制器的方法
公开(公告)号：US20160244870A1
公开(公告)日：2016-08-25
申请号：US15024001
申请日：2013-09-24
申请人： Frank SCHNAPPENBERGER , Anke HELLMICH , Thomas KOCH , Thomas DEPPISCH
发明人： Frank SCHNAPPENBERGER , Anke HELLMICH , Thomas KOCH , Thomas DEPPISCH
IPC分类号： C23C14/00 , C23C14/54
CPC分类号： C23C14/0042 , C23C14/544 , H01J37/32449 , H01J37/32981 , H01J37/3299
摘要： A method for controlling a gas supply to a process chamber is provided. The method includes: measuring a gas parameter by each of two or more sensors provided in the process chamber; determining a combined gas parameter from the measured gas parameters; and controlling the gas supply to the process chamber based on the determined combined gas parameter.
摘要翻译：提供了一种用于控制对处理室的气体供应的方法。该方法包括：通过设置在处理室中的两个或更多个传感器中的每一个测量气体参数; 根据测量的气体参数确定组合气体参数; 以及基于所确定的组合气体参数来控制对所述处理室的气体供应。

5. 发明申请

US20160189939A1 MINI ROTATABLE SPUTTER DEVICES FOR SPUTTER DEPOSITION 审中-公开
标题翻译：用于喷射器沉积的微型可旋转溅射装置
公开(公告)号：US20160189939A1
公开(公告)日：2016-06-30
申请号：US14384287
申请日：2012-03-12
申请人： Thomas DEPPISCH , Frank SCHNAPPENBERGER , Andreas LOPP , Annemarie FLOCK , Götz GÖRISCH
发明人： Thomas DEPPISCH , Frank SCHNAPPENBERGER , Andreas LOPP , Annemarie FLOCK , Götz GÖRISCH
IPC分类号： H01J37/34 , C23C14/35
CPC分类号： H01J37/3414 , C23C14/35 , H01J37/3277 , H01J37/3405 , H01J37/3417 , H01J37/342
摘要： A deposition apparatus and a method for depositing deposition material on a web is described. The deposition apparatus includes a first sputter device support defining a first axis for a first rotatable sputter device, a second sputter device support defining a second axis for a second rotatable sputter device, and a coating window. The first sputter device support and the second sputter device support are adapted for supporting the first rotatable sputter device and the second rotatable sputter device to provide at least a component of the deposition material to be deposited on the web over a coating drum. Further, the distance between the first axis and the second axis is smaller than 200 mm.
摘要翻译：描述了沉积设备和在网上沉积沉积材料的方法。沉积设备包括限定用于第一可旋转溅射器件的第一轴线的第一溅射器件支撑件，限定用于第二可旋转溅射器件的第二轴线的第二溅射器件支撑件和涂覆窗口。第一溅射装置支撑件和第二溅射装置支撑件适于支撑第一可旋转溅射装置和第二可旋转溅射装置，以提供要沉积在卷筒纸上的沉积材料的至少一部分在涂布滚筒上。此外，第一轴和第二轴之间的距离小于200mm。

6. 发明申请

US20110192716A1 METHOD FOR PRODUCING AN ITO LAYER AND SPUTTERING SYSTEM 审中-公开
标题翻译：生产ITO层和溅射系统的方法
公开(公告)号：US20110192716A1
公开(公告)日：2011-08-11
申请号：US12707546
申请日：2010-02-17
申请人： Anke HELLMICH , Frank SCHNAPPENBERGER , Joerg KREMPEL-HESSE
发明人： Anke HELLMICH , Frank SCHNAPPENBERGER , Joerg KREMPEL-HESSE
IPC分类号： C23C14/34
CPC分类号： C23C14/086 , C23C14/3407 , C23C14/3421 , C23C14/35 , H01J37/3405 , H01J37/342
摘要： The present disclosure relates to a method for producing an indium-tin-oxide layer, comprising: providing a substrate to be coated in a sputtering chamber; providing a rotatable non-bonded target around a backing tube for coating the substrate in the sputtering chamber; and sputtering the material from the target in an atmosphere containing an O2/H2 mixture. Further the present disclosure relates to a sputtering system comprising a sputtering chamber having at least one gas inlet and being adapted for at least one backing tube for a non-bonded rotatable target, a control device adapted to control the flow through the gas inlet, wherein the control device is adapted to control the at least one gas inlet such that a coating on a substrate using a sputtering process is performed in an atmosphere containing an O2 /H2 mixture in the sputtering chamber for forming an indium-tin-oxide layer.
摘要翻译：本公开内容涉及一种制造铟锡氧化物层的方法，包括：在溅射室中提供待涂覆的基板; 在背衬管周围提供可旋转的未粘合的靶，用于在溅射室中涂覆基底; 并在包含O 2 / H 2混合物的气氛中从靶上溅射材料。此外，本公开涉及一种溅射系统，其包括具有至少一个气体入口并且适用于至少一个用于非粘合的可旋转靶的背衬管的溅射室，适于控制通过气体入口的流动的控制装置，其中控制装置适于控制至少一个气体入口，使得使用溅射工艺的衬底上的涂层在用于形成铟锡氧化物层的溅射室中的含有O 2 / H 2混合物的气氛中进行。

7. 发明申请

US20110005925A1 TARGET BACKING TUBE, CYLINDRICAL TARGET ASSEMBLY AND SPUTTERING SYSTEM 审中-公开
标题翻译：目标后支管，圆柱形目标组件和喷射系统
公开(公告)号：US20110005925A1
公开(公告)日：2011-01-13
申请号：US12505396
申请日：2009-07-17
申请人： Frank SCHNAPPENBERGER , Roland WEBER , Joerg KREMPEL-HESSE , Anke HELLMICH
发明人： Frank SCHNAPPENBERGER , Roland WEBER , Joerg KREMPEL-HESSE , Anke HELLMICH
IPC分类号： C23C14/34
CPC分类号： H01J37/3405 , H01J37/3435 , H01J37/3497
摘要： The present application concerns a target backing tube for a rotatable cylindrical target assembly comprising: a tube for at least one target element to be disposed there around, wherein the tube has an exterior surface adapted to be directed to the at least one target element; and a thermal reflection cover covering a portion of at least 20% of the exterior surface of the tube. Further, the present application concerns a rotatable cylindrical target assembly comprising: said target backing tube and at least one target element disposed around the target backing tube, wherein the thermal reflection cover disposed between the target backing tube and the at least one target element.
摘要翻译：本申请涉及一种用于可旋转圆柱形目标组件的目标背衬管，包括：用于至少一个目标元件的管子，其设置在其周围，其中所述管具有适于被引导到所述至少一个目标元件的外表面; 以及覆盖管的外表面的至少20％的一部分的热反射罩。此外，本申请涉及一种可旋转圆柱形目标组件，其包括：所述目标背衬管和围绕目标背衬管设置的至少一个目标元件，其中设置在目标背衬管和至少一个目标元件之间的热反射盖。

8. 发明申请

US20110240465A1 END-BLOCK AND SPUTTERING INSTALLATION 审中-公开
标题翻译：端块和溅射安装
公开(公告)号：US20110240465A1
公开(公告)日：2011-10-06
申请号：US12757752
申请日：2010-04-09
申请人： Frank SCHNAPPENBERGER
发明人： Frank SCHNAPPENBERGER
IPC分类号： C23C14/34
CPC分类号： C23C14/3407 , F16C19/38 , H01J37/3435
摘要： An end-block and a deposition apparatus including an end-block are provided. The end-block includes a base body which is adapted to be connected to the deposition apparatus in a non-rotational manner. The end-block further includes a rotary bearing arranged around the base body and a rotor which is arranged around the rotary bearing and adapted to receive a rotatable target.
摘要翻译：提供端块和包括端块的沉积设备。端块包括适于以非旋转方式连接到沉积设备的基体。端块还包括围绕基体设置的旋转轴承和围绕旋转轴承设置并适于接收可旋转靶的转子。

9. 发明申请

US20110005923A1 SPUTTERING SYSTEM, ROTATABLE CYLINDRICAL TARGET ASSEMBLY, BACKING TUBE, TARGET ELEMENT AND COOLING SHIELD 审中-公开
标题翻译：喷射系统，可旋转圆柱形目标组件，背管，目标元件和冷却屏蔽
公开(公告)号：US20110005923A1
公开(公告)日：2011-01-13
申请号：US12505379
申请日：2009-07-17
申请人： Frank SCHNAPPENBERGER , Roland WEBER , Joerg KREMPEL-HESSE , Anke HELLMICH
发明人： Frank SCHNAPPENBERGER , Roland WEBER , Joerg KREMPEL-HESSE , Anke HELLMICH
IPC分类号： C23C14/34
CPC分类号： H01J37/342 , H01J37/3405 , H01J37/3435 , H01J37/3497
摘要： The application concerns a target backing tube for a rotatable cylindrical target assembly comprising: a tube for at least one target element to be disposed there around, wherein the tube has an exterior surface adapted to face the at least one target element, wherein a portion of the exterior surface of the tube has a mean emissivity of 0.7 to 1, wherein the portion is at least 50% of the exterior surface of the tube. Further, the application concerns a cooling shield for a sputtering system comprising a rotatable target, the cooling shield has an interior surface adapted to face a target element of a sputtering system and an exterior surface; wherein a portion of the interior surface of the cooling shield has a mean emissivity of 0.7 to 1, wherein the portion is at least 50% of the interior surface of the cooling shield. Additionally, the application concerns a target element for a rotatable cylindrical target assembly of a sputtering system, wherein the target element an interior surface adapted to face a target backing tube onto which the target cylinder is adapted to be disposed and exterior surface, wherein a portion of the interior surface of the target element has a mean emissivity of 0.7 to 1, wherein the portion is at least 50% of the interior surface of the target element.
摘要翻译：该应用涉及用于可旋转的圆柱形目标组件的目标背衬管，其包括：用于至少一个目标元件的管，其被布置在其周围，其中管具有适于面向至少一个目标元件的外表面，其中一部分管的外表面具有0.7至1的平均发射率，其中该部分至少为管外表面的50％。此外，该应用涉及包括可旋转靶的溅射系统的冷却屏蔽，冷却屏具有适于面对溅射系统的目标元件和外表面的内表面; 其中所述冷却罩的内表面的一部分的平均发射率为0.7比1，其中所述部分是所述冷却屏蔽的内表面的至少50％。另外，该应用涉及一种用于溅射系统的可旋转圆柱形目标组件的目标元件，其中目标元件适于面向目标背衬管的内表面，目标圆柱体适于布置在其上并且外表面，其中一部分目标元件的内表面的平均发射率为0.7比1，其中该部分是目标元件的内表面的至少50％。

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